• Title/Summary/Keyword: LCD cleaning

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A Study for Development and Characteristics of Electrostatic Eliminator Suitable for the Super Clean Room Less than Class 100(I) (공기 청정지역(Class 100 이하)에 적합한 정전기 제거장치의 개발 및 특성에 관한 연구(I) - LCD 제조 공정을 중심으로 -)

  • Jung, Yong-Chul;Park, Hoon-Kyu;Lee, Dong-Hoon
    • Journal of the Korean Society of Safety
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    • v.21 no.4 s.76
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    • pp.60-65
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    • 2006
  • It is a well known fact that LCD is a central part of the IT industry which is important in the present and the future. But the biggest problem of LCD manufacturing is maintaining a cleaning room environment and administration. Therefore the purpose of this study is to first, prevent the yield depreciation and damage of products, and second, protect the worker ftom accidental electrostatic discharge during LCD manufacture. The soft x-ray ionizer is a type of electrostatic reducer device. It protects against electrostatic discharge in the cleaning room environment and is a necessary environmental factor during LCD production. The positive aspects of the soft x-ray are its shorter time and wider angle of exposure. But the negative aspect of the soft x-ray is its need for several shielding of protection from the harmful x-ray exposure. On this study, the development of the Air Nozzle-type ionizer to amend and refine some problems. For example, examined the electrostatic reduce device of a soft x-ray type and discovered the ion did not go inside well. also workers to be free from danger. An Air Nozzle-type ionizer is comprised of soft x-ray radiation and ionized air production. Air is injected through the nozzle after being ionized from radiation. It supplies air keeping the same pressure into the end foundation of ion production. The soft x-ray is the structure which radiates ionized air through the nozzle (21 holes) having micro holes of the ionizable radiation after ionizing the inside air by the ion production. A worker does not need a cover to protect against x-rays and the Air Nozzle-type ionizer is easy to set up and is more effective at eliminating electrostatic.

클린룸 내 스프링쿨러 소화설비 시공사례

  • 김형겸
    • Air Cleaning Technology
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    • v.17 no.4 s.67
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    • pp.58-68
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    • 2004
  • 국내 반도체, TFT-LCD, PDP 등의 제조공장 클린룸 내부의 스프링클러 소화설비는 90년대 말까지는 소화설비의 오 작동에 의한 고가 생산 장비의 물 피해가 우려 되어 면제가 되어왔으나, 1998년 대만 반도체 공장의 대형 화재사건이 발생한 이후로는 영미계 재 보험사들의 강력한 요청에 의하여 국내 관련 제조시설 내부에도 스프링클러 소화설비는 의무화 되고 있는 실정이다. 본 글에서는 반도체 제조공장의 소화설비의 특성을 중심으로 클린룸 내의 스프링클러 소화설비 시공사례를 소개하여 관련업계 관계자들의 이해를 돕고자 한다.

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Improvement of the Electrical Characteristics of a Polysilicon TFT Using Buffered Oxide Etch Cleaning (Buffered Oxide Etch 세정에 의한 다결정 실리콘 TFT의 전기적 특성 개선)

  • 남영묵;배성찬;최시영
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.41 no.8
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    • pp.31-36
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    • 2004
  • we developed a technique to manufacture more reliable polycrystalline silicon TFT-LCDs using UV cleaning and buffered oxide etch(BOE) cleaning which remove the native oxide of the silicon surface before laser annealing. To investigate the effects of pre-treatments on the surface roughness of polycrystalline silicon, we measured atomic force microscopy(AFM). Also the electrical characteristics of polysilicon TFTs, breakdown characteristic and switching Performance, were tested for various pre-treatment conditions and several locations in large glass substrate.

