• Proceedings of the Korean Vacuum Society Conference
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• 2010.08a
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• pp.291-291
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• 2010

Electron-beam lithography (EBL) process is a versatile tool for a fabrication of nanostructures, nano-gap electrodes or molecular arrays and its application to nano-device. However, it is not appropriate for the fabrication of sub-5 nm features and high-aspect-ratio nanostructures due to the limitation of EBL resolution. In this study, the precision assembly and alignment of DNA molecule was demonstrated using sub-5 nm nanostructures formed by a combination of conventional electron-beam lithography (EBL) and plasma ashing processes. The ma-N2401 (EBL-negative tone resist) nanostructures were patterned by EBL process at a dose of $200\;{\mu}C/cm2$ with 25 kV and then were ashed by a chemical dry etcher at microwave (${\mu}W$) power of 50 W. We confirmed that this method was useful for sub-5 nm patterning of high-aspect-ratio nanostructures. In addition, we also utilized the surface-patterning technique to create the molecular pattern comprised 3-(aminopropyl) triethoxysilane (APS) as adhesion layer and octadecyltrichlorosilane (OTS) as passivation layer. DNA-templated gold nanoparticle chain was attached only on the sub-5 nm APS region defined by the amine groups, but not on surface of the OTS region. We were able to obtain DNA molecules aligned selectively on a SiO2/Si substrate using atomic force microscopy (AFM).

• Journal of the Korean Society for Precision Engineering
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• v.28 no.4
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• pp.513-520
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• 2011

The NIL processes have been studied to implement low cost, high throughput and high resolution application. A RNIL(roller NIL) is an alternative approach to flat nanoimprint lithography. RNIL process is necessary to transfer patterns on flexible substrates. Compared with flat NIL, RNIL has the advantages of better uniformity, less pressing force, and the ability to repeat the patterning process continuously on a large substrate. This paper studies the design, construction and verification of a thermal RNIL system. The proposed RNIL system can easily adopt the flat shaped hot plate which is one of the most important technologies for NIL. The NIL system can be used to transfer patterns from a flexible stamp to a flexible substrate, from a flexible stamp to a Si substrate, and from a roller stamp to a flexible substrate, etc. Patterning on flexible substrates is one of the key technologies to produce bendable displays, solar cells and other applications.

• Journal of the Korean Society for Precision Engineering
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• v.22 no.12 s.177
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• pp.42-50
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• 2005

This paper presents an ultra precision machining system using a high sensitive force sensing module to measure machining forces and penetration displacement in a tip-based nanopatterning. The force sensing module utilizes a leaf spring mechanism and a capacitive displacement sensor and it has been designed to provide a measuring range from 80 ${\mu}N$ to 8 N. This force sensing module is mounted on a PZT driven in-feed motion stage with 1 nm resolution. The sample can be moved by X-Y scanning motion stage with 5 nm resolution. In nano indentation experiments and patterning experiments, the machining forces were controlled and monitored by the force sensing module. Then, the patterned samples were measured by AFM. Experimental results demonstrated that the developed system can be used as an effective device in nano indentation and nanopatterning operation.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.1109-1112
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• 2004

This paper presents a high sensitive force sensing module to measure machining forces for a tip-based nanopatterning instrument. The force sensing module utilizing a leaf spring mechanism and a capacitive displacement sensor has been designed to provide a measuring range from 80$\mu$N to 8N. This force sensing module is mounted on a PZT driven in-feed motion stage with 1 nm resolution. The sample can be moved by a X-Y scanning motion stage with 5 nm resolution. In the patterning experiments, the machining forces were controlled and monitored by the force sensing module. Then, the patterned sample was measured by AFM. Experimental results demonstrated that the developed force sensing module can be used as an effective sensing device in the nanopatterning operation.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.108-108
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• 2007

