• Title/Summary/Keyword: In-situ monitoring

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Radiology for Ductal Carcinoma In Situ of the Breast: Updates on Invasive Cancer Progression and Active Monitoring

  • Lars J Grimm
    • Korean Journal of Radiology
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    • v.25 no.8
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    • pp.698-705
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    • 2024
  • Ductal carcinoma in situ (DCIS) accounts for approximately 30% of new breast cancer diagnoses. However, our understanding of how normal breast tissue evolves into DCIS and invasive cancers remains insufficient. Further, conclusions regarding the mechanisms of disease progression in terms of histopathology, genetics, and radiology are often conflicting and have implications for treatment planning. Moreover, the increase in DCIS diagnoses since the adoption of organized breast cancer screening programs has raised concerns about overdiagnosis and subsequent overtreatment. Active monitoring, a nonsurgical management strategy for DCIS, avoids surgery in favor of close imaging follow-up to de-escalate therapy and provides more treatment options. However, the two major challenges in active monitoring are identifying occult invasive cancer and patients at risk of invasive cancer progression. Subsequently, four prospective active monitoring trials are ongoing to determine the feasibility of active monitoring and refine the patient eligibility criteria and follow-up intervals. Radiologists play a major role in determining eligibility for active monitoring and reviewing surveillance images for disease progression. Trial results published over the next few years would support a new era of multidisciplinary DCIS care.

Nondestructive Characterization and In-situ Monitoring of Corrosion Degradation by Backward Radiated Ultrasound

  • Song, Sung-Jin;Kim, Young H.;Bae, Dong-Ho;Kwon, Sung D.
    • Corrosion Science and Technology
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    • v.4 no.3
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    • pp.114-119
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    • 2005
  • Since the degradation caused by corrosion is restricted to the surface of materials, conventional ultrasonic nondestructive evaluation methods based on ultrasonic bulk waves are not applicable to characterization of the corrosion degradation. To take care of this difficulty, a new nondestructive evaluation method that uses ultrasonic backward radiation has been proposed recently. This paper explores the potential of this newly developed method for nondestructive characterization and in-situ monitoring of corrosion degradation. Specifically, backward radiated ultrasounds from aged thermo-mechanically controlled process (TMCP) steel specimens by corrosion fatigue were measured and their characteristics were correlated to those of the aged specimens. The excellent correlation observed in the present study demonstrates the high potential of the backward radiated ultrasound as an effective tool for nondestructive characterization of corrosion degradation. In addition, the potential of the backward radiated ultrasound to in-situ monitoring of corrosion degradation is under current investigation.

In-situ monitoring technique for deposition process of CdS buffer layer for CIGS thin film solar cells (CIGS 박막 태양전지용 CdS 버퍼층 제조 공정의 in-situ 모니터링 기술)

  • Kown, Young-Jun;Ahn, Se-Jin;Yoon, Jae-Ho;Yoon, Kyung-Hoon
    • 한국신재생에너지학회:학술대회논문집
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    • 2008.05a
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    • pp.434-435
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    • 2008
  • An in-situ monitoring technique for deposition process of CdS buffer layer was developed in this work. A quartz crystal microbalance (QCM) was used to measure the frequency change during the CdS deposition process and the relation ship between frequency change and film thickness and optical transmittance was investigated. The film thickness shows a linear relationship with frequency change, demonstrating that frequency change measured by QCM can be used a in-situ monitoring tool for CdS deposition process.

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In-situ Endpoint Detection for Dielectric Films Plasma Etching Using Plasma Impedance Monitoring and Self-plasma Optical Emission Spectroscopy with Modified Principal Component Analysis

  • Jang, Hae-Gyu;Chae, Hui-Yeop
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.153-153
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    • 2012
  • Endpoint detection with plasma impedance monitoring and self-plasma optical emission spectroscopy is demonstrated for dielectric layers etching processes. For in-situ detecting endpoint, optical-emission spectroscopy (OES) is used for in-situ endpoint detection for plasma etching. However, the sensitivity of OES is decreased if polymer is deposited on viewport or the proportion of exposed area on the wafer is too small. To overcome these problems, the endpoint was determined by impedance signal variation from I-V monitoring (VI probe) and self-plasma optical emission spectroscopy. In addition, modified principal component analysis was applied to enhance sensitivity for small area etching. As a result, the sensitivity of this method is increased about twice better than that of OES. From plasma impedance monitoring and self-plasma optical emission spectroscopy, properties of plasma and chamber are analyzed, and real-time endpoint detection is achieved.

