• Title/Summary/Keyword: Hexamethylcyclotrisiloxane

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Preparation and Properties of Poly(dimethylsiloxane-co-N-phenylsiloxazane) Modified Acrylate Resin (Poly(dimethylsiloxane-co-N-phenylsiloxazane) 변성 Acrylate Resin의 제조와 그 특성)

  • Kang, Doo-Whan;Kum, Min-Woo;Yoon, Jae-Seon
    • Polymer(Korea)
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    • v.34 no.2
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    • pp.154-158
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    • 2010
  • We first synthesized N-phenylcyclotrisiloxazane ($D_3^{NPh}$) through a cyclization of $\alpha$,$\omega$- dichlorohexamethyltrisiloxane with aniline and prepared poly(dimethylsiloxane-co-N-phenylsiloxazane) copolymer (PDMS-NPSOX) by a ring opening copolymerization of them with hexamethylcyclotrisiloxane $D_3$. An acrylate monomer modified with PDMS-NPSOX was synthesized by using chloroethyl methacrylate and copolymerized with methylmethacrylate (MMA) and n-butylacrylate. The composition of the copolymer was chosen to control their glass transition temperature ($T_g$) to 25 $^{\circ}C$. By changing the comonomer from PDMS to PDMS-NPSOX, $T_g$ and adhesive strength of the copolymer were increased from 20 to 25 $^{\circ}C$ and from 1.76 to 2.23 N/cm, respectively.

Synthesis and Photocharacteristics of Polysiloxane substituted Naphthoquinone-1,2-diazide sulfonyl group (Naphthoquinone-1,2-Diazaide-Sulfonyl기 치환 Polysiloxane의 합성과 그 감광특성)

  • Kang, Doo-Whan;Chung, Nag-Jin
    • Applied Chemistry for Engineering
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    • v.2 no.4
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    • pp.348-355
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    • 1991
  • Polysiloxane copolymers were prepared by copolymerizing hexamethylcyclotrisiloxane with tetramethylcyclotetrasiloxane, and then reacted with allyamine. Copolymers containing naphthoquinone-1,2-diazide-5-sulfonyl group were synthesized by reacting naphthoquinone-1,2-diazide-5-sulfonyl chloride with siloxane copolymers having amino group. Thermal decomposition temperatures of copolymers were $360{\sim}450^{\circ}C$, and photosensitive characteristics were dependent on the molecular weights of backbone resins and sensitizers. Sensitivity of copolymers was $50{\sim}120mJ/cm^2$ and contrast(${\gamma}$) was 1.4~2.1.

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Growth promotion and root development of Nicotiana tabacum L. by plant growth promoting fungi (PGPF) (식물 생장 촉진 진균에 의한 담배의 생장 촉진과 뿌리 발달)

  • Hong, Eunhye;Lee, Jinok;Kim, Sujung;Nie, Hualin;Kim, Young-Nam;Kim, Jiseong;Kim, Sunhyung
    • Journal of Plant Biotechnology
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    • v.47 no.4
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    • pp.337-344
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    • 2020
  • Plant growth-promoting microorganisms promote plant growth by supplying nutrients to roots and interacting with the intrinsic factors in plants through volatile organic compounds (VOCs). In this study, we evaluated the effect of UOS, plant growth-promoting fungi (PGPF) isolated from previous study, on the growth of Nicotiana tabacum L. var Xanthi nc. Phylogenetic analysis and GC-MS were used to identify the fungal species and the VOCs emitted by the UOS, respectively. The fresh weight of UOS-treated Nicotiana tabacum L. was 3.8 and 4.2-fold higher than that of the control groups grown in vertical and I-plates, respectively. Moreover, in the UOS-treated plants, the length of the primary root was half and the number of lateral roots were twice compared to those in control plants. The UOS was identified as Phoma sp. by studying spore and mycelial morphology and using phylogenetic analysis. GC-MS revealed that the VOC emitted by the UOS was hexamethylcyclotrisiloxane (D3). These results suggest that the UOS of Phoma sp. influences plant growth and root development through D3. We expect this UOS and its VOC, D3 to be utilized in the future to increase growth and enhance yield for other plants.

