• 제목/요약/키워드: Laser Direct Patterning

검색결과 63건 처리시간 0.039초

Characteristics of Laser Direct Patterned Indium Tin Oxide Layer by Overlapping Rates of Laser Beam

  • Li, Zhao-Hui;Ahn, Min-Hyung;Choi, Kyung-Min;Im, Seung-Hyeok;Jung, Kyung-Seo;Cho, Eou-Sik;Kwon, Sang-Jik
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1496-1499
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    • 2009
  • A diode-pumped Nd:$YVO_4$ laser was used to obtain indium tin oxide (ITO) patterns on glass substrate with various overlapping rates. The results showed that the overlapping rate of laser beam influences on the edge structure of ITO pattern and the surface roughness of ablated groove bottom. At a laser repetition rate of 40 kHz, the optimized condition of overlapping rate was 75 %.

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PC 기판상에 스퍼터링된 투명전도 산화막의 레이저 식각 특성 (Laser Direct Etching on Transparent Conductive Oxide Films Sputtered on Polycarbonate Substrates)

  • 이정민;권상직;조의식
    • 한국전기전자재료학회논문지
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    • 제27권3호
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    • pp.146-150
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    • 2014
  • As a method of simple patterning of transparent conductive oxide (TCO) films deposited on flexible substrates, laser direct etching was carried out on TCO films sputtered on polycarbonate (PC) substrates. As a result of different binding energies in TCO films, indium tin oxide (ITO) and indium gallium zinc oxide (IGZO) were more easily etched than zinc oxide with different $Nd:YVO_4$ laser beam conditions.

레이저 직접 묘화법에 의한 알루미나 기판위의 미세 전도성 패턴 제작 (The fabrication of micro- size conductor lines on alumina patterned by laser ablation)

  • 김혜원;이제훈;신동식;강성군
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.1889-1892
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    • 2003
  • The fabrication of micro-size patterning on alumina substrate is generated by laser direct writing, which has high precision and selectivity of various laser beam energies. The depth and width of patterns is affected by laser parameter such as laser power, scan rate. Through the chemical and mechanical polishing Pd seeds was effectively got rid of alumina substrate for selectivity electroless Ni plating. Thermal treatment is good method for changing electrical property of conductor line, because the treatment can control of the grain size.

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집속 아르곤 이온 레이저 빔을 이용한 레이저 유도 직접 구리 패터닝 (Laser-Induced Direct Copper Patterning Using Focused $Ar^+$ Laser Beam)

  • 이홍규;이경철;안민영;이천
    • 한국전기전자재료학회논문지
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    • 제13권11호
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    • pp.969-975
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    • 2000
  • Laser direct writing of micro-patterned copper lines has been achieved by pyrolytic decomposition of copper formate films (Cu(HCOO)$_2$.4$H_2O$), as a metallo-organic precursor, using a focused CW Ar$^{+}$ laser beam (λ=514nm) on PCB boards and glass substrates. The linewidth and thickness of the lines wee investigated as a functin of laser power and scan speed. The profiles of the lines were measured by scanning electron microscope (SEM), surface profiler ($\alpha$-step) and atomic force measured by scanning electron microscope (SEM), surface profiler ($\alpha$-step) and atomic force microscopy (AFM). The electrical resistivities of the patterned lines were also investigated as a function of laser parameters using probe station and semiconductor analyzer. We compared resistivities of the patterned copper lines with these of the Cu bulk. Resistivities decreased due to changes in morphology and porosity of the deposit, which were about 3.8 $\mu$$\Omega$cm and 12$\mu$$\Omega$cm on PCB and glass substrates after annealing at 30$0^{\circ}C$ for 5 minutes.s.

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다중 패턴의 회절광학소자 제작을 위한 레이저 직접 노광시스템의 공정 연구 (Process Study of Direct Laser Lithographic System for Fabricating Diffractive Optical Elements with Various Patterns)

  • 김영광;이혁교;김영식;이윤우
    • 반도체디스플레이기술학회지
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    • 제18권2호
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    • pp.58-62
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    • 2019
  • Diffractive Optical Elements(DOEs) diffracts incident light using the diffraction phenomenon of light to generate a desired diffraction image. In recent years, the use of diffraction optics, which can replace existing refractive optical elements with flat plates, has been increased by implementing various optical functions that could not be implemented in refractive optical devices and by becoming miniaturized and compacted optical elements. Direct laser lithography is typically used to effectively fabrication such a diffractive optical element in a large area with a low process cost. In this study, the process conditions for fabricating patterns of diffractive optical elements in various shapes were found using direct laser lithographic system, and optical performance evaluation was performed through fabrication.

