• Title/Summary/Keyword: I-AFM

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Nano Force Metrology and Standards (나노 힘 측정 및 표준)

  • Kim M.S.;Park Y.K.;Choi J.H.;Kim J.H.;Kang D.I.
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.59-62
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    • 2005
  • Small force measurements ranging from 1 pN to $100{\mu}N$, we call it Nano Force, become the questions of common interests of biomechanics, nanomechanics, material researches, and so on. However, unfortunately, quantitative and accurate force measurements have not been taken so far. This is because there ,are no traceable force standards and a calibration scheme. This paper introduces a quantitative force metrology, which provides traceable link to SI (International Systems of Units). We realize SI traceable force ranging from 1 nN to $100{\mu}N$ using an electrostatic balance and disseminate it through transfer standards, which are self-sensing cantilevers that have integrated piezoresistive strain gages. We have been built a prototype electrostatic balance and Nano Force Calibrator (NFC), which is an AFM cantilever calibration system. As a first experiment, we calibrated normal spring constants of commercial AFM cantilevers using NFC. Calibration results show that the spring constants of them are quite differ from each other and nominal values provided by a manufacturer (up to 240% deviation).

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Corrosion Inhibition Properties of New Thiazolidinedione Derivatives for Copper in 3.5 wt.% NaCl Medium (3.5 중량% NaCl 매질에서 구리에 대한 새로운 티아졸리딘디온 유도체의 부식 억제 특성)

  • Lgaz, Hassane;Lee, Han-Seung
    • Proceedings of the Korean Institute of Building Construction Conference
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    • 2021.11a
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    • pp.27-28
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    • 2021
  • The search for new corrosion inhibitors for different corrosive mediums is a never-ending task. In the present work, the corrosion inhibition behavior and adsorption mechanism of two novel synthetic thiazolidinedione derivatives noted MTZD and ATZD in 3.5 wt.% NaCl solution on copper were investigated. Electrochemical, scanning electron microscope (SEM), atomic force microscopy (AFM) techniques were used along with first-principles DFT calculations. At maximum inhibitor concentration i.e., 300 ppm corrosion inhibition efficiency reached maximum up to 90% and 96% for MTZD and ATZD, respectively, and thereby followed the order of ATZD > MTZD. The inhibition efficiency increased up to 24 h of immersion, and then decreased after 48h immersion. The potentiodynamic curves suggested that the inhibition action of tested compounds is a mixed type of inhibitor. The first-principles DFT calculations suggested that compounds under investigation formed covalent bonds with Cu(111) surface via reactive sites. SEM and AFM results confirmed the formation of protective barrier that prevent corrosion attack.

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Influence of Wet Chemistry Damage on the Electrical and Structural Properties in the Wet Chemistry-Assisted Nanopatterned Ohmic Electrode (Wet chemistry damage가 Nanopatterned p-ohmic electrode의 전기적/구조적 특성에 미치는 영향)

  • Lee, Young-Min;Nam, Hyo-Duk;Jang, Ja-Soon;Kim, Sang-Mook;Baek, Jong-Hyub
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.150-150
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    • 2008
  • 본 연구에서는 Wet chemistry damage가 Nanopatterned p-ohmic electrode에 미치는 영향을 연구하였다. Nanopattern은 Metal clustering을 이용하여, P-GaN와 Ohmic형성에 유리한 Pd을 50$\AA$ 적층한 후 Rapid Thermal Annealing방법으로 $850^{\circ}C$, $N_2$분위기에서 3min열처리를 하여 Pd Clustering mask 를 제작하였다. Wet etching은 $85^{\circ}C$, $H_3PO_4$조건에서 시간에 따라 Sample을 Dipping하는 방법으로 시행하였다 Ohmic test를 위해서 Circular - Transmission line Model 방법을 이용하였으며, Atomic Force Microscopy과 Parameter Analyzer로 Nanopatterned GaN surface위에 형성된 Ni/ Au Contact에서의 전기적 분석과, 표면구조분석을 시행하였다. AFM결과 Wet처리시간에 따라서 Etching형상 및 Etch rate이 영향을 받는 것이 확인되었고, Ohmic test에서 Wet chemistry처리에 의한 Tunneling parameter와 Schottky Barrier Height가 크게 증/감함을 관찰하였다. 이러한 결과들은 Wet처리에 의해서 발생된 Defect가 GaN의 표면과 하부에서 발생되며, Deep acceptor trap 및 transfer거동과 밀접한 관련이 있음을 확인 할 수 있었다. 보다 자세한 Transport 및 Wet chemical처리영향에 관한 형성 Mechanism은 후에 I-V-T, I-V, C-V, AFM결과 들을 활용하여 발표할 예정이다.

