• Title/Summary/Keyword: Hydrogen deposition

Search Result 566, Processing Time 0.027 seconds

Fundamentals of Underpotential Deposition : Importance of Underpotential Deposition in Interfacial Electrochemistry

  • Lee Jong-Won;Pyun Su-Il
    • Journal of the Korean Electrochemical Society
    • /
    • v.4 no.4
    • /
    • pp.176-181
    • /
    • 2001
  • This article covers the fundamentals of underpotential deposition (UPD), focussing on the importance of UPD in interfacial electrochemistry. Firstly, this article described the basic concepts of UPD, including underpotential shift and electrosorption valency. Secondly, the present article explained UPD of hydrogen, followed by hydrogen evolution or hydrogen absorption, giving special attention to the adsorption sites of hydrogen on metal surface and the absorption mechanism into Pd. Finally, this article briefly presented the important factors associated with UPD in various fields of interfacial electrochemistry from practical viewpoints.

Measurement of hydrogen content in a-C:H films prepared by ECR-PECVD (ECR-PECVD 방법으로 증착된 a-C:H 박막의 수소함량 측정)

  • 손영호;정우철;정재인;김인수;배인호
    • Journal of the Korean Vacuum Society
    • /
    • v.10 no.1
    • /
    • pp.119-126
    • /
    • 2001
  • Hydrogenated amorphous carbon (a-C:H) films were deposited by ECR-PECVD (electron cyclotron resonance-plasma enhanced chemical vapor deposition) method with deposition conditions such as ECR plasma source power, gas composition of methane and hydrogen, deposition time and substrate bias voltage. The hydrogen content in the films has been measured by ERDA (elastic recoil detection analysis) using 2.5 MeV $He^{++}$ ion beam. From the results of AES (Auger electron spectroscopy), RBS (Rutherford backscattering spectrometry) and ERDA, the composition elements of deposited film were confirmed the carbon atom and the hydrogen atom. It was observed by FTIR (Fourier transform infrared) that the hydrogen contents in the film varied according to the deposition conditions. In deposition condition of substrate bias voltage, the hydrogen contents were decreased remarkably because the amount of dehydrogenation in films was increased as the substrate bias voltage increased. In the rest deposition conditions, the hydrogen contents in the film were measured in the range 45~55%.

  • PDF

Hydrogen sensor of SWNT-PdOx system using the vacuum filtering deposition method (진공여과증착법을 이용한 SWNT-PdOx계 수소센서)

  • Kim, Il-Jin;Park, Kee-Bae
    • Journal of Sensor Science and Technology
    • /
    • v.19 no.2
    • /
    • pp.87-91
    • /
    • 2010
  • Hydrogen gas sensors were fabricated using $PdO_x$ loaded with SWNTs. The nanoparticle powders of $SWNT_s-PdO_x$ composite were deposited on Si wafer substrates by a vacuum filtering deposition method. The fabricated sensors were tested against hydrogen gas. The composition ratio that exhibited the highest response to hydrogen gases was SWNTs : $PdO_x$ = 98 : 2 in wt% ratio at operating temperature of about $150^{\circ}C$. The response and recovery times were shorter than 1.0 min. in presence of 1000 ppm hydrogen.

Modeling on Hydrogen Effects for Surface Segregation of Ge Atoms during Chemical Vapor Deposition of Si on Si/Ge Substrates

  • Yoo, Kee-Youn;Yoon, Hyunsik
    • Korean Chemical Engineering Research
    • /
    • v.55 no.2
    • /
    • pp.275-278
    • /
    • 2017
  • Heterogeneous semiconductor composites have been widely used to establish high-performance microelectronic or optoelectronic devices. During a deposition of silicon atoms on silicon/germanium compound surfaces, germanium (Ge) atoms are segregated from the substrate to the surface and are mixed in incoming a silicon layer. To suppress Ge segregation to obtain the interface sharpness between silicon layers and silicon/germanium composite layers, approaches have used silicon hydride gas species. The hydrogen atoms can play a role of inhibitors of silicon/germanium exchange. However, there are few kinetic models to explain the hydrogen effects. We propose using segregation probability which is affected by hydrogen atoms covering substrate surfaces. We derived the model to predict the segregation probability as well as the profile of Ge fraction through layers by using chemical reactions during silicon deposition.

A Study on the Pd-Ni Alloy Hydrogen Membrane Using the Sputter Deposition (스퍼터 증착 방식으로 제조된 Pd-Ni 합금 수소 분리막 연구)

  • Kim Dong-Won;Park Jeong-Won;Kim Sang-Ho;Park Jong-Su
    • Journal of the Korean institute of surface engineering
    • /
    • v.37 no.5
    • /
    • pp.243-248
    • /
    • 2004
  • A palladium-nikel(Pd-Ni) alloy composite membrane has been fabricated on microporous nickel support formed with nickel powder. Plasma surface treatment process is introduced as pre-treatment process instead of HCI activation. Pd coating layer was prepared by dc magnetron sputtering deposition after $H_2$ plasma surface treatment. Palladium-nickel alloy composite layer had a fairly uniform and dense surface morphology. The membrane was characterized by permeation experiments with hydrogen and nitrogen gases at temperature of 773 K and pressure of 2.2psi. The hydrogen permeance was 6 ml/minㆍ$\textrm{cm}^2$ㆍatm and the selectivity was 120 for hydrogen/nitrogen($H_2$/$N_2$) mixing gases at 773 K.

