• 제목/요약/키워드: In-water cleaning

검색결과 648건 처리시간 0.028초

Polly-pigs를 이용한 노후급수관의 세관에 관한 연구 (Old Service Pipe Cleaning of Polly-pigs Cleaning technique)

  • 이현동;배철호;박정훈;김길남
    • 한국물환경학회지
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    • 제18권3호
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    • pp.303-312
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    • 2002
  • 본 연구에서는 기존 배관설비 분야에서 다양한 용도로 사용되고 있는 Polly-Pigs를 이용한 건물내 급수관의 스케일을 제거하기 위한 공법을 개발하여 이를 평가하였다. 15mm 노후관의 세관실험결과, KDP series에 의해서 직관부 또는 곡관부의 통수능은 3.5~15.4%까지 증가되는 것으로 나타났으며, 육안분석결과 대부분 제거가 이루어진 부분은 적색 스케일($Fe_2O_3{\cdot}3H_2O$)이었으며, 흑색 스케일($Fe_2O_4{\cdot}nH_2O$)의 제거에는 한계가 있는 것으로 나타났다. 그러나 KDP series의 겉표면에서 Fine sand를 coating한 KDPS series에 의해서는 sand의 효과로 노후관의 통수능이 13.0~17.9%까지 증가되어 통수능이 95.9~99.5%까지 높게 회복되는 것으로 나타났으며, 대부분의 흑색 스케일도 크게 제거되는 것으로 나타났다. 또한 Cleaning v/v의 나선형 가이드 베인(Helical guide vane)과 Pigs의 회전날개(Rotating wing)의 영향으로 주행시 Pigs의 회전력은 크게 향상되어 16배이상 회전수가 증가하는 것으로 나타났다. 이로 인해 100mm 급수관의 세관에서는 통수능이 90%인 노후관이 세관 후 통수능이 완전히 회복되는 것으로 나타났다. 또한 15mm 급수관에 비하여 매우 낮은 압력하에서도 세관효과가 높은 것으로 나타나 관경이 클수록 세관에 필요한 세관압력은 크게 감소되며, 세관효과는 증가되는 것으로 나타났다.

다이케스팅 이형재 분사 로봇시스템의 터빈 모듈 설계에 관한 연구 (Study of Turbine Module Design for Die Casting Mold Release Injection Robot System)

  • 최현진;손영범;박철우;이승용;최성대
    • 한국기계가공학회지
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    • 제14권5호
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    • pp.1-7
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    • 2015
  • Cleaning by injecting dry ice and water is a generally adopted trend these days to clean molds (injection, diecasting foundry, press, rubber mold, etc). This cleaning method is performed manually, or by installing multiple high pressure spray nozzles. We have manufactured a turbine cleaning module device that is able to clean diecasting modules at any position and angle in the space by mounting an articulated robot instead of the existing pipe type injection nozzle, to minimize lead time and enhance working yield of the cleaning process. In this paper, we analyzed process factors that are required to design the turbine module by reviewing number of revolution, and results according to different blade angles and thicknesses of the mold release injection turbine module, using computational fiuid dynamics (CFD).

이젝터를 이용한 세정기술 개발의 기초연구 (Basic Investigation for the Development of Cleaning Technology with Ejector)

  • 박상규;양희천
    • 대한기계학회논문집B
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    • 제41권1호
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    • pp.29-36
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    • 2017
  • 본 논문은 환형노즐 이젝터를 이용하여 세정수 공급과 기포생성을 동시에 할 수 있는 세정기술 개발을 위한 기초연구를 목적으로 한다. 환형노즐 이젝터의 피치변화에 따른 구동 및 부유체의 정량적 유동특성과 세정수조에 분출되는 분류의 정성적 가시화 이미지를 분석하였으며, 세정물의 농약 잔류물 성분의 농도를 검증하였다. 피치가 증가하면 구동유량은 증가하는 반면에, 유량비는 감소하였다. 피치가 증가하면 분류는 부력분류나 평형분류 거동을 나타내며, 잔류농약의 농도는 감소 후 증가하였다.

제철 폐수의 고구배 자기분리HGMS(High Gradient Magnetic Seperation) 처리에 관한 연구 (Study on the Purification of Wastewater by Superconducting HGMS for Steelmaking Industry)

  • 김태형;하동우;오상수;하태욱;김영훈;강채훈
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.360-360
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    • 2008
  • Steelmaking industry is widely known to use a lot of water and same amount of wastewater is generated. Although toxicity of wastewater from Steelmaking industry is low, it contains an amount of various organic materials and Fe-Oxides. It is important to recycle the wastewater because of water shortages and water pollution. In general, large-scale equipment is necessary to process the wastewater. On the other hand, superconducting high gradient magnetic separation (HGMS) system can process the wastewater in the small space. Superconducting HGMS system that had a purpose to purify the wastewater was assembled. Cryo-cooled Nb-Ti superconducting magnet was used for magnetic separator. This system can operate continuously because contaminated filters can keep on returning after cleaning. The various magnetic seeding reactions were investigated to increase the reactivity of coagulation. Filter cleaning system was developed to decrease the quantity of clean water. This research was supported by a grant from Korea Electrotechnology Research Institute, Republic of Korea.

