• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.253-253
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• 2012

Low temperature SiOx film process has being required for both silicon and oxide (IGZO) based low temperature thin film transistor (TFT) for application of flexible display. In recent decades, from low density and high pressure such as capacitively coupled plasma (CCP) type plasma enhanced chemical vapor deposition (PECVD) to the high density plasma and low pressure such as inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) have been used to researching to obtain high quality silicon oxide (SiOx) thin film at low temperature. However, these plasma deposition devices have limitation of controllability of process condition because process parameters of plasma deposition such as RF power, working pressure and gas ratio influence each other on plasma conditions which non-leanly influence depositing thin film. In compared to these plasma deposition devices, neutral beam assisted chemical vapor deposition (NBaCVD) has advantage of independence of control parameters. The energy of neutral beam (NB) can be controlled independently of other process conditions. In this manner, we obtained NB dependent high crystallized intrinsic and doped silicon thin film at low temperature in our another papers. We examine the properties of the low temperature processed silicon oxide thin films which are fabricated by the NBaCVD. NBaCVD deposition system consists of the internal inductively coupled plasma (ICP) antenna and the reflector. Internal ICP antenna generates high density plasma and reflector generates NB by auger recombination of ions at the surface of metal reflector. During deposition of silicon oxide thin film by using the NBaCVD process with a tungsten reflector, the energetic Neutral Beam (NB) that controlled by the reflector bias believed to help surface reaction. Electrical and structural properties of the silicon oxide are changed by the reflector bias, effectively. We measured the breakdown field and structure property of the Si oxide thin film by analysis of I-V, C-V and FTIR measurement.

• 한국기계가공학회지
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• 제10권1호
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• pp.31-37
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• 2011

Recently, the technology of surface treatment is being more important which affects the material cost reduction and substitution to the expensive material. The material used for the mechanical processing should have not only high intensity, but also strength toughness, wear resistance and corrosion resistance. In order to increase the durability and have better quality of the parts using such kind of tooling material, various kinds of research of the surface hardening through many kinds of heat resources is being done and practically applied. In this study, the characteristics of hardening surface zone for high strength of the press die material through laser beam irradiation are researched. In this study, it is experimentally observed by the status of the surface morphology, tensile strength, the hardness distribution of the base metal and wear condition by the surface hardness pattern by the laser beam based on the process parameters of $CO_2$ laser by using SM45C and STD11 used for press tool. Through this research, the characteristics of surface hardened zone for high strength of the thin metal by laser beam irradiation is done.

• 한국자동차공학회논문집
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• 제12권2호
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• pp.190-196
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• 2004

ACR(All Clear Reflector), also widely referred to as FFR(Free Form Reflector), were designed in general and intelligent ways using a NUDBS surface for the mathematical modelling of the reflector shape and artificial intelligence as the optimum design algorithm. An ACR, which consists of a continuous surface reflector and clear outer lens, offers styling advantages and provides a high quality light performance. The clear outer lens of an ACR remains efficient even with a highly inclined shape, as in the design of a sports car, as well as the complete clearness of the reflector surface eliminates the nuisance of stray light caused by the steps between adjacent segments of multi-faced reflectors. The application of an ACR to low beam lamp was so sucessful to obtain the sharp cut-off with the lens-free single-surfaced-smooth reflector. The design technique of ACR was tested with all types of lamps, including low beams, high beams, and fog lamps.

• Journal of the Optical Society of Korea
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• 제14권2호
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• pp.127-130
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• 2010

We have developed an efficient electron beam (e-beam) source, a microcolumn, that can be used as a source module for of microscopy and its applications. To obtain a low operating voltage, a very sharp cold field electron emitter was developed by electrochemically etching a tungsten wire. Laser diffraction was used for the fabrication of high-quality electron lenses and for their precise alignment. The measurement of the e-beam currents, and SEM images captured by the microcolumn confirmed the potential of the device as a very good e-beam source.

• Nuclear Engineering and Technology
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• 제53권4호
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• pp.1049-1078
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• 2021

The review summarizes the published data on the widely applied electron-beam, laser-beam, as well as resistance upset, projection, and spot welding of zirconium alloys for nuclear applications. It provides the results of their analysis to identify common patterns in this area. Great attention has been paid to the quality requirements, the edge preparation, up-to-date equipment, process parameters, as well as post-weld treatment and processing. Also, quality control and weld repair methods have been mentioned. Finally, conclusions have been drawn about a significant gap between the capabilities of advanced welding equipment to control the microstructure and, accordingly, the properties of welded joints of the zirconium alloys and existing algorithms that enable to realize them in the nuclear industry. Considering the ever-increasing demands on the high-burnup accident tolerant nuclear fuel assemblies, great efforts should be focused on the improving the welding procedures by implementing predefined heat input cycles. However, a lot of research is required, since the number of possible combinations of the zirconium alloys, designs and dimensions of the joints dramatically exceeds the quantity of published results on the effect of the welding parameters on the properties of the welds.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1992년도 하계학술대회 논문집 B
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• pp.942-944
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• 1992

The free electron laser (FEL) is driven by electron beams with energies ranging from hundreds of kilovolt to hundreds of megavolt. Therefore the efficiency of FEL strongly depends on the beam quality. In this paper we examined the relation between applied voltage and magnetic field at the magnetically insulated cylindrical cold cathode for the high quality electron beam by the numerical analysis. As a result, we knew that the beam widening strongly depended on applied magnetic field and voltage.

