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http://dx.doi.org/10.7736/KSPE.2016.33.10.845

Parametric Study for a Diffraction Optics Fabrication by Using a Direct Laser Lithographic System  

Kim, Young-Gwang (Department of science and Measurement, University of Science and Technology)
Rhee, Hyug-Gyo (Department of science and Measurement, University of Science and Technology)
Ghim, Young-Sik (Department of science and Measurement, University of Science and Technology)
Lee, Yun-Woo (Department of science and Measurement, University of Science and Technology)
Publication Information
Journal of the Korean Society for Precision Engineering / v.33, no.10, 2016 , pp. 845-850 More about this Journal
Abstract
A direct laser lithography system is widely used to fabricate various types of DOEs (Diffractive Optical Elements) including lenses made as CGH (Computer Generated Hologram). However, a parametric study that uniformly and precisely fabricates the diffractive patterns on a large area (up to $200mm{\times}200mm$) has not yet been reported. In this paper, four parameters (Focal Position Error, Intensity Variation of the Lithographic Beam, Patterning Speed, and Etching Time) were considered for stabilization of the direct laser lithography system, and the experimental results were presented.
Keywords
Direct laser lithographic system; Laser lithography; Diffractive Optical Element;
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Times Cited By KSCI : 2  (Citation Analysis)
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