A Study on the Removal of Electrostatic using Transmitted Ions Generated Soft X-ray with Compressed Air (기류방출형 연X선 조사에 의한 정전기 제거 장치에 관한 연구)

  • Kwon, Sung-Yul;Lee, Dong-Hoon;Choi, Jae-Wook;Seo, Min-Seok
    • Journal of the Korean Society of Safety
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    • v.25 no.1
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    • pp.27-31
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    • 2010
  • It is a well known fact that the LCD and Semiconductor Devices are a central part of IT industry which is important in the present and the future. But the biggest problem of Semiconductor and LCD manufacturing is maintaining a cleaning room environment. For this reason, the soft X-ray type Ionizer was used as the electrostatic reducer device, which protects damage of the product against electrostatic discharge in the manufacturing process. Therefore it is a essential important factor during Semiconductor and LCD production process. But the soft X-ray has a intrinsic problem with harmful to human being in case of soft X-ray exposure. That's reason we have the research to solve above problem and made an apparatus that it was covered with shielding structure to protect X-ray radiation to outside. And besides, it has a possibility to eliminate the charged electrostatic in the narrow space through the slot for Ion emissions with dual soft X-ray sources on the both side. It is also not make the particles from itself when it has been operated.

Simulation of Ultrasonic Dry Cleaning for Semiconductor/display Device Application (반도체/디스플레이 소자용 초음파 건식세정 시뮬레이션 연구)

  • Yun, Eui-Jung;Lee, Gang-won;Kim, Chol-Ho;Lee, Seok-Tae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.12
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    • pp.1259-1263
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    • 2004
  • In this paper, the optimum design of ultrasonic dry cleaning head was investigated. The transducer instead of mechanical dynamic structure was used to generate ultrasonic wave and the horn-shape amplifier was utilized to solve the energy decaying problem of ultrasonic wave with propagating it through the media. The analyses of ultrasonic wave and a fluid for the selected structure of a cleaning head were carried out using SYSNOISE and ANSYS simulators, respectively. Based on simulator results, the distance between a horn and the substrate of 4 mm and the horn diameter of 10 mm were determined to maximize the energy of ultrasonic waves. The cooling structure was also considered to reduce the heat from the transducer and the horn. The equivalent circuit for the fabricated horn was deduced from HP4194A impedance/gain/phase analyzer and the frequency of an ultrasonic wave of 20.25 kHz was confirmed using the parameters of the equivalent circuit.

RF Power Conversional System for Environment-friendly Ferrite Core Inductively Coupled Plasma Generator (환경친화형 페라이트 코어 유도결합 플라즈마 고주파 전력 변환 장치)

  • Lee, Joung-Ho;Choi, Dae-Kyu;Kim, Soo-Seok;Lee, Byoung-Kuk;Won, Chung-Yuen
    • Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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    • v.20 no.8
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    • pp.6-14
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    • 2006
  • This paper is a study about a proper method of plasma generation to cleaning method and a high frequency power equipment circuit to generation of plasma that used cleaning of chamber for TFT-LCD PECVD. The high density plasma required for cleaning causes a possibility of high density plasma more than $1{\times}10^{11}[EA/cm^3]$. It apply a ferrite core of ferromagnetic body to a existing ICP form. In case of power transfer equipment on 400[kHz] high frequency to generation of plasma it makes certain a stable switching operation in condition of plasma through using a inverter form for general purpose HB. And it demonstrates the performance of power transfer equipment using methods of measurement which use a transformer of series combination the density of plasma and the rate of dissolution of $NF_3$ in condition of $A_r\;and\;NF_3$.

HACCP의 환경 최적화를 위한 식품 클린룸 설계에 관한 연구

  • Won, Yeong-Jae
    • Air Cleaning Technology
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    • v.23 no.3
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    • pp.1-9
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    • 2010
  • This study proposed the optimum design values for the biological clean room system observing the regulations of Hazard Analysis Critical Control Point (HACCP). Even though the standard for industrial clean room system has been well established, the basis for biological food clean room system is the first stage. In order to prevent the contaminations in advance for food storages, processes, and distributions, the criterion of Hazard Analysis Critical Control Point is positively required. This study also suggested the possible ways of how to avoid the hazardous contaminations.

