• Journal of radiological science and technology
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• v.14 no.2
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• pp.15-21
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• 1991

Experiment was conducted on the image quality and exposure dose following replacement of $CaWO_4$ system screen BH-III and BX-III which have so far been used for high-voltage hard-radiation quality radiography, with rare earth system screen KO750, combined with high contrast film SRH, while additional filter was altered, Cu 0.8 mm+Al 1.4 mm(HVL : Al 8.8 mm), Cu 1.3 mm+Al 1.0 mm(HVL : Al 10.6 mm) and Cu 1.8 mm+Al 1.5 mm(HVL : Al 11.4 mm). AS a result, visual evaluation did not detect extreme changes in image quality under the respective condition(HVL : $Al\;8.8\;mm{\sim}Al\;11.4\;mm$). It was noted, however, that surface exposure dose declined with an increase in the thickness of the additional filter, as it was $18.9\;{\mu}Gy$ at HVL Al 8.8 mm, $17.5\;{\mu}Gy$ at Al 10.6 mm and $15.7\;{\mu}Gy$ at Al 11.4 mm. Considering the limited rating of X-ray equipment and wear of machinery, however, the range of $Cu\;1.3\;mm{\sim}1.8\;mm+Al\;1.0\;mm{\sim}1.5\;mm(1/16\;VL{\sim}1/32\;VL)$ seemed to be a limit.

• Korean Journal of Materials Research
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• v.29 no.11
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• pp.684-689
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• 2019

Single crystals, which have complexed composition, are fabricated by solid state grain growth. However, it is hard to achieve stable properties in a single crystal due to trapped pores. Aerosol deposition (AD) is suitable for fabrication of single crystals with stable properties because this process can make a high density coating layer. Because of their unique features (nano sized grains, stress inner site), it is hard to fabricate single crystals, and so studies of grain growth behavior of AD film are essential. In this study, a $BaTiO_3$ coating layer with ${\sim}9{\mu}m$ thickness is fabricated using an aerosol deposition method on (100) and (110) cut $SrTiO_3$ single crystal substrates, which are adopted as seeds for grain growth. Each specimen is heat-treated at various conditions (900, 1,100, and $1,300^{\circ}C$ for 5 h). $BaTiO_3$ layer shows different growth behavior and X-ray diffraction depending on cutting direction of $SrTiO_3$ seed. Rectangular pillars at $SrTiO_3$ (100) and laminating thin plates at $SrTiO_3$ (110), respectively, are observed.

• Corrosion Science and Technology
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• v.5 no.2
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• pp.77-83
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• 2006

The plasma electrolytic oxidation (PEO) process is a relatively new surface treatment technique that produces a chemically stable and environment-friendly electrolytic coating that can be applied to all types of magnesium alloys. In this study, the characteristics of oxide film were examined after coating the extruded AZ31 alloy through the PEO process. Hard ceramic coatings were obtained on the AZ31 alloy by changing the coating time from 10min to 60min. The morphologies of the surface and the cross-section of the PEO coatings were examined by scanning electron microscopy and optical microscopy, and the thickness of the coating was measured. The X-ray diffraction pattern of the coating shows that the coated layer consists mainly of the MgO and $Mg_2SiO_4$ phases after the oxidation reaction. The hardness of the coated AZ31 alloy increased with increasing coating time. In addition, the corrosion rates of the coated and uncoated AZ31 alloys were examined by salt spray tests according to ASTM B 117 and the results show that the corrosion resistance of the coated AZ31 alloy was superior to that of the un-coated AZ31 alloy.

• Journal of The Korean Astronomical Society
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• v.36 no.spc1
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• pp.63-73
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• 2003

Solar flares present a number of radiative characteristics indicative of kinetic processes of high energy particles. Proper understanding of the kinetic processes, however, relies on how well we can separate the acceleration from transport characteristics. In this paper, we discuss microwave and hard X-ray bursts as a powerful tool in investigating the acceleration and transport of high energy electrons. After a brief review of the studies devoted to the kinetic process of solar flare particles, we cast them into a simple formulation which allows us to handle the injection, trap, and precipitation of flare electrons self-consistently. The formulation is then taken as a basis for interpreting and analyzing a set of impulsive and gradual bursts occurred on 2001 April 6 observed with the Owens Valley Solar Array, and HXT/WBS onboard Yohkoh satellite. We quantify the acceleration, trap, and precipitation processes during each burst in terms of relevant time scales, and also determine ambient density and magnetic field. Our result suggests that it should be the acceleration property, in particular, electron pitch angle distribution, rather than the trap condition, that is mainly responsible for the distinctive properties of the impulsive and gradual flares.

• The Bulletin of The Korean Astronomical Society
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• v.38 no.2
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• pp.90.1-90.1
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• 2013

To better understand the physics underlying the eruption of prominences in solar active regions, we studied eruption processes of two active prominences located in the active region NOAA 11261 using multi-wavelength observational data with high temporal and spatial resolution. Specifically, we examined (1) the temporal variation of morphology and plasma properties of the two active prominences, (2) magnetic fields and their evolution on the photospheric surface underneath the prominences, and (3) the time profiles and locations of radio, EUV, and soft/hard X-ray emissions produced by the M9.3 flare related to the prominence eruption. As a result, we found that: (1) a prominence F1 began to erupt and expand as the abrupt and intense EUV brightening occurred in the localized region underneath the western part of F1 at 03:45 UT prior to the peak time of the M9.3 flare, (2) F1 split into two parts: i.e., the western part asymmetrically erupted by producing the M9.3 flare with microwave source motions along the magnetic polarity inversion line between the two flare ribbons, while the eastern part coalesced into a pre-existing prominence F2, (3) F2 became unstable due to the coalescence with the eastern part of F1, and then it partially erupted with clockwise untwisting motions.

