• Journal of the Korean institute of surface engineering
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• v.49 no.6
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• pp.580-586
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• 2016

Cr-Si-Al-N coating with different Si content were deposited by hybrid physical vapor deposition (PVD) method consisting of unbalanced magnetron (UBM) sputtering and arc ion plating (AIP). The deposition temperature was $300^{\circ}C$, and the gas ratio of $Ar/N_2$ were 9:1. The CrSi alloy and aluminum targets used for arc ion plating and sputtering process, respectively. Si content of the CrSi alloy targets were varied with 1 at%, 5 at%, and 10 at%. The phase analysis, composition and microstructural analysis performed using x-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM) including energy dispersive spectroscopy (EDS), respectively. All of the coatings grown with textured CrN phase (200) plane. The thickness of the Cr-Si-Al-N films were measured about $2{\mu}m$. The friction coefficient and removal rate of films were measured by a ball-on-disk test under 20N load. The friction coefficient of all samples were 0.6 ~ 0.8. Among all of the samples, the removal rate of CrSiAlN (10 at% Si) film shows the lowest values, $4.827{\times}10^{-12}mm^3/Nm$. As increasing of Si contents of the CrSiAlN coatings, the hardness and elastic modulus of CrSiAlN coatings were increased. The morphology and composition of wear track of the films was examined by scanning electron microscopy (SEM) and energy dispersive spectroscopy, respectively. The surface energy of the films were obtained by measuring of contact angle of water drop. Among all of the samples, the CrSiAlN (10 at% Si) films shows the highest value of the surface energy, 41 N/m.

• Korean Journal of Soil Science and Fertilizer
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• v.31 no.1
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• pp.67-71
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• 1998

This study was carried out to granulate artificial zeolite powder that remove ammonium nitrogen and phosphorous simultaneously in wastewater treatment. Optimum water content was required for 30 percent volume to granulate artificial zeolite with 1.7mm diameter and 1~2cm length using granulator. Portland cement could remove much $NH_4{^+}$ and $PO_4{^{3-}}$ from the wastewater than other binding materials. Mixed 33, 25. 20. 16 percent of portland cement to artificial zeolite powder(v/v), cation exchange capacity of the granulars were 66.5, 81.4, 126.8, $151.2cmol^+kg^{-1}$ and hardness of that were 176.1, 24.4, 4.1, $0.4kg\;cm^{-2}$, respectively. Content of portland cement in the granular were related with removal of $PO_4{^{3-}}$ positively and that of $NH_4{^+}$ negatively. Shaked 1g of the granulars that made of portland cement 33 percent with 40ml synthetic wastewater containing $NH_4{^+}$ $1545mgl^{-1}$ and $PO_4{^{3-}}$ $417mgl^{-1}$, 99.4 percent of $NH_4{^+}$ and 90.3 percent of $PO_4{^{3-}}$ were removed simultaneously after 48 hours shaking. The longer shaking, the more $NH_4{^+}$ and $PO_4{^{3-}}$were removed. The artificial zeolite granular had both micropore and macropore that could be useful in the wastewater purification.

• Journal of the Korean Association of Oral and Maxillofacial Surgeons
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• v.38 no.1
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• pp.44-49
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• 2012

Introduction: Sialolithes are initiated by localized deposition of calcified material in the salivary glands. And that may even cause various symptom especially swelling and pain. This study purposes to collect statistical data of sialolithiasis for clinical analysis. Materials and Methods: Among forty seven patients who have visited Seoul National University Dental Hospital during 2004-2009, patients' age, sex, location and size of stone, radiodensity of stone, symptom, surgical procedure were investigated. Statistical correlation between size, location, symptom was evaluated. Chemical composition was analyzed for 3 sialolithes. Results: The average age was 41.4 years. Sialolithiasis had slight female predilection (57.4%). Most cases occurred in the submandibular glands (91.5%). And most cases had radiopaque features (95.8%). The average size was 7.17 mm. The most frequent location of the stones were the duct orifice and the submandibular gland hilum (16 cases in each), followed by the middle part of the duct (n=8), the intraglandular area (n=4), and the proximal part of the duct (n=3). Eleven cases were asymptomatic. Thirty six cases had complaints of pain, swelling, hardness, and decrease in saliva flow (multiple symptoms). Various methods of surgery was performed. Two cases were self-removed. Thirty seven cases underwent procedure involving stone removal alone. Six cases underwent gland extirpation, and two cases underwent ductoplasty. Conclusion: There was no statistical correlation between size, location, and symptoms. Sialolith was composed of Ca (58.5-69.3%), P (30.7-35.7%), organic material, and trace inorganic material.