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Physical and Chemical Properties of Waste Glass as Feed Materials for the Production of Foamed Glass (발포유리 원료로서 폐 유리의 물리 화학적 특성)

  • Lee, Chul-Tae
    • Applied Chemistry for Engineering
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    • v.16 no.3
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    • pp.440-448
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    • 2005
  • Physical and chemical properties of waste glass, such as bottle glass, plate glass, and LCD glass were investigated to test the feasibility of starting materials for the production of high quality foamed glass for insulating grade construction material without pre-treatments such as cleaning, and waste removals. For this purpose, chemical analysis, thermal analysis, crystalline analysis, and rheological analysis including viscosity were proceeded and the preparation of foamed glass under the qualitative conditions obtained from these various analysis was also attempted. Overall results of various analysis and investigations for these waste glass showed that waste bottle glass and plate glass have high possivility of use as feed materials for the production of foamed glass.

Assessment of hazardous substances and workenvironment for cleanrooms of microelectronic industry (전자산업 청정실의 작업환경 및 유해물질농도 평가)

  • Chung, Eun-Kyo;Park, Hyun-Hee;Shin, Jung-Ah;Jang, Jae-Kil
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.19 no.3
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    • pp.280-287
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    • 2009
  • High-tech microelectronics industry is known as one of the most chemical-intensive industries. In Korea, Microelectronics industry occupied 38% of export and 16% of working employees work in microelectronics industry. But, chemical information and health hazards of high-tech microelectronics manufacturing are poorly understood because of rapid development and its penchant for secrecy. We need to investigate on chemical use and exposure control. We Site-visits to 6 high-tech microelectronics manufacturing company which have cleanroom work using over 1,000kg organic solvents (5 semi-conductor chips and its related parts company, 1 liquid crystal display (LCD)). We reviewed their data on chemical use and ventilation system, and measured TVOCs (Total Volatile Organic Compounds) and carbon dioxide concentration. All cleanroom air passed through hepa filters to acheive low particle levels and only 1 cleanroom uses carbon filters to minimize the organic solvents exposures In TVOC screening test, Cleanroom for semi-conductor chips and its related parts company with laminar down flow system (e.g. class 1~100) showed nondetectable level of TVOCs concentration, but Cleanroom for liquid crystal display (LCD) with conventional flow system (e.g. class 1,000~10,000) showed 327 ppm as TVOCs. Acetone concentration in cleanroom for Jig cleaning, LC Injection, Sealing processes were 18.488ppm (n=14), 49.762 ppm (n=15), 8.656 ppm (n=14) as arithmetric mean. Acetone concentration in cleanroom for LCD inspection process was 40ppm (n=55) as geometric mean, where the range was 7.8~128.7ppm and weakly correlated with ventilation rate efficiency(r=0.44, p<0.05). To control organic solvents in cleanrooms, chemical and carbon filters should be installed with hepa filters. Even though their volatile organic compounds concentration was not exceed to occupational exposure limits, considering of entrance limited cleanroom environment, long-term period exposure effects and adverse health effects of cleanroom worker need further reseach.

Laser Processing Technology in Semiconductor and Display Industry (반도체 및 디스플레이 산업에서의 레이저 가공 기술)

  • Cho, Kwang-Woo;Park, Hong-Jin
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.6
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    • pp.32-38
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    • 2010
  • Laser material processing technology is adopted in several industry as alternative process which could overcome weakness and problems of present adopted process, especially semiconductor and display industry. In semiconductor industry, laser photo lithography is doing at front-end level, and cutting, drilling, and marking technology for both wafer and EMC mold package is adopted. Laser cleaning and de-flashing are new rising technology. There are 3 kinds of main display industry which use laser technology - TFT LCD, AMOLED, Touch screen. Laser glass cutting, laser marking, laser direct patterning, laser annealing, laser repairing, laser frit sealing are major application in display industry.