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In-situ fatigue monitoring procedure using nonlinear ultrasonic surface waves considering the nonlinear effects in the measurement system

  • Dib, Gerges;Roy, Surajit;Ramuhalli, Pradeep;Chai, Jangbom
    • Nuclear Engineering and Technology
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    • v.51 no.3
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    • pp.867-876
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    • 2019
  • Second harmonic generation using nonlinear ultrasonic waves have been shown to be an early indicator of possible fatigue damage in nuclear power plant components. This technique relies on measuring amplitudes, making it highly susceptible to variations in transducer coupling and instrumentation. This paper proposes an experimental procedure for in-situ surface wave nonlinear ultrasound measurements on specimen with permanently mounted transducers under high cycle fatigue loading without interrupting the experiment. It allows continuous monitoring and minimizes variation due to transducer coupling. Moreover, relations describing the effects of the measurement system nonlinearity including the effects of the material transfer function on the measured nonlinearity parameter are derived. An in-situ high cycle fatigue test was conducted using two 304 stainless steel specimens with two different excitation frequencies. A comprehensive analysis of the nonlinear sources, which result in variations in the measured nonlinearity parameters, was performed and the effects of the system nonlinearities are explained and identified. In both specimens, monotonic trend was observed in nonlinear parameter when the value of fundamental amplitude was not changing.

Integration of in-situ load experiments and numerical modeling in a long-term bridge monitoring system on a newly-constructed widened section of freeway in Taiwan

  • Chiu, Yi-Tsung;Lin, Tzu-Kang;Hung, Hsiao-Hui;Sung, Yu-Chi;Chang, Kuo-Chun
    • Smart Structures and Systems
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    • v.13 no.6
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    • pp.1015-1039
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    • 2014
  • The widening project on Freeway No.1 in Taiwan has a total length of roughly 14 kilometers, and includes three special bridges, namely a 216 m long-span bridge crossing the original freeway, an F-bent double decked bridge in a co-constructed section, and a steel and prestressed concrete composite bridge. This study employed in-situ monitoring in conjunction with numerical modeling to establish a real-time monitoring system for the three bridges. In order to determine the initial static and dynamic behavior of the real bridges, forced vibration experiments, in-situ static load experiments, and dynamic load experiments were first carried out on the newly-constructed bridges before they went into use. Structural models of the bridges were then established using the finite element method, and in-situ vehicle load weight, arrangement, and speed were taken into consideration when performing comparisons employing data obtained from experimental measurements. The results showed consistency between the analytical simulations and experimental data. After determining a bridge's initial state, the proposed in-situ monitoring system, which is employed in conjunction with the established finite element model, can be utilized to assess the safety of a bridge's members, providing useful reference information to bridge management agencies.

In-situ Monitoring of Matric Suctions in a Weathered Granite Soil Slope (풍화화강토 사면에서 강우로 인한 모관흡수력 변화에 대한 실험 연구)

  • 이인모;조우성;김영욱;성상규
    • Proceedings of the Korean Geotechical Society Conference
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    • 2002.03a
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    • pp.509-516
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    • 2002
  • Rainfall-induced landslides in a weathered granite soil slope have mostly relative shallow slip surfaces above the groundwater table The pore-water pressure of soil above the groundwater table is usually negative. This negative pore-water pressure(or matric suction) has been found to make a large contribution to the slope stability. Therefore, the variation of in-situ matric suction profiles with time in a soil slope should be understood. In this study, a field measurement program was carried out from June to August, 2001 to monitor in-situ matric suctions and volumetric water contents in a weathered granite soil slope. The influence of climatic conditions on the variation of in-situ matric suctions could be found to decrease rapidly with depth. It could be found that decrement of matric suction induced by precipitation is affected not only by the amount and duration of rainfalls but also by the initial matric suction just prior to rainstorms. The soil-water characteristic from the field monitoring tends toward the wetting path of SWCC obtained from the laboratory test.

