• 제목/요약/키워드: Indium-Tin Oxide

검색결과 972건 처리시간 0.037초

Study on the Seasoning Effect for Amorphous In-Ga-Zn-O Thin Film Transistors with Soluble Hybrid Passivation

  • 윤수복;김두현;홍문표
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.256-256
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    • 2012
  • Oxide semiconductors such as zinc tin oxide (ZTO) or indium gallium zinc oxide (IGZO) have attracted a lot of research interest owing to their high potential for application as thin film transistors (TFTs) [1,2]. However, the instability of oxide TFTs remains as an obstacle to overcome for practical applications to electronic devices. Several studies have reported that the electrical characteristics of ZnO-based transistors are very sensitive to oxygen, hydrogen, and water [3,4,5]. To improve the reliability issue for the amorphous InGaZnO (a-IGZO) thin-film transistor, back channel passivation layer is essential for the long term bias stability. In this study, we investigated the instability of amorphous indium-gallium-zinc-oxide (IGZO) thin film transistors (TFTs) by the back channel contaminations. The effect of back channel contaminations (humidity or oxygen) on oxide transistor is of importance because it might affect the transistor performance. To remove this environmental condition, we performed vacuum seasoning before the deposition of hybrid passivation layer and acquired improved stability. It was found that vacuum seasoning can remove the back channel contamination if a-IGZO film. Therefore, to achieve highly stable oxide TFTs we suggest that adsorbed chemical gas molecules have to be eliminated from the back-channel prior to forming the passivation layers.

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DC마그네트론 스퍼터링법으로 PET 기판위에 저온 증착한 ITO박막의 비저항과 굽힘 저항성에 대한 RF인가의 영향 (Effect of RF Superimposed DC Magnetron Sputtering on Electrical and Bending Resistances of ITO Films Deposited on PET at Low Temperature)

  • 박미랑;이성훈;김도근;이건환;송풍근
    • 한국표면공학회지
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    • 제41권5호
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    • pp.214-219
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    • 2008
  • Indium tin oxide (ITO) films were deposited on PET substrate by RF superimposed DC magnetron sputtering using ITO (doped with 10 wt% $SnO_2$) target. Substrate temperature was maintained below $750^{\circ}C$ without intentionally substrate heating during the deposition. The discharge voltage of DC power supply was decreased from 280 V to 100 V when superimposed RF power was increased from 0 W to 150 W. The electrical properties of the ITO films were improved with increasing of superimposed RF power. In the result of cyclic bending test, relatively high mechanical property was obtained for the ITO film deposited with RF power of 75 W under DC current of 0.75 A which could be attributed to the decrease of internal stress caused by decrease in both deposition rate and plasma impedance.

대향식 스퍼터링법으로 증착된 ITO 양극 위에 제작된 OLED 성능 (Performance of OLED Fabricated on the ITO Deposited by Facing Target Sputtering)

  • 윤철;김상호
    • 한국표면공학회지
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    • 제41권5호
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    • pp.199-204
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    • 2008
  • Indium tin oxide (ITO) has been commonly used as an anode for organic light emitting diode (OLED), because of its relatively high work function, high transmittance, and low resistance. The ITO was mostly deposited by capacitive type DC or RF sputtering. In this study we introduced a new facing target sputtering method. On applying this new sputtering method, the effect of fundamental deposition parameters such as substrate heating and post etching were investigated in relation to the resultant I-V-L characteristics of OLED. Three kinds of ITOs deposited at room temperature, at $400^{\circ}C$ and at $400^{\circ}C$ with after surface modification by $O_2$ plasma etching were compared. The OLED on ITO deposited with substrate heating and followed by etching showed better I-V-L characteristics, which starts to emit light at 4 volts and has luminescence of $65\;cd/m^2$ at 9 volts. The better I-V-L characteristics were ascribed to the relevant surface roughness with uniform micro-extrusions and to the equi-axed micromorphology of ITO surface.

