• Title/Summary/Keyword: ICP

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Transcriptional Regulation of the VP16 Gene of Herpes Simplex Virus Type 1

  • Kwun, Hyun-Jin;Jun, Hong-Ki;Lee, Tae-Ho;Jang, Kyung-Lib
    • BMB Reports
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    • v.32 no.5
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    • pp.456-460
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    • 1999
  • The promoter of the HSV-1 VP16 gene contains binding sites for the cellular transcription factors such as USF, CTF, and Sp1, each of which affects basal level expression of the VP16 gene. Transcription of the VP16 gene was induced by viral immediate-early proteins, ICP0 and ICP4, in a synergistic manner but repressed by ICP22. To gain further insight into the role of ICP0 in the expression of the VP16 gene during virus infection, several mutants with deletions in each of their transcriptional regulatory elements were generated. According to transient gene expression assays of these mutants using the CAT gene as a reporter, the USF and CTF binding sites were necessary for efficient induction of the promoter in the presence of transfected ICP0 or during virus infection, whereas the Sp1 binding site had little effect on ICP0-mediated VP16 expression. These results indicate that the immediate early proteins of HSV-1 regulate expression of the VP16 gene during virus infection by modulating the activities of cellular transcription factors such as USF and CTF.

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Chonbuk National University 60kW and 200kw ICP(RF) Plasma systems for Advance Material processing (전북대학교 소재공정용 60kW 및 200kW ICP(RF) 플라즈마 발생 장치 구축 현황)

  • Lee, Mi-Yeon;Kim, Jeong-Soo;Seo, Jun-Ho;Choi, Seong-Man;Hong, Bong-Guen
    • Proceedings of the Korean Society of Propulsion Engineers Conference
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    • 2010.11a
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    • pp.781-783
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    • 2010
  • Chonbuk national university High-enthalpy plasma research center is under construction for 60kW and 200kw ICP(RF) Plasma system as Advance Material R&D and production equipment. The 60kW & 200kW ICP(RF) plasma systems will contribute to promote Korea's material industrial development and Thermal plasma technology.

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Analysis of Trace Elements in Mud Flat with Neutron Activation Analysis (NAA) and Atomic Spectroscopy (중성자 방사화 분석법과 원자 분광법을 이용한 갯벌 시료 중 미량원소 분석법에 관한 연구)

  • Nam, Sang-Ho;Kim, Min-Jae;Chung, Yong-Sam;Kim, Sun-Ha
    • Analytical Science and Technology
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    • v.15 no.6
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    • pp.521-528
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    • 2002
  • Neutron Activation Analysis (NAA) and Inductively Coupled Plasma Atomic Emission Spectrometry (ICP-AES) have been applied for the determination of inorganic elements in mud flat of south seaside in Korea. The analytical results of Al, Ca, Fe, Mg, K and Na by NAA were compared with those by ICP-AES. The results show that NAA is superior to ICP-AES for the determination of minor elements in sediment. Accordingly, NAA will play an important role in the analysis of environment samples such as mud flat and sediment having complex matrix.

Effect of Inductively Coupled Plasma on the Microstructure, Structure and Mechanical Properties of NbN Coatings (유도결합 플라즈마 파워가 NbN 코팅막의 미세구조, 결정구조 및 기계적 특성에 미치는 영향에 관한 연구)

  • Chun, Sung-Yong
    • Journal of the Korean institute of surface engineering
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    • v.48 no.5
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    • pp.205-210
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    • 2015
  • NbN coatings were prepared by ICP (inductively coupled plasma) assisted magnetron sputtering from a Nb metal target in $Ar+N_2$ atmosphere at various ICP powers. Effect of ICP on the microstructure, crystalline structure and mechanical properties of NbN coatings was investigated by field emission electron microscopy, X-ray diffraction, atomic force microscopy and nanoindentation measurements. The results show that ICP power has a significant influence on coating microstructure, structure and mechanical properties of NbN coatings. With the increasing of ICP power, coating microstructure evolves from the columnar structure of DC process to a highly dense one. Crystalline structure of NbN coatings were changed from cubic ${\delta}$-NbN to hexagonal ${\beta}-Nb_2N$ with increase of ICP power. The maximum nano hardness of 25.4 GPa with Ra roughness of 0.5 nm was obtained from the NbN coating sputtered at ICP power of 200 W.

GaN Etch Process System using Parallel Plasma Source for Micro LED Chip Fabrication (병렬 플라즈마 소스를 이용한 마이크로 LED 소자 제작용 GaN 식각 공정 시스템 개발)

