• Proceedings of the Materials Research Society of Korea Conference
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• 2012.05a
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• pp.69.2-69.2
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• 2012

Graphene films have a strong potential to replace indium tin oxide anodes in organic light-emitting diodes (OLEDs), to date. However, the luminous efficiency of OLEDs with graphene anodes has been limited by a lack of efficient methods to improve the low work function and reduce the sheet resistance of graphene films to the levels required for electrodes. Here, we fabricate flexible OLEDs by modifying the graphene anode to have a high work function and low sheet resistance, and thus achieve extremely high luminous power efficiencies (37.2 lm/W in fluorescent OLEDs, 102.7 lm/W in phosphorescent OLEDs), which are significantly higher than those of optimized devices with an indium tin oxide anode (24.1 lm/W in fluorescent OLEDs, 85.6 lm/W in phosphorescent OLEDs). We also fabricate flexible white OLED lighting devices using the graphene anode. These results demonstrate the great potential of graphene anodes for use in a wide variety of high-performance flexible organic optoelectronics.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.159-159
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• 2008

Indium-tin oxides (ITO) films have been widely used as transparent electrodes for optoelectronic devices such as organic light emitting diodes (OLEDs), photovoltaics, touch screen devices, and flat-paneldisplay. In particular, to improve hole injection efficiency in OLEDs, transparent electrodes should have high work-function besides their transparency and low resistivity. Nevertheless, few studies have been made on engineering the work function of ITO for use as an efficient anode. In this study, the effects of a wide range of Nb or Zn doping rate on the changes in work functions of ITO anode were investigated. The Nb or Zn doped ITO films were fabricated on glass substrates using combinatorial sputtering system which yields a linear composition spread of Nb or Zn concentration in ITO films in a controlled manner by co-sputtering two targets of ITO and Nb2O5 or ITO and ZnO. We have also examined the resistivity, transmittance, and other structural properties of the Nb or Zn-doped ITO films. Furthermore, OLEDs employing Nb or Zn-doped ITO anodes were fabricated and the device performances were investigated concerned with the work function changes.

• Proceedings of the KSRS Conference
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• 2004.10a
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• pp.489-493
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• 2004

The Modulation Transfer Function (MTF) is commonly used to characterize the spatial quality of imaging systems. This work is the attempt to measure the MTF for KOMPSAT EOC using the non-parametric method as ground inputs. The spatial performance of the KOMPSAT EOC was analyzed by edge method while in flight using multi-temporal image data collected over test site in Seoul. The results from this work demonstrate the potential applicability of this method to estimate MTF for high spatial resolution satellite KOMPSAT-2 that is being developed to be launched in 2005.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.21 no.1
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• pp.29-34
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• 2008

In this paper, we investigated electrical and physical characteristics of nickel silicide using rare-earth metals(Er, Yb, Tb, Dy), Incorporated Ytterbium into Ni-silicide is proposed to reduce work function of Ni-silicide for nickel silicided schottky barrier diode (Ni-silicided SBD). Nickel silicide makes ohmic-contact or low schottky barrier height with p-type silicon because of similar work function (${\phi}_M$) in comparison with p-type silicon. However, high schottky barrier height is formed between Ni-silicide and p-type substrate by depositing thin ytterbium layer prior to Ni deposition. Even though the ytterbium is deposited below nickel, ternary phase $Yb_xN_{1-x}iSi$ is formed at the top and inner region of Ni-silicide, which is believed to result in reduction of work function about 0.15 - 0.38 eV.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.157-159
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• 2005

MOS capacitors were fabricated to study electrical and chemical properties of Ta-Mo metal alloy with $ZrO_2$. The work function of Ta-Mo alloy were varied from 4.1eV to 5.1eV by controlling the composition. When the atomic composition of Mo is 10%, good thermal stability up to $800^{\circ}C$ was observed and work function of MOS capacitor was 4.1eV, compatible for NMOS application. But pure Ta exhibited very poor thermal stability. After $600^{\circ}C$ annealing, equivalent oxide thickness of tantalum gate MOS capacitor was continuously decreased. Barrier heights of Ta-Mo alloy and pure metal that supported the work function values were calculated from Fowler-Nordheim analysis. As a result of these electrical?experiments, Ta-Mo metal alloy with $ZrO_2$ is excellent gate electrode for NMOS.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2022.10a
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• pp.118-120
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• 2022

This paper investigated the change of threshold voltage according to the influence of work-function variation (WFV) of metal gate in the device structure of monolithic 3-dimension inverter (M3DINV). In addition, in order to investigate the change in threshold voltage according to the electrical coupling of the NMOS stacked on the PMOS, the gate voltages of PMOS were applied as 0 and 1 V and then the electrical coupling was investigated. The average change in threshold voltage was measured to be 0.1684 V, and they standard deviation was 0.00079 V.

• Journal of Korean Society for Quality Management
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• v.21 no.1
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• pp.190-198
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• 1993

A multiple criteria model for the facility layout problem considers both of the quantitative, the cost of the work flow, and qualitative, the closeness rating score, aspect. Rosenblatt, Fortenberry & Cox and Urban have developed multiple criteria models that consider both of the quantitative and qualitative aspect. Fortenberry & Cox's multiplicity model penalizes facilities with undesirable closeness rating and high work flows more than those undesirable closeness rating and low work flow between them to contribute to the objective function regardless of the closeness rating between these facilities. In this paper, it is intended to develops a improved multiple-criteria facility layout model considering the function for maintaning the distance between facilities.

• Applied Chemistry for Engineering
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• v.23 no.3
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• pp.289-292
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• 2012

Au electrodes modified with self-assembled monolayers (SAMs) were used to control the work function of source/drain electrodes in triethylsilylethynyl anthradithiophene (TES ADT)-based organic thin film transistors (OTFTs). By using benzothiol (BT) and pentafluorobenzothiol (PFBT) SAMs, the hole injection barrier between Au and the highest occupied molecular orbital (HOMO) of TES ADT was controlled. After a solvent annealing, TES ADT OTFTs with PFBT SAM-treated Au electrodes were found to exhibit high field-effect mobilities of $0.05\;cm^2/Vs$ and on/off current ratios of $10^6$.

• Proceedings of the KSRS Conference
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• 2005.10a
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• pp.482-484
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• 2005

The Modulation Transfer Function (MTF) is commonly used to characterize the spatial quality of imaging systems. This work is the attempt to measure the MTF at Nyquist frequency of the satellite imaging system what has 1m spatial resolution for KOMPSAT-2 image using the edge function. Artificial tarp targets are used in this study. A type of this tarp edge consists of two adjacent uniform bright and dark sides commonly used to test the performance of an optical system in edge function. The results from this work demonstrate the potential applicability of this method to estimate the response characteristics for KOMPSAT-2 that is scheduled to be launched.

• JSTS:Journal of Semiconductor Technology and Science
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• v.13 no.5
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• pp.522-529
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• 2013

In this paper, simple but very effective techniques to suppress subthreshold hump effect for high-voltage (HV) complementary metal-oxide-semiconductor (CMOS) technology are presented. Two methods are proposed to suppress subthreshold hump effect using a simple layout modification approach. First, the uniform gate oxide method is based on the concept of an H-shaped gate layout design. Second, the gate work function control method is accomplished by local ion implantation. For our experiments, $0.18{\mu}m$ 20 V class HV CMOS technology is applied for HV MOSFETs fabrication. From the measurements, both proposed methods are very effective for elimination of the inverse narrow width effect (INWE) as well as the subthreshold hump.