• Title/Summary/Keyword: Laser beam exposure pattern

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Double Exposure Laser Interference Lithography for Pattern Diversity using Ultraviolet Continuous-Wave Laser

  • Ma, Yong-Won;Park, Jun Han;Yun, Dan Hee;Gwak, Cheongyeol;Shin, Bo Sung
    • Journal of the Microelectronics and Packaging Society
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    • v.26 no.2
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    • pp.9-14
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    • 2019
  • The newly discovered properties of periodic nanoscale patterns have increasingly sparked research interests in various fields. Along this direction, it is worth mentioning that there had been rare studies conducted on interference exposure, a method of creating periodic patterns. Additionally, these few studies seemed to validate the existence of only exact quadrangle shapes and dot patterns. This study asserted the formation of wavy patterns associated to using multiple exposures of the ratio of the first exposure intensity to the second exposure intensity. Such patterns were designed and constructed herein via overlapping of two Gaussian beams relative to certain rotation angles, and with a submicron structure fabricated based on a 360-nm continuous-wave laser. Results confirmed that the proposed double exposure laser interference lithography is able to create circular, elliptical and wavy patterns with no need for complex optical components.

A Study on the Analysis of Multi-beam Energy for High Resolution with Maskless Lithography System Using DMD (DMD를 이용한 마스크리스 리소그래피 시스템의 고해상도 구현을 위한 다중 빔 에너지 분석에 관한 연구)

  • Kim, Jong-Su;Shin, Bong-Cheol;Cho, Yong-Kyu;Cho, Myeong-Woo;Lee, Soo-Jin
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.12 no.2
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    • pp.829-834
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    • 2011
  • Exposure process is the most important technology to fabricate highly integrated circuit. Up to now, mask type lithography process has been generally used. However, it is not efficient for small quantity and/or frequently changing products. Therefore, maskless lithography technology is raised in exposure process. In this study, relations between multi-beam energy and overlay were analyzed. Exposure experiment of generating pattern was performed. It was from presented scan line by multi- beam simulation. As a result, optimal scan line distance was proposed by simulation, and micro pattern accuracy could be improved by exposure experiment using laser direct imaging system.

Fluorescent Pattern Generation on the Fluorescent Photopolymer with 2-beam Coupling Method (2-beam Coupling 방법을 이용한 광 고분자 형광 패턴 형성)

  • Kim, Yoon-Jung;Kim, Jeong-Hun;Sim, Bo-Yeon;Lee, Myeong-Kyu;Kim, Eun-Kyoung
    • Korean Journal of Optics and Photonics
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    • v.21 no.1
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    • pp.6-11
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    • 2010
  • Fluorescent photopolymer film was prepared with composition containing acrylate monomer, binder, a visible light sensitive photo initiator, and fluorescent anthracene polymer. A fluorescent grating pattern was inscribed on the photopolymer film using a 2-beam coupling method. A 514 nm laser was coupled to generate a beam-interference pattern. A highly fluorescent diffractive line pattern was formed on the fluorescent photopolymer within 30 sec. of exposure. The fluorescence intensity was highly enhanced in the patterned area, possibly due to the change in the environment of the fluorescent polymers by the photo-polymerization of monomers. Under a photo-mask, a gap electrode pattern was formed of fluorescent gratings with a sub-micron scale, which was matched well to the calculated value ($2.5\;{\mu}m$ and $0.6\;{\mu}m$) based on the refractive index of the photopolymer and beam incident angle ($3.4^{\circ}$, $15^{\circ}$) to the photopolymer surface.

A study of multiple-exposure nanosphere lithography for photonic quasi-crystals fabrication (광자 준결정 제작을 위한 다중 노광 나노구 리소그라피 연구)

  • Yeo, Jong-Bin;Lee, Hyun-Yong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.62-62
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    • 2010
  • Photonic quasi-crystals(PQCs) have been fabricated by a multiple-exposure nanosphere lithography (MENSL) method using the self-assembled nanospheres as lens-mask patterns. The multiple-exposing source is collimated laser beam and rotation, tilting system. The arrays of the PQCs exhibited variable lattice structures and shape the control of ratating angle ($\theta$), tilting angle ($\gamma$) and the exposure conditions. The used nanosphere size is upto the $1\;{\mu}m$. Images of prepared 2D PQCs were observed by SEM. We believe that the MENSL method is a suitable useful tool to realize the PQCs arrays of large area.

