• Journal of the Korean Society for Precision Engineering
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• v.23 no.3 s.180
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• pp.56-60
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• 2006

A high-resolution shadow mask, or called a nanostencil was fabricated for high resolution lithography. This high-resolution shadowmask was fabricated by a combination or MEMS processes and focused ion beam (FIB) milling. 500 nm thick and $2{\times}2mm$ large membranes wore made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. A subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to the high resolution of the FIB milling process, nanoscale apertures down to 70 nm could be made into the membrane. By local deposition through the apertures of nanostencil, nanoscale patterns down to 70 nm could be achieved.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.2
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• pp.245-250
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• 2011

A high-resolution shadow mask, a nanostencil, is widely used for high resolution lithography. This high-resolution shadowmask is often fabricated by a combination of MEMS processes and focused ion beam (FIB) milling. In this study, FIB milling on 500-nm-thin SiN membrane was tested and characterized. 500 nm thick and $2{\times}2$ mm large membranes were made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. A subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to the high resolution of the FIB milling process, nanoscale apertures down to 60 nm could be made into the membrane. The nanostencil could be used for nanoscale patterning by local deposition through the apertures.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2000.11a
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• pp.118-122
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• 2000

Recently, High accuracy and precision are required in various industrial field especially, semiconductor manufacturing apparatus, Ultra precision positioning apparatus, Information field and so on. Positioning technology is a very important one among them. For composition of this technology, the development of system with high speed and high resolution is needed. At start point and end position vibration must be repressed on this system for composition of position control. This vibration is arisen nose, is increased setting time, is reduced accuracy. Especially, repressed for the lead with high speed. The small actuator with high speed and high resolution is need to repression against this residual vibration. This actuator is, for example, piezo actuator, piezoelectric material that converting from electronic signal to mechanical force is adequate material, beacause of control of control to position and force. In this study, piezo electric material is used to actuator, ultra precision positioning apparatus with stage of hinge structure is designed, simulation is performed, control performance is tested by producing apparatus. For easy usage and stability in industrial field, we perform to simulation and to position control test by digital PID controller.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.5 s.170
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• pp.103-112
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• 2005

This paper presents one-axis high precision scanning system and illustrates the design of modified $X-Y-{\theta}$ stage as a tracker using VCM and commercialized air bearings for it. The scanning system for 100nm resolution is composed of the 3-axis stage and one axis long stroke linear motor stage as a follower. In this study a previous proposed and presented structure of VCM for the fine stage is modified. The tracker has 3 DOF($X-Y-{\theta}$ motions by four VCM actuators which are located on the same plane. So 4 actuating forces are suggested and designed to create least pitch and roll motions. This article will show about the design especially about optimal design. The design focus of this fine stage is to have high acceleration to accomplish high throughput. The optimal design of maximizing acceleration is performed in restrained size. The most sensitive constraint of this optimal design is heat dissipation of coil. There are 5 design variables. Because the relationship between design variables and system parameters are quite complicated, it is very difficult to set design variables manually. Due to it, computer based optimal design procedure using MATLAB is used. Then, this paper also describes the procedures of selecting design variables for the optimal design and a mathematical formulation of the optimization problem. Based on the solution of the optimization problem, the final design of the stage is also presented. The results can be verified by MAXWELL. The designed stage has the acceleration of about 5 $m/s^{2}$ with 40kg total mass including wafer chuck and interferometer mirror. And the temperature of coil is increased $50^{\circ}C$. In addition, the tracker is controlled by high precision controller system with HP interferometer for it and linear scaler for the follower. At that time, the scanning system has high precision resolution about 5nm and scanning resolution about 40nm in 25mm/s constant speed

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.511-512
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• 2009

• Journal of the Korean Society for Precision Engineering
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• v.27 no.8
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• pp.84-90
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• 2010

In focused ion beam (FIB) fabrication processes the ion beam intensity with Gaussian profile has a drawback for high resolution machining. In this paper, the fabrication method to modify the beam profile at substrate using silt mask is proposed to increase the machining resolution at high current. Slit mask is utilized to block the part of beam and transmit only high intensity portion. A nano manipulator is utilized to handle the silt mask. Geometrical analysis on fabricated profile through silt mask was conducted. By utilizing proposed method, improvement of machining resolution was achieved.

• The Bulletin of The Korean Astronomical Society
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• v.35 no.1
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• pp.36.1-36.1
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• 2010

OFC (Optical Frequency Comb) is an optical spectrum which consists of equidistant lines in frequency space. OFC can thus be used as an optical ruler. Since it was demonstrated in late 1990s, it is revolutionizing many fields in frequency metrology such as the measurement of absolute optical frequencies, the measure ratios of optical frequencies with extremely high precision. It is also used in high-precision spectroscopy. In astronomy, OFC can be used as a very accurate and stable wavelength standard for a high resolution spectrograph to measure the radial velocity of celestial bodies with extremely high accuracy of about several tens cm/s. In our presentation, we will introduce some basic concepts of OFC and some issues to use it in astronomical spectrograph. We will also present our plan to develop a high resolution spectrograph with OFC.

• Journal of the Korean Society for Precision Engineering
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• v.21 no.11
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• pp.117-124
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• 2004

Recently, nano-methodology is increasingly important as the ruler for measuring nano-technology, and we applied the linear encoder to nano-methodology. The quadrature output in the linear encoder has an effect on increasing the resolution in some techniques. Already, various interpolation techniques based on the quadrature signal have applied to the precision servo system. In this paper, we propose a new interpolation algorithm for ultra-precision positioning in the low speed with simulation by MATLAB SIMULINK. This method modified previous methods and was properly designed for some given control system. To verify, we first fulfilled the encoder signal test to find main parameters fer the signal transformation, then we proved the proposed interpolation algorithm by experiments, which show that the result of the interpolation algorithm corresponds with the measurement of the laser interferometer in 100 nm unit approximately. In addition, we can get more precise measurement by more accurate and noise-free signal. So we need to compensate imperfections in the encoder signal. After that, we will apply this algorithm to nano positioning system.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2013.05a
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• pp.1075-1076
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• 2013

• International Journal of Precision Engineering and Manufacturing
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• v.7 no.4
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• pp.3-7
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• 2006

Confocal scanning microscopy is a measurement technique used to observe micrometer and sub-micrometer features due to its high resolution, nondestructive properties, and 3D surface profiling capabilities. The design, implementation, and performance test of a confocal scanning microscopy system are presented in this paper. A short-wavelength laser (405 nm) and an objective lens with a high numerical aperture (0.95) were used to achieve the desired high resolution, while the x- and y-axis scans were implemented using an acousto-optic deflector and galvanomirror, respectively. An objective lens with a piezo-actuator was used to scan the z-axis. A spatial resolution of less than 138 nm was achieved, along with successful 3D surface reconstructions.