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Electrical Characterization of Nanoscale $Au/TiO_2$ Schottky Diodes Probed with Conductive Atomic Force Microscopy

  • Lee, Hyunsoo;Van, Trong Nghia;Park, Jeong Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.290.1-290.1
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    • 2013
  • The electrical characterization of Au islands on TiO2 at nanometer scale (as a Schottky nanodiode) has been studied with conductive atomic force microscopy in ultra-high vacuum. The diverse sizes of the Au islands were formed by using self-assembled patterns on n-type TiO2 semiconductor film using the Langmuir-Blodgett process. Local conductance images showing the current flowing through the TiN coated AFM probe to the surface of the Au islands on TiO2 was simultaneously obtained with topography, while a positive sample bias is applied. The boundary of the Au islands revealed a higher current flow than that of the inner Au islands in current AFM images, with the forward bias presumably due to the surface plasmon resonance. The nanoscale Schottky barrier height of the Au/TiO2 Schottky nanodiode was obtained by fitting the I-V curve to the thermionic emission equation. The local resistance of the Au/TiO2 nanodiode appeared to be higher at the larger Au islands than at the smaller islands. The results suggest that conductive atomic force microscopy can be used to reveal the I-V characterization of metal size dependence and the electrical effects of surface plasmon on a metal-semiconductor Schottky diode at nanometer scale.

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Effects of Thermal Treatment on Structural Properties of DLC Films Deposited by FCVA Method (FCVA 방법으로 증착된 DLC 박막의 열처리에 따른 구조적 물성 분석)

  • 김영도;장석모;박창균;엄현석;박진석
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.52 no.8
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    • pp.325-329
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    • 2003
  • Effects of thermal treatment on the structural properties of diamond-like carbon (DU) films were examined. The DLC films were deposited by using a modified filtered cathodic vacuum arc (FCVA) deposition system and by varying the negative substrate bias voltage, deposition time, and nitrogen flow rate. Thermal treatment on DLC films was performed using a rapid thermal annealing (RTA) process at $600^{\circ}C$ for 2min. Raman spectroscopy, x-ray photoemission spectroscopy (XPS), atomic force microscope (AFM), and surface profiler were used to characterize the I$_{D}$I$_{G}$ intensity ratio, sp$^3$ hybrid carbon fraction, internal stress, and surface roughness. It was found for all the deposited DLC films that the RTA-treatment results in the release of internal compressive stress, while at the same time it leds to the decrease of sp$^3$ fraction and the increase of I$_{D}$I$_{G}$ intensity ratio. It was also suggested that the thermal treatment effect on the structural property of DLC films strongly depends on the diamond-like nature (i.e., sp$^3$ fraction) of as-deposited film.ed film.

Design and deposition of two-layer antireflection and antistatic coatings using a TiN thin film (TiN 박막을 이용한 2층 무반사 코팅의 설계 및 층착)

  • 황보창권
    • Korean Journal of Optics and Photonics
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    • v.11 no.5
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    • pp.323-329
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    • 2000
  • In this study we have calculated an ideal complex refractive index of a TiN trim used in a layer of anl1reilecnon (I\R) coatmg, [air$ISiO_2ITiNIglass$] in the visible. Also we simulated the rellectance of lwo-layer AR coating by varying the thicknesses of TiN and $SiO_2$ layers, respecl1vely. The simolation results show that we can controllhe lowest reflectance and AR band of tile AR coating. The TIN fihns were fabricated by a RF magnetron sputtering apparalus. The chemical, structural and electrical properties of TiN fih11S were inveshgated by the Rutherford backscattering spech'oscopy (RBS), atomic force microscope (AFM) and 4-point probe. The optical properlies were inve,tigated by the spectrophotometer and vanable angle spectroscopic ellipsometer (VASE). The smface roughness of TiN flhns \vas $9~10\AA$. TIle resistivity of TiN films was TEX>$360~730\mu$\Omega $ cm. The ,toichlOllletry of TiN film was 1'1: O:N = I: 0.65 :0.95 and ilic oxygen wa~ found on ilie smface. With these experimental and simu]al1on resulLs, we deposited duo: two-layer AR coating, [air$ISiO_2ITiNIglass$] and the refleClance was under 0.5% ill the regIOn of 440-650 run. 0 run.

