Assessment of hazardous substances and workenvironment for cleanrooms of microelectronic industry

전자산업 청정실의 작업환경 및 유해물질농도 평가

  • Chung, Eun-Kyo (Occupational Safety and Health Research Institute, KOSHA) ;
  • Park, Hyun-Hee (Occupational Safety and Health Research Institute, KOSHA) ;
  • Shin, Jung-Ah (Occupational Safety and Health Research Institute, KOSHA) ;
  • Jang, Jae-Kil (Industrial Safety Training Institute)
  • 정은교 (한국산업안전보건공단 산업안전보건연구원) ;
  • 박현희 (한국산업안전보건공단 산업안전보건연구원) ;
  • 신정아 (한국산업안전보건공단 산업안전보건연구원) ;
  • 장재길 (한국산업안전보건공단 산업안전보건교육원)
  • Received : 2009.05.11
  • Accepted : 2009.07.23
  • Published : 2009.09.30

Abstract

High-tech microelectronics industry is known as one of the most chemical-intensive industries. In Korea, Microelectronics industry occupied 38% of export and 16% of working employees work in microelectronics industry. But, chemical information and health hazards of high-tech microelectronics manufacturing are poorly understood because of rapid development and its penchant for secrecy. We need to investigate on chemical use and exposure control. We Site-visits to 6 high-tech microelectronics manufacturing company which have cleanroom work using over 1,000kg organic solvents (5 semi-conductor chips and its related parts company, 1 liquid crystal display (LCD)). We reviewed their data on chemical use and ventilation system, and measured TVOCs (Total Volatile Organic Compounds) and carbon dioxide concentration. All cleanroom air passed through hepa filters to acheive low particle levels and only 1 cleanroom uses carbon filters to minimize the organic solvents exposures In TVOC screening test, Cleanroom for semi-conductor chips and its related parts company with laminar down flow system (e.g. class 1~100) showed nondetectable level of TVOCs concentration, but Cleanroom for liquid crystal display (LCD) with conventional flow system (e.g. class 1,000~10,000) showed 327 ppm as TVOCs. Acetone concentration in cleanroom for Jig cleaning, LC Injection, Sealing processes were 18.488ppm (n=14), 49.762 ppm (n=15), 8.656 ppm (n=14) as arithmetric mean. Acetone concentration in cleanroom for LCD inspection process was 40ppm (n=55) as geometric mean, where the range was 7.8~128.7ppm and weakly correlated with ventilation rate efficiency(r=0.44, p<0.05). To control organic solvents in cleanrooms, chemical and carbon filters should be installed with hepa filters. Even though their volatile organic compounds concentration was not exceed to occupational exposure limits, considering of entrance limited cleanroom environment, long-term period exposure effects and adverse health effects of cleanroom worker need further reseach.

Keywords

References

  1. 정은교. 박현희 등. 작업장 최적환기효율 유지방안 연구. 한국산업안전보건공단 산업안전보건연구원 연구보고서. 한국산업안전공단. 2007
  2. 김종열 등 역. 클린룸환경의 계획과 설계. 일본공기청정협회. Ohmsha&태훈출판사. 2005
  3. 정지연 등. 업무용 빌딩 소재 사무실의 실내환기 평가. 한국산업위생학회지 2008;1892):115-121
  4. (주)신성이엔지. 클린룸${\cdot}$바이오 클린룸. 도서출판 한미, 2005
  5. 공기청정기술. 국내 공기청정산업 현황 및 기술개발 현황. 제 11편, 제 1호. 1998
  6. 한국생활환경학회지. 산업용 클린룸의 환경조건. 한국생활환경학회지, 제 8권, 제2호. pp 159~165. 2001
  7. 김무환 등. 공기조화 및 냉동, 피어슨 에듀케이션 코리아, 2002
  8. 김교두 역. 공기조화·위생공학편람 ; 공기조화편, 도서출판 금탑, 1983
  9. 강동묵. 화학물질 노출기준 제·개정 연구 및 산업보건편람작성(IPA). 노동부. 2005
  10. 노동부. 화학물질 및 물리적인자 노출기준(고시 제2008-26호). 노동부. 2008
  11. 노동부. 전국제조업체작업환경실태조사(2004). 노동부. 2005
  12. 정지연 등. 사무실 공기질 평가 및 관리기준 개발(Ⅰ,Ⅱ). 한국산업안전보건공단 산업안전보건연구원 연구보고서. 한국산업안전공단. 2004
  13. 한국산업안전공단 산업안전보건연구원(2004). 유해물질별작업환경측정방법, KOSHA Code A-1-2004. 한국산업안전공단
  14. Joseph LaDou(1994). 'Health Issues in the Global Semiconductor Industry'. Annals Academy of Medicine, Vol. 23, No. 5
  15. HSE. Cancer among current and former workers at National Semiconductor. Greenock. 2001
  16. Watterson(2003). Health and Safety Executive Inspection of U.K. Semiconductor Manufactures. Int Occup Environ Health, Vol 9, pp. 392 ~ 395 https://doi.org/10.1179/oeh.2003.9.4.392
  17. ACGIH. Industrial Ventilation- A Manual of Recommended Practice, 25th ed. Ohio:ACGIH.; 2002
  18. National Institute of Occupational Safety and Health(NIOSH). NIOSH Manual of Analytical Method. 4th ed., NIOSH, Cincinnati, Ohio, 1994
  19. ACGIH. Hazard assessment and control technology in semiconductor manufacturing. LEWIS PUBLISHERS, INC. 25th ed. Ohio, Oct. 20-22, 1987
  20. Michael E. Williams, David G. Baldwin, Paul C. Manz, Semiconductor industrial hygiene handbook. monitoring, ventilation, equipment and ergonomics,. Noyes Publications. 1995
  21. Y. K. Chuah, C-H. Tsai, S. C. Hu, Simultaneous control of particle contamination and VOC pollution under different operating conditions of a mini-environment that contains a coating process, Electronics Research and Service Organization, Industrial Technology Research Institute, Chutung, Taiwan, 1999
  22. Lewis Scarpace, Michel Williams, David Baldwiny, James Stewart, Results of Industrial hygiene sampling in semiconductor manufacturing operations, LEWIS PUBLISHERS, ACGIH, 1987
  23. Hallock MF, Hammond SK, Hines CJ, Woskie SR, Schenker MB. Patterns of chemical use and exposure control in the Semiconductor Health Study. Am J Ind Med. 1995;28(6):681- 97 https://doi.org/10.1002/ajim.4700280605