  • Son, Boseong;Kong, Dae-Young;Lee, Young-Woong;Kim, Huijin;Park, Si-Hyun
    • Journal of the Semiconductor & Display Technology
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    • v.20 no.3
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    • pp.32-38
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    • 2021
  • We developed an inductively coupled plasma (ICP) etcher for GaN etching using a parallel plasma electrode source with a multifunctional chuck matched to it in order for the low power consumption and low process cost in comparison with the conventional ICP system with a helical-type plasma electrode source. The optimization process condition using it for the micro light-emitting diode (µ-LED) chip fabrication was established, which is an ICP RF power of 300 W, a chuck power of 200 W, a BCl3/Cl2 gas ratio of 3:2. Under this condition, the mesa structure with the etch depth over 1 ㎛ and the etch angle over 75° and also with no etching residue was obtained for the µ-LED chip. The developed ICP showed the improved values on the process pressure, the etch selectivity, the etch depth uniformity, the etch angle profile and the substrate temperature uniformity in comparison with the commercial ICP. The µ-LED chip fabricated using the developed ICP showed the similar or improved characteristics in the L-I-V measurements compared with the one fabricated using the conventional ICP method

Flexural Strength of PHC Pile Reinforced with Infilled Concrete, Transverse and Longitudinal Reinforcements (내부충전 콘크리트와 횡보강 및 축방향 철근으로 보강된 PHC 말뚝의 휨강도)

  • Bang, Jin-Wook;Hyun, Jung-Hwan;Lee, Bang-Yeon;Lee, Seung-Soo;Kim, Yun-Yong
    • Journal of the Korea Concrete Institute
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    • v.25 no.1
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    • pp.91-98
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    • 2013
  • The pre-tensioned spun high strength concrete (PHC) pile has poor load carrying capacity in shear and flexure, while showing excellent axial load bearing capacity. The purpose of this study is to evaluate the flexural performance of the concrete-infilled composite PHC (ICP) pile which is the PHC pile reinforced with infilled concrete, transverse and longitudinal reinforcement for the improvement of shear and flexural load carrying capacity. The ICP pile specimen was designed to make allowable axial compression and bending moment higher load bearing capacity than those determined through the investigation of abutment design cases. The allowable axial compression and bending moment of the ICP pile was obtained using the program developed for calculating the axial compression - bending moment interaction. Then, ICP pile specimens were manufactured and flexural tests were performed. From the test results, it was found that the maximum bending moment of the ICP pile was approximately 45% higher than that of the PHC pile and the safety factor of ICP pile design was about 4.5 when the allowable bending moment was determined to be 25% of the flexural strength.

Determination of boron in steel by HNO3-NH4HF2 digestion and ICP-MS (질산-이플루오린화암모늄 분해 및 ICP-MS에 의한 철강 중 붕소 정량에 관한 연구)

  • Choi, Won Myung;Eum, Chul Hun;Park, Ilyong
    • Analytical Science and Technology
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    • v.27 no.6
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    • pp.352-356
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    • 2014
  • Various studies have been done to improve the properties of the steel by adding boron to the steel. Some studies have reported on the analysis of the boron in steel by AAS (atomic absorption spectrometry), ICP-OES(inductively coupled plasma-optical emission spectrometry), ICP-MS (inductively coupled plasma/mass spectrometry). The volatile loss of boron of steel in sample digestion and the separation procedure for avoiding matrix effect by high concentration of iron are difficulties for determination of boron in steel. The method to determine boron in steel by ICP-MS was developed without volatilization of boron in sample digestion step with $HNO_3-NH_4HF_2$ digestion method, and the additional separation process for avoiding matrix effect. Complete decomposition of steel with $HNO_3-NH_4HF_2$ digestion method, and boron determination by ICP-MS in the matrix of high concentration of iron were possible. Quantitative recoveries of boron in certified standard steel by new method in this study were 103 to 111%, and the relative standard deviation is less than 5%. The method detection limit was $1.17{\mu}g/g$.

Newly Designed Ion Beam Etcher with High Etch Rate

  • Cheong, Hee-Woon
    • Journal of Magnetics
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    • v.20 no.4
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    • pp.366-370
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    • 2015
  • New ion beam etcher (IBE) using a magnetized inductively coupled plasma (M-ICP) has been developed. The magnetic flux density distributions inside the upper chamber, where the plasma is generated by inductive coupling, were successfully optimized by arranging a pair of circular coils very carefully. More importantly, the proposed M-ICP IBE exhibits higher etch rate than ICP.

Determination of Boron in Steels by Precipitation Method and ICP-AES (침전법과 ICP-AES법에 의한 철강 시료 중 Boron의 분석)

  • Lim, Heon-Sung;Lee, Sueg-Geun
    • Analytical Science and Technology
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    • v.15 no.2
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    • pp.180-183
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    • 2002
  • The new useful method for the direct determination of trace boron in iron matrix was studied by applying the precipitation of $Fe(OH)_3$ and ICP-AES. Optimum pH range was 11 ~ 12.5. Linear concentration range of boron was $0.01{\sim}1.0{\mu}g/m{\ell}$ in $5000 {\mu}g/m{\ell}$ solution as iron.

Periodic Variation of Magnetized Plasma for E-ICP (자화 플라즈마의 주기적 특성 변화와 E-ICP)

  • 라상호;박세근;오범환
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.616-619
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    • 2000
  • It is important to control the plasma characteristics for high quality plasma process. Recently, a novel method proposed by us, named as Enhanced-ICP, using periodic weak time-varying axial magnetic field added to a normal ICP source, has improved etch characteristics much. Variation of plasma characteristics according to the frequency of time-varying axial magnetic field have been measured and analyzed.

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