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Fabrication of Pair-Photonic Crystal Arrays using Multiple-Exposure Nanosphere Lithography (다중노광 나노구 리소그라피를 이용한 쌍-광자결정 어레이 제작)

  • Yeo, Jong-Bin;Han, Gwang-Min;Lee, Hyun-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.3
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    • pp.245-249
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    • 2010
  • Two dimensional(2D) pair-photonic crystals (pair-PCs) have been fabricated by a multiple-exposure nanosphere lithography (MENSL) method using the self-assembled nanospheres as lens-mask patterns and the collimated laser beam as a multiple-exposing source. The arrays of the 2D pair-PCs exhibited variable lattice structures and shape the control of rotating angle (${\Theta}$), tilting angle (${\gamma}$) and the exposure conditions. In addition, the base period or filling factor of pair-PCs as well as their shapes could be changed by experimental conditions and nanosphere size. A 1.18-${\mu}m$-thick resist was spincoated on Si substrate and the multiple exposure was carried out at change of ${\gamma}$ and ${\Theta}$. Images of prepared 2D pair-PCs were observed by SEM. We believe that the MENSL method is a suitable useful tool to realize the pair-periodic arrays of large area.

Measurement of In- plane Displacement by Speckle Photography and Image Processing (스펙클 포토그라피와 화상처리(畵像處理)에 의(依)한 면내변위(面內變位) 계측(計測))

  • Han, Eung-Kyo;Sumi, Seinosuke;Kim, Koung-Suk
    • Journal of the Korean Society for Nondestructive Testing
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    • v.6 no.2
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    • pp.37-45
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    • 1987
  • Speckle photography is a very useful method for measuring in-plane surface displacement. In its basic form, the object to be studied is illuminated with a divergent laser beam, and a double exposure photograph of the object is recorded, on a fine-grain film or plate, before and after the object is deformed, The magnitude and the direction of the displacement can then be obtained by measuring the spacing and the direction of the Young's fringe, which is produced by probing the developed negative with an unexpaned laser beam, and consists of a pattern of parallel equi-spaced dark bands. In this paper, a hybrid optical and electronic image processing is described-Young's fringe on the viewing screen is observed by a TV-camera and the 2-D video signal is converted from analog to digital and transfered to the computer where the spacing and direction of the fringes are calculated. Several examples of application show that the displacement magnitude and direction can be determined with an accuracy of $0.1{\mu}m\;and\;0.1^{\circ}$ respectively.

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Fabrication of 2D Bravais Nano Pattern and Growth of ZnO Nano Rods with Photonic Crystal Effect (2차원 Bravais Lattice를 가지는 나노 패턴 제조 및 광결정 효과를 가지는 ZnO 나노 기둥 성장)

  • Kim, Tae-Un;Moon, Jong-Ha;Kim, Seon-Hoon;Kim, Doo-Gun;Kim, Jin-Hyeok
    • Korean Journal of Materials Research
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    • v.21 no.12
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    • pp.697-702
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    • 2011
  • Two-dimensional (2D) nano patterns including a two-dimensional Bravais lattice were fabricated by laser interference lithography using a two step exposure process. After the first exposure, the substrate itself was rotated by a certain angle, $90^{\circ}$ for a square or rectangular lattice, $75^{\circ}$ for an oblique lattice, and $60^{\circ}$ for a hexagonal lattice, and the $90^{\circ}$ and laser incident angle changed for rectangular and the $45^{\circ}$ and laser incident angle changed for a centered rectangular; we then carried out a second exposure process to form 2D bravais lattices. The band structure of five different 2D nano patterns was simulated by a beam propagation program. The presence of the band-gap effect was shown in an oblique and hexagonal structure. The oblique latticed ZnO nano-photonic crystal array had a pseudo-bandgap at a frequency of 0.337-0.375, 0.575-0.596 and 0.858-0.870. The hexagonal latticed ZnO nano-crystallite array had a pseudo-bandgap at a frequency of 0.335-0.384 and 0.585-0.645. The ZnO nano structure with an oblique and hexagonal structure was grown through the patterned opening window area by a hydrothermal method. The morphology of 2D nano patterns and ZnO nano structures were investigated by atomic force microscopy and scanning electron microscopy. The diameter of the opening window was approximately 250 nm. The height and width of ZnO nano-photonic crystals were 380 nm and 250 nm, respectively.