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Exchange Coupling of FerromagneticlAntiferrmagnetic through Nonmagnetic Layer in Antiferromagnetic

  • Kim Jong-Min;Kim Young-Sung
    • Proceedings of the Korean Magnestics Society Conference
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    • 2004.12a
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    • pp.200-201
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    • 2004
  • The $H_{EB}$ was investigated for exchange coupling $20\;{\AA}\;Fe/x\;{\AA}\;NiO\;(type-I samples)$, $20\;{\AA}\;Fe/x\;{\AA}$ nonmagnetic layer $(MgO, Ag, Cu)/(500-x{\AA})$ NiO (type-II smaples). In type-I samples, the $H_{EB}$ is long-range coupling when looking from the point of view of the AFM. The $H_{EB}$ consistent with a generalized Meiklejohn-Bean approach. The critical thickness, which $H_{EB}$ is observed, is $130\;{\AA}$. In type-II samples, MgO layer more decouples the thin interfacial NiO from bottom NiO than other nonmagnetic layer. Nd the decoupling of Ag smallest. This means that the Ag layer has strong coupling the thin interfacial NiO with bottom NiO.

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P-side-down mounting by using AuSn alloy solder of semiconductor laser (반도첼 레이저의 AuSn 합금 솔더를 사용한 p-side-down방식의 마운팅)

  • Choi, S.H.;Heo, D.C.;Bae, H.C.;Han, I.K.;Lee, C.
    • Proceedings of the KIEE Conference
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    • 2003.10a
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    • pp.273-275
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    • 2003
  • 본 실험은 고출력 반도체 레이저의 p-side-down 마운팅용 솔더로서 AuSn 합금 솔더(80wt%:20wt%)의 적합성에 대해 연구하였다. $1{\mu}m$이하의 균일도로 폴리싱 된 Cu heat sink의 표면에 두께 $1{\mu}m$의 Ni로 코팅을 한다음, AuSn 다층박막은 e-beam 증착기로 AuSn 합금 솔더는 열증착기로 각각 증착하였다. 열처리는 산화 방지를 위해 $N_2$ 분위기에서 행하였으며, 동일한 압력으로 마운팅을 하였다. 표면의 거칠기와 형상은 AFM(Atomic Force Microscope)과 SEM(Scanning Electron Microscopy)으로 그리고 Au와 Sn의 성분비는 AES(Auger Electron Spectroscopy) 로 비교하였다. 또한 CW(연속발진)을 통한 L-I(Light-Current)측정을 통해 본딩상태를 비교하였다.

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Preparation of PHBV/Collagen Nanofibrous Mats and their Tissue Compatibility Compatibilscaffolds for tissue engineering

  • Meng, Wan;Kim, Se-Yong;Yuan, Jiang;Kim, Jung-Chul;Kwon, Oh-Hyeong;Ito, Yoshihiro;Kang, Inn-Kyu
    • Proceedings of the Polymer Society of Korea Conference
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    • 2006.10a
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    • pp.50-51
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    • 2006
  • The nanofibrous scaffolds were obtained by co-electrospinning PHBV and collagen Type I in HIFP. The resulting fiber diameters were in the range between 300 and 600 nm. The nanofiber surfaces were characterized by ATR-FTIR, ESCA and AFM. The PHBV and collagen components of the PHBV-Col nanofibrous scaffold were biodegraded by PHB depolymerase and a collagenase Type I aqueous solution, respectively. It was found, from the cell-culture experiment, that the PHBV-Col nanofibrous scaffold accelerated the adhesion of the NIH 3T3 cell compared to the PHBV nanofibrous scaffold, thus showing a good tissue engineering scaffold.

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The thickness effect on surface and electrical properties of PVP layer as insulator layer of OTFTs (OTFT 소자의 절연층으로써 두께에 따른 PVP 층의 표면 및 전기적 특성)

  • Seo, Choong-Seok;Park, Yong-Seob;Park, Jae-Wook;Kim, Hyung-Jin;Yun, Deok-Yong;Hong, Byung-You
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.245-245
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    • 2008
  • In this work, we describe the characterization of PVP films synthesized by spin-coater method and fabricate OTFTs of a bottom gate structure using pentacene as the active layer and polyvinylphenol (PVP) as the gate dielectric on Au gate electrode. We investigated the surface and electrical properties of PVP layer using an AFM method and MIM structure, and estimated the device properties of OTFTs including $I_D-V_D$, $I_D-V_G$, threshold voltage $V_T$, on/off ratio, and field effect mobility.

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