• Advances in materials Research
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• v.7 no.1
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• pp.73-81
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• 2018

$TiO_2/CH_3NH_3Pb_{1-x}Sb_xI_{3-3x}Br_{3x}-based$ photovoltaic devices were fabricated by a spin-coating method using mixture solutions with $SbBr_3$. Effects of $SbBr3$, CsI or RbBr addition to $CH_3NH_3PbI_3$ precursor solutions on the photovoltaic properties where investigated. The short-circuit current densities and photoconversion efficiencies were improved by adding a small amount of $SbBr_3$, CsI or RbBr to the perovskite phase, which would be due to the doping effect of Sb, Br and Cs/Rb atom at the Pb, I and $CH_3NH3$ sites, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.166-166
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• 2010

Recently, TFTs based on amorphous oxide semiconductors (AOSs) such as ZnO, InZnO, ZnSnO, GaZnO, TiOx, InGaZnO(IGZO), SnGaZnO, etc. have been attracting a grate deal of attention as potential alternatives to existing TFT technology to meet emerging technological demands where Si-based or organic electronics cannot provide a solution. Since, in 2003, Masuda et al. and Nomura et al. have reported on transparent TFTs using ZnO and IGZO as active layers, respectively, much efforts have been devoted to develop oxide TFTs using aforementioned amorphous oxide semiconductors as their active layers. In this thesis, I report on the performance of thin-film transistors using amorphous indium gallium zinc oxides for an active channel layer at room temperature. $SiO_2$ was employed as the gate dielectric oxide. The amorphous indium gallium zinc oxides were deposited by RF magnetron sputtering. The carrier concentration of amorphous indium gallium zinc oxide was controlled by oxygen pressure in the sputtering ambient. Devices are realized that display a threshold voltage of 1.5V and an on/off ration of > $10^9$ operated as an n-type enhancement mode with saturation mobility with $9.06\;cm^2/V{\cdot}s$. The devices show optical transmittance above 80% in the visible range. In conclusion, the fabrication and characterization of thin-film transistors using amorphous indium gallium zinc oxides for an active channel layer were reported. The operation of the devices was an n-type enhancement mode with good saturation characteristics.

• 한국초전도학회:학술대회논문집
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• v.10
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• pp.179-183
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• 2000

For a ground plane in high-temperature superconducting ramp-edge junction devices, YBa$_2$Cu$_3$O$_{7-{\delta}}$/SrTiO$_3$/YBa$_2$Cu$_3$O$_{7-{\delta}}$ multilayer structures were fabricated using pulsed laser deposition and ECR ion milling. Various process parameters were adjusted to enhance the device characteristics. By etching the STO layer to form a tapered edge of about 15$^{\circ}$ and in-situ RF plasma treatment of bottom YBCO surface prior to deposition of top YBCO, the top-to-bottom YBCO showed T$_c$ of 75${\sim}$80 K and I$_c$ of about 40 mA through holes. It was found that the deposition of bottom YBCO at a reduced laser repetition rate of 1Hz increased the T$_c$ of top YBCO to 79.9 K. The resistivity of 570 layer was about 10$^6$ ${\Omega}$cm at 60 K, which ensures good electrical isolation between successive YBCO layers.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1992.11a
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• pp.123-127
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• 1992

When MOS devices is exposed to radiation, radiation effects of P-type MOS capacitor can cause modulation and/or degradation in devices characteristics and its operating life. The oxide layer is grown in $O_2$+T.C.E. and its thickness ranges from 40 to 80 nm. Irradiations on MOS capacitor were performed by Cobalt-60 gamma ray source and total dose ranges from $10^4$ to $10^8$ rads. The radiation effect on electrical conduction characteristics(I-V) in MOS capacitor was measured as a function of gate oxide thickness and total dose. From the experimental result, I-V characteristics is found to be influenced strongly by total dose in irradiated p-type MOS capacitors. The ohmic current is dependant on of total dose in irradiated P-type MOS capacitors. This results are explained using surface states at interface radiation-induced traps.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.50-50
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• 2008

ZnO has been extensively studied for optoelectronic applications such as blue and ultraviolet (UV) light emitters and detectors, because it has a wide band gap (3.37 eV) anda large exciton binding energy of ~60 meV over GaN (~26 meV). However, the fabrication of the light emitting devices using ZnO homojunctions is suffered from the lack of reproducibility of the p-type ZnO with high hall concentration and mobility. Thus, the ZnO-based p-n heterojunction light emitting diode (LED) using p-Si and p-GaN would be expected to exhibit stable device performance compared to the homojunction LED. The n-ZnO/p-GaN heterostructure is a good candidate for ZnO-based heterojunction LEDs because of their similar physical properties and the reproducibleavailability of p-type GaN. Especially, the reduced lattice mismatch (~1.8 %) and similar crystal structure result in the advantage of acquiring high performance LED devices with low defect density. However, the electroluminescence (EL) of the device using n-ZnO/p-GaN heterojunctions shows the blue and greenish emissions, which are attributed to the emission from the p-GaN and deep-level defects. In this work, the n-ZnO:Ga/p-GaN:Mg heterojunction light emitting diodes (LEDs) were fabricated at different growth temperatures and carrier concentrations in the n-type region. The effects of the growth temperature and carrier concentration on the electrical and emission properties were investigated. The I-V and the EL results showed that the device performance of the heterostructure LEDs, such as turn-on voltage and true ultraviolet emission, developed through the insertion of a thin intrinsic layer between n-ZnO:Ga and p-GaN:Mg. This observation was attributed to a lowering of the energy barriers for the supply of electrons and holes into intrinsic ZnO, and recombination in the intrinsic ZnO with the absence of deep level emission.

