• Journal of the Microelectronics and Packaging Society
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• v.30 no.3
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• pp.94-101
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• 2023

Zinc oxide(ZnO) is a semiconductor material with a bandgap of 3.37 eV and an exciton binding energy of 60 meV for various applications. Recently ZnO has been proven to enhance its electrical properties for utilization as an alternative for transparent conducting oxide (TCO) materials. In this study, cation(Al, Ga)-anion(F) single and double doped ZnO thin films were grown by atomic layer deposition (ALD) to enhance the electrical properties. The structural and optical properties of doped ZnO thin films were analyzed, and doping effects were confirmed to electrical characteristics. In single doped ZnO, it was observed that the carrier concentration was increased after doping, acting as a donor to ZnO. Among the single doping elements, F doped ZnO(FZO) showed the highest mobility and conductivity due to the passivation effect of oxygen vacancies. In the case of double doping, higher electrical characteristics were observed compared to single doping. Among the samples, Al-F doped ZnO(AFZO) exhibited the lowest resistance value. This results can be attributed to an increase in delocalized electron states and a decrease in lattice distortion resulting from the differences in ionic radius. The partial density of states(PDOS) was also analyzed and observed to be consistent with the experimental results.

• Journal of the Korean Ceramic Society
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• v.44 no.1 s.296
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• pp.32-36
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• 2007

Zinc gallate $(ZnGa_2O_4)$ thin film phosphors have been formed on ITO glass substrates by a sol-gel spinning coating method. For the formation of the film phosphors, the starting materials of zinc acetate dihydrate, gallium nitrate hydrate and 2-methoxyethanol as a solution were used. The thin films deposited were firstly dried at $100^{\circ}C$ and fired at $500^{\circ}C\;or\;600^{\circ}C$ for 30 min and then, annealed $500^{\circ}C\;or\;600^{\circ}C$ at for 30 min under an annealing atmosphere of 3% $H_2/Ar$. The thin films deposited on ITO glass plates showed the (220), (222), (400), (422), (511), and (440) peaks of spinel structure as well as the (311) peak indicating a standard powder diffraction pattern. The surface morphologies of the thin film phosphors were observed with a firing and an annealing condition. The $ZnGa_2O_4$ film phosphors showed the blue emission spectra around 410 nm as well as the emission spectra in the UV region (360-380 nm).

• Journal of Information Display
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• v.9 no.3
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• pp.8-11
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• 2008

A novel non-alkoxide sol-gel process for synthesizing Ga-doped ZnO thin film on glass was derived for possible use as a transparent electrode in flat-panel displays, using zinc acetate dehydrate as the starting material. The structural and electrical properties of thin films have been characterized as functions of Ga addition and post-heat-treatments. Their carrier density, Hall mobility, and optical transmittance were measured and discussed herein to explain the characteristics of the sol-gel-derived Ga-doped ZnO thin film on glass.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.59 no.1
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• pp.108-112
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• 2010

Design of experiment (DOE) method is employed for a systematic and highly efficient optimization of Ga-doped ZnO thin films synthesized by pulsed laser deposition (PLD) process. We sequentially adopted fractional-factorial design (FD) and central composite design (CCD) of the DOE methods. In fractional-FD stage, significant factors to make conductive electrode are found to target-substrate (T-S) distance and oxygen partial pressure. Moreover, correlation among the process factors is elucidated using surface profile modeling. Electrical properties of the GZO films grown on a glass substrate had been optimized to find that the lowest electrical resistivity of about $1.8'10^{-4}Wcm$ which was acquired with the T-S distance and the oxygen pressure of 4 cm and 7 mTorr, respectively. During the DOE-fueled optimization process, the transparency of the GZO films is ensured higher than 85 %.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.310-310
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• 2013

