• Smart Structures and Systems
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• v.13 no.6
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• pp.1015-1039
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• 2014

The widening project on Freeway No.1 in Taiwan has a total length of roughly 14 kilometers, and includes three special bridges, namely a 216 m long-span bridge crossing the original freeway, an F-bent double decked bridge in a co-constructed section, and a steel and prestressed concrete composite bridge. This study employed in-situ monitoring in conjunction with numerical modeling to establish a real-time monitoring system for the three bridges. In order to determine the initial static and dynamic behavior of the real bridges, forced vibration experiments, in-situ static load experiments, and dynamic load experiments were first carried out on the newly-constructed bridges before they went into use. Structural models of the bridges were then established using the finite element method, and in-situ vehicle load weight, arrangement, and speed were taken into consideration when performing comparisons employing data obtained from experimental measurements. The results showed consistency between the analytical simulations and experimental data. After determining a bridge's initial state, the proposed in-situ monitoring system, which is employed in conjunction with the established finite element model, can be utilized to assess the safety of a bridge's members, providing useful reference information to bridge management agencies.

• Proceedings of the Korean Geotechical Society Conference
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• 2005.03a
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• pp.1384-1389
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• 2005

A real-time monitoring system for in-situ soil remediation technologies is developed and then applied to electrokinetic remediation technique in the field trial tests during 150days. The developed system is consisted the controlled program based on internet web page, data logger, measurement instruments and so on. In the measured items there are pH, temperature, electrical current and potential, vacuum pressure. The results indicated that the system is successively applied to electrokinetic remediation technique, and further research considering economic view and multi purpose system for in-situ soil remediation technologies is needed.

• Journal of the Semiconductor & Display Technology
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• v.20 no.3
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• pp.27-31
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• 2021

VI probe, which is one of various in-situ plasma monitoring sensor, is frequently used for in-situ process monitoring in mass production environment. In this paper, we correlated the plasma etch results with VI probe data with the small amount of gas flow rate changes to propose usefulness of the VI probe in real-time process monitoring. Several different sized contact holes were employed for the etch experiment, and the etched profiles were measured by scanning electron microscope (SEM). Although the shape of etched hole did not show satisfactory relationship with VI probe data, the chamber status changed along the incremental/decremental modification of the amount of gas flow was successfully observed in terms of impedance monitoring.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.523-523
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• 2012

As the wafer geometric requirements continuously complicated and minutes in tens of nanometers, the expectation of real-time add-on sensors for in-situ plasma process monitoring is rapidly increasing. Various industry applications, utilizing plasma impedance monitor (PIM) and optical emission spectroscopy (OES), on etch end point detection, etch chemistry investigation, health monitoring, fault detection and classification, and advanced process control are good examples. However, process monitoring in semiconductor manufacturing industry requires non-invasiveness. The hypothesis behind the optical monitoring of plasma induced ion current is for the monitoring of plasma induced charging damage in non-invasive optical way. In plasma dielectric via etching, the bombardment of reactive ions on exposed conductor patterns may induce electrical current. Induced electrical charge can further flow down to device level, and accumulated charges in the consecutive plasma processes during back-end metallization can create plasma induced charging damage to shift the threshold voltage of device. As a preliminary research for the hypothesis, we performed two phases experiment to measure the plasma induced current in etch environmental condition. We fabricated electrical test circuits to convert induced current to flickering frequency of LED output, and the flickering frequency was measured by high speed optical plasma monitoring system (OPMS) in 10 kHz. Current-frequency calibration was done in offline by applying stepwise current increase while LED flickering was measured. Once the performance of the test circuits was evaluated, a metal pad for collecting ion bombardment during plasma etch condition was placed inside etch chamber, and the LED output frequency was measured in real-time. It was successful to acquire high speed optical emission data acquisition in 10 kHz. Offline measurement with the test circuitry was satisfactory, and we are continuously investigating the potential of real-time in-situ plasma induce current measurement via OPMS.

• Transactions on Electrical and Electronic Materials
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• v.13 no.3
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• pp.139-143
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• 2012

Optical emission spectroscopy (OES) is often used for real-time analysis of the plasma processes. OES has been suggested as a primary plasma process monitoring tool. It has the advantage of non-invasive in-situ monitoring capability but selecting the proper wavelengths for the analysis of OES data generally relies on empirically established methods. In this paper, we propose a practical method for the selection of OES wavelength peaks for the analysis of plasma etch process and this is done by investigating reactants and by-product gas species that reside in the plasma etch chamber. Wavelength selection criteria are based on the standard deviation and correlation coefficients. Moreover, chemical actinometry is employed for the normalization of the selected wavelengths. We also present the importance of chemical actinometry of OES data for quantitative analysis of plasma. Then, the suggested OES peak selection method is employed.. This method is used to find out the reason behind abnormal etching of PR erosion during a series of $SiO_2$ etch processes using the same recipe. From the experimental verification, we convinced that OES is not only capable for real-time detection of abnormal plasma process but it is also useful for the analysis of suspicious plasma behavior.

