• 센서학회지
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• 제6권4호
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• pp.252-257
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• 1997

ITO(indium-tin-oxide)/PPV(poly(p-phenylenevihylene))/음극 전극의 단층구조와 ITO /PVK(poly(N-vinylcarbazole))/PPV/음극전극의 이층구조를 가진 유기 EL(electroluminescence) 소자를 제작하였으며, 전기-광학적 특성을 측정하였다. 실험 결과, 단층구조에서는 PPV막의 열변환 온도를 $140^{\circ}C$에서 $260^{\circ}C$로 증가할수록 최대 휘도가 $118.8\;cd/m^{2}$(20V)에서 $21.14\;cd/m^{2}$(28V)으로 감소하였고, EL 스펙트럼의 최대 피크가 500nm에서 580nm로 이동하였다. 또한, 음극전극의 일함수가 낮을수록 소자의 발광휘도와 주입 전류는 증가되었다. 이층구조에서는 PVK막의 농도가 감소함에 따라 발광휘도가 $70.71\;cd/m^{2}$(32V)에서 $152.7\;cd/m^{2}$(26V)으로 증가하였다.

• 한국재료학회지
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• 제18권1호
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• pp.32-37
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• 2008

The electrical, optical, structural and surface properties of an indium tin oxide (ITO) film grown on a flexible PET substrate using a specially designed roll-to-roll (R2R) sputtering system as a function of the DC power, $Ar/O_2$ flow ratio, and rolling speed is reported. It was observed that both the electrical and optical properties of the ITO film on the PET substrate were critically dependent on the $Ar/O_2$ flow ratio. In addition, x-ray diffraction examination results showed that the structure of the ITO film on the PET substrate was an amorphous structure regardless of the DC power and the $Ar/O_2$ flow ratio due to a low substrate temperature, which was maintained constant by a main cooling drum. Under optimized conditions, ITO film with resistivity of $6.44{\times}10^{-4}{\Omega}-cm$ and transparency of 86% were obtained, even when prepared at room temperature. Furthermore, bending test results exhibited that R2R-grown ITO film had good flexibility which would be applicable to flexible displays and solar cells.

• 전기전자학회논문지
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• 제23권3호
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• pp.904-909
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• 2019

$100^{\circ}C$에 소성한 인듐 아연 산화막 (IZO)을 이온빔 처리하여, 균일할 수평 액정 배향을 구현하였다. 유리 기판 위에 코팅된 IZO 박막을 $100^{\circ}C$에 소성하고 액정 배향 기술로 이온빔을 사용하였다. 이것을 이용하여 얻어진 액정 배향의 특성을 분석하기 위해서, 편광 현미경과 결정 회전법을 사용하였다. 또한 이온빔 처리된 IZO 박막을 이용하여 만든 액정 셀이 높은 품질의 액정 소자에 충분한 열적 안정성을 가진다는 것을 확인할 수 있었다. 그리고 전계방출 주사 전자 현미경을 이용하여 이온빔의 IZO 박막의 표면에 미치는 영향을 분석하였다. 이것을 통하여 이온빔이 IZO 박막 표면의 거칠기를 변화시키고, 액정 배향에 영향을 준다는 것을 확인할 수 있었다. 마지막으로 IZO 박막으로 제작한 액정 셀의 전기-광학 특성을 측정하였다. 그리고 이것이 기존에 사용되는 러빙법 처리된 폴리이미드 박막으로 제작한 액정 셀보다 뛰어난 특성을 가진다는 것을 확인하였다. 또한 액정 고정 에너지를 측정하여 이것이 균일한 액정 배향을 구현하기 위한 적합한 특성을 가진다는 것을 확인하였다.

• 센서학회지
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• 제31권2호
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• pp.85-89
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• 2022

We investigated a pH sensor using an Indium tin oxide (ITO) nanoparticle (NP) film printed on a flexible substrate. First, the printing precision and mechanical stability of the ITO-printed film were investigated. In particular, the factors that influence the crystallinity of ITO films were studied using X-ray diffraction pattern analysis. The response of the ITO pH sensor was calibrated using a series of standard pH solutions (pH 3-11). The pH values of various specimens were measured using an ITO pH sensor, and the results were compared with those of various pH measurement methods. As a result of the experiment, the maximum error was approximately ± 0.04 pH (0.4 %) at pH 9, which indicated that the ITO pH sensor is highly suitable for pH measurement. Finally, we used the ITO pH sensor to the measure of general specimens such as solvents and beverages and compared the results in comparison with those obtained from several conventional methods.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.162-162
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• 2010

InSb has received great attentions as a promising candidate for the active layer of infrared photodetectors due to the well matched band gap for the detection of $3{\sim}5\;{\mu}m$ infrared (IR) wavelength and high electron mobility (106 cm2/Vs at 77 K). In the fabrication of InSb photodetectors, passivation step to suppress dark currents is the key process and intensive studies were conducted to deposit the high quality passivation layers on InSb. Silicon dioxide (SiO2), silicon nitride (Si3N4) and anodic oxide have been investigated as passivation layers and SiO2 is generally used in recent InSb detector fabrication technology due to its better interface properties than other candidates. However, even in SiO2, indium oxide and antimony oxide formation at SiO2/InSb interface has been a critical problem and these oxides prevent the further improvement of interface properties. Also, the mechanisms for the formation of interface phases are still not fully understood. In this study, we report the quantitative analysis of indium and antimony oxide formation at SiO2/InSb interface during plasma enhanced chemical vapor deposition at various growth temperatures and subsequent heat treatments. 30 nm-thick SiO2 layers were deposited on InSb at 120, 160, 200, 240 and $300^{\circ}C$, and analyzed by X-ray photoelectron spectroscopy (XPS). With increasing deposition temperature, contents of indium and antimony oxides were also increased due to the enhanced diffusion. In addition, the sample deposited at $120^{\circ}C$ was annealed at $300^{\circ}C$ for 10 and 30 min and the contents of interfacial oxides were analyzed. Compared to as-grown samples, annealed sample showed lower contents of antimony oxide. This result implies that reduction process of antimony oxide to elemental antimony occurred at the interface more actively than as-grown samples.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2009년도 하계학술대회 논문집
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• pp.93-94
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• 2009

