• Journal of Korea Multimedia Society
• /
• v.18 no.2
• /
• pp.120-127
• /
• 2015

Mild Cognitive Impairment(MCI) is a prior step to Alzheimer's Disease(AD). It is different from AD which is seriously affecting daily life. Particularly, the hippocampus could be charged a crucial function for forming memory. MCI has a high risk about progress to AD. Our investigated research for a relationship between hippocampus and AD has been studied. The measurement of hippocampus volumetric is one of the most commonly used method. The three dimensional reconstructed medical images could be passible to interpret and its examination in various aspects but the cost of brain research with the medical equipment is very high. In this study, 3D visualization was performed from a series of brain Magnetic Resonance Images(MRI) and we have designed and implemented a competitive software tool based on the open libraries of Visualization ToolKit(VTK). Consequently, our visualization software tool could be useful to various medical fields and specially prognosis and diagnosis for MCI patients.

• Journal of the Korean institute of surface engineering
• /
• v.57 no.3
• /
• pp.165-178
• /
• 2024

In semiconductor memory device manufacturing, the capability for high aspect ratio contact (HARC) etching determines the density of memory device. Given that there is no standardized definition of "high" in high aspect ratio, it is crucial to continuously monitor recent technology trends to address technological gaps. Not only semiconductor memory manufacturing companies such as Samsung Electronics, SK Hynix, and Micron but also semiconductor manufacturing equipment companies such as Lam Research, Applied Materials, Tokyo Electron, and SEMES release annual reports on HARC etching technology. Although there is a gap in technological focus between semiconductor mass production environments and various research institutes, the results from these institutes significantly contribute by demonstrating fundamental mechanisms with empirical evidence, often in collaboration with industry researchers. This paper reviews recent studies on HARC etching and the study of dielectric etching in various technologies.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2004.08a
• /
• pp.75-75
• /
• 2004

• Proceedings of the Korean Vacuum Society Conference
• /
• 2015.08a
• /
• pp.136.2-136.2
• /
• 2015

반도체 제조는 chip의 성능 향상 및 단가 하락을 위해 지속적으로 pattern size가 nano size로 감소해 왔고, capacitor 용량은 증가해 왔다. 이러한 현상은 contact hole의 aspect ratio를 지속적으로 증가시킨바, 그에 따라 최적의 HARC (high aspect ratio contact)을 확보하는 적합한 dry etch process가 필수적이다. 그러나 HARC dry etch process는 많은 critical plasma properties 에 의존하는 매우 복잡한 공정이다. 따라서, critical plasma properties를 적절히 조절하여 higher aspect ratio, higher etch selectivity, tighter critical dimension control, lower P2ID과 같은 plasma characteristics을 확보하는 것이 요구된다. 현재 critical plasma properties를 제어하기 위해 다양한 plasma etching 방법이 연구 되어왔다. 이 중 plasma를 낮은 kHz의 frequency에서 on/off 하는 pulsed plasma etching technique은 nanoscale semiconductor material의 etch 특성을 효과적으로 향상 시킬 수 있다. 따라서 본 실험에서는 dual-frequency capacitive coupled plasma (DF-CCP)을 사용하여 plasma operation 동안 duty ratio와 pulse frequency와 같은 pulse parameters를 적용하여 plasma의 특성을 각각 제어함으로써 etch selectivity와 uniformity를 향상 시키고자 하였다. Selective SiO2 contact etching을 위해 top electrode에는 60 MHz pulsed RF source power를, bottom electrode에는 2MHz pulse plasma를 인가하여 synchronously pulsed dual-frequency capacitive coupled plasma (DF-CCP)에서의 plasma 특성과 dual pulsed plasma의 sync. pulsing duty ratio의 영향에 따른 etching 특성 등을 연구 진행하였다. 또한 emissive probe를 통해 전자온도, OES를 통한 radical 분석으로 critical Plasma properties를 분석하였고 SEM을 통한 etch 특성분석과 XPS를 통한 표면분석도 함께 진행하였다. 그 결과 60%의 source duty percentage와 50%의 bias duty percentage에서 가장 향상된 etch 특성을 얻을 수 있었다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.18 no.5
• /
• pp.389-395
• /
• 2005