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자외선 열화 전후 건조 옻의 용매별 용출 특성 (Extraction Characteristics of Dried Asian Lacquer by Solvents Before and After UV Degradation)

  • 박종서
    • 보존과학회지
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    • 제36권2호
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    • pp.103-111
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    • 2020
  • 건조칠기 유물 세척 시 사용되는 다양한 용매을 대상으로 클리닝 효과를 비교하기 위해 실험을 진행하였다. 건조칠과 자외선에 24일 노출시킨 건조칠에 물, 에탄올, 아세톤, 헥산을 가하여 녹아 나오는 물질을 열분해/GC/MS로 검출하였다. 용출되는 양은 아세톤과 에탄올에서 많았으며, 극성이 높은 용매인 물은 저분자량 용출에 비교적 효율이 좋았다. 비극성 용매인 헥산은 용출량이 매우 낮았다. UV에 24일 노출되어 열화가 많이 진행된 건조칠은 노출되기 전 건조칠에 비해 용출되는 물질이 크게 증가하였다. 열화가 되면서 고분자 형태의 우루시올 사슬이 절단되고 산화되는 과정을 거쳐 dicarboxylic acid를 포함한 저분자량의 극성 물질을 생성하기 때문인 것으로 보인다. 이와 같은 용출특성은 칠기유물을 클리닝하는 용매를 선택할 때 유물의 열화 상태와 더불어 중요한 참고자료가 될 것이다.

Fabrication of Hierarchical Nanostructures Using Vacuum Cluster System

  • Lee, Jun-Young;Yeo, Jong-Souk
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.389-390
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    • 2012
  • In this study, we fabricate a superhydrophobic surface made of hierarchical nanostructures that combine wax crystalline structure with moth-eye structure using vacuum cluster system and measure their hydrophobicity and durability. Since the lotus effect was found, much work has been done on studying self-cleaning surface for decades. The surface of lotus leaf consists of multi-level layers of micro scale papillose epidermal cells and epicuticular wax crystalloids [1]. This hierarchical structure has superhydrophobic property because the sufficiently rough surface allows air pockets to form easily below the liquid, the so-called Cassie state, so that the relatively small area of water/solid interface makes the energetic cost associated with corresponding water/air interfaces smaller than the energy gained [2]. Various nanostructures have been reported for fabricating the self-cleaning surface but in general, they have the problem of low durability. More than two nanostructures on a surface can be integrated together to increase hydrophobicity and durability of the surface as in the lotus leaf [3,5]. As one of the bio-inspired nanostructures, we introduce a hierarchical nanostructure fabricated with a high vacuum cluster system. A hierarchical nanostructure is a combination of moth-eye structure with an average pitch of 300 nm and height of 700 nm, and the wax crystalline structure with an average width and height of 200 nm. The moth-eye structure is fabricated with deep reactive ion etching (DRIE) process. $SiO_2$ layer is initially deposited on a glass substrate using PECVD in the cluster system. Then, Au seed layer is deposited for a few second using DC sputtering process to provide stochastic mask for etching the underlying $SiO_2$ layer with ICP-RIE so that moth-eye structure can be fabricated. Additionally, n-hexatriacontane paraffin wax ($C_{36}H_{74}$) is deposited on the moth-eye structure in a thermal evaporator and self-recrystallized at $40^{\circ}C$ for 4h [4]. All of steps are conducted utilizing vacuum cluster system to minimize the contamination. The water contact angles are measured by tensiometer. The morphology of the surface is characterized using SEM and AFM and the reflectance is measured by spectrophotometer.

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실험계획에 기반한 수돗물 성분(Chloride and Sulfate Ions)의 구조재료 부식 영향성 고찰 (Effects of Chloride and Sulfate Ions on Corrosion Behaviors of Structural Materials Based on Design of Experiment)

  • 임동인;노흥수;권혁준;박승렬;조만식;이두열
    • Corrosion Science and Technology
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    • 제22권3호
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    • pp.201-213
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    • 2023
  • Corrosion management of an aircraft and its engine relies on rinsing and cleaning using tap water. Few studies have reported effects of tap water species on corrosion behaviors of structural materials. In this study, a series of experiments were conducted based on the design of experiment. Solutions with different levels of chloride and sulfate ions were prepared using a full factorial design. Two structural materials (aluminum alloy and steel) were used for an alternate immersion test. Weight loss was then measured. In addition, a silver specimen was utilized as a sensor for chloride deposition measurement. The silver specimen was examined using the electrochemical reduction method, XPS, and SEM-EDS. Surface analysis revealed that levels of chloride and sulfate ions were sufficient for the formation of silver chloride and silver surface. Statistical analysis of weight loss and chloride deposition rate showed significant differences in measured values. Concentration of chloride ions greatly affected corrosion behaviors of structural materials. Sulfate ion hindered the adsorption reaction. These results emphasize the importance of controlling ion concentration of tap water used for cleaning and rinsing an aircraft.

