• Title/Summary/Keyword: Lithography

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Total-internal-reflection Holographic Photo-lithography by Using Incoherent Light (비가간섭광을 이용한 내부전반사 홀로그래픽 리소그라피)

  • Lee, Joon-Sub;Park, Woo-Jae;Lee, Ji-Whan;Song, Seok-Ho;Lee, Sung-Jin
    • Korean Journal of Optics and Photonics
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    • v.20 no.6
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    • pp.334-338
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    • 2009

  • Recently, with increasing demand for flat-panel display product, methods for large area patterning are required. TIR (total internal reflection) holographic photo-lithography isstudied as one of the methods of large area lithography. In conventional TIR holography, light sources for hologram recording and image reconstruction are coherent beams such as laser beams. If the image is reconstructed with an incoherent light source such a UV lamp, the image noise from the coherence of light will be reduced and the UV lamp will be a better light source for large area exposure. We analyzed the effect of spectral bandwidth and angular bandwidth of the light source in image reconstruction and verified image blurring with experiments. For large area patterning which has micro-scale line width, it is expected that TIR holographic photo lithography by UV lamp will become a low-noise and low-priced technique.

  • https://doi.org/10.3807/KJOP.2009.20.6.334 인용 PDF KSCI

TIR Holographic lithography using Surface Relief Hologram Mask (표면 부조 홀로그램 마스크를 이용한 내부전반사 홀로그래픽 노광기술)

  • Park, Woo-Jae;Lee, Joon-Sub;Song, Seok-Ho;Lee, Sung-Jin;Kim, Tae-Hyun
    • Korean Journal of Optics and Photonics
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    • v.20 no.3
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    • pp.175-181
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    • 2009

  • Holographic lithography is one of the potential technologies for next generation lithography which can print large areas (6") as well as very fine patterns ($0.35{\mu}m$). Usually, photolithography has been developed with two target purposes. One was for LCD applications which require large areas (over 6") and micro pattern (over $1.5{\mu}m$) exposure. The other was for semiconductor applications which require small areas (1.5") and nano pattern (under $0.2{\mu}m$) exposure. However, holographic lithography can print fine patterns from $0.35{\mu}m$ to $1.5{\mu}m$ keeping the exposure area inside 6". This is one of the great advantages in order to realize high speed fine pattern photolithography. How? It is because holographic lithography is taking holographic optics instead of projection optics. A hologram mask is the key component of holographic optics, which can perform the same function as projection optics. In this paper, Surface-Relief TIR Hologram Mask technology is introduced, and enables more robust hologram masks than those previously reported that were formed in photopolymer recording materials. We describe the important parameters in the fabrication process and their optimization, and we evaluate the patterns printed from the surface-relief TIR hologram masks.

  • https://doi.org/10.3807/HKH.2009.20.3.175 인용 PDF KSCI

Room Temperature Imprint Lithography for Surface Patterning of Al Foils and Plates (알루미늄 박 및 플레이트 표면 미세 패터닝을 위한 상온 임프린팅 기술)

  • Tae Wan Park;Seungmin Kim;Eun Bin Kang;Woon Ik Park
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.2
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    • pp.65-70
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    • 2023

  • Nanoimprint lithography (NIL) has attracted much attention due to its process simplicity, excellent patternability, process scalability, high productivity, and low processing cost for pattern formation. However, the pattern size that can be implemented on metal materials through conventional NIL technologies is generally limited to the micro level. Here, we introduce a novel hard imprint lithography method, extreme-pressure imprint lithography (EPIL), for the direct nano-to-microscale pattern formation on the surfaces of metal substrates with various thicknesses. The EPIL process allows reliable nanoscopic patterning on diverse surfaces, such as polymers, metals, and ceramics, without the use of ultraviolet (UV) light, laser, imprint resist, or electrical pulse. Micro/nano molds fabricated by laser micromachining and conventional photolithography are utilized for the nanopatterning of Al substrates through precise plastic deformation by applying high load or pressure at room temperature. We demonstrate micro/nanoscale pattern formation on the Al substrates with various thicknesses from 20 ㎛ to 100 mm. Moreover, we also show how to obtain controllable pattern structures on the surface of metallic materials via the versatile EPIL technique. We expect that this imprint lithography-based new approach will be applied to other emerging nanofabrication methods for various device applications with complex geometries on the surface of metallic materials.

  • https://doi.org/10.6117/kmeps.2023.30.2.065 인용 PDF