• 제목/요약/키워드: Low dielectric constant

검색결과 645건 처리시간 0.028초

$Ta_2O_{5}$ 커패시터 박막의 유전 특성과 열 안정성에 관한 연구 (The Study on Dielectric Property and Thermal Stability of $Ta_2O_{5}$ Thin-films)

  • 김인성;이동윤;송재성;윤무수;박정후
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제51권5호
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    • pp.185-190
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    • 2002
  • Capacitor material utilized in the downsizing passive devices and dynamic random access memory(DRAM) requires the physical and electrical properties at given area such as capacitor thickness reduction, relative dielectric constant increase, low leakage current and thermal stability. Common capacitor materials, $SiO_2$, $Si_3N_4$, $SiO_2$/$Si_3N_4$,TaN and et al., used until recently have reached their physical limits in their application to several hundred angstrom scale capacitor. $Ta_2O_{5}$ is known to be a good alternative to the existing materials for the capacitor application because of its high dielectric constant (25 ~35), low leakage current and high breakdown strength. Despite the numerous investigations of $Ta_2O_{5}$ material, there have little been established the clear understanding of the annealing effect on capacitance characteristic and conduction mechanism, design and fabrication for $Ta_2O_{5}$ film capacitor. This study presents the structure-property relationship of reactive-sputtered $Ta_2O_{5}$ MIM capacitor structure processed by annealing in a vacuum. X-ray diffraction patterns skewed the existence of amorphous phase in as-deposited condition and the formation of preferentially oriented-$Ta_2O_{5}$ in 670, $700^{\circ}C$ annealing. On 670, $700^{\circ}C$ annealing under the vacuum, the leakage current decrease and the enhanced temperature-capacitance characteristic stability. and the leakage current behavior is stable irrespective of applied electric field. The results states that keeping $Ta_2O_{5}$ annealed at vacuum gives rise to improvement of electrical characteristics in the capacitor by reducing oxygen-vacancy and the broken bond between Ta and O.

$CaCO_3$ 첨가에 따른 저온소결 PNW-PMN-PZT 세라믹스의 압전 및 유전 특성 (Piezoelectric and Dielectric Characteristics of Low Temperature Sintering PNW-PMN-PZT Ceramics with the Amount of $CaCO_3$ Addition)

  • 이상호;이창배;정광현;류주현;박창엽;정영호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.421-424
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    • 2004
  • In this study, in order to develop low temperature sintering ceramics for ultrasonic vibrator, PNW-PMN-PZT system ceramics were manufactured with the amount of $CaCO_3$ addition and their piezoelectric, dielectric and microstructural characteristics were investigated. $CaCO_3$ addition to PNW-PMN-PZT basic composition was proved to be capable of sintering the ceramics at temperature below $1000^{\circ}C$ due to the effect of $Li_2CO_3-CaCO_3$ liquid phase. However, with increasing the amount of $CaCO_3$ addition, the second phase was appeared. As the results, electromechanical coupling coefficient (kp) and dielectric constant $(\epsilon_r)$ decreased. Taking into consideration electromechanical coupling coefficient (kp) of 0.49, mechanical quality factor (Qm) of 1396, dielectric constant $(\epsilon_r)$ of 1300 and density of $7.78[g/cm^2]$, it was concluded that the 0.25wt% $CaCO_3$ addition composition ceramics sintered at $920^{\circ}C$ was suitable for ultrasonic vibrator application.

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Deposition of Plasma Polymerized Films on Silicon Substrates Using Plasma Assisted CVD Method For Low Dielectric Application

  • Kim, M.C.;S.H. Cho;J.H. Boo;Lee, S.B.;J.G. Han;B.Y. Hong;S.H. Yang
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2001년도 춘계학술발표회 초록집
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    • pp.72-72
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    • 2001
  • Plasma polymerized thin films have been deposited on Si(lOO) substrates at $25-400^{\circ}C$ using thiophene ($C_4H_4S$) precursor by plasma assisted chemical vapor deposition (PACVD) method for low-dielectric device application. In order to compare physical properties of the as-grown thin films, the effects of the plasma power, gas flow ratio and deposition temperature on the dielectric constant and thermal stability were mainly studied. XRD and TED studies revealed that the as-grown thin films have highly oriented amorphous polymer structure. XPS data showed that the polymerized thin films that grown under different RF power and deposition temperature as well as different gas ratio of $Ar:H_2$ have different stoichiometric ratio of C and S compared with that of monomer, indicating a formation of mixture polymers. Moreover, we also realized that oxygen free and thermally stable polymer thin films could be grown at even $400^{\circ}C$. The results of SEM, AFM and TEM showed that the polymer films with smooth surface and sharp interface could be grown under various deposition conditions. From the electrical property measurements such as I-V and C-V characteristics, the minimum dielectric constant and the best leakage current were obtained to be about 3.22 and $10-11{\;}A/\textrm{cm}^2$, respectively.

