Analytical Science and Technology (분석과학)

The Korean Society of Analytical Sciences (한국분석과학회)
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Study on the Treatment of Hydrogen Chloride Gas used in Semiconductor Process by using Gas Adsorption Agents such as Zeolite Resins, ZnO, and AgMnO3

제올라이트 수지 및 ZnO, AgMnO3 등의 무기흡착제를 이용한 반도체 공정에서 사용되는 염산가스의 처리 및 측정에 관한 연구

  • Park, Jeong-Jun (Department of Chemistry, College of Natural Sciences) ;
  • Lim, H.B. (Department of Chemistry, College of Natural Sciences) ;
  • Hwang, Cheong-Soo (Department of Chemistry, College of Natural Sciences)
  • 박정준 (단국대학교 자연과학대학 화학과) ;
  • 임흥빈 (단국대학교 자연과학대학 화학과) ;
  • 황청수 (단국대학교 자연과학대학 화학과)
  • Received : 2003.03.20
  • Accepted : 2003.05.02
  • Published : 2003.06.25
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Abstract

Hydrogen Chloride is among the most problematic gases used in semiconductor process. It raises serious environmental and health problems due to its extreme toxicity. This study is to develop a method to effectively remove hydrogen chloride gas during the process by using various types of inorganic gas adsorption agents, which have not been attempted in the conventional methods. The removal efficiency of the gas was both qualitatively and quantitatively measured by a FT-IR spectrophotometer. The whole device for the measurement has been designed and built in our lab. The removal efficiencies of hydrogen chloride gas were compared between those tested resins; zeolite A, modified AgA zeolite, ZnO, and $AgMnO_3$. The experimental result revealed that ZnO showed the best efficiency that had removed 0.067 g of HCl per 1 g of the resin used.

반도체 공정에서는 많은 종류의 가스를 사용하는데 그들 중 염산 가스는 독성으로 인해 많은 환경오염 문제들을 야기 시키고 있다. 본 논문에서는 염산 가스를 기존의 제거 방식이 아닌 제올라이트수지 등의 흡착제들을 이용한 제거 방법 및 측정을 하는 연구를 수행하였다. 실험 장치는 실험조건을 고려하여 직접 설계 및 제작을 하였다. 그리고 각종 수지를 이용한 흡착제거정도를 비교하기 위하여 제올라이트 A, $Ag^+$ 이온으로 치환된 AgA 제올라이트, ZnO, $AgMnO_3$ 등의 수지를 이용하여 실험하였다. 가스의 분석은 적외선 분광기 (FT-IR)를 이용하여 정성 및 정량분석을 하여 각 각의 수지에 의한 염산 가스의 제거량을 계산함으로써 각 수지의 제거 효율을 확인, 비교하였다. 본 실험에서 사용된 수지들 중에서 ZnO 가 수지 1 g에 대해 0.067 g 의 HCl 가스를 제거하는 가장 좋은 결과를 나타내었다.

Keywords

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