• Transactions of Materials Processing
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• v.24 no.4
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• pp.287-292
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• 2015

The possibility of chemical precipitation for recycled ammonium paratungstate (APT) was studied. WO₃ particles were synthesized by chemical precipitation method using a 1:2 weight ratio of APT:DI-water. At the 500℃ sintering temperature, the X-ray diffraction results showed that APT completely decomposed to WO₃. For the granulated powder WC-Co, vacuum heat treatment at proper temperatures increases tap density and flow-ability. Hardness of the WC-Co thermal spray coating layer was measured in the range HV 831~1266. Spray conditions for the best characteristic values were an oxygen flow rate=1500 scfh, a fuel flow rate = 5.25gph and a gun distance = 320mm.

• Transactions on Electrical and Electronic Materials
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• v.4 no.3
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• pp.1-4
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• 2003

The etching of Au thin films has been performed in an inductively coupled $CF_4 / Cl_2 / Ar$ plasma. The etch properties including etch rate and selectivity were examined as $CF_4$ content adds from o to $30\%$ to $Cl_2/Ar$ plasma. The $Cl_2/(Cl_2 + Ar)$ gas mixing ratio was fixed at $20\%$. Other parameters were fixed at an rf power of 700 W, a dc bias voltage of -150 V, a chamber pressure of 15 mTorr, and a substrate temperature of $30^{\circ}C$. The highest etch rate of the Au thin film was 370 nm/min at a $10\%$ additive $CF_4$ into $Cl_2/Ar$ gas mixture. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. The XPS analysis shows that the intensities of Ail peaks are changed, indicating that there is a chemical reaction between Cl and Au. Au-Cl is hard to remove on the surface because of its high melting point. However, etching products can be sputtered by Ar ion bombardment.

• Transactions on Electrical and Electronic Materials
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• v.11 no.5
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• pp.202-205
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• 2010

In this study, the etch properties of $Al_2O_3$ thin films deposited by atomic layer deposition were investigated as a function of the $O_2$ content in $BCl_3$/Ar inductively coupled plasma. The experiments were performed by comparing the etch rates and selectivity of $Al_2O_3$ over the hard mask materials as functions of the input plasma parameters, such as the gas mixing ratio, DC-bias voltage, ratio-frequency (RF) power and process pressure. The highest obtained etch rate was 477 nm/min at an RF power of 700 W, $O_2$ to $BCl_3$/Ar gas ratio of 15%, DC-bias voltage of -100 V and process pressure of 15 mTorr. The deposition occurred on the surfaces when the amount of $O_2$ added to the $BCl_3$/Ar gas was too high at a low DC-bias voltage or high process pressure. X-ray photoelectron spectroscopy was used to investigate the chemical reactions on the etched surface.

• Transactions of the Korean Society of Mechanical Engineers
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• v.12 no.3
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• pp.489-496
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• 1988

This paper is studied to know wear mechanism in variation of austempering temperature and holding time of austempered ductile cast iron against mating material SM45C hardened by heat treatment. The wear tests were carried out by rubbing the annular surface of two test pieces in dry sliding friction. The wear mechanism was investigated by scanning electron microscopy and the retained austenite volume fraction was investigated by X-ray diffractometer. The experimental results show that the wear characteristics depend largely on the oxidation of the testing materials which is influenced by the sliding velocity and distance. The retained austenite has a negative effect during frictional contact because it has increased severe wear by softened surface layer. It is shown experimentally that hard metals have lower frictional resistance and hence the resistance to adhesion is increased due to stronger interatomic linking bonds and increase in the surface energy.

• Proceedings of the Korean Society of Machine Tool Engineers Conference
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• 2003.10a
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• pp.89-94
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• 2003

Hard coatings are known to improve the performance of cutting tools in aggressive machining applications, such as high speed machining. New superhard Ti-Al-Si-W films, characterized by a nanocomposite nano-sized (Ti,Al,Si)N crystallites embedded in amorphous $Si_3 N_4$ matrix, could be successfully synthesized on WC-Co substrates by a hybrid coating system of arc ion plating(AIP) and sputtering method. The hardness of Ti-Al-Si-N film increased with incorporation of Si, and had the maximum value ~50 GPa at the Si content of 9 at.%, respectively. And the X-ray diffraction patterns of Ti-Al-Si-N films with various Si content is investigated. In this study, Ti-Al-Si-N coatings were applied to end-mill tools made of WC-Co material by a hybrid coating system. Cutting tests fir the high-hardened material (STD11,$H_R$)C62 and their performances in high speed cutting conditions were studied. Also, the tool wear and tool lift of Ti-Al-Si-N with various si(6, 9, 19) contents were measured.