• Journal of Korean Tunnelling and Underground Space Association
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• v.26 no.2
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• pp.153-167
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• 2024

Recently the ground settlement has been increasing in urban area according to development. And, this may attribute a groundwater level drawdown. This study presents an analysis of groundwater level drawdown for circular vertical shaft excavation of ｢◯◯◯◯ double track railway build transfer operate project｣. And, in-situ monitoring data and numerical analysis were compared. So, if we examine the groundwater level drawdown in design, ground conditions should be applied so that the site situation can be reflected. And, groundwater level should be considered a seasonal measurement in order to apply the appropriate groundwater level. It was confirmed a similar predicted value to groundwater level drawdown of in-situ monitoring data.

• Journal of the Semiconductor & Display Technology
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• v.5 no.1 s.14
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• pp.45-49
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• 2006

In this paper, a new method that monitors the quantity of particles using ion-counter in vacuum environment is introduced. In-situ particle monitoring (ISPM) system is composed by Gerdien type ion-counter (house-made), DC power supply and electrometer. The ion-counter applied by positive voltage detects only positive charged particles. Therefore the particles to be detected should be in known charge state for further data analysis. ion-counter is installed at the exhaust line of process equipment where the pressure loss is structurally low. ISPM system performance has been verified with SMPS (Scanning Mobility Particle Sizer) system. The correlation coefficient is above 0.98 at the particle size range of $20{\sim}300nm$ in diameter with identified charge distribution under $0.1{\sim}10.0$ Torr.

• Proceedings of the Korean Geotechical Society Conference
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• 2009.03a
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• pp.11-16
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• 2009

Better understanding of in-situ mechanical behavior of pavement foundations is very important to predict long-term effects on the system performance of transport infrastructure. In order to do that, resilient stiffness characterization of geomaterals is needed to properly adopt such mechanistic analysis under both traffic and environmental loadings. In this paper, in situ monitoring data from KHC test road was used to analyze the non-linearity of stress conditions under traffic and moisture loadings. Then, the predicted non-linear response using finite element method with a selected constitutive model of foundation geomaterials are verified with the field data.

• Nuclear Engineering and Technology
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• v.46 no.6
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• pp.737-752
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• 2014

As condition-based maintenance (CBM) has risen as a new trend, there has been an active movement to apply information technology for effective implementation of CBM in power plants. This motivation is widespread in operations and maintenance, including monitoring, diagnosis, prognosis, and decision-making on asset management. Thermal efficiency analysis in nuclear power plants (NPPs) is a longstanding concern being updated with new methodologies in an advanced IT environment. It is also a prominent way to differentiate competitiveness in terms of operations and maintenance costs. Although thermal performance tests implemented using industrial codes and standards can provide officially trustworthy results, they are essentially resource-consuming and maybe even a hind-sighted technique rather than a foresighted one, considering their periodicity. Therefore, if more accurate performance monitoring can be achieved using advanced data analysis techniques, we can expect more optimized operations and maintenance. This paper proposes a framework and describes associated methodologies for in-situ thermal performance analysis, which differs from conventional performance monitoring. The methodologies are effective for monitoring, diagnosis, and prognosis in pursuit of CBM. Our enabling techniques cover the intelligent removal of random and systematic errors, deviation detection between a best condition and a currently measured condition, degradation diagnosis using a structured knowledge base, and prognosis for decision-making about maintenance tasks. We also discuss how our new methods can be incorporated with existing performance tests. We provide guidance and directions for developers and end-users interested in in-situ thermal performance management, particularly in NPPs with large steam turbines.

• Transactions on Electrical and Electronic Materials
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• v.14 no.2
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• pp.71-77
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• 2013

Advanced semiconductor manufacturing technology requires methods to maximize tool efficiency and improve product quality by reducing process variability. Real-time plasma process monitoring and diagnosis have become crucial for fault detection and classification (FDC) and advanced process control (APC). Additional sensors may increase the accuracy of detection of process anomalies, and optical monitoring methods are non-invasive. In this paper, we propose the use of a chromatic data acquisition system for real-time in-situ plasma process monitoring called the Plasma Eyes Chromatic System (PECS). The proposed system was initially tested in a six-inch research tool, and it was then further evaluated for its potential to detect process anomalies in an eight-inch production tool for etching blanket oxide films. Chromatic representation of the PECS output shows a clear correlation with small changes in process parameters, such as RF power, pressure, and gas flow. We also present how the PECS may be adapted as an in-situ plasma arc detector. The proposed system can provide useful indications of a faulty process in a timely and non-invasive manner for successful run-to-run (R2R) control and FDC.