• 제목/요약/키워드: Hydrogen chloride (HCl)

검색결과 43건 처리시간 0.022초

$H_2/HCl/Air$ 예혼합 화염의 질소산화물 생성에서 염화수소의 영향 (The Effect of Hydrogen Chloride on the $NO_x$ Production in $H_2/HCl/Air$ Premixed Flame)

  • 권영석;이기용
    • 한국연소학회지
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    • 제9권4호
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    • pp.28-34
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    • 2004
  • Numerical simulations of freely propagating flames burning $H_2/HCl/Air$ Air mixtures were performed at atmospheric pressure in order to understand the effect of hydrogen chloride on flame structures. The chemical and physical effects of hydrogen chloride on flame structures were observed. A chemical kinetic mechanism was developed, which involved 26 gas-phase species and 198 forward elementary reactions. Under several equivalence ratios the flame speeds were calculated and compared with those obtained from the experiments, the results of which were in good agreement. As hydrogen chloride as additive was added into $H_2/Air$ flame, the flame speed, radical concentration and NO production rate were decreased. The chemical effect of hydrogen chloride caused the reduction of radical concentration, and then the decrease of the net rate of NO production. It was found that the influence in the reduction of $EI_{NO}$ with the addition of hydrogen chloride was attributed more due to the chemical effect than the physical effect.

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Influence of Plasma Treatment on Hydrogen Chloride Removal of Activated Carbon Fibers

  • Park, Soo-Jin;Kim, Byung-Joo;Ryu, Seung-Kon
    • Carbon letters
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    • 제5권3호
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    • pp.103-107
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    • 2004
  • The atmospheric pressure plasma treatments ($Ar/O_2$ and $Ar/N_2$) of activated carbon fibers (ACFs) were carried out to introduce hydrophilic functional groups on carbon surfaces in order to enhance the hydrogen chloride gas (HCl) adsorption. Surface properties of the ACFs were determined by XPS and SEM. $N_2$/77 K adsorption isotherms were investigated by BET and D-R (Dubinin-Radushkevich) plot methods. The HCl removal efficiency was confirmed by HCl detecting tubes (range:1~40 or 40~1000 ppm). As experimental results, it was found that all plasma-treated ACFs showed the decrease in the pore volume, but the HCl removal efficiency showed higher level than that of the untreated ACFs. This result indicated that the plasma treatments led to the conformation of hydrophilic functional groups on the carbon surfaces, resulting in the increase of the interaction between the ACFs and HCl gas.

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Influence of Nickel Electroplating on Hydrogen Chloride Removal of Activated Carbon Fibers

  • Park, Soo-Jin;Jin, Sung-Yeol;Ryu, Seung-Kon
    • Carbon letters
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    • 제5권4호
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    • pp.186-190
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    • 2004
  • In this work, a nickel metal (Ni) electroplating on the activated carbon fiber (Ni/ACFs) surfaces was carried out to remove the toxic hydrogen chloride (HCl) gas. The surface properties of the treated ACFs were determined by using nitrogen adsorption isotherms at 77 K, SEM, and X-ray diffraction (XRD) measurements. HCl removal efficiency was confirmed by a gas-detecting tube technique. As a result, the nickel metal contents on the ACF surfaces were increased with increasing the plating time. And, it was found that the specific surface area or the micropore volume of the ACFs studied was slightly decreased as increasing the plating time. Whereas, it was revealed that the HCl removal efficiency containing nickel metal showed higher efficiency values than that of untreated ACFs. These results indicated that the presence of nickel metal on the ACF surfaces played an important role in improving the HCl removal over the Ni/ACFs, due to the catalytic reactions between nickel and chlorine.

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메탄-공기 예혼합 화염에서 염화수소의 역할 (The Function of Hydrogen Chloride on Methane-Air Premixed Flame)

  • 신성수;이기용
    • 대한기계학회논문집B
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    • 제29권9호
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    • pp.979-987
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    • 2005
  • Numerical simulations were performed at atmospheric pressure in order to understand the effect of additives on flame speed, flame temperature, radical concentrations, $NO_x$ formation, and heat flux in freely propagating $CH_4-Air$ flames. The additives were both carbon dioxide and hydrogen chloride which had a combination of physical and chemical behavior on hydrocarbon flame. In the flame established with the same mole of methane and additive, hydrogen chloride significantly contributed toward the reduction of flame speed, flame temperature, $NO_x$ formation and heat flux by the chemical effect, whereas carbon dioxide mainly did so by the physical effect. The impact of hydrogen chloride on the decrease of the radical concentration was about $1.4\~3.0$ times as large as that of carbon dioxide. Hydrogen chloride had higher effect on the reduction of $EI_{NO}$ than carbon dioxide because of the chemical effect of hydrogen chloride. The reaction, $OH+HCl{\rightarrow}Cl+H_2O$, played an important role in the heat flux from flames added by hydrogen chloride instead of the reaction, $OH+H_2{\rightarrow}H+H_2O$ which was an important reaction in hydrocarbon flames.

