• 전기화학회지
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• 제4권3호
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• pp.113-117
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• 2001

탄소계 전극을 사용하는 EDLC(Electric Double Layer Capacitor)용의 축전용량과 충방전속도는 전해질의 종류, 충방전 조건 그리고 탄소계 물질의 물리화학적 성질에 따라 크게 달라질 수 있다. 이에 본 연구에서는 dip coating method에 의해 제조된 EDLC용 활성탄소 전극에서 유기 전해질의 종류를 달리하여 충방전 실험과 전기화학적인 실험을 시행하였다. 또한 충전전류밀도와 방전전류밀도의 변화에 따른 비축전 용량의 변화를 조사하였고, 최적 유기전해질의 조건에서 leakage current 특성, 자가방전 특성 그리고 시간전압곡선을 기존의 $1M-Et_4NBF_4/PC$와 비교하였다 활성탄, 소전극으로 비표면적이 $2000m^2/g$인 MSP-20을 사용하고 유기전해질로는 $1M-LiPF_6/PC-DEC(1:1)$를 사용한 EDLC에서 130 F/g 정도의 우수한 비축전 용량을 나타내었고 저항면에서도 가장 낮은 수치를 나타내었다 $1M-LiPF_6/PCDEC(1:1)$를 사용한 EDLC는 15분동안 0.0004A의 낮은 leakage current와 100시간 경과 후 0.8V의 우수한 자가 방전 특성 그리고 IR-drop이 적은 선형의 시간-전압곡선을 보여주었다.

• Korean Chemical Engineering Research
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• 제47권4호
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• pp.418-423
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• 2009

유기발광다이오드(OLED)에서 정공 주입층(hole injection layer, HIL)으로 사용되는 poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate)(PEDOT:PSS)에 관능성기가 치환된 MWCNT(multi-wall carbon nanotube)를 도입하여 PEDOT:PSS-MWCNT 나노 복합재 박막을 제조하였다. PEDOT:PSS-MWCNT 박막 층은 ITO 유리 위에 스핀 코팅되어 제조하였으며 FT-IR과 UV-Vis 및 SEM을 이용하여 박막의 투과도 및 개질된 MWCNT 함량에 따른 박막의 모폴로지 특성을 관찰하였다. 또한, ITO/PEDOT:PSS-MWCNT/NPD/$Alq_3$/Al 다층 소자를 제조하여 J-V 및 L-V 특성을 고찰하였다. 산 처리에 의해 관능성기가 도입된 MWCNT는 PEDOT:PSS 용액 내에서 분산성이 확인되었으며, 제조된 박막은 우수한 투과도 특성을 보였다. 다층 소자 특성에서 PEDOT:PSS 층에 개질된 MWCNT 도입으로 MWCNT의 함량이 증가함에 따라 다층 소자의 전류 밀도가 증가됨을 확인하였고, 반면에 소자의 휘도는 급격히 감소하는 특성을 보였다. 이것은 MWCNT에 의하여 전하 이동은 수월하게 하였으나 MWCNT가 가지는 정공을 가두는 성질에 의해 정공 이동도가 저하되었기 때문인 것으로 판단된다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제4권3호
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• pp.228-239
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• 2004

In this paper, an analytical model accounting for the quantum effects in MOSFETs has been developed to study the behaviour of $high-{\kappa}$ dielectrics and to calculate the threshold voltage of the device considering two dielectrics gate stack. The effect of variation in gate stack thickness and permittivity on surface potential, inversion layer charge density, threshold voltage, and $I_D-V_D$ characteristics have also been studied. This work aims at presenting a relation between the physical gate dielectric thickness, dielectric constant and substrate doping concentration to achieve targeted threshold voltage, together with minimizing the effect of gate tunneling current. The results so obtained are compared with the available simulated data and the other models available in the literature and show good agreement.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1998년도 추계학술대회 논문집
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• pp.53-56
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• 1998