LIFT 방법에 의한 전도성 미세 패터닝 공정 연구 (Micro patterning of conductor line by laser induced forward transfer(LIFT))

  • 이제훈;한유희
    • 한국레이저가공학회지
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    • 제2권3호
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    • pp.52-61
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    • 1999
  • The laser induced forward transfer(LIFT) technique employs a pulsed laser to transfer parts of a thin metal film from an optically transparent target onto an arbitrary substrate in close proximity to the metal film on the target. In this work, a two-step method, the combination of LIFT process, in which a Au film deposited on the $Al_2$O$_3$ substrate by Nd:YAG laser and subsequent Au electroless metal plating on the by LIFT process generated Au seed, was presented. The influence of laser parameters, wavelength, laser power, film thickness and overlap ratio of pulse tracks, on the shapes of deposit and conductor line after electroless plating is experimentally studied. As a results, the threshold power densities for ablation, deposition and metallization were determined and comparison of threshold value between the wave length 1064nm and the second harmonic generated 532nm. In odor to determine a possible application in the electronic industry, a smallest conduct spot size, line width and isolated line space were generated.

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Ag Electrode Strain Sensor Fabrication Using Laser Direct Writing Process

  • Kim, Hyeonseok;Shin, Jaeho;Hong, Sukjoon;Ko, Seung Hwan
    • 센서학회지
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    • 제24권4호
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    • pp.215-218
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    • 2015
  • As several innovative technologies for flexible electric devices are being realized, demand for in-situ strain monitoring for flexible electric devices is being emphasized. Because flexible devices are commonly influenced by substrate strain, suitable strain sensors for flexible devices are essential for the sophisticated maneuvering of flexible devices. In this study, a flexible strain sensor based on an Ag electrode is prepared on a polyimide substrate using the LDW (laser direct writing) process. In this process, first, the Ag nanoparticles are coated on the substrate and selectively sintered using a focused laser. Because of the advantages of the LDW process (such as being mask-less, using low temperatures, and having non-vacuum characteristics), the entire fabrication process has been dramatically simplified; as a final outcome, a highly reliable strain sensor has been fabricated. Using this strain sensor, various strain conditions that arise from different bending radii can be detected by measuring real-time electrical signals.

플라즈마 디스플레이 패널을 위한 레이저 직접 패터닝 (Laser-Direct Patterning for Plasma Display Panel)

  • 안민영;이경철;이홍규;이천
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.99-102
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    • 1999
  • A mixture which was made from organic gel, glass powder and ceramic powder was masklessly etched for fabrication of barrier rib of PDP(Plasma Display Panel) by focused Ar$^{+}$ laser( λ =514 nm) and Nd:YAG(λ =532, 266 nm) laser irradiation at the atmosphere. The depth of the etched grooves increases with increasing a laser fluence and decreasing a scan speed. Using second harmonic of Nd:YAG laser, the threshold laser fluence was 6.5 mJ/$\textrm{cm}^2$ for the sample of PDP barrier rib softened at 12$0^{\circ}C$. The thickness of 130 ${\mu}{\textrm}{m}$ of the sample on the glass was clearly removed without any damage on the glass substrate by fluence of 19.5 J/$\textrm{cm}^2$....

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펨토초 레이저 펄스를 이용한 환원된 그래핀의 최소 선폭 패턴 구현에 관한 연구 (The study of optimal reduced-graphene oxide line patterning by using femtosecond laser pulse)

  • 정태인;김승철
    • 한국융합학회논문지
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    • 제11권7호
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    • pp.157-162
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    • 2020
  • 최근 레이저를 이용하여 환원된 친환경 그래핀 패턴 기술(Laser Induced Graphene, LIG)은 간단하고 효율적으로 원하는 형태로 다양한 기판 위에 패터닝하는 것이 가능하여 신축 유연 전자 소자, 박막 형태의 에너지 저장 소자 등과 같이 새로운 친환경 전자 소자 제작에 많이 활용되고 있다. 이러한 그래핀 패턴 구조를 이용한 전자 소자의 성능과 효용성을 높이기 위해서는 그래핀 고유의 2차원 특성을 유지하면서 가능한 최소한의 선폭을 구현할 수 있는 최적화된 레이저 패터닝 조건에 대한 연구가 필수적이다. 본 논문에서는 최근 레이저 그래핀 패턴 연구에서 많이 사용되는 Ti:sapphire 펨토초 레이저를 이용해서 그래핀 광-열 산화반응을 분석하여 최적화된 그래핀의 최소선폭을 구현하였다. 레이저 에너지의 확산 효과를 최소화하기 위하여 레이저 광강도와 레이저 스캔 속도를 조절하여 최적의 그래핀 특성을 나타내는 패턴을 연구하였으며 18 ㎛의 집속된 빔을 이용하여 최소 30 ㎛의 이차원 그래핀 선폭을 구현하였다.