한국정보디스플레이학회:학술대회논문집
- 2006.08a
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- Pages.1402-1405
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- 2006
The optical, electrical and structural properties in indium zinc oxide films deposited by LF magnetron sputtering
- Kim, Eun-Lyoung (Department of Physics, Kyungpook National University) ;
- Jung, Sang-Kooun (Department of Physics, Kyungpook National University) ;
- Kim, Myung-Chan (Mobile Display Research Center, Kyungpook National University) ;
- Lee, Yun-Su (Mobile Display Research Center, Kyungpook National University) ;
- Song, Kap-Duk (Mobile Display Research Center, Kyungpook National University) ;
- Park, Lee-Soon (Department of Polymer Science, Kyungpook National University) ;
- Sohn, Sang-Ho (Department of Physics, Kyungpook National University) ;
- Park, Duck-Kyu (Department of Physics, Kyungpook National University)
- Published : 2006.08.22
Abstract
Using a indium zinc oxide (IZO) alloy target with a ratio of 90:10 in wt%, highly transparent conducting oxide (TCO) thin films are prepared on polyethersulfone (PES) substrates by lowfrequency (LF) magnetron sputtering system. These films have amorphous structures with excellent electrical stability, surface uniformity and high optical transmittance. Experiments were carried out as a function of applied voltage. At optimal deposition conditions, thin films of IZO with a sheet resistance of 29 ohm/sq. and an optical transmission of over 82 % in the visible spectrum range were achieved. The IZO thin films fabricated by this method do not require substrate heating during the film preparation or any additional post-deposition annealing treatment.
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