• 제목/요약/키워드: Laser beam exposure pattern

검색결과 8건 처리시간 0.024초

Double Exposure Laser Interference Lithography for Pattern Diversity using Ultraviolet Continuous-Wave Laser

  • Ma, Yong-Won;Park, Jun Han;Yun, Dan Hee;Gwak, Cheongyeol;Shin, Bo Sung
    • 마이크로전자및패키징학회지
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    • 제26권2호
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    • pp.9-14
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    • 2019
  • The newly discovered properties of periodic nanoscale patterns have increasingly sparked research interests in various fields. Along this direction, it is worth mentioning that there had been rare studies conducted on interference exposure, a method of creating periodic patterns. Additionally, these few studies seemed to validate the existence of only exact quadrangle shapes and dot patterns. This study asserted the formation of wavy patterns associated to using multiple exposures of the ratio of the first exposure intensity to the second exposure intensity. Such patterns were designed and constructed herein via overlapping of two Gaussian beams relative to certain rotation angles, and with a submicron structure fabricated based on a 360-nm continuous-wave laser. Results confirmed that the proposed double exposure laser interference lithography is able to create circular, elliptical and wavy patterns with no need for complex optical components.

DMD를 이용한 마스크리스 리소그래피 시스템의 고해상도 구현을 위한 다중 빔 에너지 분석에 관한 연구 (A Study on the Analysis of Multi-beam Energy for High Resolution with Maskless Lithography System Using DMD)

  • 김종수;신봉철;조용규;조명우;이수진
    • 한국산학기술학회논문지
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    • 제12권2호
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    • pp.829-834
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    • 2011
  • 고 집적 회로의 제작에 있어서 노광 공정은 가장 중요한 기술로 주로 마스크 방식의 노광 방법을 사용하지만 다품종 소량 생산 및 주기적인 제품 변화에 있어서 효율적이지 못하기 때문에 마스크리스 리소그래피 기술이 노광공정에서 각광받고 있다. 본 연구에서는 DMD를 이용한 마스크리스 리소그래피에 있어 다중 레이저 빔의 에너지와 중첩도와의 연관성을 시뮬레이션을 통해 분석하였다. 시뮬레이션을 통해 최적의 스캔 라인 간격을 제시하였고, LDI 시스템을 이용한 노광 실험을 통해 미세 페턴의 정밀도를 향상시킬 수 있었다.

2-beam Coupling 방법을 이용한 광 고분자 형광 패턴 형성 (Fluorescent Pattern Generation on the Fluorescent Photopolymer with 2-beam Coupling Method)

  • 김윤정;김정훈;심보연;이명규;김은경
    • 한국광학회지
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    • 제21권1호
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    • pp.6-11
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    • 2010
  • 아크릴레이트계 모노머를 사용한 최적화 된 포토폴리머에 안트라센 형광폴리머를 첨가하여 형광 특성을 가지는 포토폴리머를 제조하고, 514 nm 레이저를 이용하여 2-beam coupling 방법으로 형광 포토폴리머 필름 위에 회절격자를 형성하였다. 기록 시작 후 30초 이내에 선명한 fluorescent line pattern 이 형성되었으며, 회절격자 형성 뒤, 패턴이 형성된 부분에서 형광 세기의 증가가 관찰되었다. 기록 시 간섭 빔 앞에 mask pattern 을 이용하여 $50\;{\mu}m$ gap electrode 패턴을 형성하였다. 이 때 형성된 패턴은 micron scale gap패턴 안에 회절격자로부터 생성된 submicron scale의 grating line을 보였다. 이는 beam의 광 고분자 film 표면에 대한 각도($3.6^{\circ}$, $15^{\circ}$), 패턴에 사용된 광 고분자의 굴절률 등으로부터 Bragg's equation 을 사용하여 계산된 이론적인 grating 간격 ($0.6\;{\mu}m$) 과 오차범위 안에서 일치 하였다.

광자 준결정 제작을 위한 다중 노광 나노구 리소그라피 연구 (A study of multiple-exposure nanosphere lithography for photonic quasi-crystals fabrication)

  • 여종빈;이현용
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.62-62
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    • 2010
  • Photonic quasi-crystals(PQCs) have been fabricated by a multiple-exposure nanosphere lithography (MENSL) method using the self-assembled nanospheres as lens-mask patterns. The multiple-exposing source is collimated laser beam and rotation, tilting system. The arrays of the PQCs exhibited variable lattice structures and shape the control of ratating angle ($\theta$), tilting angle ($\gamma$) and the exposure conditions. The used nanosphere size is upto the $1\;{\mu}m$. Images of prepared 2D PQCs were observed by SEM. We believe that the MENSL method is a suitable useful tool to realize the PQCs arrays of large area.

