• Title/Summary/Keyword: ICP0

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Automatic Matching of Building Polygon Dataset from Digital Maps Using Hierarchical Matching Algorithm (계층적 매칭 기법을 이용한 수치지도 건물 폴리곤 데이터의 자동 정합에 관한 연구)

  • Yeom, Junho;Kim, Yongil;Lee, Jeabin
    • Journal of the Korean Society of Surveying, Geodesy, Photogrammetry and Cartography
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    • v.33 no.1
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    • pp.45-52
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    • 2015
  • The interoperability of multi-source data has become more important due to various digital maps, produced from public institutions and enterprises. In this study, the automatic matching algorithm of multi-source building data using hierarchical matching was proposed. At first, we divide digital maps into blocks and perform the primary geometric registration of buildings with the ICP algorithm. Then, corresponding building pairs were determined by evaluating the similarity of overlap area, and the matching threshold value of similarity was automatically derived by the Otsu binary thresholding. After the first matching, we extracted error matching candidates buildings which are similar with threshold value to conduct the secondary ICP matching and to make a matching decision using turning angle function analysis. For the evaluation, the proposed method was applied to representative public digital maps, road name address map and digital topographic map 2.0. As a result, the F measures of matching and non-matching buildings increased by 2% and 17%, respectively. Therefore, the proposed method is efficient for the matching of building polygons from multi-source digital maps.

Natural isotopes and trace element analyses in glass samples (판유리 시료에서 동위원소 및 미량원소 분석법)

  • Min, Ji-Sook;Heo, Sangcheol;Kim, Jae-Guin;Kim, Eun-Ho;Kim, Dong-Wook;Chung, Hee-Sun
    • Analytical Science and Technology
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    • v.20 no.3
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    • pp.219-226
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    • 2007
  • Glass is frequently encountered as types of materials that are submitted to forensic science laboratories as a result of trace evidence transfers. The repeatability and the reproducibility of trace element analysis were presented. An analysis of variance (ANOVA) was performed on laser ablation inductively coupled plasma spectrometric analyses of the fragments to identify the source. Pairwise comparisons were completed for all samples. In a pairwise comparison, each sample was compared to each other for a possible [n(n-1)/2] (n : numbers of the samples) total comparison to associate/discriminate samples using Tukey's HSD method. The aim of this study was to determine the utility of LA-ICP-MS for multi-element analysis of forensic samples. The 12 glass fragments from two manufacturers were collected and analyzed to identify the source. An analysis of variance (ANOVA) was performed on 31 elements in NIST 612 Trace elements in Glass. Elements were classified into four categories defined by the combination of precision and variation of inter-samples. We selected 11 elements, 209Bi, 90Zr, 121Sb, 178Hf, 59Co, 238U, 208Pb, 140Ce, 118Sn, 49Ti and 137Ba. 6 pairs out of 66 possible pairs were not distinguished when compared by 137Ba (p<0.05). However, all samples were distinguished using both 49Ti and 137Ba (p<0.05). In conclusion, multi-elemental analysis with LA-ICP-MS is a potential tecnique for the discrimination of forensic samples.

Study of improving precision and accuracy by using an internal standard in post column isotope dilution method for HPLC-ICP/MS (후 컬럼 동위원소 희석법을 적용한 HPLC-ICP/MS에서의 정량분석에서 내부 표준물을 이용한 정확도와 정밀도의 개선연구)

  • Joo, Mingyu;Park, Myungsun;Pak, Yong-Nam
    • Analytical Science and Technology
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    • v.27 no.3
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    • pp.140-146
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    • 2014
  • An internal standard was used in PCID (post column isotope dilution) to improve the accuracy and precision in quantification of various chemical species. The error occurring in the column was the largest in HPLC-ICP/MS (high performance liquid chromatography-inductively coupled plasma/mass spectrometry) when PCID and other traditional quantification methods were compared with each other. Internal standard was effective in correcting the loss of sample in the column to improve accuracy and precision. When applied to SeMet, using MeSecys or $Se^{4+}$ as an internal standard, relative errors were reduced from 31% and 13% to less than 1%, while standard deviations were reduced from 5.1% and 6.9% to 1.5% and 0.2%, respectively. Positive aspects of using an internal standard in PCID were compared with other quantitative techniques and discussed in detail.