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Application of Real-Time Monitoring System to In-Situ Soil Remediation Project (원위치 지반오염정화사업에서의 실시간 모니터링 시스템의 적용 사례)

  • Jung, Seung-Yong;Kim, Byung-Il;Han, Sang-Jae;Kim, Soo-Sam;Hong, Sang-Ki
    • Proceedings of the Korean Geotechical Society Conference
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    • 2005.03a
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    • pp.1384-1389
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    • 2005
  • A real-time monitoring system for in-situ soil remediation technologies is developed and then applied to electrokinetic remediation technique in the field trial tests during 150days. The developed system is consisted the controlled program based on internet web page, data logger, measurement instruments and so on. In the measured items there are pH, temperature, electrical current and potential, vacuum pressure. The results indicated that the system is successively applied to electrokinetic remediation technique, and further research considering economic view and multi purpose system for in-situ soil remediation technologies is needed.

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A Preliminary Research on Optical In-Situ Monitoring of RF Plasma Induced Ion Current Using Optical Plasma Monitoring System (OPMS)

  • Kim, Hye-Jeong;Lee, Jun-Yong;Chun, Sang-Hyun;Hong, Sang-Jeen
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.523-523
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    • 2012
  • As the wafer geometric requirements continuously complicated and minutes in tens of nanometers, the expectation of real-time add-on sensors for in-situ plasma process monitoring is rapidly increasing. Various industry applications, utilizing plasma impedance monitor (PIM) and optical emission spectroscopy (OES), on etch end point detection, etch chemistry investigation, health monitoring, fault detection and classification, and advanced process control are good examples. However, process monitoring in semiconductor manufacturing industry requires non-invasiveness. The hypothesis behind the optical monitoring of plasma induced ion current is for the monitoring of plasma induced charging damage in non-invasive optical way. In plasma dielectric via etching, the bombardment of reactive ions on exposed conductor patterns may induce electrical current. Induced electrical charge can further flow down to device level, and accumulated charges in the consecutive plasma processes during back-end metallization can create plasma induced charging damage to shift the threshold voltage of device. As a preliminary research for the hypothesis, we performed two phases experiment to measure the plasma induced current in etch environmental condition. We fabricated electrical test circuits to convert induced current to flickering frequency of LED output, and the flickering frequency was measured by high speed optical plasma monitoring system (OPMS) in 10 kHz. Current-frequency calibration was done in offline by applying stepwise current increase while LED flickering was measured. Once the performance of the test circuits was evaluated, a metal pad for collecting ion bombardment during plasma etch condition was placed inside etch chamber, and the LED output frequency was measured in real-time. It was successful to acquire high speed optical emission data acquisition in 10 kHz. Offline measurement with the test circuitry was satisfactory, and we are continuously investigating the potential of real-time in-situ plasma induce current measurement via OPMS.

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In-Situ Optical Monitoring of Electrochemical Copper Deposition Process for Semiconductor Interconnection Technology

  • Hong, Sang-Jeen;Wang, Li;Seo, Dong-Sun;Yoon, Tae-Sik
    • Transactions on Electrical and Electronic Materials
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    • v.13 no.2
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    • pp.78-84
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    • 2012
  • An in-situ optical monitoring method for real-time process monitoring of electrochemical copper deposition (CED) is presented. Process variables to be controlled in achieving desired process results are numerous in the CED process, and the importance of the chemical bath conditions cannot be overemphasized for a successful process. Conventional monitoring of the chemical solution for CED relies on the pH value of the solution, electrical voltage level for the reduction of metal cations, and gravity measurement by immersing sensors into a plating bath. We propose a nonintrusive optical monitoring technique using three types of optical sensors such as chromatic sensors and UV/VIS spectroscopy sensors as potential candidates as a feasible optical monitoring method. By monitoring the color of the plating solution in the bath, we revealed that optically acquired information is strongly related to the thickness of the deposited copper on the wafers, and that the chromatic information is inversely proportional to the ratio of $Cu$ (111) and {$Cu$ (111)+$Cu$ (200)}, which can used to measure the quality of the chemical solution for electrochemical copper deposition in advanced interconnection technology.