본 연구에서는 Titanium (Ti) source/drain 전극 접합이 차세대 비정질 InGaZnO (IGZO) 기반 박막형 트랜지스터에 미치는 영향을 화학적, 구조적, 전기적 특성 분석을 통하여 관찰하고 Ti/IGZO 접합 특성을 설명할 수 있는 메커니즘을 제시하였다. IGZO 기반 박막형 트랜지스터 소자의 구동 특성은 transmission line method (TLM) 패턴 공정을 이용하여 정량적으로 분석되었다. 비정질 IGZO 기반의 박막형 트랜지스터에서 Ti source/drain 전극 접합에 의한 구동 특성 변화 및 영향을 확인하기 위하여 금속/산화물 계면 반응성이 낮은 silver (Ag) source/drain 전극이 reference로 비교되었으며, 그 결과 Ti source/drain 전극 접합이 적용된 비정질 IGZO 트랜지스터의 경우 Ti 금속과 IGZO 산화물 계면에 형성되는 열역학적으로 안정한 $TiO_x$ 층의 형성에 의해 VT ($-{\Delta}0.52V$) shift 및 saturation mobility ($8.48cm^2$/Vs) 상승됨을 확인하였다. 뿐만 아니라 TLM 패턴을 이용한 IGZO 트랜지스터의 전기적 변수 도출 및 수치적 해석으로부터 $TiO_x$ 계면층 형성이 Ti 금속과 비정질 InGaZnO 계면에서의 effective contact resistivity를 효과적으로 낮출 수 있음을 확인하였다. Ti source/drain 전극 접합에 의해 발생되는 $TiO_x$ 계면층의 화학적, 구조적 특성과 $TiO_x$ 계면층 생성에 의한 소자 특성 변화를 연관시켜 해석함으로써, IGZO 기반 박막형 트랜지스터에서의 Ti source/drain 전극 접합이 비정질 IGZO 기반 박막형 트랜지스터에 미치는 영향을 설명하였다.

• ETRI Journal
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• v.28 no.6
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• pp.787-789
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• 2006

In this letter, we report that vertically well-aligned ZnO nanowires were grown on GaN epilayers and c-plane sapphire via a vapor-liquid-solid process by introducing a 3 nm Au thin film as a catalyst. In our experiments, epitaxially grown ZnO nanowires on Au-coated GaN were vertically well-aligned, while nanowires normally tilted from the surface when grown on Au-coated c-$Al_2O_3$ substrates. However, pre-growth annealing of the Au thin layer on c-$Al_2O_3$ resulted in the growth of well-aligned nanowires in a normal surface direction. High-resolution transmission electron microscopy measurements showed that the grown nanowires have a hexagonal c-axis orientation with a single-crystalline structure.

• Korean Journal of Materials Research
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• v.30 no.4
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• pp.204-210
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• 2020

ZnO thin films are of considerable interest because they can be customized by various coating technologies to have high electrical conductivity and high visible light transmittance. Therefore, ZnO thin films can be applied to various optoelectronic device applications such as transparent conducting thin films, solar cells and displays. In this study, ZnO rod and thin films are fabricated using aqueous chemical bath deposition (CBD), which is a low-cost method at low temperatures, and environmentally friendly. To investigate the structural, electrical and optical properties of ZnO for the presence of citrate ion, which can significantly affect crystal form of ZnO, various amounts of the citrate ion are added to the aqueous CBD ZnO reaction bath. As a result, ZnO crystals show a nanorod form without citrate, but a continuous thin film when citrate is above a certain concentration. In addition, as the citrate concentration increases, the electrical conductivity of the ZnO thin films increases, and is almost unchanged above a certain citrate concentration. Cu(In,Ga)Se₂ (CIGS) solar cell substrates are used to evaluate whether aqueous CBD ZnO thin films can be applicable to real devices. The performance of aqueous CBD ZnO thin films shows performance similar to that of a sputter-deposited ZnO:Al thin film as top transparent electrodes of CIGS solar cells.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.72-72
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• 2011