Dry Etching of GaAs and AlGaAs Semiconductor Materials in High Density BCl3and BCl3/Ar Inductively Coupled Plasmas (BCl3및 BCl3/Ar 고밀도 유도결합 플라즈마를 이용한 GaAs와 AlGaS 반도체 소자의 건식식각)

  • Lim, Wan-tae;Baek, In-kyoo;Lee, Je-won;Cho, Guan-Sik;Jeon, Min-hyun
    • Korean Journal of Materials Research
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    • v.13 no.10
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    • pp.635-639
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    • 2003
  • We investigated dry etching of GaAs and AiGaAs in a high density planar inductively coupled plasma system with BCl$_3$and BCl$_3$/Ar gas chemistry. A detailed etch process study of GaAs and ALGaAs was peformed as functions of ICP source power, RIE chuck power and mixing ratio of $BCl_3$ and Ar. Chamber process pressure was fixed at 7.5 mTorr in this study. The ICP source power and RIE chuck power were varied from 0 to 500 W and from 0 to 150 W, respectively. GaAs etch rate increased with the increase of ICP source power and RIE chuck power. It was also found that etch rates of GaAs in $15BCi_3$/5Ar plasmas were relatively high with applied RIE chuck power compared to pure 20 sccm $BCl_3$plasmas. The result was the same as AlGaAs. We expect that high ion-assisted effect in $BCl_3$/Ar plasma increased etch rates of both materials. The GaAs and AlGaAs features etched at 20 sccm $BCl_3$and $15BCl_3$/5Ar with 300 W ICP source power, 100 W RIE chuck power and 7.5 mTorr showed very smooth surfaces(RMS roughness < 2 nm) and excellent sidewall. XPS study on the surfaces of processed GaAs also proved extremely clean surfaces of the materials after dry etching.

Dry Etching of GaAs and AlgaAs Semiconductor Materials in High Density BCl$_3$, BCl$_3$/Ar Inductively Coupled Plasmas (BCl$_3$, BCl$_3$/Ar 고밀도 유도결합 플라즈마를 이용한 GaAs 와 AlGaAs 반도체 소자의 건식식각)

  • Lim, Wan-Tae;Baek, In-Kyoo;Lee, Je-Won;Cho, Guan-Sik;Jeon, Min-Hyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.07a
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    • pp.31-36
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    • 2003
  • We investigated dry etching of GaAs and AlGaAs in a high density planar inductively coupled plasma system with $BCl_3$ and $BCl_3/Ar$ gas chemistry. A detailed process study as a function of ICP source power, RIE chuck power and $BCl_3/Ar$ mixing ratio was performed. At this time, chamber pressure was fixed at 7.5 mTorr. The ICP source power and RIE chuck power were varied from 0 to 500 W and from 0 to 150 W, respectively. GaAs etch rate increased with the increase of ICP source power and RE chuck power. It was also found that etch rate of GaAs in $BCl_3$ gas with 25% Ar addition was superior to that of GaAs in a pure $BCl_3$ (20 sccm $BCl_3$) plasma. The result was same with AlGaAs. We expect that high ion-assisted effect in $BCl_3$/Ar plasma increased etch rates of both materials. The GaAs and AIGaAs features etched at 20 sccm $BCl_3$ and $15BCl_3/5Ar$ with 300 W ICP source power, 100 W RIE chuck power and 7.5 mTorr showed very smooth surfaces(RMS roughness < 2 nm) and excellent sidewall. XPS study on the surfaces of processed GaAs also proved extremely clean surfaces of the materials after dry etching.

