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Fabrication of nanostencil using FIB milling for nanopatterning  

Chung Sung-Ill (LG 생산기술원)
Oh Hyeon-Seok (LG 생산기술원)
Kim Gyu-Man (경북대학교 기계공학부)
Publication Information
Journal of the Korean Society for Precision Engineering / v.23, no.3, 2006 , pp. 56-60 More about this Journal
Abstract
A high-resolution shadow mask, or called a nanostencil was fabricated for high resolution lithography. This high-resolution shadowmask was fabricated by a combination or MEMS processes and focused ion beam (FIB) milling. 500 nm thick and $2{\times}2mm$ large membranes wore made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. A subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to the high resolution of the FIB milling process, nanoscale apertures down to 70 nm could be made into the membrane. By local deposition through the apertures of nanostencil, nanoscale patterns down to 70 nm could be achieved.
Keywords
Shadow mask; nanostencil; Focused ion beam; Evaporation; nanolithography;
Citations & Related Records
Times Cited By KSCI : 1  (Citation Analysis)
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