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임의유전체 기판을 이용한 주파수 혼합기의 소형화 (Size-Reduction of Frequency Mixers Using Artificial Dielectric Substrate)

  • 권경훈;임종식;정용채;안달
    • 전기학회논문지
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    • 제62권5호
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    • pp.657-662
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    • 2013
  • A size-reduced high frequency mixer designed by adopting artificial dielectric substrate is described in this work. The artificial dielectric substrate is composed by stacking the lower substrate in which a lot of metalized via-holes exist, and upper substrate on which microstrip lines are realized. The effective dielectric constant increases due to the inserted lots of via-holes, and this may be applied to size-reduction of high frequency circuits. In this work, in order to present an application example of size-reduction for active high frequency circuits using the artificial dielectric substrate, a 8GHz single gate mixer is miniaturized and measured. It is described that the basic circuit elements for mixers such as hybrid, low pass filter, and matching networks can be replaced by the artificial dielectric substrate for size-reduction. The final mixer has 55% of size compared to the normal one. The measured average conversion gain is around 3dB which is almost similar result as the normal circuit.

저온소결 PMN-PZT 압전세라믹의 소성시간에 따른 미세구조 및 압전특성 (Microstructural and Piezoelectric Properties of Low Temperature Sintering PMN-PZT Ceramics with the Variations of Sintering Times)

  • 류주현;이창배;이상호;백동수;정영호;임인호
    • 한국전기전자재료학회논문지
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    • 제18권3호
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    • pp.237-242
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    • 2005
  • In this paper, in order to develop the low temperature sintering ceramics for multilayer piezoelectric transformer, PMN-PZT ceramics were manufactured with the variations of sintering times, and their microstructural, piezoelectric and dielectric properties were investigated. Li$_2$CO$_3$ and Bi$_2$O$_3$ were used as sintering aids and the specimens were sintered during 30, 60, 90, 120, 150, and 180 minutes, respectively. At the specimen sintered during 90 minute, mechanical quality factor(Qm), electro-mechanical coupling factor(kp) and dielectric constant were showed the optimum values of 2,356, 0.504 and 1,266, respectively.

Microwave properties of pulsed-laser SrTiO$_3$ thin films at low temperatures

  • Lee, G.D.;Kim, C.O.;Hong, J.P.;Kwak, J.S.
    • 한국초전도학회:학술대회논문집
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    • 한국초전도학회 2000년도 High Temperature Superconductivity Vol.X
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    • pp.207-210
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    • 2000
  • Properties of SrTiO$_3$ thin films were characterized under the influence of an applied dc voltage utilizing a gold resonator with a flip-chip capacitor. The measurements were performed at microwave frequency ranges and low temperatures cryogenic temperatures. The dielectric constant of 830 and the low loss tangent of 6X10$^{-3}$ at 3.64 GHz were observed at 90 K and 100 V. The quality in the SrTiO$_3$ film was presented in terms of fractional frequency under the bias voltages and cryogenic temperatures.

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소결조제 첨가에 따른 PMW-PMN-PZT 세라믹의 저온소결 특성 (Low temperature sintering properties of the $Pb(Mg_{1/2}W_{1/2})O_3-Pb(Mn_{1/3}Nb_{2/3})O_3-Pb(Zi,Ti)O_3$ ceramics with the addition of sintering aids)

  • 이현석;류주현;이창배;정영호;백동수
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.350-351
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    • 2005
  • In this study, in order to develop the low temperature sintering multilayer piezoelectric transformer, PMW-PMN-PZT system ceramics were manufactured with the addition of sintering aids, and their dielectric and piezoelectric characteristics were investigated. At the composition ceramics sintered at $900^{\circ}C$, dielectric constant(${\varepsilon}r$), electromechanical coupling factor(kp) and mechanical quality factor(Qm) showed the optimal value of 1043, 0.44 and 793, respectively, for multilayer piezoelectric transformer application.