• Journal of the Korean Society for Precision Engineering
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• v.29 no.12
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• pp.1285-1289
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• 2012

This study has been focused on application of ELID lapping process for mirror-surface machining of sapphire wafer. Sapphire wafer is a superior material with optic properties of high performance as light transmission, thermal conductivity, hardness and so on. High effective surface machining technology is necessary to use sapphire as various usages. The interval ELID lapping process has been set up for lapping of the sapphire material. According to the ELID lapping experimental results, it shows that 12.5 kg of load for lapping is most pertinent to ELID lapping. the surface of sapphire can be eliminated by metal bonded wheel with micron abrasives and the surface roughness of 60 nmRa can be gotten using grinding wheel of 2,000 mesh in 4.5 um, depth of cut. In this study, the chemical experiments after ELID grinding also has been conducted to check chemical reaction between workpiece and grinding wheel on ELID grinding process. It shows that the chemical reaction has not happened as the results of the chemical experiments.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.12 no.4
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• pp.75-80
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• 2013

Single crystal sapphire being used in high technology industry is a brittle material with a high hardness and excellent physical properties. ELID(Electrolytic In-Process Dressing) grinding technology was applied to material removal machining process of single crystal sapphire wafer. Ultrasonic vibration which added to material using ultrasonic table was adopted to efficient ELID grinding of sapphire materials. The evaluation of the ground surface of single crystal sapphire wafer was carried out by means of surface measuring by using AFM(Atomic Force Microscope), surface roughness tester and optical microscope device. As the results of experiment, it was shown that more efficient grinding was conducted when using ultrasonic table. In case of using #170 grinding wheel, surface roughness of ELID ground specimen in using ultrasonic table was superior to ELID ground specimen without ultrasonic table. However, In case of using #2000 grinding wheel, surface roughness of ELID ground specimen in using ultrasonic table was inferior to ELID ground specimen without ultrasonic table.

• Tribology and Lubricants
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• v.35 no.6
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• pp.323-329
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• 2019

Sapphire is currently used as a substrate material for blue light-emitting diodes (LEDs). The market for sapphire substrates has expanded rapidly as the use of LEDs has extended into various industries. However, sapphire is classified as one of the most difficult materials to machine due to its hardness and brittleness. Recently, a lap-grinding process has been developed to combine the lapping and diamond mechanical polishing (DMP) steps in a single process. This paper studies, the effect of wafer surface roughness on the chemical mechanical polishing (CMP) process by pressure and abrasive concentration in the lap-grinding process of a sapphire wafer. In this experiment, the surface roughness of a sapphire wafer is measured after lap-grinding by varying the pressure and abrasive concentration of the slurry. CMP is carried out under pressure conditions of 4.27 psi, a plate rotation speed of 103 rpm, head rotation speed of 97 rpm, and slurry flow rate of 170 ml/min. The abrasive concentration of the CMP slurry was 20wt, implying that the higher the surface roughness after lapgrinding, the higher the material removal rate (MRR) in the CMP. This is likely due to the real contact area and actual contact pressure between the rough wafer and polishing pad during the CMP. In addition, wafers with low surface roughness after lap-grinding show lower surface roughness values in CMP processes than wafers with high surface roughness values; therefore, further research is needed to obtain sufficient surface roughness before performing CMP processes.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.07a
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• pp.50-53
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• 2003

CMP (chemical mechanical polishing) process remained to solve several problems in deep sub-micron integrated circuit manufacturing process. especially consumables (polishing pad, backing film, slurry, pad conditioner), one of the most important components in the CMP system is the slurry. Among the composition of slurries (buffer solution, bulk solution, abrasive particle, oxidizer, inhibitor, suspension, antifoaming agent, dispersion agent), the abrasive particles are important in determining polish rate and planarization ability of a CMP process. However, the cost of abrasives is still very high. So, in order to reduce the high COO (cost of ownership) and COC (cost of consumables) in this paper, we have collected the silica abrasive powders by filtering after subsequent CMP process for the purpose of abrasive particle recycling. And then, we have studied the possibility of recycle of reused silica abrasive through the analysis of particle size and hardness. Also, we annealed the collected abrasive powders to promote the mechanical strength of reduced abrasion force. Finally, we compared the CMP characteristics between self-developed KOH-based silica abrasive slurry and original slurry. As our experimental results, we obtained the comparable removal rate and good planarity with commercial products. Consequently, we can expect the saving of high cost slurry.

