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http://dx.doi.org/10.15207/JKCS.2020.11.7.157

The study of optimal reduced-graphene oxide line patterning by using femtosecond laser pulse  

Jeong, Tae-In (Dept. of Cogno-Mechatronics Engineering, Pusan National University)
Kim, Seung-Chul (Dept. of Optics and Mechatronics Engineering, Dept. of Cogno-Mechatronics Engineering, Pusan National University)
Publication Information
Journal of the Korea Convergence Society / v.11, no.7, 2020 , pp. 157-162 More about this Journal
Abstract
In recent years, laser induced graphene process have been intensively studied for eco-friendly electronic device such as flexible electronics or thin film based energy storage devices because of its simple and effective process. In order to increase the performance and efficiency of an electronic device using such a graphene patterned structure, it is essential to study an optimized laser patterning condition as small as possible linewidth while maintaining the graphene-specific 2-dimensional characteristics. In this study, we analyzed to find the optimal line pattern by using a Ti:sapphire femtosecond laser based photo-thermal reduction process. we tuned intensity and scanning speed of laser spot for generating effective graphene characteristic and minimum thermal effect. As a result, we demonstrated the reduced graphene pattern of 30㎛ in linewidth by using a focused laser beam of 18㎛ in diameter.
Keywords
Graphene; Reduced graphene oxide; Laser induced graphene; Minimum linewidth; Femtosecond laser direct writing;
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