• Title/Summary/Keyword: LPE method

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An investigation of optical characteristics of InGaAsP/InP RWG MQW-LD by LPE method (LPE(Liquid phase Epitaxy)방법으로 제작된 InGaAs/InP Ridge Waveguide Multiple Quantum Well Laser Diode의 광학적 특성조사)

  • 오수환;하홍춘;박윤호;안세경;이석정;홍창희
    • Korean Journal of Optics and Photonics
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    • v.7 no.3
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    • pp.266-271
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    • 1996
  • In this study the evaluation of RWG MQW-LD fabricated with our vertical LPE system has been carried out with measuring its optical characteristics. This laser diode operated in lateral single mode as designed, and it showed 77% of internal quantum efficiency, 18cm of internal loss and 5.5$\AA$/$^{\circ}C$ of the thermal characterictic of the lasing wavelength. From these results we conclude that the vertical LPE system are fairly good and it might he useful to fabricate MQW wafer for laser diode.

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The Development of Fertical type LPE System for Single Crystal Growth (단결정 성장을 위한 수직형 LPE 장치의 제작)

  • 오종환
    • Proceedings of the Optical Society of Korea Conference
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    • 1989.02a
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    • pp.201-205
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    • 1989
  • In this study, the vertical type LPE system has been developed by fully hand-made. The temperature fluctuation and minimum cooling rate of this LPE system are within $\pm$0.05$^{\circ}C$ and 0.15$^{\circ}C$/min, respectively. It is considered that these properties are enough to grow III-V semiconductor compounds single crystals by liquid phase epitaxy method. Futhermore in this study. 1.3${\mu}{\textrm}{m}$ GaInAsP/InP single crystal growing has been carried out by this system. It has been obtained that the growing rate was about 0.72${\mu}{\textrm}{m}$/min for InP binary layer and 0.36${\mu}{\textrm}{m}$/min for GaInAsP quarternary layer under 0.6$^{\circ}C$/min cooling rate condition.

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Superconducting Properties and Tunneling Spectroscopy of Bi2Sr2Ca(Cu1-xNix)2O8+δ Film by LPE Method (LPE법으로 성장시킨 Bi2Sr2Ca(Cu1-xNix)2O8+δ 막(film)의 초전도특성 및 터널링 분광)

  • 이민수
    • Journal of the Korean Ceramic Society
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    • v.40 no.5
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    • pp.455-459
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    • 2003
  • Tunneling spectra of B $i_2$S $r_2$Ca(C $u_{1-x}$ N $i_{x}$ )$_2$ $O_{8+}$$\delta$/ film by LPE method have been measured using break junctions. The energy gap 2$\Delta$ and 2$\Delta$/ $k_{B}$ $T_{c}$ $^{zero}$ increased with increase of ft. We obtained the energy gap Parameter 2$\Delta$(4.2 K) = 54.4~64 meV, and corresponding1y $\Delta$/ $k_{B}$ $T_{c}$ $^{zero}$=7.36~10.14, larger than the BCS value. The lattice constant c and critical temperature $T_{c}$ $^{zero}$ decrease with increase of $\chi$$_{L}$.

Structural properties of $Zn:LiNbO_3/Mg:LiNbO_3$ single crystal thin films grown by LPE method (LPE법으로 성장시킨 $Zn:LiNbO_3/Mg:LiNbO_3$ 단결정 박막의 구조적 특성)

  • Lee, H.J.;Shin, T.I.;Lee, J.H.;Yoon, D.H.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.15 no.3
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    • pp.120-123
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    • 2005
  • The 5 mol% ZnO doped $LiNbO_3$ film and the 2 mol% MgO doped $LiNbO_3$ film were grown on the $LiNbO_3$ (001) substrate by liquid phase epitaxy (LPE) method with $Li_2CO_3-V_2O_5$ flux system. The crytsallinity and the lattice mismatch between $Zn:LiNbO_3$, film and $Mg:LiNbO_3$, film were analyzed by x-ray rocking curve (XRC). In addition, the ZnO and MgO distribution in the cross-section of the multilayer thin films was observed using electron probe micro analyzer (EPMA).

Correlation Between Lateral Photovoltaic Effect and Conductivity in p-type Silicon Substrates

  • Lee, Seung-Hoon;Shin, Muncheol;Hwang, Seongpil;Park, Sung Heum;Jang, Jae-Won
    • Bulletin of the Korean Chemical Society
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    • v.34 no.6
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    • pp.1845-1847
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    • 2013
  • The lateral photovoltaic effect (LPE) can be observed in semiconductors by irradiating a light spot position between electrodes on sample's surface. Because lateral photovoltaic voltage (LPV) is sensitively changed by light spot position, a LPE device has been tried as a position-sensitive detector. This study discusses the correlation between LPV and conductivity in p-type silicon and nano-structured Au deposited p-type silicon (nano-Au silicon), respectively. Conductivity measurement of the sample was carried out using the four-wire method to eliminate contact resistance, and conductivity dependence on LPV was simultaneously measured by changing the light irradiation position. The result showed a strong correlation between conductivity and LPV in the p-type silicon sample. The correlation coefficient was 0.87. The correlation coefficient between LPV and conductivity for the nano-Au silicon sample was 0.41.

LPE GROWTH OF $La_{2-x}Sr_xCuO_4$ SINGLE-CRYSTALLINE FILMS

  • Tanaka, Isao;Tanabe, Hideyoshi;Watauchi, Satoshi;Kojima, Hironao
    • Proceedings of the Korea Association of Crystal Growth Conference
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    • 1999.06a
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    • pp.371-387
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    • 1999
  • La2-xSrxCuO4 single-crystalline films were prepared on bulk single crystals of Zn-doped La2CuO4 as the substrates by LPE technique using tow deferent methods. When prepared using an alumina crucible in normal electrical furnace, the La2-xSrxCuO4 films were contaminated with less than 3 at% aluminum from the alumina crucibles. Aluminum contamination either reduced or completely destroyed the superconductivity of the La2-xSrxCuO4 films. For LPE growthby modified TSFZ method using an infrared heating furnace without crucibles, the La2-xSrxCuO4 films of x=0.11 showed superconducting with Tconset 36 K, which is 10 K higher than that in the La2-xSrxCuO4 bulk single crystals.

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The analysis of leakage current of InGaAsP/InP PBH-LD fabricated by LPE (LPE 방법으로 제작된 InGaAsP/InP PBH-LD의 누설전류해석)

  • 최미숙;김정호;홍창희
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2002.11a
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    • pp.481-485
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    • 2002
  • In this study, we fabricated the PBH-LD by meltback method using the LPE. The PBH-LDs are analyzed the leakage current that flows through leakage current path like the p-n diode and p-n-p-n current blocking layer. We observed the variation of threshold current with the leakage width $W_{ι}$. As a consequence, we confirmed that the threshold current became low in the decrease of the leakage width and in the increase of the ratio of specific resistivity of leakage region to active region. We also compared between the calculated threshold current in the absence of leakage region and the measured threshold current in the device. As a result, the ratio of specific resistivity was about 0.5 in the measured LDs, which have the width of a active layer of 1.4${\mu}{\textrm}{m}$ and leakage width of 0.6${\mu}{\textrm}{m}$.

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