• 한국진공학회지
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• 제6권S1호
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• pp.110-114
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• 1997

Development of metal ion source growth of high quality Cu metal film formation of non-stoichiometric $SnO_2$ films of Si(100), and modification fo polymer surface by low enregy ion beam have been carried out at KIST Ion Beam Lab. A new metal ion source with high ion beam flux has been developed by a hybrid ion beam (HIB) deposition and non-stoichiometric $SnO_2$ films are controlled by supplying energy. The ion assisted reaction (IAR) in which keV ion beam is irradiated in reactive gas environment has been deveolped for modifying the polymers and enhancing adhesion to other materials and advantages of the IAR have been reviewed.

• Journal of Radiation Protection and Research
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• 제46권3호
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• pp.120-126
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• 2021

Background: This paper aims to evaluate the clinical utility and radiation dosimetry, for the mobile X-ray imaging of patients with known or suspected infectious diseases, through the window of an isolation room. The suitability of this technique for imaging coronavirus disease 2019 (COVID-19) patients is of particular focus here, although it is expected to have equal relevance to many infectious respiratory disease outbreaks. Materials and Methods: Two exposure levels were examined, a "typical" mobile exposure of 100 kVp/1.6 mAs and a "high" exposure of 120 kVp/5 mAs. Exposures of an anthropomorphic phantom were made, with and without a glass window present in the beam. The resultant phantom images were provided to experienced radiographers for image quality evaluation, using a Likert scale to rate the anatomical structure visibility. Results and Discussion: The incident air kerma doubled using the high exposure technique, from 29.47 µGy to 67.82 µGy and scattered radiation inside and outside the room increased. Despite an increase in beam energy, high exposure technique images received higher image quality scores than images acquired using lower exposure settings. Conclusion: Increased scattered radiation was very low and can be further mitigated by ensuring surrounding staff are appropriately distanced from both the patient and X-ray tube. Although an increase in incident air kerma was observed, practical advantages in infection control and personal protective equipment conservation were identified. Sites are encouraged to consider the use of this technique where appropriate, following the completion of standard justification practices.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.259-259
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• 2008

The LTCC (Low Temperature Co-fired Ceramic) technology meets the requirements for high quality microelectronic devices and microsystems application due to a very good electrical and mechanical properties, high reliability and stability as well as possibility of making integrated three dimensional microstructures. The wet process, which has been applied to the etching of the metallic thin film on the ceramic substrate, has multi process steps such as lithography and development and uses very toxic chemicals arising the environmental problems. The other side, Plasma technology like ion beam sputtering is clean process including surface cleaning and treatment, sputtering and etching of semiconductor devices, and environmental cleanup. In this study, metallic multilayer pattern was fabricated by the ion beam etching of Ti/Pd/Cu without the lithography. In the experiment, Alumina and LTCC were used as the substrate and Ti/Pd/Cu metallic multilayer was deposited by the DC-magnetron sputtering system. After the formation of Cu/Ni/Au multilayer pattern made by the photolithography and electroplating process, the Ti/Pd/Cu multilayer was dry-etched by using the low energy-high current ion-beam etching process. Because the electroplated Au layer was the masking barrier of the etching of Ti/Pd/Cu multilayer, the additional lithography was not necessary for the etching process. Xenon ion beam which having the high sputtering yield was irradiated and was used with various ion energy and current. The metallic pattern after the etching was optically examined and analyzed. The rate and phenomenon of the etching on each metallic layer were investigated with the diverse process condition such as ion-beam acceleration energy, current density, and etching time.

• Journal of Radiation Protection and Research
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• 제43권3호
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• pp.97-106
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• 2018

Background: A cargo container scanner using a high-energy X-ray generates a fan beam X-ray to acquire a transmitted image. Because the generated X-rays by LINAC may affect the image quality and radiation protection of the system, it is necessary to acquire accurate information about the generated X-ray beam distribution. In this paper, a diode-based multi-channel spatial dose measuring device for measuring the X-ray dose distribution developed for measuring the high energy X-ray beam distribution of the container scanner is described. Materials and Methods: The developed high-energy X-ray spatial dose distribution measuring device can measure the spatial distribution of X-rays using 128 diode-based X-ray sensors. And precise measurement of the beam distribution is possible through automatic positioning in the vertical and horizontal directions. The response characteristics of the measurement system were evaluated by comparing the signal gain difference of each pixel, response linearity according to X-ray incident dose change, evaluation of resolution, and measurement of two-dimensional spatial beam distribution. Results and Discussion: As a result, it was found that the difference between the maximum value and the minimum value of the response signal according to the incident position showed a difference of about 10%, and the response signal was linearly increased. And it has been confirmed that high-resolution and two-dimensional measurements are possible. Conclusion: The developed X-ray spatial dose measuring device was evaluated as suitable for dose measurement of high energy X-ray through confirmation of linearity of response signal, spatial uniformity, high resolution measuring ability and ability to measure spatial dose. We will perform precise measurement of the X-ray beamline in the container scanning system using the X-ray spatial dose distribution measuring device developed through this research.