Electroluminescent(EL) devices based on organic materials have been of great interest due to their possible applications for large-area flat-panel displays, where they are attractive because of their capability of multicolor emission, and low operation voltage. In this study, glass substrate/ITO/Eu(TTA)$_3$(Phen)/Al(A), glass substrate/ITO/TPD/Eu(TTA)$_3$(p-hen)/Al(B) and glass substrate/ITO/TPD/Eu(TTA)$_3$(phen)/AlQ$_3$/Al(C) structures were fabricated by vacuum evaporation method. where aromatic diamine(TPD) was used as a hole transporting material, Eu(TTA)$_3$(phen) as an emitting material. and tris(8-hydroxyquinoline)Aluminum(AlQ$_3$) as an electron transporting layer. Electroluminescent(EL) and I-V characteristics of Eu(TTA)$_3$(Phen) with a various thickness were investigated. This structure shows the red EL spectrum, which is almost the same as the PL spectrum of Eu(TTA)$_3$(phen). I-V characteristics of this structure show that turn-on voltage was 9V and current density was 0.01A/$\textrm{cm}^2$ at a dc operation voltage of 9V. Electrical transporting phenomena of these structures was explained using the trapped- charge-limited current model with I-V characteristics.

• 한국세라믹학회지
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• 제31권11호
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• pp.1330-1336
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• 1994

Ta2O5 films were deposited on the p-Si(100) substrates by ECR-PECVD and annealed in O2 atmosphere. The thicknesses of Ta2O5/SiO2 layers were measured by an ellipsometer and a cross-sectional TEM. Annealing in O2 atmosphere enhanced the stoichiometry of the Ta2O5 film and reduced the impurity carbon content. Ta2O5 films were crystallized at the annealing temperatures above 75$0^{\circ}C$. The best leakage current characteristics and the maximum dielectric constant of Ta2O5/SiO2 film capacitor were observed in the specimen annealed at $700^{\circ}C$ and 75$0^{\circ}C$, respectively. The flat band voltage of the Al/Ta2O5/SiO2/p-Si MOS capacitor was varied in the range of -0.6~-1.6 V with the annealing temperature. The conduction mechanism in the Ta2O5 film, the variation of the effective oxide charge density with the annealing temperature, and the effective electric field distribution in the Ta2O5/SiO2 double layer were also discussed.

• Journal of Electrochemical Science and Technology
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• 제11권3호
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• pp.238-247
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• 2020

Some nano structured bimetallic NiPd electrocatalysts were electrodeposited on glassy carbon electrodes using a double potential step chronoamperometry. The morphology of the electrodeposited samples was investigated by field emission-scanning electron microscopy, while their compositions were evaluated using energy dispersive X-ray spectroscopy. It was observed that the electrodeposited samples contained a low Ni content, in the range of 0.80 - 7.10%. The electrodeposited samples were employed as the anode electro-catalysts for the oxidation of sodium borohydride in NaOH solution (1.0 M) using cyclic voltammetry, chronoamperometry, rotating disk electrode, and impedance spectroscopy. The number of exchanged electrons, charge transfer resistances, apparent rate constants, and double layer capacitances were calculated for the oxidation of borohydride on the prepared catalysts. According to the results obtained, the NiPd-2 sample with the lowest Ni content (0.80%), presented the highest catalytic activity for borohydride oxidation compared with the other NiPd samples as well as the pure Pd sample. The anodic peak current density was obtained to be about 1.3 times higher on the NiPd-2 sample compared with that for the Pd sample.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2008년도 제39회 하계학술대회
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• pp.1291-1292
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• 2008

ITO is widely used as an anode material in OLED, because of its good transparency, low electrical resistivity, high work function, and efficient hole injection properties. The interface between the electrode and the organic layer in the OLED effects the charge injection process and may influence the electrical and the luminance properties. Surface treatment of ITO, such as an Aquaregia treatment has been shown to enhance the efficiency, and luminance characteristics of the OLED. In this study, we investigated the effect of Aquaregia treatment. The fundamental structures of the OLED were ITO/NPB/$Alq_3$/LiF/Al. The current density-voltage-luminance, efficiency, and lifetime characteristics were measured with untreated and Aquaregia-treated ITO substrates. The Aquaregia treatment was found to enhance the performance of OLED. For the Aquaregia treated device, the maximum luminance and efficiency were increased by about 2 times compared to the untreated device. The mechanism of the Aquaregia treatment is discussed based on AFM analyses.

