• Title/Summary/Keyword: Junction device

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A Study on Battery Chargers for the next generation high speed train using the Phase-shift Full-bridge DC/DC Converter (위상전이 풀-브리지 DC/DC 컨버터를 이용한 차세대 고속 전철용 Battery Charger에 관한 연구)

  • Cho, Han-Jin;Lee, Won-Cheol;Lee, Sang-Seok;Kim, Tae-Hwan;Won, Chung-Yuen
    • Proceedings of the KSR Conference
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    • 2009.05b
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    • pp.623-628
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    • 2009
  • There is an increasing demand for efficient high power/weight auxiliary power supplies for use on high speed traction application. Many new conversion techniques have been proposed to reduce the voltage and current stress of switching components, and the switching losses in the traditional pulse width modulation(PWM) converter. Especially, the phase shift full bridge zero voltage switching PWM techniques are thought most desirable for many applications because this topology permits all switching devices to operate under zero voltage switching(ZVS) by using circuit parasitic components such as leakage inductance of high frequency transformer and power device junction capacitance. The proposed topology is found to have higher efficiency than conventional soft-switching converter. Also it is easily applicable to phase shift full bridge converter by applying an energy recovery snubber consisted of fast recovery diodes and capacitors.

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A Study on the Battery Charger for Next Generation High Speed Train (차세대 고속 전철용 Battery Charger 에 관한 연구)

  • Jeong, Han-Jeong;Lee, Won-Cheol;Lee, Sang-Seok;Paik, Jin-Sung;Won, Chung-Yuen
    • Proceedings of the KSR Conference
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    • 2008.11b
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    • pp.321-324
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    • 2008
  • Recently, there is an increasing demand for efficient high power/weight auxiliary power supplies for use on high speed traction application. many new conversion techniques have been proposed to reduce the voltage and current stress of switching components, and the switching losses in the traditional pulse width modulation(PWM) converter. Among them, the phase shift full bridge zero voltage switching PWM techniques are thought most desirable for many applications because this topology permits all switching devices to operate under zero voltage switching(ZVS) by using circuit parasitic components such as leakage inductance of high frequency transformer and power device junction capacitance. The proposed topology is found to have higher efficiency than conventional soft-switching converter. Also it is easily applicable to phase shift full bridge converter by applying an energy recovery snubber consisted of fast recovery diodes and capacitors.

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Electrical Properties of TiO2 Thin Film and Junction Analysis of a Semiconductor Interface

  • Oh, Teresa
    • Journal of information and communication convergence engineering
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    • v.16 no.4
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    • pp.248-251
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    • 2018
  • To research the characteristics of $TiO_2$ as an insulator, $TiO_2$ films were prepared with various annealing temperatures. It was researched the currents of $TiO_2$ films with Schottky barriers in accordance with the contact's properties. The potential barrier depends on the Schottky barrier and the current decreases with increasing the potential barrier of $TiO_2$ thin film. The current of $TiO_2$ film annealed at $110^{\circ}C$ was the lowest and the carrier density was decreased and the resistivity was increased with increasing the hall mobility. The Schottky contact is an important factor to become semiconductor device, the potential barrier is proportional to the hall mobility, and the hall mobility increased with increasing the potential barrier and became more insulator properties. The reason of having the high mobility in the thin films in spite of the lowest carrier concentration is that the conduction mechanism in the thin films is due to the band-to-band tunneling phenomenon of electrons.

Measurement of 2-Dimensional Dopant Profiles by Electron Holography and Scanning Capacitance Microscopy Methods (일렉트론홀로그래피와 주사정전용량현미경 기술을 이용한 2차원 도펀트 프로파일의 측정)

  • Park, Kyoung-Woo;Shaislamov, Ulugbek;Hyun, Moon Seop;Yoo, Jung Ho;Yang, Jun-Mo;Yoon, Soon-Gil
    • Korean Journal of Metals and Materials
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    • v.47 no.5
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    • pp.311-315
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    • 2009
  • 2-dimensional (2D) dopant profiling in semiconductor device was carried out by electron holography and scanning capacitance microscopy methods with the same multi-layered p-n junction sample. The dopant profiles obtained from two methods are in good agreement with each other. It demonstrates that reliability of dopant profile measurement can be increased through precise comparison of 2D profiles obtained from various techniques.

Numerical study of topological SQUIDs

  • Soohong, Choi;Yeongmin, Jang;Sara, Arif;Yong-Joo, Doh
    • Progress in Superconductivity and Cryogenics
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    • v.24 no.4
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    • pp.11-15
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    • 2022
  • We conducted numerical calculations to obtain the critical current as a function of the magnetic flux through the topologically trivial and non-trivial superconducting quantum interference devices (SQUIDs), with varying the capacitive and inductive couplings of Josephson junctions (JJs). Our calculation results indicate that a nontrivial SQUID is almost indistinguishable from trivial SQUID, considering the effective capacitance coupling. When the SQUID contains 2π- and 4π-periodic supercurrents, the periodicity of the current-flux relation can be distinguished from the purely trivial or nontrivial SQUID cases, and its difference is sensitive to the relative ratio between the topologically trivial and nontrivial supercurrents. We believe that our calculation results would provide a practical guide to quantitatively measure the portion of the topologically nontrivial supercurrents in experiments.