The etching technology of the high aspect ratio contact(HARC) is necessary at the critical contact processes of semiconductor devices. Etching the $SiO_{2}$ contact hole with the sub-micron design rule in manufacturing VLSI devices, the unexpected phenomenon of 'profile tilting' or 'bottom distortion' is often observed. This makes a short circuit between neighboring contact holes, which causes to drop seriously the device yield. As the aspect ratio of contact holes increases, the high C/F ratio gases, $C_{4}F_{6}$, $C_{4}F_{8}$ and $C_{5}F_{8}$, become widely used in order to minimize the mask layer loss during the etching process. These gases provide abundant fluorocarbon polymer as well as high selectivity to the mask layer, and the polymer with high sticking yield accumulates at the top-wall of the contact hole. During the etch process, many electrons are accumulated around the asymmetric hole mouth to distort the electric field, and this distorts the ion trajectory arriving at the hole bottom. These ions with the distorted trajectory induce the deformation of the hole bottom, which is called 'profile tilting' or 'bottom distortion'. To prevent this phenomenon, three methods are suggested here. 1) Using lower C/F ratio gases, $CF_{4}$ or $C_{3}F_{8}$, the amount of the Polymer at the hole mouth is reduced to minimize the asymmetry of the hole top. 2) The number of the neighboring holes with equal distance is maximized to get the more symmetry of the oxygen distribution around the hole. 3) The dual frequency plasma source is used to release the excessive charge build-up at the hole mouth. From the suggested methods, we have obtained the nearly circular hole bottom, which Implies that the ion trajectory Incident on the hole bottom is symmetry.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2013.08a
• /
• pp.230-230
• /
• 2013

플라즈마를 활용한 미세 패턴의 건식 식각은 반도체 소자 공정에 있어서 가장 중요한 기술 중 하나이다. 한편, 매년 발행되는 ITRS Roadmap 에 따르면 DRAM 의 1/2 pitch 는 감소하는 동시에 Contact A/R (Aspect Ratio) 는 증가하고 있다. 이러한 추세 속에서 기존의 공정을 그대로 활용할 경우 식각물의 프로파일 왜곡 혹은 휨 현상이 발생하고 식각 속도가 저하되며 이러한 특성들이 결과적으로는 생산성의 저하로 이어질 수 있다. 이러한 현상을 최소화하기 위해서는 무엇보다 독립된 plasma parameter 들이 식각물의 프로파일 혹은 식각 속도 등에 어떠한 영향을 주는 지에 대한 학문적 이해가 필요하다. 본 논문에서는 최소 CD (Critical Dimenstion) 100nm, 최대 A/R 30 인 HARC (High Aspect Ration Contact hole) 의 식각 특성이 plasma parameter 에 따라 어떻게 변하는지 확인해 보고자 한다. 산화물의 식각은 대표적인 high density plasma source 중의 하나인 ICP에서 진행하였으며 기존에 알려진 plasma parameter 에 더하여 자장의 인가가 산화물의 식각 특성에 어떠한 영향을 주는지 살펴보고자 전자석을 ICP 에 추가로 설치하여 실험을 진행하였다. 결과적으로, plasma parameter 에 따른 혹은 자장의 세기 변화에 따른 산화물의 식각 실험을 플라즈마 진단 실험과 병행하여 진행함으로써 다양한 인자에 따른 산화물의 식각 메커니즘을 정확하게 이해하고자 하였다. 실험 내용을 요약하면 다음과 같다. 먼저, 전자석의 전류 인가 조건에 따라 축 방향 혹은 반경 방향으로의 자장의 분포가 달라질 수 있음을 확인하였고 플라즈마 진단 결과 축 방향 혹은 반경 방향으로의 자장이 증가하였을 때 고밀도의 플라즈마가 형성될 수 있음은 물론 반경 방향으로의 플라즈마 밀도의 균일도가 향상됨을 확인할 수 있었다. 또한 ICP 조건에서 바이어스 주파수, 압력, 바이어스 파워, 소스 파워, 가스 유량 등의 plasma parameter 가 산화물의 식각 특성에 미치는 영향 및 메커니즘을 규명하였고 이 과정을 통해 최적화된 프로파일을 바탕으로 축 방향 혹은 반경 방향으로 증가하는 자장을 인가하였을 때 (M-ICP 혹은 자화 유도 결합 플라즈마) ICP 대비 산화물의 식각 속도가 증가함은 물론 PR-to-oxide 의 선택비가 개선될 수 있음을 확인할 수 있었다. 자장의 인가에 따른 산화물의 정확한 식각 메커니즘은 향후의 실험 진행을 통해 이해하고 이를 통해 궁극적으로는 산화물의 식각 공정이 나아가야 할 올바른 방향을 제시하고자 한다.