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PZT + 0.5wt%$MnO_2$ + 1wt%$B_2O_3$ 세라믹스의 저온소결에 관한 연구 (Low-Temperature Sintering of PZT+0.5wt%$MnO_2$+1wt%$B_2O_3$ ceramics)

  • 신혜경;김대일;배선기
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.346-347
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    • 2005
  • In this study, in order to develop the low temperature sintering ceramics, PZT ceramics adding $MnO_2$, $B_2O_3$ were manufactured, and their piezoelectric and dielectric properties is investigated. The results of this study were gotten such as follows. The electromechanical coupling coefficient(kp) showed good properties on the whole, showed its maximum value 28.266 in specimens sintered at 1200[$^{\circ}C$]. The mechanical quality coefficient(Qm) showed its maximum value 162.61 in specimens sintered at 1200[$^{\circ}C$] and was increased by increasing sintering temperature. The dielectric constant showed the optimum values of 538.903 at specimen sintered at $1000^{\circ}C$.

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Micro/Millimeter-Wave Dielectric Indialite/Cordierite Glass-Ceramics Applied as LTCC and Direct Casting Substrates: Current Status and Prospects

  • Ohsato, Hitoshi;Varghese, Jobin;Vahera, Timo;Kim, Jeong Seog;Sebastian, Mailadil T.;Jantunen, Heli;Iwata, Makoto
    • 한국세라믹학회지
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    • 제56권6호
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    • pp.526-533
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    • 2019
  • Indialite/cordierite glass-ceramics demonstrate excellent microwave dielectric properties such as a low dielectric constant of 4.7 and an extremely high quality factor Qf of more than 200 × 103 GHz when crystallized at 1300℃/20 h, which are essential criteria for application to 5G/6G mobile communication systems. The glass-ceramics applied to dielectric resonators, low-temperature co-fired ceramic (LTCC) substrates, and direct casting glass substrates are reviewed in this paper. The glass-ceramics are fabricated by the crystallization of glass with cordierite composition melted at 1550℃. The dielectric resonators are composed of crystallized glass pellets made from glass rods cast in a graphite mold. The LTCC substrates are made from indialite glass-ceramic powder crystallized at a low temperature of 1000℃/1 h, and the direct casting glass-ceramic substrates are composed of crystallized glass plates cast on a graphite plate. All these materials exhibit excellent microwave dielectric properties.

Crystal Structure and Dielectric Responses of Pulsed Laser Deposited (Ba, Sr)$TiO_3$ Thin Films with Perovskite $LaNiO_3$ Metallic Oxide Electrode

  • Lee, Su-Jae;Kang, Kwang-Yong;Jung, Sang-Don;Kim, Jin-Woo;Han, Seok-Kil
    • The Korean Journal of Ceramics
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    • 제6권3호
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    • pp.258-261
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    • 2000
  • Highly (h00)-oriented (Ba, Sr)TiO$_3$(BST) thin films were grown by pulsed laser deposition on the perovskite LaNiO$_3$(LNO) metallic oxide layer as a bottom electrode. The LNO films were deposited on SiO$_2$/Si substrates by rf-magnetron sputtering method. The crystalline phases of the BST film were characterized by x-ray $\theta$-2$\theta$, $\omega$-rocking curve and $\psi$-scan diffraction measurements. The surface microsturcture observed by scanning electron microscopy was very dense and smooth. The low-frequency dielectric responses of the BST films grown at various substrate temperatures were measured as a function of frequency in the frequency range from 0.1 Hz to 10 MHz. The BST films have the dielectric constant of 265 at 1 kHz and showed multiple dielectric relaxation at the low frequency region. The origin of these low-frequency dielectric relaxation are attributed to the ionized space charge carriers such as the oxygen vacancies and defects in BST film, the interfacial polarization in the grain boundary region and the electrode polarization. We studied also on the capacitance-voltage characteristics of BST films.

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