Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Periodic Variation of Magnetized Plasma for E-ICP

자화 플라즈마의 주기적 특성 변화와 E-ICP

  • 라상호 (인하대학교 전자재료공학과) ;
  • 박세근 (인하대학교 전자재료공학과) ;
  • 오범환 (인하대학교 전자재료공학과)
  • Published : 2000.07.01
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Abstract

It is important to control the plasma characteristics for high quality plasma process. Recently, a novel method proposed by us, named as Enhanced-ICP, using periodic weak time-varying axial magnetic field added to a normal ICP source, has improved etch characteristics much. Variation of plasma characteristics according to the frequency of time-varying axial magnetic field have been measured and analyzed.

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