• 대한기계학회논문집B
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• 제30권5호
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• pp.397-404
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• 2006

Effects of surface defect distribution on flame instability during flame-surface interaction are experimentally investigated. To examine chemical quenching phenomenon which is caused by radical adsorption and recombination processes on the surface, thermally grown silicon oxide plates with well-defined defect density were prepared. ion implantation technique was used to control the number of defects, i.e. oxygen vacancies. In an attempt to preferentially remove oxygen atoms from silicon dioxide surface, argon ions with low energy level from 3keV to 5keV were irradiated at the incident angle of $60^{\circ}$. Compositional and structural modification of $SiO_2$ induced by low-energy $Ar^+$ ion irradiation has been characterized by Atomic Force Microscopy (AFM) and X-ray Photoelectron Spectroscopy (XPS). It has been found that as the ion energy is increased, the number of structural defect is also increased and non-stoichiometric condition of $SiO_x({\le}2)$ is enhanced.

• Bulletin of the Korean Chemical Society
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• 제7권6호
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• pp.416-421
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• 1986

The solvent coordination effect on the excited state processes of Mg(II)- and Zn(II)-phthalocyanines has been described. The triplet state of these compounds decays with mixed first and second order kinetics or mainly second order kinetics depending on the solvents used. The first order component of the rate constants decrease along with the series, dimethylsulfoxide (5-coordinated), 1-chloronaphthalene (4-coordinated) and piperidine (6-coordinated), while the second order rate constant is dependent on the diffusion rate constant of the solvents. The excited state quenching by methylviologen or p-benzoquinone is discussed. And ion recombination rate constant is given.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.195-197
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• 2002

CdTe quantum dots(QDs) were synthesized in aqueous solution by colloidal method. Photoluminescence(PL) spectra of the synthesized CdTe QDs revealed the intensity of PL peaks was stronger as the condensation time was longer. This result was thought because annealing effect by thermal energy transferred during condensation eliminated defects which act as traps and recombination centers in CdTe particle. PL intensity has stron dependence of Te precursor concentration. It confirmed the ratio of Te ion to Cd ion added during synthesis affected the particle size and size distribution of the CdTe QDs. Finally, the synthesized CdTe QDs were identified to be cubic structured CdTe quantum dots by X-ray diffraction(XRD).

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 춘계학술발표회 논문집
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• pp.124-125
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• 2012

Korea institute of materials science (KIMS) use a linear deposition source called as a closed drift linear plasma source (CDLPS) as well as dual magnetron sputtering (DMS) to deposit SiOxCyHz films in $HMDSO/O_2$ plasma. The CDLPS generates linear plasma using closed drifting electrons and can reduce device degradations due to energetic ion bombardments on organic devices such as organic photovoltaic and organic light emission diode by controlling an ion energy. The deposited films are investigated by Fourier transform infrared (FT-IR) spectroscopy, X-ray photoelectron spectroscopy (XPS), and atomic force microscopy (AFM). Optical emission spectroscopy (OES) is used to measure relative radical populations of dissociation and recombination products such as H, CH, and CO in plasma. And SiOx film is applied to a barrier film on organic photovoltaic devices.

• BMB Reports
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• 제44권5호
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• pp.341-346
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• 2011

The single-stranded DNA binding activity of the Escherichia coli RecA protein is crucial for homologous recombination to occur. This and other biochemical activities of ssDNA binding proteins may be affected by various factors. In this study, we analyzed the effect of $CaCl_2$, NaCl and $NH_4NO_3$ salts in combination with the pH and nucleotide cofactor effect on the ssDNA-binding activity of RecA. The studies revealed that, in addition to the inhibitory effect, these salts exert also a stimulatory effect on RecA. These effects occur only under very strict conditions, and the presence or absence and the type of nucleotide cofactor play here a major role. It was observed that in contrast to ATP, ATP${\gamma}$S prevented the inhibitory effect of NaCl and $NH_4NO_3$, even at very high salt concentration. These results indicate that ATP${\gamma}$S most likely stabilizes the structure of RecA required for DNA binding, making it resistant to high salt concentrations.

• 한국응용곤충학회지
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• 제32권4호
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• pp.407-413
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• 1993

숙주범위가 서로 다른 Autographa californica NPV(AcNPV)와 Bombyx mori NPV(BmNPV)를 Spodoptera frugiperda(Sf9) 또는 Bombyx mori(BmN-4)의 세포에 동시감염(coinfection)시킨 후, 숙주범위가 확장된 재조합 바이러스를 Sf9세포에서 10종 BmN-4세포에서 2종씩 플라크 순화하여 선발하였다. 각 재조합 바이러스 DNA의 제한효소 분석결과는 한번 이상의 재조합이 일어났음을 보여주었다. 재조합 바이러스 RecB-8의 전자현미경 관찰결과는 다각체의 모양이 모바이러스인 AcNPV나 BmNPV와는 전혀 다른 정사면체 모양이었으며 또한, 모바이러스와는 달리 virion이 다각체에 거의 매립되어 있지 않은 특징을 보였다.