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Signal compensation by the light scattering of sample aerosols in ICP-AES (ICP-AES에서 에어로졸의 광산란에 의한 신호의 보정)

  • Yeon, Pyung-Hum;Pak, Yong-Nam
    • Analytical Science and Technology
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    • v.25 no.4
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    • pp.223-229
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    • 2012
  • Analytical signal from ICP was compensated by the light scattering of sample aerosols. Reference scattering signal was generated by a He-Ne or diode laser, monitored for the amount of aerosol producing and used for the compensation of analytical signals. The result showed that significant improvement in precision could be achieved for the short-term signal (within 1 minute) from 3.4% to 0.9% RSD in signal and 14.9% to 4.2% for the long-term (10 minutes) for Be, Pb and Co. This method is very useful not only for the pulse type but for continuous type signals especially when a nebulizer is unstable. To improve long-term precision, higher stability is required in the scattering cell and detector as well as the reduction of noise from the line between a nebulizer and plasma.

Risk Assessment of Arsenic in Agricultural Products (농산물 중 비소 위해평가)

  • Choi, Hoon;Park, Sung-Kug;Kim, Dong-Sul;Kim, Mee-Hye
    • Korean Journal of Environmental Agriculture
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    • v.29 no.3
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    • pp.266-272
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    • 2010
  • The present study was carried out to assess exposure & risk for Korean by total and inorganic As intake through agricultural products. Total arsenic analysis was performed using microwave device and ICP-MS. 50% MeOH extraction and anion-exchange HPLC-ICP-MS method has been used to determine arsenic species. 329 samples covering 20 kinds of agricultural products were collected from various retail outlets and markets across Korea. The concentration of total As was in the range of 0.001~0.718 mg/kg, while inorganic and organic arsenic species in all samples was not determined. For risk assessment, probable daily intake was calculated and compared with provisional tolerable weekly intake (PTWI, 15 ${\mu}g$/kg b.w./week for inorganic arsenic) established by JECFA. The median daily exposure to total and inorganic As by intake of agricultural products except rice was ranged 0.0002~0.012, 0.0001~0.001 ${\mu}g$/kg b.w./day, corresponding to 0.01~0.5%, 0.002~0.1% of PTWI, respectively. The median level of total and inorganic As intake through rice was 0.603 and 0.041 ${\mu}g$/kg b.w./day, and 28.1% and 1.9% of PTWI, respectively. Therefore, the level of overall exposure to arsenic for Korean through agricultural products was below the recommended JECFA levels, indicating of least possibility of risk.

Risk Analysis of Arsenic in Rice Using by HPLC-ICP-MS (HPLC-ICP-MS를 이용한 쌀의 비소 위해도 평가)

  • An, Jae-Min;Park, Dae-Han;Hwang, Hyang-Ran;Chang, Soon-Young;Kwon, Mi-Jung;Kim, In-Sook;Kim, Ik-Ro;Lee, Hye-Min;Lim, Hyun-Ji;Park, Jae-Ok;Lee, Gwang-Hee
    • Korean Journal of Environmental Agriculture
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    • v.37 no.4
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    • pp.291-301
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    • 2018
  • BACKGROUND: Rice is one of the main sources for inorganic arsenic among the consumed crops in the world population's diet. Arsenic is classified into Group 1 as it is carcinogenic for humans, according to the IARC. This study was carried out to assess dietary exposure risk of inorganic arsenic in husked rice and polished rice to the Korean population health. METHODS AND RESULTS: Total arsenic was determined using microwave device and ICP-MS. Inorganic arsenic was determined by ICP-MS coupled with HPLC system. The HPLC-ICP-MS analysis was optimized based on the limit of detection, limit of quantitation, and recovery ratio to be $0.73-1.24{\mu}g/kg$, $2.41-4.09{\mu}g/kg$, and 96.5-98.9%, respectively. The inorganic arsenic concentrations of daily exposure (included in body weight) were $4.97{\times}10^{-3}$ (${\geq}20$ years old) $-1.36{\times}10^{-2}$ (${\leq}2$ years old) ${\mu}g/kg\;b.w./day$ (PTWI 0.23-0.63%) by the husked rice, and $1.39{\times}10^{-1}$ (${\geq}20$ years old) $-3.21{\times}10^{-1}$ (${\leq}2$ years old) ${\mu}g/kg\;b.w./day$ (PTWI 6.47-15.00%) by the polished rice. CONCLUSION: The levels of overall exposure to total and inorganic arsenic by the husked and polished rice were far lower than the recommended levels of The Joint FAO/WHO Expert Committee on Food Additives (JECFA), indicating of little possibility of risk.

