[KSCI] Korea Science Citation Index Service

Study on the Treatment of Hydrogen Chloride Gas used in Semiconductor Process by using Gas Adsorption Agents such as Zeolite Resins, ZnO, and AgMnO₃

Park, Jeong-Jun (Department of Chemistry, College of Natural Sciences)
Lim, H.B. (Department of Chemistry, College of Natural Sciences)
Hwang, Cheong-Soo (Department of Chemistry, College of Natural Sciences)

Publication Information

Analytical Science and Technology / v.16, no.3, 2003 , pp. 218-225 More about this Journal

Abstract

Hydrogen Chloride is among the most problematic gases used in semiconductor process. It raises serious environmental and health problems due to its extreme toxicity. This study is to develop a method to effectively remove hydrogen chloride gas during the process by using various types of inorganic gas adsorption agents, which have not been attempted in the conventional methods. The removal efficiency of the gas was both qualitatively and quantitatively measured by a FT-IR spectrophotometer. The whole device for the measurement has been designed and built in our lab. The removal efficiencies of hydrogen chloride gas were compared between those tested resins; zeolite A, modified AgA zeolite, ZnO, and $AgMnO_3$ . The experimental result revealed that ZnO showed the best efficiency that had removed 0.067 g of HCl per 1 g of the resin used.

Keywords

HCl gas treatment; Zeolite; $AgMnO_3$ ; ZnO; Semiconductor process;

Citations & Related Records

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