• 한국재료학회지
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• 제17권7호
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• pp.352-357
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• 2007

Since a pattern defects "repair" system using a diode pumped solid state laser for Flat Panel Display (FPD) was suggested, a lot of laser systems have been explored and developed for mass-production microfabrication process. A maskless lithography system using 405 nm violet laser and Digital Micromirror Device (DMD) has been developed for PDP and Liquid Crystal Display (LCD) Thin Film Transistor (TFT) photolithography process. In addition, a "Laser Direct Patterning" system for Indium Tin Oxide (ITO) for Plasma Display Panel(PDP) has been evaluated one of the best successful examples for laser application system which is applied for mass-production lines. The "heat" and "solvent" free laser microfabrications process will be widely used because the next-generation flat panel displays, Flexible Display and Organic Light Emitting Diode (OLED) should use plastic substrates and organic materials which are very difficult to process using traditional fabrication methods.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.784-787
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• 2002

Oganic light emitting diodes (OLEDs) using PBD(2-(4-biphenylyl)-5-(4-tert-butylpheny)-1,3,4oxadiazole) as a hole blocking layer were fabricated and their device performances were investigated. The devices have a structure of glass substrate ${\setminus}$ indium tin oxide (ITO) ${\setminus}$ TPD(HTL)${\setminus}$PBD,BCP(HBL)${\setminus}$Alq3(EIL)${\setminus}$Mg:Ag(cathode). In this work Bathocuproine(BCP:2,9-Dimethyl-4,7-diphenyl-1,10-phenanthroline) and PBD which were previously known as a good ETL material were used as a HBL. By employing HBL, the luminance and quantum efficiency of OLEDs could be improved due to the increase of recombination probability of electrons and holes.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.777-779
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• 2002

We report the performance of pentacene-based organic thin film transistors (OTFT) with PMMA (polymethyl methacrylate) as the gate insulator which was spin-coated on the ITO (indium tin oxide) glass substrate which was used as the gate contact. The pentacene thin film was deposited on the PMMA film and then Au source/drain contacts were deposited through shadow mask. The pentacene film shows better molecular ordering on PMMA compared with $SiO_2$ of Si wafer. The devices exhibited the field effect mobility of ${\sim}0.004cm^2$/Vs and on/off current ratio of ${\sim}10^3$.

• 한국표면공학회지
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• 제47권1호
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• pp.20-24
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• 2014

Joule heat is generated by applying an electric filed to a conductive layer located beneath or above the amorphous silicon film, and is used to raise the temperature of the silicon film to crystallization temperature. An electric field was applied to an indium tin oxide (ITO) conductive layer to induce Joule heating in order to carry out the crystallization of amorphous silicon. Polycrystalline silicon was produced within the range of a millisecond. To investigate the kinetics of Joule-heating induced crystallization (JIC) solid phase crystallization was conducted using amorphous silicon films deposited by plasma enhanced chemical vapor deposition and using tube furnace in nitrogen ambient. Microscopic and macroscopic uniformity of crystallinity of JIC poly-Si was measured to have better uniformity compared to that of poly-Si produced by other methods such as metal induced crystallization and Excimer laser crystallization.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2009년도 춘계학술대회 논문집
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• pp.173-174
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• 2009

증착 온도를 변화시켜 성장시킨 Ga-doped ZnO 박막을 수소 열처리를 통해 구조적 전기적 광학적 성질을 기존의 투명 전극으로 사용되는 ITO (indium tin oxide) 물질을 대체할 수 있는 가능성을 확인하였다. 열처리 전 Ga-doped ZnO 박막의 증착온도가 증가함에 따라 전기적 성질이 향상되었지만 423 K 이상의 온도에서는 과잉 dopant인 Ga 으로 인한 기여도가 커져 $ZnGa_{2}O_{4}$와 $Ga_{2}O_{3}$ 상으로 인해 박막의 질이 저하되는 것을 확인할 수 있었다. 수소 열처리 후 과잉 dopant Ga 으로 인하여 상온에서 올린 박막만 전기적 성질이 향상되었지만 나머지 증착 온도 변화를 둔 박막에서는 큰 변화가 없었다.