• Journal of the Korean institute of surface engineering
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• v.41 no.1
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• pp.1-5
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• 2008

In this work, improvement of mechanical and electrical properties of gate dielectric layer for flexible organic thin film transistor (OTFT) devices was investigated. In order to increase the mechanical flexibility of PVP (poly(4-vinyl phenol) organic gate dielectric, a very thin inorganic $HfO_2$ layers with the thickness of $5{\sim}20nm$ was inserted in between the spin-coated PVP layers. Insertion of the inorganic $HfO_2$ in the laminated organic/inorganic structure of PVP/$HfO_2$/PVP layer led to a dramatic reduction in the leakage current compared to the pure PVP layer. Under repetitive cyclic bending, the leakage current density of the laminated PVP/$HfO_2$/PVP layer with the thickness of 20-nm $HfO_2$ layer was not changed, while that of the single PVP layer was increased significantly. Mechanical flexibility tests of the OTFT devices by cyclic bending with 5 mm bending radius indicated that the leakage current of the laminated PVP/$HfO_2$(20 nm)/PVP gate dielectric in the device structure was also much smaller than that of the single PVP layer.

• KIISE Transactions on Computing Practices
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• v.22 no.2
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• pp.95-100
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• 2016

In the current era of big data and cloud computing, the amount of data utilized is increasing, and various systems to process this big data rapidly are being developed. A distributed file system is often used to store the data, and glusterFS is one of popular distributed file systems. As computer technology has advanced, NAND flash SSDs (Solid State Drives), which are high performance storage devices, have become cheaper. For this reason, datacenter operators attempt to use SSDs in their systems. They also try to install glusterFS on SSDs. However, since the glusterFS is designed to use HDDs (Hard Disk Drives), when SSDs are used instead of HDDs, the performance is degraded due to structural problems. The problems include the use of I/O-cache, Read-ahead, and Write-behind Translators. By removing these features that do not fit SSDs which are advantageous for random I/O, we have achieved performance improvements, by up to 255% in the case of 4KB random reads, and by up to 50% in the case of 64KB random reads.

• Journal of KIISE
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• v.43 no.4
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• pp.411-418
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• 2016

In recent times, NAND flash memory has become widely used as secondary storage for computing devices. Accordingly, to take advantage of NAND flash memory, new file systems have been actively studied and proposed. The performance of these file systems is generally measured with benchmark tools. However, since benchmark tools are executed by software simulation methods, many researchers get non-uniform benchmark results depending on the system environments. In this paper, we use Filebench, one of the most popular and representative benchmark tools, to analyze benchmark results and study the reasons why the benchmark result variations occur. Our experimental results show the differences in benchmark results depending on the system environments. In addition, this study substantiates the fact that system performance is affected mainly by background I/O requests and fsync operations.

• Journal of KIISE
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• v.42 no.12
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• pp.1480-1485
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• 2015

As SSDs are increasingly being used as high-performance storage or caches, attention is increasingly paid to the provision of SSDs with Quality-of-Service for I/O request streams of various applications in server systems. Since most SSDs are using the AHCI controller interface on a SATA bus, it is not possible to provide a differentiated service by distinguishing each I/O stream from others within the SSD. However, since a new SSD interface, the NVME controller interface on a PCI Express bus, has been proposed, it is now possible to recognize each I/O stream and schedule I/O requests within the SSD for differentiated services. This paper proposes Flash Operation Group Scheduling within NVME-based flash storage devices, and demonstrates through QEMU-based simulation that we can achieve a proportional bandwidth share for each I/O stream.

• The KIPS Transactions:PartA
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• v.8A no.4
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• pp.311-318
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• 2001

In recent years, users\` demands for multimedia service are increasing because of a diffusion of internet. Server systems, however, offer inefficient multimedia data service to users. Multimedia applications often transfer the same data between shared devices at very high rates, and therefore require an efficient I/O subsystem. Data copying and context switching have long been identified as sources of I/O inefficiency. Therefore we propose the new Multimedia Stream System Call (MSSC) mechanism, which is inserted into a Linux kernel: The MSSC mechanism operates in kernel domain with RTP (Real-time Transport Protocol). We present measurements indicating that use of our techniques resulted in a 12.5%∼14% gain in throughput as compared with a conventional Linux system.