• Journal of the Korean Electrochemical Society
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• v.5 no.3
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• pp.131-142
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• 2002

The Langmuir adsorption isotherms of the under-potentially deposited hydrogen (UPD H) and the over-potentially deposited hydrogen (OPD H) at the poly-Pt/0.5M $H_2SO_4$ and 0.5 M LiOH aqueous electrolyte interfaces have been studied using cyclic voltammetric and ac impedance techniques. The behavior of the phase shift $(0^{\circ}{\leq}{-\phi}{\leq}90^{\circ})$ for the optimum intermediate frequency corresponds well to that of the fractional surface coverage $(1{\geq}{\theta}{\geq}0)$ at the interfaces. The phase-shift method, i.e., the phase-shift profile $({-\phi}\;vs.\;E)$ for the optimum intermediate frequency, can be used as a new electrochemical method to determine the Langmuir adsorption isotherms $({\theta}\;vs.\;E)$ of the UPD H and the OPD H for the cathodic $H_2$ evolution reactions at the interfaces. At the poly-Pt/0.5M $H_2SO_4$ aqueous electrolyte interface, the equilibrium constant (K) and the standard free energy $({\Delta}G_{ads})$ of the OPD H are $2.1\times10^{-4}$ and 21.0kJ/mol, respectively. At the poly-Pt/0.5M LiOH aqueous electrolyte interface, K transits from 2.7(UPD H) to $6.2\times10^{-6}$ (OPD H) depending on the cathode potential (E) and vice versa. Similarly, ${\Delta}G_{ads}$ transits from -2.5kJ/mol (UPD H) to 29.7kJ/mol (OPD H) depending on I and vice versa. The transition of K and ${\Delta}G_{ads}$ is attributed to the two distinct adsorption sites of the UPD H and the OPD H on the poly-Pt surface. The UPD H and the OPD H on the poly-Pt surface are the independent processes depending on the H adsorption sites themselves rather than the sequential processes for the cathodic $H_2$ evolution reactions. The criterion of the UPD H and the OPD H is the H adsorption sites and processes rather than the $H_2$ evolution reactions and potentials. The poly-Pt wire electrode is more efficient and useful than the Pt(100) disc electrode for the cathodic $H_2$ evolution reactions in the aqueous electrolytes. The phase-shift method is well complementary to the thermodynamic method rather than conflicting.

• Phonetics and Speech Sciences
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• v.10 no.4
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• pp.91-99
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• 2018

Korean stops are currently undergoing a tonogenetic sound change, as found in the Seoul dialect in which a merged VOT of aspirated and lax stops induces F0 to be the primary cue for distinguishing the two stops and the lax stops have lower F0 than the aspirated stops. In tonal languages, low tone is produced with a breathy voice. This study investigated whether there are changes in voice quality with respect to the tonogenetic sound change of Korean stops. Two age groups speaking the Seoul dialect participated in this study: five females and six males born in the 1940s and 1950s and nine females and eight males born in the 1980s and 1990s. This study replicated previous findings of VOT and F0 and further examined H1-H2, H1-A1, and H1-A2 to see how they correlate with the sound change. In the older and younger generations, H1-H2, H1-A1, and H1-A2 were significantly lower after the tense stops than after the aspirated and lax stops, but they were not significantly different after the aspirated and lax stops. However, the younger females exhibited some different results for H1-H2 and H1-A2 than the older generation. In the younger females, the H1-H2 mean was higher after the aspirated stops than it was after the lax stops at the vowel onset, and the H1-H2 difference increased at the vowel midpoint. Although there was an inter-speaker variation in the results of H1-H2 and H1-A1, analyses of individual speakers showed that the H1-H2 and H1-A1 were higher after the lax stops than after the aspirated stops in the younger female speakers. These results indicate that lax stops tend to be breathier than aspirated stops in the younger female speakers. They also indicate that changes in voice quality are on Korean stops with tonal sound change, but are still developing.

• Journal of the Korean Chemical Society
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• v.39 no.3
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• pp.198-203
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• 1995

The Mo(V) $di-\mu-oxo$ type $(Mo_2O_4(H_2O)_2L)$ complexes $(L:\;C_3H_7CH(SCH_2COOH)_2,\;C_6H_5CH(SCH_2COOH)_2,\;CH_3OC_6H_4CH(SCH_2COOH)_2,\;C_5H_{10}C(SCH_2COOH)_2,\;C_3H_7C(CH_3)(SCH_2COOH)_2,\;C_3H_7CH(SCH_2CH_2COOH)_2,\;C_6H_5CH(SCH_2CH_2COOH)_2)$ have been prepared by the reaction of $[Mo_2O_4(H_2O)_6]^{2+}$ with a series of dithiodicarboxy ligands. These complexes are completed by two terminal oxygens arranged trans to one another and each ligand forms a chelate type between two molybdenum. In $Mo_2O_4(H_2O)_2L$, two $H_2O$ coordinated at trans site of terminal oxygens. The prepared complexes have been characterized by elemental analysis, infrared spectra, electronic spectra, and nuclear magnetic resonance spectra. In the potential range -0.00 V to -1.00 V at a scan rate of 20 $mVs^{-1}$, a cathodic peak at -0.50∼-0.58 V (vs. SCE) and an anodic peak at -0.40∼-0.43 V (vs. SCE) have been observed in aquous solution. The ratio of the cathodic to anodic current ($I_{pc}/I_{pa}$) is almost 1, we infer that redox is reversible reaction.