$CH_4/O_2/N_2$ 화염에서 할로겐 첨가제의 역할 (The Function of Halogen Additive in $CH_4/O_2/N_2$ Flames)

  • 이기용;신성수
    • 한국연소학회:학술대회논문집
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    • 대한연소학회 2003년도 제27회 KOSCO SYMPOSIUM 논문집
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    • pp.209-214
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    • 2003
  • Numerical simulations are performed at atmospheric pressure in order to understand the effect of additives on flame speed, flame temperature, the radical concentration, the NOx formation in freely propagating $CH_4/O_2/N_2$ flames. The additives used are carbon dioxide and hydrogen chloride which have a combination of physical and chemical behavior on hydrocarbon flame. In the flame established with the same mole of methane and additive, $CO_2$ addition significantly contributes toward the reduction of flame speed and flame temperature by the physical effect, whereas addition of HCl mainly does by the chemical effect. The impact of HCl addition on the decrease of the radical concentration is about 1.6-1.8 times as large as $CO_2$ addition. Hydrogen chloride addition is higher on the reduction of EINO than $CO_2$ addition because of the chemical effect of HCl.

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제올라이트 수지 및 ZnO, AgMnO3 등의 무기흡착제를 이용한 반도체 공정에서 사용되는 염산가스의 처리 및 측정에 관한 연구 (Study on the Treatment of Hydrogen Chloride Gas used in Semiconductor Process by using Gas Adsorption Agents such as Zeolite Resins, ZnO, and AgMnO3)

  • 박정준;임흥빈;황청수
    • 분석과학
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    • 제16권3호
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    • pp.218-225
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    • 2003
  • 반도체 공정에서는 많은 종류의 가스를 사용하는데 그들 중 염산 가스는 독성으로 인해 많은 환경오염 문제들을 야기 시키고 있다. 본 논문에서는 염산 가스를 기존의 제거 방식이 아닌 제올라이트수지 등의 흡착제들을 이용한 제거 방법 및 측정을 하는 연구를 수행하였다. 실험 장치는 실험조건을 고려하여 직접 설계 및 제작을 하였다. 그리고 각종 수지를 이용한 흡착제거정도를 비교하기 위하여 제올라이트 A, $Ag^+$ 이온으로 치환된 AgA 제올라이트, ZnO, $AgMnO_3$ 등의 수지를 이용하여 실험하였다. 가스의 분석은 적외선 분광기 (FT-IR)를 이용하여 정성 및 정량분석을 하여 각 각의 수지에 의한 염산 가스의 제거량을 계산함으로써 각 수지의 제거 효율을 확인, 비교하였다. 본 실험에서 사용된 수지들 중에서 ZnO 가 수지 1 g에 대해 0.067 g 의 HCl 가스를 제거하는 가장 좋은 결과를 나타내었다.

Synthesis of Tris(silyl)methanes by Modified Direct Process

  • 이창엽;한준수;유복렬;정일남
    • Bulletin of the Korean Chemical Society
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    • 제21권10호
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    • pp.959-968
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    • 2000
  • Direct reaction of elemental silicon with a mixture of (dichloromethyl)silanes 1 $[Cl_3-nMenSiCHCl_2:$ n = 0 (a), n = 1(b), n = 2(c), n = 3(d)] and hydrogen chloride has been studied in the presence of copper catalyst using a stirred bed reactor equ ipped with a spiral band agitator at various temperatures from $240^{\circ}C$ to $340^{\circ}C.$ Tris(si-lyl) methanes with Si-H bonds, 3a-d $[Cl_3-nMenSiCH(SiHCl_2)_2]$, and 4a-d $[Cl_3-nMenSiCH(SiHCl_2)(SiCl_3)]$, were obtained as the major products and tris(silyl)methanes having no Si-H bond, 5a-d $[Cl_3-nMenSiCH(SiCl_3)_2]$, as the minor product along with byproducts of bis(chlorosilyl)methanes, derived from the reaction of silicon with chloromethylsilane formed by the decomposition of 1. In addition to those products, trichlorosilane and tetra-chlorosilane were produced by the reaction of elemental silicon with hydrogen chloride. The decomposition of 1 was suppressed and the production of polymeric carbosilanes reduced by adding hydrogen chloride to 1. Cad-mium was a good promoter for and the optimum temperature for this direct synthesis was $280^{\circ}C$.