Recently, Zinc oxide (ZnO) nano-structures have been received attractive attention because of their outstanding optical and electrical properties. It might be a promising material considered for applications to photonic and electronic devices such as ultraviolet light emitting diode, thin film transistor, and gas sensors. ZnO nano-structures can be typically synthesized by the VLS growth mode and self-assembly. In the VLS growth mode using various growth techniques, the noble metal catalysts such as Au and Sn were used. However, the growth of ZnO nano-structures on nano-crystalline Au seeds using radio frequency (RF) magnetron sputtering might be explained by the profile coating, i.e. the ZnO nano-structures were a morphological replica of Au seeds. Ga doped ZnO (ZnO:Ga) nano-structures using this concept were synthesized and characterized by XRD, AFM, SEM, and TEM. We found that surface morphology is drastically changed from initial islands to later sun-flower typed nano-structures. We will present the structural evolution of ZnO:Ga nano-structures with increasing the film thickness.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.423-423
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• 2012

ZnO, SnO2, In2O3:Sn와 같은 투명하고 전도성이 있는 박막은 panel display, 전자발광소자, 박막트랜지스터, 태양전지 등의 전극물질로서 폭넓게 사용되고 있다. 이러한 전극 물질을 이용하는 광전자소자의 성능을 개선하기 위해서는 가시광선영역에서 광투과율이 높고, 전기전도도가 좋아야 한다. 최근 ZnO, SnO2, In2O3, MgO, Ga2O3 등으로 이루어진 3원 또는 다원화합물로 제조된 산화물 박막이 새로운 투명한 전도성 박막으로 많은 관심을 끌고 있다. 본 연구에서는 Ga2O3 박막을 radio-frequency magnetron sputtering 방법을 이용하여 증착하였다. 기존에 사용되던 ceramic target을 개선하여 powder target을 사용하였다. 반응가스는 순수하게 Ar 가스만 사용하였고, Sapphire(0001) 기판을 사용하였다. 초기에는 flat한 layered 구조로 증착이 이루어졌으나, 증착시간이 20분이 지나면서부터는 밤송이 모양을 가지는 나노구조체가 생성되기 시작하였고, 이후 나노 밤송이의 밀도가 점차 증가하였다. Ga2O3 나노 밤송이의 특성에 대하여 발표할 예정이다.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.205-205
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• 2015

최근, 비정질 산화물 반도체를 이용한 TFT는 투명성, 유연성, 저비용, 저온공정이 가능하기 때문에 차세대 flat-panel 디스플레이의 back-plane TFT로써 다양한 방면에서 연구되고 있다. 산화물 반도체 In-Zn-O-시스템에서는 Gallium (Ga)을 suppressor로 사용한 a-In-Ga-Zn-O (a-IGZO) 뿐만 아니라, Magnesium (Mg), Hafnium (Hf), Tin (Sn), Zirconium (Zr) 등의 다양한 물질이 연구되었다. 그 중 Silicon (Si)은 Ga, Hf, Sn, Zr, Mg과 같은 suppressor에 비해 구하기 쉬우며 가격적인 측면에서도 저렴하다는 장점이 있다. solution 공정으로 제작한 산화물 반도체 TFT는 진공 시스템을 사용한 공정보다 공정시간이 짧고, 저비용, 대면적화가 가능하다는 장점이 있다. 하지만, 투명하고 유연한 device를 제작하기 위해서는 저온 공정과 low thermal budget은 필수적이다. 이러한 측면에서 MWI (Microwave Irradiation)는 저온공정이 가능하며, 짧은 공정 시간에도 불구하고 IZO 시스템의 산화물 반도체의 전기적 특성 향상을 기대할 수 있는 효율 적인 열처리 방법이다. 본 연구에서는 In-Zn-O 시스템의 TFT에서 silicon (Si)를 Suppressor로 사용한 a-Si-In-Zn-O (SIZO) TFT를 제작하여 두 가지 열처리 방법을 사용하여 TFT의 전기적 특성을 확인하였다. 첫 번째 방법은 Box Furnace를 사용하여 N2 분위기에서 $600^{\circ}C$의 온도로 30분간 열처리 하였으며, 두 번째는 MWI를 사용하여 1800 W 출력 (약 $100^{\circ}C$)에 2분간 열처리 하였다. MWI 열처리는 Box Furnace 열처리에 비해 저온 공정 및 짧은 시간에도 불구하고 향상된 전기적 특성을 확인 할 수 있었다.