Journal of the Korean Electrochemical Society (전기화학회지)

The Korean Electrochemical Society (한국전기화학회)
권호 표지
DOI QR코드

DOI QR Code

Fundamentals of Underpotential Deposition : Importance of Underpotential Deposition in Interfacial Electrochemistry

  • Lee Jong-Won (Corrosion and Interfacial Electrochemistry Research Laboratory at Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology) ;
  • Pyun Su-Il (Corrosion and Interfacial Electrochemistry Research Laboratory at Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology)
  • Published : 2001.11.01
Download PDF
⟨ Previous Next ⟩

Abstract

This article covers the fundamentals of underpotential deposition (UPD), focussing on the importance of UPD in interfacial electrochemistry. Firstly, this article described the basic concepts of UPD, including underpotential shift and electrosorption valency. Secondly, the present article explained UPD of hydrogen, followed by hydrogen evolution or hydrogen absorption, giving special attention to the adsorption sites of hydrogen on metal surface and the absorption mechanism into Pd. Finally, this article briefly presented the important factors associated with UPD in various fields of interfacial electrochemistry from practical viewpoints.

본 논문은 계면 전기화학에서의 underpotential deposition (UPD)의 중요성에 초점을 맞추어 UPD의 기본원리에 대하여 다루었다. 우선 underpotential shift와 electrosorption valency에 대한 설명과 함께 UPD의 기본개념을 기술하였다. 다음으로 금속표면에서의 수소발생 또는 금속내부로의 수소흡수 반응 이전에 관찰되는 수소의 UPD를 설명하였고, 특히 금속 표면에서의 흡착위치와 Pd으로의 흡수기구에 대하여 중점적으로 기술하였다. 마지막으로, 계면 전기화학의 여러 분야에서 UPD와 관련된 중요한 인자들을 응용적인 측면에서 간략히 설명하였다.

Keywords