• 한국진공학회지
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• 제9권4호
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• pp.428-435
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• 2000

정전 탐침을 이용하여 유도 결합형 반응기에서 발생하는 산소 플라즈마의 음이온 발생 특성을 관찰하였다. 입력전력과 운전압력 조건에 따른 산소 플라즈마에서 electronegative 음이온 플라즈마의 입력전력과 운전압력에 따른 정전 탐침에 흐르는 포화 양 전류 대 포화 음 전류(전자 전류와 음 이온 전류의 합)의 전류 비율과 플라즈마 부유 전위와 플라즈마 전위 차의 변화로부터 음이온 발생 특성관찰을 하였다. 전류비의 증가와 전위차 값의 감소는 입력전력이 증가함에 따라 약 30∼60 mTorr 운전압력 영역에서 나타났으며 이 조건에서 음이온의 발생량이 증가함을 의미하고, 플라즈마내의 이온들은 음이온과 재결합에 의한 손실이 증가하여 플라즈마 밀도가 감소함을 알 수 있었다.

• 공업화학
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• 제30권4호
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• pp.499-503
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• 2019

GaInP/GaAs 양자우물(quantum well)구조를 N-AlGaInP/p-GaInP 이종 접합구조 태양전지에 도입하여 그 특성을 조사하고 양자우물구조가 없는 태양전지와 비교하였다. 에피층은 (100)평면이 (111)A 방향으로 $6^{\circ}$ 기울어진 p-GaAs 기판 위에 성장하였다. 태양전지 박막구조는 두께 400 nm의 N-AlGaInP 층에 590 nm의 p-GaInP와 210 nm의 GaInP/GaAs 양자 우물 구조(10 nm GaInP/5 nm GaAs의 14겹 구조)가 도입된 양자우물 태양전지 구조와 800 nm의 p-GaInP의 단일이종접합 구조로 이루어진다. 측정결과 $1{\times}1mm^2$의 태양전지에서 단락전류밀도($J_{sc}$)는 양자우물구조가 도입된 태양전지에서는 $9.61mA/cm^2$, 양자우물 구조가 없는 태양전지에서는 $7.06mA/cm^2$가 각각 측정되었다. 이차이온질량 분석법(SIMS)과 외부양자효율(external quantum efficiency) 측정을 통하여 단락전류 증가에 의한 효율증가가 흡수 스펙트럼의 확대가 아닌 양자우물에 의한 carrier 재결합의 억제에 의한 효과임을 확인하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 춘계학술대회 논문집 전기기기 및 에너지변환시스템부문
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• pp.52-56
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• 2006

Some of factors affecting photo-conversion efficiency of dye sensitized solar cells (DSCs) are discussed in terms of $TiO_2$ electrodes. The first topic is on the surface modification of $TiO_2$ nano-particles, which is associated with electron traps on the surface of $TiO_2$ nano-particles. The surface is modified with dye molecules under pressurized $CO_2$ atmosphere to increase the surface coverage of $TiO_2$ nano-particles with dye molecules. This increases Jsc because of an increase in the amount of dye molecules and a decrease in the amount of trapping sites on $TiO_2$ nano-particles. In addition, the decrease in the amount of trap sites increases Voc because decreases in Voc are brought about by the recombination of $I_2$ molecules with electrons trapped on the $TiO_2$ surfaces. Selective staining for tandem cells is proposed. The second topic is on the contact between a $SnO_2$/F transparent conductive layer (TCL) and nano-particles. Polishing the TCL surfaces with silica nano-particles increases the contact, resulting in Jsc increases. The third topic is the fabrication of ion-paths in $TiO_2$ layers. Electro-spray coating of $TiO_2$ nano-particles onto TCL is shown to be effective for fabricating ion-paths in $TiO_2$ layers, which increases Jsc.

• 한국표면공학회지
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• 제29권6호
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• pp.816-823
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• 1996

Chlorine containing high density plasmas are widely used to etch various materials in the microelectronic device fabrication. In this study, the characteristics of inductively coupled $Cl_2(O_2/N_2$) plasmas and their effects on the formation of silicon etching have been investigated using a Langmuir probe, quadrupole mass spectrometry(QMS), X-ray photoelectron spectroscopy(XPS), and Scanning Electron Microscopy(SEM). The addition of oxygen for chlorine plasmas reduced ion current densities and chlorine radical densities compared to the nitrogen addition by the recombination of oxygen with chlorine. Also, when silicon is etched in $Cl_2/O_2$ plasmas, etch products recombined with oxygen such as $SiCl_xO_y$ emerged. However, when nitrogen is added to chlorine, etch products recombined with nitrogen or Si-N bondings on the etched silicon surface were not found. All the silicon etch characteristics were dependent on the plasma conditions such as ion density, radical density, etc. As a result sub micron vertical silicon trench etch profiles could be effectively formed using optimized etch conditions for $Cl_2/O_2\; and \;Cl_2/N_2$ gas combinations.