리스크 완화를 위한 Wet Scrubber 세정수 pH의 효율적 관리 (Efficient Management of the pH of the Wet Scrubber Washing Water for Risk Mitigation)

  • 주동연;서재민;김명철;백종배
    • 한국안전학회지
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    • 제35권6호
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    • pp.85-92
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    • 2020
  • Wet Scrubber reacts the incoming pollutant gas with cleaning water (water + absorbent) to absorb pollutants and release the clean air to the atmosphere. Wet scrubbers and packed tower scrubbers using this principle are widely used in businesses that emit acid gases. In particular, in the etching process using hydrochloric acid (HCl), alkaline washing water (NaOH) having a pH of about 8 to 11 is used to absorb a large amount of acid gas. However, These salts are attached to the injection nozzle (nozzle), filling material (packing), and the demister (Demister), causing air pollution, human damage, and inoperability due to clogging and acid gas discharge. Therefore, In this study, an improvement plan was proposed to manage the washing water with pH 3~4 acidic washing water. The test method takes samples from the Wet Scrubber flue measurement laboratory twice a month for 1 year. Hydrogen chloride (HCl) concentration (ppm) was measured, and nozzle clogging and scale conditions were measured, compared, and analyzed through a differential pressure gauge and a pressure gauge. As a result of the check, it was visually confirmed that the scale was reduced to 50% or less in the spray nozzle, filler, and demister. In addition, the emission limit of hydrogen chloride in accordance with the Enforcement Regulation of the Air Quality Conservation Act [Annex 8] met 3 ppm or less. Therefore, even if the washing water is operated in an acidic pH range of 3 to 4, it is expected to reduce air pollution and human damage due to clogging of internal parts, and it is expected to reduce maintenance costs such as regular cleaning or replacement of parts.

Controllable Etching of 2-Dimentional Hexagonal Boron Nitride by Using Oxygen Capacitively Coupled Plasma

  • Qu, Deshun;Yoo, Won Jong
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2013년도 춘계학술대회 논문집
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    • pp.170-170
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    • 2013
  • We present a novel etching technique for 2-dimentional (2-D) hexagonal boron nitride (h-BN) by using capacitively coupled plasma (CCP) of oxygen combined with a post-treatment by de-ionized (DI) water. Oxygen CCP etching process for h-BN has been systematically studied. It is found that a passivation layer was generated to obstruct further etching while it can be easily and radically removed by DI water. An essential cleaning effect also has been observed in the etching process, organic residues are successfully removed and the surface roughness has much decreased. Considering h-BN is the most important 2-D dielectric material and its potential application for graphene to silicon-based electronic devices, such an etching method can be widely used to control the 2-D h-BN thickness and improve the surface quality.

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탈이온수의 압력과 정제된 $N_2$가스가 ILD-CMP 공정에 미치는 영향 (Influence of DI Water Pressure and Purified $N_2$Gas on the Inter Level Dielectric-Chemical Mechanical Polishing Process)

  • 김상용;이우선;서용진;김창일;장의구
    • 한국전기전자재료학회논문지
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    • 제13권10호
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    • pp.812-816
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    • 2000
  • It is very important to understand the correlation of between inter dielectric(ILD) CMP process and various facility factors supplied to equipment to equipment system. In this paper, the correlation between the various facility factors supplied to CMP equipment system and ILD-CMP process was studied. To prevent the partial over-polishing(edge hot-spot) generated in the wafer edge area during polishing, we analyze various facilities supplied at supply system. With facility shortage of D.I water(DIW) pressure, we introduced an adding purified $N_2$(P$N_2$)gas in polishing head cleaning station for increasing a cleaning effect. DIW pressure and P$N_2$gas factors were not related with removal rate, but edge hot-spot of patterned wafer had a serious relation. We estimated two factors (DIW pressure and P$N_2$gas) for the improvement of CMP process. Especially, we obtained a uniform planarity in patterned wafer and prohibited more than 90% wafer edge over-polishing. In this study, we acknowledged that facility factors supplied to equipment system played an important role in ILD-CMP process.

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