• Bulletin of the Korean Chemical Society
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• 제23권3호
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• pp.399-403
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• 2002

The complex of iron(II) tris(3-Br-phen) (3-Br-phen; 3-bromo-1,10-phenanthroline) was prepared as a precursor of electropolymerization and the crystal structure of [Fe(3-Br-phen)3]($PF_6$)2${\cdot}$CH3CN with a distorted octahedral geometry has been investigated. The reductive electropolymerization of $>[Fe(3-Br-phen)3]^{2+}$ complex onto the surface of a glassy carbon electrode and indium tin oxide (ITO) optically transparent electrode were performed in acetonitrile at room temperature. Thin film of poly-$>[Fe(3-Br-phen)3]^{2+}$ formed was adherent, electroactive and stably deposited on a glassy carbon disk electrode. The thin metallopolymeric film formed was also confirmed by absorption spectroscopy.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.203-203
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• 2012

The SWCNTs network are formed on various plastic substrates such as poly(ethylene terephthalate) (PET), polyimide (PI) and soda lime glass using roll-to-roll printing and spray process. Selective patterning of carbon nanotubes film on transparent substrates was performed using a femtosecond laser. This process has many advantages because it is performed without chemicals and is easily applied to large-area patterning. It could also control the transparency and conductivity of CNT film by selective removal of CNTs. Furthermore, selective cutting of carbon nanotube using a femtosecond laser does not cause any phase change in the CNTs, as usually shown in focused ion beam irradiation of the CNTs. The patterned SWCNT films on transparent substrate can be used electrode layer for touch panels of flexible or flat panel display instead indium tin oxide (ITO) film.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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• pp.275-275
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• 2011

전극에 응용할 수 있는 소재 중 탄소나노소재는 구리와 비슷한 전기 전도성을 가지며 박막 코팅 시 투명성이 보장되고 코팅력이 매우 우수하다. 하지만 현재 다양한 분야에 응용되고 있는 투명전극 소재인 Indium tin oxide (ITO)를 대체하기에는 아직 이른 실정이다. 또 다른 투명전극 응용 소재인 silver nanowire는 전기 전도성이 우수한 반면 투명 전극으로서 두께가 두꺼워질수록 Haze 발생과 기판과의 부착력, 박막형성 뒤의 내구성 문제가 있다. 본 연구에서는 상기 두 재료를 결합하여 복합 전극을 만들어 두 재료의 복합 비율에 따른 투명성과 전기 전도성을 비교하였다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2015년도 추계학술대회 논문집
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• pp.201-202
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• 2015

최근 Indium Tin Oxide (ITO)를 대체하기 위해 많은 각광을 받고 있는 AgNW 투명전극에 대한 연구가 활발하게 진행되고 있으나, AgNW의 경우 기존 용액공정을 활용한 분산과 코팅으로 AgNW의 네트워크 형성시 접촉에 대한 문제점으로 전기적으로 균일한 면저항을 얻기 어려운 단점이 잘 알려져 있다. 또한 AgNW의 분산성을 위해 첨가된 절연체인 바인더에 의해 수분에 취악하고 또한 열적으로 매우 불안한 특성을 보여준다. 이러한 문제점을 해결하기 위해 본 연구에서는 플라즈마를 활용하여 AgNW에 존재하는 바인더를 화학적, 물리적으로 효과적으로 제거할 수 있었으며, 이를 통해 환경적, 열적 안정성을 확보할 수 있었다. 더불어 AgNW에 내산화성이 우수한 부가적인 박막을 형성함으로 300도 이상의 고온에서도 안정한 AgNW 투명전극 소재를 개발할 수 있었다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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• pp.11-12
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• 2000

An 18.1" Thin Film Transistor Liquid Crystal Display (TFT LCD) monitor adopting high brightness In Plane Switching (IPS) technology was realized. While conventional IPS structure used a Chromium (Cr) and Molybdenum (Mo) for a drain electrode, Indium Tin Oxide (ITO) was proposed and verified in this paper. Black sticky micropeal spacers were introduced for the reduction of light scattering phenomena, which was observed at dark room with the conventional micropeal spacers. With the proposed method, more than 10 % aperture ratio was increased and the excellent image quality was obtained.