Anti-corrosion Properties of SiOxCy(-H) thin Films Synthesized and Oxidized by Atmospheric Pressure Dielectric Barrier Discharge (대기압 유전체배리어방전으로 합성 및 산화 처리된 SiOxCy(-H) 박막의 부식방지 특성)

  • Kim, Gi-Taek;Kim, Yoon Kee
    • Journal of the Korean institute of surface engineering
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    • v.53 no.5
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    • pp.201-206
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    • 2020
  • A SiOxCy(-H) thin film was synthesized by atmospheric pressure dielectric barrier discharge(APDBD), and a SiO2-like layer was formed on the surface of the film by oxidation treatment using oxygen plasma. Hexamethylcyclotrisiloxane was used as a precursor for the SiOxCy(-H) synthesis, and He gas was used for stabilizing APDBD. Oxygen permeability was evaluated by forming an oxidized SiOxCy(-H) thin film on a PET film. When the single-layer oxidized SiOxCy(-H) film was coated on the PET, the oxygen gas permeability decreased by 46% compared with bare PET. In case of three-layer oxidized SiOxCy(-H) film, the oxygen gas permeability decreased by 73%. The oxygen permeability was affected by the thickness of the SiO2-like layer formed by oxidation treatment rather than the thickness of the SiOxCy(-H) film. The excellent corrosion resistance was demonstrated by coating an oxidized SiOxCy(-H) thin film on the silver-coated aluminum PCB for light emitting diode (LED).

Semi-Permanent Hydrophilization of Polyester Textile by Polymerization and Oxidation Using Atmospheric Pressure Dielectric Barrier Discharge (APDBD)

  • Se Hoon Shin;Yoon Kee Kim
    • Korean Journal of Materials Research
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    • v.33 no.4
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    • pp.115-123
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    • 2023
  • In this paper, we report and discuss the semi-permanently hydrophilic (SPH) treatment of polyester fabric using plasma polymerization and oxidation based on atmospheric pressure dielectric barrier discharge (APDBD) technology. SiOxCy(-H) was coated on polyester fabric using Hexamethylcyclotrisiloxane (HMCTSO) as a precursor, and then plasma oxidation was performed to change the upper layer of the thin film to SiO2-like. The degradation of hydrophilicity of the SPH polyester fabrics was evaluated by water contact angle (WCA) and wicking time after repeated washing. The surface morphology of the coated yarns was observed with scanning electron microscopy, and the presence of the coating layer was confirmed by measuring the Si peak using energy dispersive x-ray spectroscopy. The WCA of the SPH polyester fabric increased to 50 degrees after 30 washes, but it was still hydrophilic compared to the untreated fabric. The decrease in hydrophilicity of the SPH fabric was due to peeling of the SiOxCy(-H) thin film coated on polyester yarns.

Detection of Antifungal Endolichenic Fungi and Antifungal Compound (항진균성 지의류 내생 곰팡이 및 항진균성 물질의 탐색)

  • Cheon, Da-Mi;Jang, Da Som;Kim, Hye Young;Choi, Kap Seong;Choi, Sang Ki
    • Korean Journal of Microbiology
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    • v.49 no.2
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    • pp.165-171
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    • 2013
  • To isolate a novel antifungal compound, we obtained 571 kinds of endolichenic fungi from Lichen Bioresources Center and examined their antifungal abilities. Four fungi Stereocaulon sp. (1429), Stereocaulon sp. (1430), Cryptosporiopsis sp. (0156), and Graphis sp. (1245) showed high antifungal activity against Candida albicans when they grew in both liquid and solid media. We extracted the culture supernatants of these fungi with chloroform and then ethyl acetate. The chloroform fraction exhibited the highest anti-fungal activities when those fractions were examined for the growth inhibition of Candida albicans with disc diffusion method. To see information for the inhibitor present in chloroform fraction we employed GC-MS for the fractions of Stereocaulon sp. (1429). We found that hexamethylcyclotrisiloxane, decanoic acid, hexadecanonic acid-methyl ester, 14-octadecenoic acid-methyl ester, and octadecenoic acid-methyl ester were present more in chloroform fraction than in ethylacetate fraction. This indicates that those compounds could be possible antifungal candidates since antifungal activity of chloroform extract was two times higher than that of ethyl acetate extract.