금속염화물이 담지된 V2O5-WO3/TiO2 계 SCR 촉매에 의한 수은 및 NO 동시 제거 (Simultaneous Removal of Mercury and NO by Metal Chloride-loaded V2O5-WO3/TiO2-based SCR catalysts)

  • 함성원
    • 청정기술
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    • 제23권2호
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    • pp.172-180
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    • 2017
  • HCl에 의한 원소수은의 염화수은으로의 산화반응에 대한 열역학적 검토 결과 수십 ppm 수준의 HCl이 존재하는 경우에 SCR 반응 온도범위에서 원소수은의 염화수은으로의 전환은 100% 가능한 것으로 확인하였다. SCR공정 운전 온도범위에서 Cu, Fe, Mn의 염화물이 담지된 $V_2O_5-WO_3/TiO_2$ 촉매가 우수한 NO 제거 활성을 보였다. $NH_3-TPD$ 측정결과 $NH_3$의 흡착강도를 나타내는 탈착온도가 높은 촉매가 우수한 NO 제거활성을 나타내었다. 반응가스에 HCl을 공급할 경우 원소수은의 산화반응이 촉진되는 결과를 얻을 수 있었다. 그러나, NO와 함께 $NH_3$가 존재하는 SCR반응 조건에서는 촉매표면에 강하게 흡착되는 $NH_3$에 의해 촉매표면에 HCl의 흡착이 방해를 받기 때문에 HCl에 의한 원소수은의 염화수은으로의 산화반응 활성이 억제되는 것으로 나타났다. SCR반응 조건에서 금속염화물이 담지된 $V_2O_5-WO_3/TiO_2$ 촉매가 금속염화물이 담지되지 않은 $V_2O_5-WO_3/TiO_2$ 촉매에 비해 우수한 수은 산화활성을 보이는데 이는 촉매 표면에 존재하는 금속염화물의 염소기가 수은 산화반응에 참여하여 활성을 증가시키기 때문으로 판단된다.

폴리염화비닐(PVC)의 열안정성에 제올라이트가 미치는 영향 (Effects of Zeolites on Thermal Stability of Poly(vinyl chloride))

  • Xu, Jiayou;Liang, Qinghua;Xian, Xiumei;Li, Kaidan;Liu, Jie
    • 폴리머
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    • 제39권1호
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    • pp.1-5
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    • 2015
  • The effects of zeolite on the thermal stability of poly(vinyl chloride) (PVC) were investigated by the static thermal stability test, pyrolysis experiment and ultraviolet spectrum. The results showed that the porous zeolite could absorb hydrogen chloride (HCl), which suppressed the catalysis of HCl on thermal degradation of PVC, thus improved the thermal stability of PVC. The oxidizing acid which was loaded on zeolite had oxidated on the double bond that formed during the dehydrochlorination of PVC. This process could prohibit the growth of the conjugated polyene and improved the color of PVC. Hence, zeolite might be possible to come up with a high performance thermal stabilizer.

고정층 반응기에서 K-계열 흡수제의 압력에 따른 HCl 흡수 거동 연구 (Effect of Pressure on HCl Absorption Behaviors of a K-based Absorbent in the Fixed Bed Reactor)

  • 김재영;박영철;조성호;류호정;백점인;박영성;문종호
    • 청정기술
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    • 제19권2호
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    • pp.165-172
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    • 2013
  • 본 연구에서는 고정층 반응기(높이 15 cm, 내경 0.5 cm)에서 K-계열 건식 흡수제($K_2CO_3/Al_2O_3$, 한국전력공사 전력연구원)를 이용하여 반응압력 변화에 따른 염화수소 흡수 실험을 수행하였다. 반응온도는 가스화 직후, 필터를 거쳐서 주입되는 것을 가정하여 $400^{\circ}C$로 설정하였으며, 반응기체 농도는 750 ppm HCl ($N_2$ balance)으로 설정하였다. 반응압력은 1, 5, 10, 15, 20 bar로 증가시켰다. 압력이 증가할수록 K-계열 흡수제의 흡수 성능이 증가하였다. 흡수제를 구성하고 있는 주요 물질인 $K_2CO_3$가 HCl 가스와 반응하여 KCl 결정을 형성하였으며, 강한 결합에너지로 인하여 흡수제의 재생이 실질적으로 불가능하였다. 이에 대한 광학적, 물리적, 화학적 특성을 SEM, EDX, BET, TGA, XRD를 이용하여 분석하였다. $400^{\circ}C$, 20 bar 조건(가스화 이후 탈할로겐 공정의 온도 및 압력조건)에서 $K_2CO_3$ 흡수제는 Ca 계열 및 Mg 계열의 흡수제에 비해 높은 HCl 흡수능 및 HCl/$N_2$ 분리 거동을 보였다.