ITO(Indium Tin Oxide) 전극상의 전기화학적 Nickel 박막형성 (Growth of Electrochemical Nickel Thin Film on ITO(Indium Tin Oxide) Electrode)

  • 김우성;성정섭
    • 한국안광학회지
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    • 제7권2호
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    • pp.155-161
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    • 2002
  • 전도성 혹은 비전도성 지지체에서 전기변색이 가능한 수 nm에서 수액 nm 두께의 금속 니켈 박막 형성에 대한 연구를 수행하였다. 광학렌즈나 혹은 LCD에 사용되는 ITO, 실리콘 웨이퍼에 박막 형성에 대한 연구는 다양한 두께의 니켈 박막은 자체로서의 응용 가능성 뿐 아니라, 광전기화학 소자, 특히 선글라스로 대변되는 변색 소자에의 응용 가능성이 아주 크다. 이러한 소자들은 나노 기술 응용과 양자점의 응용 등으로 경박단소형의 렌즈나 전지, 유리 그리고 태양 선지 등에 응용이 가능하다. 전기화학적으로 니켈 금속을 ITO 유리위에 코팅한 후, AFM, XRD을 이용하여 미세구조를 확인하고, 순환전압전류법, 시간대전류법, 임피던스를 이용하여 이들의 전기화학적 박막 특성을 조사하였다.

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ITO 전극 형성 방법이 청색 발광 다이오드의 전기 광학적 특성에 미치는 영향 (Influence of ITO-Electrode Deposition Method on the Electro-optical Characteristics of Blue LEDs)

  • 한재호;김상배;전동민
    • 대한전자공학회논문지SD
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    • 제44권11호
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    • pp.43-50
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    • 2007
  • ITO(Indium Tin Oxide) 전극 형성방법은 ITO 박막 자체의 전기 광학적 특성 뿐 아니라 ITO를 전극으로 하는 청색 발광 다이오드(파장 469nm)의 전기 광학적 특성 및 신뢰성에도 큰 영향을 미침을 확인하였다. 세 가지 ITO 전극 형성 방법 즉 electron beam evaporation법과 sputtering법, 그리고 electron beam evaporation법으로 먼저 증착한 뒤에 sputtering법으로 증착한 hybrid법 등을 사용하여 청색 발광 다이오드를 제작한 다음에 ITO 박막의 특성과 aging에 따른 발광 다이오드의 전기 광학적 특성 변화를 고찰하였다. 그 결과, ITO 전극을 sputtering 또는 electron beam evaporation 방법으로 형성한 발광 다이오드는 각각 sputtering damage의 문제와 전기저항이 증가하는 문제점을 안고 있음을 발견하였다. 그리고 이 문제점들을 hybrid 방법으로 해결하였다.

Multifunctional Indium Tin Oxide Thin Films

  • 장진녕;장윤성;윤장원;이승준;홍문표
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.162-162
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    • 2016
  • We present multifunctional indium tin oxide (ITO) thin films formed at room temperature by a normal sputtering system equipped with a plasma limiter which effectively blocks the bombardment of energetic negative oxygen ions (NOIs). The ITO thin film possesses not only low resistivity but also high gas diffusion barrier properties even though it is deposited on a plastic substrate at room temperature without post annealing. Argon neutrals incident to substrates in the sputtering have an optimal energy window from 20 to 30 eV under the condition of blocking energetic NOIs to form ITO nano-crystalline structure. The effect of blocking energetic NOIs and argon neutrals with optimal energy make the resistivity decrease to $3.61{\times}10-4{\Omega}cm$ and the water vapor transmission rate (WVTR) of 100 nm thick ITO film drop to $3.9{\times}10-3g/(m2day)$ under environmental conditions of 90% relative humidity and 50oC, which corresponds to a value of ~ 10-5 g/(m2day) at room temperature and air conditions. The multifunctional ITO thin films with low resistivity and low gas permeability will be highly valuable for plastic electronics applications.

