Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Research Trend of High Aspect Ratio Contact Etching used in Semiconductor Memory Device Manufacturing

반도체 메모리 소자 제조에서 High Aspect Ratio Contact 식각 연구 동향

  • Hyun-Woo Tak (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Myeong-Ho Park (SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University) ;
  • Jun-Soo Lee (Department of Photovoltaic System Engineering, Sungkyunkwan University) ;
  • Chan-Hyuk Choi (SKKU Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University) ;
  • Bong-Sun Kim (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Jun-Ki Jang (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Eun-Koo Kim (Department of Semiconductor and Display Engineering, Sungkyunkwan University) ;
  • Dong-Woo Kim (School of Advanced Materials Science and Engineering, Sungkyunkwan University) ;
  • Geun-Young Yeom (School of Advanced Materials Science and Engineering, Sungkyunkwan University)
  • 탁현우 (성균관대학교 신소재공학과) ;
  • 박명호 (성균관대학교 나노과학기술학과) ;
  • 이준수 (성균관대학교 태양광시스템공학협동과정) ;
  • 최찬혁 (성균관대학교 나노과학기술학과) ;
  • 김봉선 (성균관대학교 신소재공학과) ;
  • 장준기 (성균관대학교 신소재공학과) ;
  • 김은구 (성균관대학교 반도체디스플레이공학과) ;
  • 김동우 (성균관대학교 신소재공학과) ;
  • 염근영 (성균관대학교 신소재공학과)
  • Received : 2024.04.22
  • Accepted : 2024.05.16
  • Published : 2024.06.30
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Abstract

In semiconductor memory device manufacturing, the capability for high aspect ratio contact (HARC) etching determines the density of memory device. Given that there is no standardized definition of "high" in high aspect ratio, it is crucial to continuously monitor recent technology trends to address technological gaps. Not only semiconductor memory manufacturing companies such as Samsung Electronics, SK Hynix, and Micron but also semiconductor manufacturing equipment companies such as Lam Research, Applied Materials, Tokyo Electron, and SEMES release annual reports on HARC etching technology. Although there is a gap in technological focus between semiconductor mass production environments and various research institutes, the results from these institutes significantly contribute by demonstrating fundamental mechanisms with empirical evidence, often in collaboration with industry researchers. This paper reviews recent studies on HARC etching and the study of dielectric etching in various technologies.

Keywords

References

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