The influences of $O_2$ partial pressure on electrical properties of transparent semiconducting indium zinc tin oxide thin films deposited at room temperature by magnetron sputtering have been investigated. The experimental results show that by varying the $O_2$ partial pressure during deposition, electron mobilities of IZTO thin film can be controlled between 7 and $25\;cm^2/Vs$. For conducting films, the carrier concentration and resistivity are ${\sim}\;10^{21}\;cm^{-3}$ and ${\sim}\;10^{-4}\;{\Omega}\;cm$, respectively. Concerning semiconducting films, under 12% $O_2$ partial fraction, the electron concentration is $10^{18}\;cm^{-3}$, showing the promising candidate for the application of transparent thin film transistors.

• 전력전자학회:학술대회논문집
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• 전력전자학회 2008년도 하계학술대회 논문집
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• pp.646-648
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• 2008

The multi-films of a metallic film and a transparent conducting oxide (TCO, indium-tin oxide, ITO) film were formed on the stainless steel 316 and 304 plates by a sputtering method and an E-beam method and then the external metallic region of the stainless steel bipolar plates was converted into the metal nitride films through an annealing process. The multi-film formed on the stainless steel bipolar plates showed the XRD patterns of the typical indium-tin oxide, the metallic phase and the metal substrate and the external nitride film. The XRD pattern of the thin film on the bipolar plates modified showed two metal nitride phases of CrN and $Cr_2N$ compound. Surface microstructural morphology of the multi-film deposited bipolar plates was observed by AFM and FE-SEM. The electrical resistivity of the stainless steel bipolar plates modified was evaluated.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1402-1405
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• 2006

Using a indium zinc oxide (IZO) alloy target with a ratio of 90:10 in wt%, highly transparent conducting oxide (TCO) thin films are prepared on polyethersulfone (PES) substrates by lowfrequency (LF) magnetron sputtering system. These films have amorphous structures with excellent electrical stability, surface uniformity and high optical transmittance. Experiments were carried out as a function of applied voltage. At optimal deposition conditions, thin films of IZO with a sheet resistance of 29 ohm/sq. and an optical transmission of over 82 % in the visible spectrum range were achieved. The IZO thin films fabricated by this method do not require substrate heating during the film preparation or any additional post-deposition annealing treatment.

• 한국전기전자재료학회논문지
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• 제21권10호
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• pp.923-929
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• 2008

On the piezoelectric polymer, PVDF (poly vinylidene fluoride), the transparent conducting oxide (TCO) electrode material thin film was deposited by roll to roll sputtering process mentioned as a mass product-friendly process for display application. The deposition method for ITO Indium Tin Oxides) as our TCO was DC magnetron sputtering optimized for polymer substrate with the low process temperature. As a result, a high transparent and good conductive ITO/PVDF film was prepared. During the process, especially, the gas mixture ratio of Ar and Oxygen was concluded as an important factor for determining the film's physical properties. There were the optimum ranges for process conditions of mixture gas ratio for ITO/PVDF From these results, the doping mechanism between the oxygen atom and the metal element, Indium or Tin was highly influenced by oxygen partial pressure condition during the deposition process at ambient temperature, which gives the conductivity to oxide electrode, as generally accepted. With our studies, the process windows of TCO for display and other application can be expected.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.351.2-351.2
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• 2014

Indium tin oxide (ITO) has a lot of variations of its properties because it is basically in an amorphous state. Therefore, the differences in composition ratio of ITO can result in alteration of electrical properties. Normally, ITO is considered as transparent conductive oxide (TCO), possessing excellent properties for the optical and electrical devices. Quantitatively, TCO has transparency over 80 percent within the range of 380nm to 780nm, which is visible light although its specific resistance is less than $10-3{\Omega}/cm$. Thus, the solar cell is the best example for which ITO has perfectly matching profile. In addition, when ITO is used as transparent conductive electrode, this material essentially has to have a proper work function with contact materials. For instance, heterojunction with intrinsic thin layer (HIT) solar cell could have both front ITO and backside ITO. Because each side of ITO films has different type of contact materials, p-type amorphous silicon and n-type amorphous silicon, work function of ITO has to be modified to transport carrier with low built-in potential and Schottky barrier, and approximately requires variation from 3 eV to 5 eV. In this study, we examine the change of work function for different sputtering conditions using ultraviolet photoelectron spectroscopy (UPS). Structure of ITO films was investigated by spectroscopic ellipsometry (SE) and scanning electron microscopy (SEM). Optical transmittance of the films was evaluated by using an ultraviolet-visible (UV-Vis) spectrophotometer