• 한국재료학회지
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• 제28권1호
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• pp.18-23
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• 2018

To study the impedance characteristics of a fluorescent OLED according to the device structure, we fabricated Device 1 using ITO / NPB / $Alq_3$ / Liq / Al, Device 2 using ITO / 2-TNATA / NPB / $Alq_3$ / Liq / Al, and Device 3 using ITO / 2-TNATA / NPB / SH-1:BD / $Alq_3$ / Liq / Al. The current density and luminance decreased with an increasing number of layers of the organic thin films in the order of Device 1, 2, 3, whereas the current efficiency increased. From the Cole-Cole plot at a driving voltage of 6 V, the maximum impedance values of Devices 1, 2, and 3 were respectively 51, 108, and $160{\Omega}$ just after device fabrication. An increase in the impedance maximum value is a phenomenon caused by the charge mobility and the resistance between interfaces. With the elapse of time after the device fabrication, the shape of the Cole-Cole plot changed to a form similar to 0 or a lower voltage due to the degradation of the device. As a result, we were able to see that an impedance change in an OLED reflects the characteristics of the degradation and the layer.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.587-587
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• 2012

Supercapacitors, which can deliver significant energy with high power density, have attracted a lot of attention due to their potential application in energy storage. Among various oxide materials, sodium vanadate has been recognized as one of the most promising electrode materials because of high electrical conductivity. In addition, larger layer spacing of ${\beta}$-Na0.33V2O5 compared to V2O5 makes easier Li+ insertion. Moreover, ${\beta}$-Na0.33V2O5 has a tunnel like structure along b axis with 3 kinds of V site allowing it to enhance the ion intercalation by introducing three different intercalation sites along the tunnel. The tunnel can act as a fast diffusion path for ion diffusion, which can improve the overall charge storage kinetics. In this study, high quality single crystalline sodium vanadate (${\beta}$-Na0.33V2O5) nanowires were grown directly on Pt coated $SiO_2$ substrate by a facile chemical solution deposition method without employing catalyst, surfactant or carrier gas. The results show that great enhancement in capacitance was observed compared with previous reports.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.67.1-67.1
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• 2012

Graphene has attracted much attention for future nanoelectronics due to its superior electrical properties. Owing to its extremely high carrier mobility and controllable carrier density, graphene is a promising material for practical applications, particularly as a channel layer of high-speed FET. Furthermore, the planar form of graphene is compatible with the conventional top-down CMOS fabrication processes and large-scale synthesis by chemical vapor deposition (CVD) process is also feasible. Despite these promising characteristics of graphene, much work must still be done in order to successfully develop graphene FET. One of the key issues is the process technique for gate dielectric formation because the channel mobility of graphene FET is drastically affected by the gate dielectric interface quality. Formation of high quality gate dielectric on graphene is still a challenging. Dirac voltage, the charge neutral point of the device, also strongly depends on gate dielectrics. Another performance killer in graphene FET is source/drain contact resistance, as the contact resistant between metal and graphene S/D is usually one order of magnitude higher than that between metal and silicon S/D. In this presentation, the key issues on graphene-based FET, including organic-inorganic hybrid gate dielectric formation, controlling of Dirac voltage, reduction of source/drain contact resistance, device structure optimization, graphene gate electrode for improvement of gate dielectric reliability, and CVD graphene transfer process issues are addressed.