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Ni-assisted growth of transparent and single crystalline indium-tin-oxide nanowires

  • 김현기;김준동;박형호
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.259-259
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    • 2015
  • Single crystalline indium-tin-oxide (ITO) nanowires (NWs) were grown by sputtering method. A thin Ni film of 5 nm was deposited before ITO sputtering. Thermal treatment forms Ni nanoparticles, which act as templates to diffuse Ni into the sputtered ITO layer to grow single crystalline ITO NWs. This Ni diffusion through an ITO NW was investigated by transmission electron microscope to observe the Ni-tip sitting on a single crystalline ITO NW. Meanwhile, a single crystalline ITO structure was found at bottom and body part of a single ITO NW without remaining of Ni atoms. This indicates the Ni atoms diffuse through the oxygen vacancies of ITO structure. Rapid thermal process (RTP) applied to generate an initial stage of a formation of Ni nanoparticles with variation in time periods to demonstrate the existence of an optimum condition to initiate ITO NW growth. Modulation in ITO sputtering condition was applied to verify the ITO NW growth or the ITO film growth. The Ni-assisted grown ITO layer has an improved electrical conductivity while maintaining a similar transmittance value to that of a single ITO layer. Electrically conductive and optically transparent nanowire-coated surface morphology would provide a great opportunity for various photoelectric devices.

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2층 구조 유기 박막 EL 소자의 전기-광학적특성 (Electro-optical characterization of heterostructure organic electroluminescent devices)

  • 김민수;박세광
    • 센서학회지
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    • 제4권4호
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    • pp.10-15
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    • 1995
  • 유기 박막 electoluminescent(EL) 소자를 제작하여 전극의 일함수에 따른 출력휘도의 의존성과 휘도-전압 특성을 측정하였다. 제작된 소자의 구조는 Indium-Tin-Oxide(ITO)/정공수송층/발광층(전자수송층)/금속전극이며, 정공수송층으로는 PMMA+TPD(0.5wt%)와 측쇄 액정 고분자 메트릭스인 MC homopolymer+TPD(0.005wt%)와 (MC/MMA)copolymer+TPD(0.005wt%)을 사용하였으며, 발광층은 $Alq_{3}$을, 금속전극으로는 Ca, Mg, Mg:Ag(10:1) 와 Al을 사용하였다. 출력특성이 전압에 따른 정류특성을 가짐을 보였으며, 소자의 문턱전압은 5볼트이고, 출력 휘도는 10 볼트에서 700 $Cd/m^{2}$이상의 휘도를 보였다.

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졸겔 연소법에 의한 nano crystalline ITO제작 및 특성 (Synthesis of nano porous indium tin oxide by sol-gel combustion hybrid method)

  • 정기영;곽동주;성열문;박차수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2009년도 제40회 하계학술대회
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    • pp.1328_1329
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    • 2009
  • Nano porous indium tin oxide (ITO) powder was synthesized employing a new route sol-gel combustion hybrid method using Ketjen Black as a fuel. The nano porous ITO powder was composed of $SnCl_4$-98.0% and $In(NO_3)_3{\cdot}XH_2O$-99.999%, produce with a $NH_4OH$ with sol-gel method as a catalyst [1,2]. Crystal structures were examined by powder X-ray diffraction (XRD), and those results show shaper intensity peak at $25.6^{\circ}(2{\Theta})$ of $SnO_2$ by increased sintering temperature. A particle morphology as well as crystal size was investigated by scanning electron microscopy(FE-SEM), and the size of the nano porous powder was found to be in the range of 20~30nm. ITO films could controlled by nano porous powder at various sintering temperature in this paper[3,4]. The sol-gel combustion method was offered simple and effective route for the synthesis of nano porous ITO powder[5].

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Langmuir-Blodgett법으로 제조한 기능성 폴리이미드 초박막의 전기화학적 특성 (Electrochemical Properties of Ultrathin Film Prepared Functional Polyimide by Langmuir-Blodgett Method)

  • 박근호;민창훈;손태철
    • 한국응용과학기술학회지
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    • 제26권4호
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    • pp.400-406
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    • 2009
  • We investigated the electrochemical properties for Langmuir-Blodgett (LB) films of functionalized polyimide. LB films of polyimide monolayer were deposited by the Langmuir-Blodgett method on the indium tin oxide(ITO) glass. The electrochemical properties measured by cyclic voltammetry with a three-electrode system(an Ag/AgCl reference electrode, a platinum wire counter electrode and LB film-coated ITO working electrode) at various concentrations(0.5, 1.0, and 1.5 N) of $NaClO_4$ solution. The current of reduction and oxidation range was measured from 1650 mV to -1350 mV, continuously. The scan rates were 50, 100 and 150 mV/s, respectively. As a result, monolayer and multilayer LB films of polyimide are appeared on irreversible process caused by the oxidation current from the cyclic voltammogram.