Cycling Characteristics of MgH2 madeby Hydriding Chemical Vapor Deposition Method (HCVD 방법으로 제조된 MgH2의 Cycling 특성)

  • Park, Kyung-Duck;Han, Jeong-Seb
    • Korean Journal of Metals and Materials
    • /
    • v.49 no.12
    • /
    • pp.945-949
    • /
    • 2011
  • The cycling characteristics of $MgH_2$ made by hydriding chemical vapor deposition method have been investigated. The particle size of $MgH_2$ made by HCVD was about $1{\mu}m$. The cycling experiment was performed by measuring hydrogen quantity absorbed at 673 K and under 35 atm of hydrogen pressure for 30 min. Up to 3 cycles the hydrogen storage capacity increased, but from 4 to 6 cycles the hydrogen storage capacity decreased rapidly. During this cycling test the particle size increased gradually from $1{\mu}m$ to $6{\mu}m$. This increase was due to sintering by the high reaction temperature and the heat of reaction during hydrogen absorption. From 7 to 30 cycles, the hydrogen storage capacity was maintained at 5.8 wt%. Even after 30 cycles, the plateau pressure was constant.

Effect of Dissolved Hydrogen on Fuel Crud Deposition (핵연료 피복관 부식생성물 부착에 대한 용존수소의 영향)

  • Baek, S.H.;Kim, U.C.;Shim, H.S.;Lim, K.S.;Won, C.H.;Hur, D.H.
    • Corrosion Science and Technology
    • /
    • v.13 no.2
    • /
    • pp.56-61
    • /
    • 2014
  • The purpose of this work is to investigate the effect of dissolved hydrogen concentration on crud deposition onto the fuel cladding surface in the simulated primary environments of a pressurized water reactor. Crud deposition tests were conducted in the dissolved hydrogen concentration range of 5~70 cc/kg at $325^{\circ}C$ for 14 days. Needle-shaped NiO deposits were formed in the hydrogen range of 5~25 cc/kg, while polygonal nickel ferrite deposits were observed at a hydrogen concentration above 35 cc/kg. However, the dissolved hydrogen content seems to have little effect on the amount of crud deposits.

Understanding the Effect on Hydrogen Evolution Reaction in Alkaline Medium of Thickness of Physical Vapor Deposited Al-Ni Electrodes (Physical Vapor Deposition 방법으로 제조된 Al-Ni 전극의 두께가 알칼라인 수전해 수소발생반응에 미치는 영향 연구)

  • HAN, WON-BI;CHO, HYUN-SEOK;CHO, WON-CHUL;KIM, CHANG-HEE
    • Transactions of the Korean hydrogen and new energy society
    • /
    • v.28 no.6
    • /
    • pp.610-617
    • /
    • 2017
  • This paper presents a study of the effect of thickness of porous Al-Ni electrodes, on the Hydrogen Evolution Reaction (HER) in alkaline media. As varying deposition time at 300 W DC sputtering power, the thickness of the Al-Ni electrodes was controlled from 1 to $20{\mu}m$. The heat treatment was carried out in $610^{\circ}C$, followed by selective leaching of the Al-rich phase. XRD studies confirmed the presence of $Al_3Ni_2$ intermetallic compounds after the heat treatment, indicating the diffusion of Ni from the Ni-rich phase to Al-rich phase. The porous structure of the Al-Ni electrodes after the selective leaching of Al was also confirmed in SEM-EDS analysis. The double layer capacitance ($C_{dl}$) and roughness factor ($R_f$) of the electrodes were increased for the thicker Al-Ni electrodes. As opposed to the general results in above, there were no further improvements of the HER activity in the case of the electrode thickness above $10{\mu}m$. This result may indicate that the $R_f$ is not the primary factor for the HER activity in alkaline media.

Fabrication of Metal-Semiconductor Interface in Porous Silicon and Its Photoelectrochemical Hydrogen Production

  • Oh, Il-Whan;Kye, Joo-Hong;Hwang, Seong-Pil
    • Bulletin of the Korean Chemical Society
    • /
    • v.32 no.12
    • /
    • pp.4392-4396
    • /
    • 2011
  • Porous silicon with a complex network of nanopores is utilized for photoelectrochemical energy conversion. A novel electroless Pt deposition onto porous silicon is investigated in the context of photoelectrochemical hydrogen generation. The electroless Pt deposition is shown to improve the characteristics of the PS photoelectrode toward photoelectrochemical $H^+$ reduction, though excessive Pt deposition leads to decrease of photocurrent. Furthermore, it is found that a thin layer (< 10 ${\mu}m$) of porous silicon can serve as anti-reflection layer for the underlying Si substrate, improving photocurrent by reducing photon reflection at the Si/liquid interface. However, as the thickness of the porous silicon increases, the surface recombination on the dramatically increased interface area of the porous silicon begins to dominate, diminishing the photocurrent.

Recent Developments in H2 Production Photoelectrochemical Electrode Materials by Atomic Layer Deposition (원자층증착법을 이용한 수소 생성용 광전기화학 전극 소재 개발 동향)

  • Han, Jeong Hwan
    • Journal of Powder Materials
    • /
    • v.25 no.1
    • /
    • pp.60-68
    • /
    • 2018
  • The design and fabrication of photoelectrochemical (PEC) electrodes for efficient water splitting is important for developing a sustainable hydrogen evolution system. Among various development approaches for PEC electrodes, the chemical vapor deposition method of atomic layer deposition (ALD), based on self-limiting surface reactions, has attracted attention because it allows precise thickness and composition control as well as conformal coating on various substrates. In this study, recent research progress in improving PEC performance using ALD coating methods is discussed, including 3D and heterojunction-structured PEC electrodes, ALD coatings of noble metals, and the use of sulfide materials as co-catalysts. The enhanced long-term stability of PEC cells by ALD-deposited protecting layers is also reviewed. ALD provides multiple routes to develop improved hydrogen evolution PEC cells.