Selective Si Epitaxy for Device Isolation (소자분리를 위한 선택적 실리콘 에피택시)

  • Yang, Jeon Wook;Cho, Kyoung Ik;Park, Sin Chong
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.23 no.6
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    • pp.801-806
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    • 1986
  • The effect of SiH2Cl2 -HCl gas on the growth rate of epitaxial layer is studied. The temperature, pressure and gas mixing ratio of SiH2Cl2 and HCl are varied to study the growth rate dependence and selective Si epitaxy. The P-n junction diode is fabricated on the epitaxial layer and electrical characteristics are examined. Also, using selective Si epitaxy, a possibility of thin dielectric isolation process, that gives an independent isolation width on the mask dimension, is examined.

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A Japanese National Project for Superconductor Network Devices

  • Hidaka, M.
    • Progress in Superconductivity
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    • v.5 no.1
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    • pp.1-4
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    • 2003
  • A five-year project for Nb-based single flux quantum (SFQ) circuits supported by Japan's Ministry of Economy Trade and Industry (METI) in Japan was started in September 2002. Since April 2003, the New Energy and Industrial Technology Development Organization (NEDO) has supported this Superconductor Network Device Project. The aim of the project is to improve the integration level of Nb-based SFQ circuits to several ten thousand Josephson junctions, in comparison with their starting integration level of only a few thousand junctions. Actual targets are a 20 GHz dual processor module for the servers and a 0.96 Tbps switch module for the routers. Starting in April 2003, the Nb project was merged with SFQ circuit research using a high-T$_{c}$ superconductor (HTS). The HTS research targets are a wide-band AD converter for mobile-phone base stations and a sampling oscilloscope for wide-band waveform measurements.

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The Schottky Diode of Optimal Stepped Oxide Layer for High Breakdown Voltage (높은 항복전압을 위한 최적 계단산화막의 쇼트키 다이오드)

  • Lee, Yong Jae;Lee, Moon Key;Kim, Bong Ryul
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.23 no.4
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    • pp.484-489
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    • 1986
  • A device with variable stepped oxide layer along the edge region of Schottky junction have been designed and fabricated. The effect of this stepped oxide layer in the edge region improves the breakdown voltage as a result of the by increase of the depletion layer width, and decreases the leakage current as compared to the effect of conventional field oxide layer, when the reverse voltage was applied. Experimental results shown that the Schottky diode with the the reverse voltage was applied. Experimenal results show that the Schottky diode with the optimal stepped oxide layer maintains nearly ideal I-V characteristics and excellent breakdown voltage(170V) by reducing the edge effect inherent in metal-semiconductor contacts. The optimal conditions of stepped oxide layer are 1700\ulcornerin thickness and 10\ulcorner in length.

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Efficiency Improvement of Organic Light-emitting Diodes depending on Thickness of Hole Injection Materials

  • Kim, Weon-Jong;Yang, Jae-Hoon;Kim, Tag-Yong;Jeong, Joon;Lee, Young-Hwan;Hong, Jin-Woong;Park, Ha-Yong;Kim, Tae-Wan
    • Transactions on Electrical and Electronic Materials
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    • v.6 no.5
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    • pp.233-237
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    • 2005
  • In the device structure of ITO/hole injection layer/N, N'-biphenyl-N, N'-bis-(1-naphenyl)-[1,1'-biphenyl]4,4'-diamine(NPB)/tris(8-hydroxyquinoline) aluminum$(Alq_3)/Al$, we investigated an effect of hole-injection materials (PTFE, PVK) on the electrical characteristics and efficiency of organic light-emitting diodes. A thermal evaporation was performed to make a thickness of NPB layer with a evaporation rate of $0.5\~1.0\;\AA/s$ in a base pressure of $5\times10^{-6}$ Torr. We measured current-voltage characteristics and efficiency with a thickness variation of hole-injection layer. The PTFE and PVK hole-injection layer improve a performance of the device in several aspects, such as good mechanical junction, reducing the operating voltage and energy band adjustment. Compared with the devices without a hole-injection layer, we have obtained that an optimal thickness of NPB was 20 nm in the device structure of $ITO/NPB/Alq_3/Al$. And using the PTFE or PVK hole-injection layer, the external quantum efficiencies of the devices were improved by $24.5\%\;and\;51.3\%$, respectively.

Sensitivity Improvement of the Web Patterned Si Photodiode (Web-패턴 Si 광다이오드의 감도특성 개선)

  • Jang, Ji-Geun;Lee, Sang-Yeol;Kim, Jang-Gi
    • Korean Journal of Materials Research
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    • v.11 no.4
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    • pp.247-250
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    • 2001
  • We have fabricated and evaluated a new Si pin photodiode for red light detection with the web patterned $p^{+}$ -shallow diffused region in the light absorbing area. From the measurements of electro-optical characteristics under the bias of -5V, the junction capacitance of 4pF and the dark current of 235pA were obtained. When the 1.6㎼ optical power with peak wavelength of 670nm was incident on the device, the optical signal current of 0.48$\mu\textrm{A}$ and the responsivity of 0.30A/W were obtained. The fabricated device showed the improved sensitivity compared to the conventional circular type device and the maximum spectral response in a spectrum of 670~700nm. The web-patterned Si photodiode can be expected to have the good discrimination characteristics between digital signals in the application of red light optics.

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