• Journal of Korean Society of Water and Wastewater
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• v.17 no.4
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• pp.534-541
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• 2003

Membrane processes are now frequently considered for application in drinking water treatment. The biggest impediment for applying membrane processes is fouling that comes from mass flux (such as particle and organic matter) to the membrane surface and its pores due to convection flow through the membrane. Natural organic matter (NOM) has been reported as the most detrimental foulant. Some research also indicated that particles were often the dominant cause of fouling. Therefore, both NOM and particle fouling need to be examined to better understand fouling in ultrafiltration. Two waters from natural sources, Lake Austin water and Missouri River water, were selected. Both waters are relatively hard waters but has significantly different particle concentrations, which will elucidate effects of particles on membrane fouling. Precipitative softening is traditionally designed to remove hardness ions in hard waters but it can also remove particles and organic matter. Therefore, the integrated water treatment with softening and ultrafiltration is proposed as a promising option for hard waters. The three levels of softening were used to represent different degrees of pretreatment to ultrafiltration in terms of organic matter (i.e., NOM fouling) and precipitates (i.e., particle fouling by further precipitation). Results showed that natural particles in Missouri River water was detrimental foulants of ultrafiltration. As the levels of softening were increased, NOM and particle removal was increased, and thus fouling was decreased. Direct images of the surface of the membranes by scanning electron microscopy allowed observation of the different properties of particles caught in fibril networks of natural organic matter.

• Journal of Ocean Engineering and Technology
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• v.25 no.5
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• pp.15-20
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• 2011

This study carried out a series of experiments involving impact tests (Drop Weight type & Charpy type with a standard specimen and newly designed I-type specimen), hardness tests, and fracture surface observations of French-made roll shell steel (F), abnormal roll shell steel (M), reheated roll shell steel (R), and S25C steel under heat treatment conditiAn experimental study was carried out to study the solid-liquid mixture upward hydraulic transport of solid particles in vertical and inclined annuli with a rotating inner cylinder. The lift forces acting on a fluidized particle play a central role in many important applications such as the removal of drill cuttings in horizontal drill holes, sand transport in fractured reservoirs, sediment transport, the cleaning of particles from surfaces, etc. In this study a clear acrylic pipe was used to observe the movement of solid particles. Annular velocities varied from 0.4 to 1.2 m/s. The effect of the annulus inclination and drill pipe rotation on the carrying capacity of a drilling fluid, particle rising velocity, and pressure drop in a slim hole annulus were measured for fully-developed flows of water and aqueous solutions of CMC (sodium carboxymethyl cellulose) and bentonite. The rotation of the inner cylinder was efficient at carrying particles to some degree. For a higher particle volume concentration, the hydraulic pressure loss of the mixture flow increased because of the friction between the wall and solids or between solids.

• Journal of Korean Society on Water Environment
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• v.22 no.3
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• pp.521-526
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• 2006

We have studied the possibility of removing Anabaena macrospora by injecting copper sulfate ($CuSO_4{\cdot}5H_2O$) into the raw water of a drinking water purification plant. Anabaena macrospora caused the unpleasant geosmin odor of drinking water in August 2001. The cell break-point of A. macrospora was 0.3 mg/L of $CuSO_4$. We were able to reduce the standing crops of A. macrospora effectively because $CuSO_4$ could break A. macrospora selectively. Because 0.3 mg/L of $CuSO_4$ could break both cells and akinetes, it reduced the possibility of a recurrent problem for them to meet a favorable condition. When $CuSO_4$ was injected in the early growth phase of algae and the mixing intensity was high, A. macrospora could be removed most effectively. The odor caused by A. macrospora was sustained for a while without any sudden change of environmental condition. Therefore, we hope that it could shorten the period of obstacle by injecting the optimal amount of 0.3 mg/L of $CuSO_4$. The water quality, alkalinity, conductivity, hardness and pH didn't changed by the injection of $CuSO_4$.