• Journal of the Optical Society of Korea
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• 제14권3호
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• pp.266-276
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• 2010

In the present study, an optical system is proposed for maskless lithography using a digital micromirror device (DMD). The system consists of an illumination optical system, a DMD, and a projection lens system. The illumination optical system, developed for 95% uniformity, is composed of fly's eye lens plates, a 405 nm narrow band pass filter (NBPF), condensing lenses, a field lens and a 250W halogen lamp. The projection lens system, composed of 8 optical elements, is developed for 4 ${\mu}m$ resolution. The proposed system plays a role of an optical engine for PCB and/or FPD maskless lithography. Furthermore, many problems arising from the presence of masks in a conventional lithography system, such as expense and time in fabricating the masks, contamination by masks, disposal of masks, and the alignment of masks, may be solved by the proposed system. The proposed system is verified by lithography experiments which produce a line pattern with the resolution of 4 ${\mu}m$ line width.

• 한국광학회:학술대회논문집
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• 한국광학회 1991년도 광학 및 양자전자학 워크샵
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• pp.109-114
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• 1991

좋은(sub=micron) 분해능을 갖는 Photoresist film의 방법에 의한 Micro-Lithography의 발달은 반도체, Electro-Optic 등의 첨단산업에 큰 기여를 하였다. 본 내용은 이러한 PR을 이용한 Lithography System의 광학적인 원리에 대해 소개하고자 한다.

• 한국광학회:학술대회논문집
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• 한국광학회 1990년도 제5회 파동 및 레이저 학술발표회 5th Conference on Waves and lasers 논문집 - 한국광학회
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• pp.222-226
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• 1990

This paper represents the construction of laser beam writing system, laser lithography, using new method that guarantees convenience and accuracy in laser focusing. The X, Y translation stage using DC motors was controlled by the computer. Minimum line width of 1.6${\mu}{\textrm}{m}$ was obtained by the laser lithography system.

• 한국광학회:학술대회논문집
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• 한국광학회 1991년도 제6회 파동 및 레이저 학술발표회 Prodeedings of 6th Conference on Waves and Lasers
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• pp.81-87
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• 1991

A design of a four-mirror optical system for submicron lithography using KrF excimer laser beam(λ=248nm) is presented. By using the third order aberration theory, analytic solutions for a telecentric, flat-field, and anastigmatic four-spherical-mirror system (reduction magnification 5$\times$) are found. Aspherization is carried out to the spherical mirror surfaces in order to reduce the residual higher order aberrations and vignetting effect. Finally we obtain a reflection system useful in submicron lithographic application.

• Journal of the Optical Society of Korea
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• 제16권3호
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• pp.221-227
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• 2012

We propose optical proximity corrections (OPCs) for digital micromirror device (DMD)-based maskless lithography. A pattern writing scheme is analyzed and a theoretical model for obtaining the dose distribution profile and resulting structure is derived. By using simulation based on this model we were able to reduce the edge placement error (EPE) between the design width and the critical dimension (CD) of a fabricated photoresist, which enables improvement of the CD. Moreover, by experiments carried out with the parameter derived from the writing scheme, we minimized the corner-rounding effect by controlling light transmission to the corners of a feature by modulating a DMD.

• 한국광학회:학술대회논문집
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• 한국광학회 1991년도 제6회 파동 및 레이저 학술발표회 Prodeedings of 6th Conference on Waves and Lasers
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• pp.88-89
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• 1991

For the micro-lithography using a KrF excimer laser beam(λ=0.248${\mu}{\textrm}{m}$) a mirror system consisting of four spherical surfaces with reduction magnification 5$\times$ is designed. Initially the aplanat condition of the mirror system is considered. And for the further improved performance of the system the distortion free condition and flat field condition within Seidel 3rd order aberrations are added to the above condition. During the process of designing the computer-aided optimization technique is extensively employed. The spherical aberration, coma, field curvature and distortion of the optimized four-spherical mirror system are removed to the diffraction limit, and residual astigmatism and off-axial vignetting are not corrected enough.

• Journal of the Optical Society of Korea
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• 제16권2호
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• pp.127-132
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• 2012

This study discusses photoresist forming using a composite grayscale to fabricate a Fresnel lens. Grayscale lithography is a common production method used to facilitate the forming of lenses with different curvatures and depths. However, this approach is time consuming and expensive. This study proposes a method for overcoming these obstacles by integrating a digital micromirror device and microscope to supplant the traditional physical grayscale mask. This approach provides a simple and practical maskless optical lithography system. According to the results, the two adjacent grayscales displayed substantial differences between the high grayscale and influence the low grayscale that ultimately affected photoresist formation. Furthermore, we show that change of up to 150% in the slope can be achieved by changing the grayscale gradient in the central zone and the ring profile. The results of the optical experiment show a focus change with different gray gradients.

• 반도체디스플레이기술학회지
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• 제9권1호
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• pp.17-21
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• 2010

Currently miniaturized electron-optical columns find their way into electron beam lithography systems. For better lithography process, it is required to make smaller spot size and longer working distance. But, the micro-columns of the multi-beam lithography system suffer from chromatic and spherical aberration, even when the electron beam is exactly on the symmetric axis of the micro-column. The off-axis error of the electron emitting source is expected to become worse with increasing off-axis distance of the focusing spot. Especially the electron beams far from the system optical axis have a non-negligible asymmetric intensity distribution in the micro-column. In this paper, the effect of the off-axis e-beam source is analyzed. To analyze this effect is to introduce a micro-column model of which the e-beam emitting source is aligned with the center of the electron beam by shifting them perpendicular to the system optical axis. The presented solution can be used to analysis the performance of the multi-electron-beam system. The performance parameters, such as the working distances and the focusing position are obtained by the computational simulations as a function of the off-axis distance of the emitting source.

• 한국정밀공학회지
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• 제33권10호
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• pp.845-850
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• 2016

A direct laser lithography system is widely used to fabricate various types of DOEs (Diffractive Optical Elements) including lenses made as CGH (Computer Generated Hologram). However, a parametric study that uniformly and precisely fabricates the diffractive patterns on a large area (up to $200mm{\times}200mm$) has not yet been reported. In this paper, four parameters (Focal Position Error, Intensity Variation of the Lithographic Beam, Patterning Speed, and Etching Time) were considered for stabilization of the direct laser lithography system, and the experimental results were presented.

• 마이크로전자및패키징학회지
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• 제25권3호
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• pp.37-41
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• 2018

본 논문에서는 UV 임프린트 기반의 평면 광 회로층을 이용한 산소농도 검출용 집적형 형광 프로브 모듈을 제안하였다. 제안된 형광 프로부 모듈은 광원과 형광 신호를 고효율로 전송할 수 있게 동일 광 경로를 가지는 비대칭 $1{\times}2$ 빔 분배기 형태로 설계되었으며, 이를 UV 임프린트 공정을 통해 제작하였다. 제작된 광 회로층의 끝단에 최적의 형광 염료 농도로 센서막을 코팅하여 산소 농도 검출용 광학 프로브 모듈을 구현하였다. 제작된 형광 프로부 모듈을 이용한 산소 농도 측정용 센서 시스템은 0%에서 20%의 가스 농도 범위에서 약 0.3%의 분해능까지 산소 농도를 검출 할 수 있었다. 이러한, 평면 광회로 기반의 형광 프로브 모듈은 저가의 집적형 산소 센서 검출 시스템을 가능하게 하여, 화학분야, 바이오 분야, 그리고 대기 및 수질 환경을 모니터링 하는 분야에 적용될 수 있을 것으로 기대된다.