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다중노광 나노구 리소그라피를 이용한 쌍-광자결정 어레이 제작 (Fabrication of Pair-Photonic Crystal Arrays using Multiple-Exposure Nanosphere Lithography)

  • 여종빈;한광민;이현용
    • 한국전기전자재료학회논문지
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    • 제23권3호
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    • pp.245-249
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    • 2010
  • Two dimensional(2D) pair-photonic crystals (pair-PCs) have been fabricated by a multiple-exposure nanosphere lithography (MENSL) method using the self-assembled nanospheres as lens-mask patterns and the collimated laser beam as a multiple-exposing source. The arrays of the 2D pair-PCs exhibited variable lattice structures and shape the control of rotating angle (${\Theta}$), tilting angle (${\gamma}$) and the exposure conditions. In addition, the base period or filling factor of pair-PCs as well as their shapes could be changed by experimental conditions and nanosphere size. A 1.18-${\mu}m$-thick resist was spincoated on Si substrate and the multiple exposure was carried out at change of ${\gamma}$ and ${\Theta}$. Images of prepared 2D pair-PCs were observed by SEM. We believe that the MENSL method is a suitable useful tool to realize the pair-periodic arrays of large area.

스펙클 포토그라피와 화상처리(畵像處理)에 의(依)한 면내변위(面內變位) 계측(計測) (Measurement of In- plane Displacement by Speckle Photography and Image Processing)

  • 한응교;각설지조;김경석
    • 비파괴검사학회지
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    • 제6권2호
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    • pp.37-45
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    • 1987
  • Speckle photography is a very useful method for measuring in-plane surface displacement. In its basic form, the object to be studied is illuminated with a divergent laser beam, and a double exposure photograph of the object is recorded, on a fine-grain film or plate, before and after the object is deformed, The magnitude and the direction of the displacement can then be obtained by measuring the spacing and the direction of the Young's fringe, which is produced by probing the developed negative with an unexpaned laser beam, and consists of a pattern of parallel equi-spaced dark bands. In this paper, a hybrid optical and electronic image processing is described-Young's fringe on the viewing screen is observed by a TV-camera and the 2-D video signal is converted from analog to digital and transfered to the computer where the spacing and direction of the fringes are calculated. Several examples of application show that the displacement magnitude and direction can be determined with an accuracy of $0.1{\mu}m\;and\;0.1^{\circ}$ respectively.

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2차원 Bravais Lattice를 가지는 나노 패턴 제조 및 광결정 효과를 가지는 ZnO 나노 기둥 성장 (Fabrication of 2D Bravais Nano Pattern and Growth of ZnO Nano Rods with Photonic Crystal Effect)

  • 김태언;문종하;김선훈;김두근;김진혁
    • 한국재료학회지
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    • 제21권12호
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    • pp.697-702
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    • 2011
  • Two-dimensional (2D) nano patterns including a two-dimensional Bravais lattice were fabricated by laser interference lithography using a two step exposure process. After the first exposure, the substrate itself was rotated by a certain angle, $90^{\circ}$ for a square or rectangular lattice, $75^{\circ}$ for an oblique lattice, and $60^{\circ}$ for a hexagonal lattice, and the $90^{\circ}$ and laser incident angle changed for rectangular and the $45^{\circ}$ and laser incident angle changed for a centered rectangular; we then carried out a second exposure process to form 2D bravais lattices. The band structure of five different 2D nano patterns was simulated by a beam propagation program. The presence of the band-gap effect was shown in an oblique and hexagonal structure. The oblique latticed ZnO nano-photonic crystal array had a pseudo-bandgap at a frequency of 0.337-0.375, 0.575-0.596 and 0.858-0.870. The hexagonal latticed ZnO nano-crystallite array had a pseudo-bandgap at a frequency of 0.335-0.384 and 0.585-0.645. The ZnO nano structure with an oblique and hexagonal structure was grown through the patterned opening window area by a hydrothermal method. The morphology of 2D nano patterns and ZnO nano structures were investigated by atomic force microscopy and scanning electron microscopy. The diameter of the opening window was approximately 250 nm. The height and width of ZnO nano-photonic crystals were 380 nm and 250 nm, respectively.