Inkjet printing is a non-contact and direct writing associated with a computer. In the industrial field, there have been many efforts to utilize the inkjet printing as a new way of manufacturing, especially for electronic devices. The etching resist used in this process is an organic polymer which becomes solidified when exposed to ultraviolet lights and has high viscosity of 300 cPs at ambient temperature. A piezoelectric-driven ink jet printhead is used to dispense $20-40\;{\mu}m$ diameter droplets onto the copper substrate to prevent subsequent etching. In this study, factors affecting the pattern formation such as printing resolution, jetting property, adhesion strength, etching and strip mechanism, UV pinning energy have been investigated. As a result, microscale Etch resist patterning of printed circuit board with tens of ${\mu}m$ high have been fabricated.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.36 no.10
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• pp.1011-1017
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• 2012

We report the development of an optical micro-nanolithography method by using a roll-type mask. It includes phase-shift lithography and photolithography for realizing various target dimensions. For sub-wavelength resolution, a structure is achieved using the near-field exposure of a photoresist through a cylindrical phase-mask, allowing high-throughput continuous patterning. By using a film-type metal mask, continuous photolithography was achieved, and this method could be used to control the period of resultant patterns in real time by changing the rotating speed of the cylinder mask. As an application, we present the fabrication of a transparent electrode in the form of a metallic mesh by using the developed roll-type photolithography process. As a result, a transparent conductor with good properties was achieved by using a recently built cylindrical phase-shift lithography prototype, which was designed for patterning on 100-mm2 substrates.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.22 no.1
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• pp.42-50
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• 2012

Light color reaction, immersion and diffusion operation through the mural art can be expressed in a variety of image types. In this paper, the digital pattern for mural art was formed by observation of the optical phenomena in natural gems and the relation between the optical sparkle in gems and minerals and pattern design was characterized. New possibility with relevance for design work based on ultramarine with a beautiful sheen and spectrum of the coloring was used for Sustainable 3D simulation modeling and represented by high-resolution Image graphic design.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.34 no.4
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• pp.262-268
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• 2021

For the past several decades, various next-generation patterning methods have been developed to obtain well-designed nano-to-micro structures, such as imprint lithography, nanotransfer printing (nTP), directed self-assembly (DSA), E-beam lithography, and so on. Especially, nTP process has much attention due to its low processing cost, short processing time, and good compatibility with other patterning techniques in achieving the formation of high-resolution functional patterns. To transfer functional patterns onto desirable substrates, the use of soft materials is required for precise replication of master mold. Here, we introduce a simple and practical nTP method to create highly ordered structures using various polymeric replica materials. We found that polymethyl methacrylate (PMMA), polystyrene (PS), and polyvinylpyridine (PVP) are possible candidates for replica materials for reliable duplication of Si master mold based on systematic analysis of pattern visualization. Furthermore, we successfully obtained well-defined metal and oxide nanostructures with functionality on target substrates by using replica patterns, through deposition and transfer process. We expect that the several candidates of replica materials can be exploited for effective nanofabrication of complex electronic devices.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2003.10a
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• pp.371-376
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• 2003

The hot embossing process has been mentioned as one of major nanoreplication techniques. This is due to its simple process, low cost, high replication fidelity and relatively high throughput. As the initial step of quantitating the embossing process, simple parametric study about embossing time have been carried out using high-resolution masters which patterned by the DRIE process and laser machining. Under the various embossing time, the viscous flow of thin PMMA films into microcavities during Compression force has been investigated. Also, a study about simulating the viscous flow during embossing process has planned and continuum scale FDM analysis was applied on this simulation. With currently available test data and condition, simple FDM analysis using FLOW3D was made attempt to match simulation and experiment.

• Journal of the Korean Society of Visualization
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• v.21 no.1
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• pp.26-30
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• 2023

Interaction of a droplet and substrate is important to determine the coating and final deposition pattern in inkjet printing system. In particular, an accurate deposition of the droplet should be guaranteed for high-resolution patterning. In this study, we performed high-speed shadowgraph experiments on droplet train impact in inkjet system. From the high-speed images, we observed an unexpected bouncing phenomenon. We have found two factors affecting bouncing regime; the Weber number and the curvature of deposited droplet. Experimental results indicate that there is a critical curvature diameter of deposited droplet, which splits into bouncing and merging regime. From this result, we obtained a power-law behavior between the Weber number and the curvature. The understanding of bouncing phenomena helps to improve the accuracy and productivity of inkjet printing.