• Journal of Life Science
• /
• v.24 no.12
• /
• pp.1276-1283
• /
• 2014

Cell adhesion molecules determine the cell-cell binding and the interactions between cells and extracellular signals. Cell-cell junctional complexes, which maintain the structural integrity of tissues, consist of more than 50 proteins including multi-PDZ domain protein 1 (MUPP1). MUPP1 contains 13 postsynaptic density-95/disks large/zonula occludens-1 (PDZ) domains and serves a scaffolding function for transmembrane proteins and cytoskeletal proteins or signaling proteins, but the mechanism how MUPP1 links and stabilizes the juxtamembrane proteins has not yet been elucidated. We used the yeast two-hybrid system to identify proteins that interact with PDZ domains of MUPP1. We found an interaction between MUPP1 and cell adhesion molecule 1 (Cadm1, also known as SynCAM1, Necl-2, or TSLC1). Cadm1 bound to the second PDZ domain of MUPP1. The carboxyl (C)-terminal end of Cadm1 has a type II PDZ-association motif (-Y-F-I) which was essential for the interaction with MUPP1 in the yeast two-hybrid assay. MUPP1 also bound to the C-terminal cytoplasmic tail region of other Cadm family members (Cadm2, Cadm3, and Cadm4). In addition, these protein-protein interactions were observed in the glutathione S-transferase (GST) pull-down assay and by co-immunoprecipitation. Anti-MUPP1 antibody co-immunoprecipitated Cadm1 and Cadm4 with MUPP1 from mouse brain extracts. These results suggest that MUPP1 could mediate interaction between Cadms and cytoskeletal proteins.

• Journal of Life Science
• /
• v.25 no.5
• /
• pp.594-600
• /
• 2015

Protein-protein interactions have a critical role in the regulation of many cellular functions. Postsynaptic density-95/disks large/zonula occludens-1 (PDZ) domain is one of domains that mediate protein-protein interactions. PDZ domains typically bind to the specific motif at the carboxyl (C)-terminal end of partner proteins. Multi-PDZ domain protein 1 (MUPP1), which has 13 PDZ domains, serves a scaffolding function for structure proteins and signaling proteins, but the cellular function of MUPP1 has not been fully elucidated. We used the yeast two-hybrid system to identify proteins that interact with PDZ domains of MUPP1. We found an interaction between MUPP1 and muskelin. Muskelin was recently identified as a GABA_A receptor (GABA_AR) α1 subunit binding protein and known to have a role in receptor endocytosis and degradation. Muskelin bound to the 3^rd PDZ domain, but not to other PDZ domains of MUPP1. The C-terminal end of muskelin was essential for the interaction with MUPP1 in the yeast two-hybrid assay. When co-expressed in HEK-293T cells, muskelin but not the C-terminal deleted muskelin was co-immunoprecipitated with MUPP1. In addition, MUPP1 co-localized with muskelin at the same subcellular region in cells. These findings collectively suggest that MUPP1 or its interacting proteins could modulate GABA_AR trafficking and turnover through the interaction with muskelin.

• Journal of Life Science
• /
• v.24 no.8
• /
• pp.820-826
• /
• 2014

The localization to specific subcellular sites and the regulation of cell surface receptors and channels are crucial for proper functioning. Postsynaptic density-95/Disks large/Zonula occludens-1 (PDZ)-domain is involved in recognition of and interaction between various proteins, by which the localization and the regulation are mediated. Multi-PDZ domain protein 1 (MUPP1) contains 13 PDZ domains. MUPP1 serves a scaffolding function for structure proteins and signaling proteins, but the mechanism how MUPP1 is stabilized and signalized has not yet been elucidated. We used the yeast two-hybrid system to identify proteins that interact with PDZ domains of MUPP1. We found an interaction between MUPP1 and Parkin. Parkin is an E3 ubiquitin ligase. Loss-of-function mutations of Parkin gene are known to cause an autosomal recessive juvenile parkinsonism. Parkin bound to the $12^{th}$ PDZ domain, but not to other PDZ domains of MUPP1. The C-terminal end of Parkin has a type II PDZ-association motif, which was essential for the interaction with MUPP1 in the yeast two-hybrid assay. When co-expressed in HEK-293T cells, Parkin co-localized with MUPP1. When co-expressed with ubiquitin in HEK-293T cells, MUPP1 has been strongly ubiquitinated by Parkin. These findings collectively suggest that MUPP1 is a novel substrate of Parkin and its function or stability could be modulated by Parkin-mediated ubiquitination.

• Journal of the Korea Institute of Information and Communication Engineering
• /
• v.23 no.12
• /
• pp.1738-1741
• /
• 2019

Music performance techniques have been primarily trained by apprenticeship. The technique transfer, which relies on the imitation of experience and actual performance without scientific evidence, required the pianists more time and effort than necessary. However, if the players in the field discover the principles of universally applicable piano playing techniques in collaboration with scientists, they will avoid errors and prepare a new paradigm in the development of piano playing techniques. This is why music performance science is needed. Little has been studied about it in Korea, but it has been activated abroad since the mid-1990s. The core science of music performance science is expected to be computer science fitting data analysis. In this paper, we introduce music performance science for the pianist and present how computer can help it.