High Density Planar Inductively Coupled Plasma Etching of GaAs in BCl$_3$-based Chemistries (BCl$_3$ 기반 가스를 이용한 GaAs의 고밀도 평판형 유도결합 플라즈마 식각)

  • ;;;;;;S.J. Pearton
    • Journal of the Korean institute of surface engineering
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    • v.36 no.5
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    • pp.418-422
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    • 2003
  • 평판형 유도결합 플라즈마 식각장비(inductively coupled plasma etcher)를 이용하여 각종 공정조건들에 따른 GaAs의 식각특성을 연구하였다. 공정변수들은 ICP 소스파워(0-500 W), RIE 척파워(0-150 W), 가스 종류($BCl_3$, $BCl_3$/Ar, $BCl_3$/Ne) 및 가스혼합비였다. $BCl_3$ 가스만을 이용하여 GaAs를 식각한 경우보다 25%의 Ar이나 Ne같은 불활성 기체를 혼합한 $15BCl_3$/5Ar, $15BCl_3$/5Ne 가스를 이용한 경우의 식각률이 더 우수한 것을 확인하였다. 그리고 50% 이하의 Ar이 혼합된 $BCl_3$/Ar의 경우는 높은 식각률 (>4,000 $\AA$/min)과 평탄한 표면(RMS roughness : <2 nm)을 얻을 수 있었지만 지나친 양(>50%)의 Ar의 혼합은 오히려 표면을 거칠게 하거나 식각률을 떨어뜨리는 결과를 가져왔다. 그리고 20 sccm $BCl_3$, 100 W RIE 척파워, 300 W ICP 소스파워, 공정압력이 7.5 mTorr인 조건에서의 GaAs의 식각결과는 아주 우수한 특성(식각률: ∼ 4,000, $\AA$/min, 우수한 수직측벽도: >$87^{\circ}$, 평탄한 표면: RMS roughness : ∼0.6 nm)을 나타내었다.

Preparation and Characterization of La0.8Ca0.2MnO3 (La0.8Ca0.2MnO3의 합성 및 특성연구)

  • 정미원;이지윤;김현정
    • Journal of the Korean Ceramic Society
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    • v.40 no.5
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    • pp.434-440
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    • 2003
  • The powders of L $a_{0.8}$C $a_{0.2}$Mn $O_3$ Colossal Magnetoresistance (CMR) materials were synthesized by sol-gel process. Lanthanum(H), Calcium(II) and Manganese(III) 2,4-Pentanedionate were dissolved in a mixed binary solution consisted of propionic acid and methanol with PEG (15 wt%) aqueous solution. The progress of reactions was monitored by FT-IR spectroscopy. The Lao scao.2Mn03 gel powders were annealed at various temperatures. The structural changes were investigated by FT-IR, CP/MAS $^{ 13}$C solid state NMR spectroscopy and XRD. The thermochemical property, particle characterization, microstructure of sintered sample, and cation composition of gel powder were studied by TG/DTA, FE-SEM and ICP-AES. The magnetic characterizations were identified through measurement of magnetic moment by VSM.