• Analytical Science and Technology
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• v.18 no.2
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• pp.112-119
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• 2005

This study reports on the efficiency of cleaning enameled magnet wire using a sulfuric acid $H_2SO_4$ and removal of dissolved organic material using hydrogen peroxide $H_2O_2$ and nitric acid $HNO_3$ at $80^{\circ}C$. The method involves the addition of pure $H_2SO_4$ and $H_2O_2$ or $HNO_3$. Layers of enameled organic material were dissolved by 90% $H_2SO_4$ and the solution was maintained as 35% $H_2O_2$ or 60% $HNO_3$. $H_2O_2$ content in aqueous $H_2O_2$ was maintained as 8.8 : 1.0. An initial concentration of $H_2SO_4$ in dissolution conditions was accomplished within 15 min, with a stripping time of about 2 h. The concentrations of $H_2O_2$ and $HNO_3$ in the processing bath were relatively low, but sufficient enough to produce an effective amount of power in the bath for the removal of the enamel material. The cleaning effect of enameled organic material involves the dehydration by $H_2SO_4$ and the oxidation by $H_2O_2$ or $HNO_3$.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.14 no.4
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• pp.135-139
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• 2004

The layered organic-inorganic hybrid compounds($C_6H_5CH_2NH_3)_2CuCl_4$ and ($NH_3C_6/H_4C_2H_4_6/H_4NH_3)CuCl_4$ have been directly synthesized. From the X-ray diffraction data and the organic guest size, the orientation of the intercalated organic amine was determined. The inorganic sheets consist of $CuCl_4^{2-}$layers of comer-sharing octahedra copper chloride. The protonated organic amine was intercalated into the $CuCl_4^{2-}$layers with bilayer structure for ($C_6H_5CH_2NH_3)_2CuCl_4$ and monolayer structure for ($NH_3C_6/H_4C_2H_4_6/H_4NH_3)CuCl_4$.

• Applied Chemistry for Engineering
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• v.18 no.6
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• pp.552-556
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• 2007

In this study, noble metals (Pd, Ru, Ir) were supported to $TiO_2$ catalyst. In order to distribute metals uniformly, $H_2O-H_2$ pretreatment technique was used. Xylene, toluene, and MEK were used as reactants. The monometallic or bimetallic catalysts were prepared by the excess wetness impregnation method and were characterized by XRD, and XPS analysis. Pd-Ru, Pd-Ir bimetallic catalysts had multipoint active sites which improved the range of Pd metal state. Bimetallic catalysts had a higher conversion of VOCs than that of monometallic one. The effect of $H_2O-H_2$ pretreatment technique was the enhancement of uniform distribution of Pd particles and promotion of catalytic efficiency. In this study, addition of Ru and Ir metals to Pd promoted oxidation conversion of VOCs. In addition, $H_2O-H_2$ pretreatment promoted removal efficiency of VOCs on the $TiO_2$ support.

• Korean Journal of Mathematics
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• v.31 no.3
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• pp.363-372
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• 2023

In this paper, we consider two functional equations: (1) h(𝓕(x, y, z) + 2x + y + z) + h(xy + z) + yh(x) + yh(z) = h(𝓕(x, y, z) + 2x + y) + h(xy) + yh(x + z) + 2h(z), (2) h(𝓕(x, y, z) - y + z + 2e) + 2h(x + y) + h(xy + z) + yh(x) + yh(z) = h(𝓕(x, y, z) - y + 2e) + 2h(x + y + z) + h(xy) + yh(x + z), without any regularity assumption for all x, y, z in a unital algebra A, where 𝓕 : A³ → A is defined by 𝓕(x, y, z) := h(x + y + z) - h(x + y) - h(z) for all x, y, z ∈ A. Also, we find general solutions of these equations in unital algebras. Finally, we prove the Hyers-Ulam stability of (1) and (2) in unital Banach algebras.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.312-312
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• 2011

In SiH4/H2 discharge for growth process of hydrogenated amorphous silicon (a-Si:H), silane polymers, produced by SiH2 + Sin-1H2n ${\rightarrow}$ SinH2n+2, have no reactivity on the film-growing surface. However, under the SiH2 rich condition, high silane reactive species (HSRS) can be produced by electron collision to silane polymers. HSRS, having relatively strong reactivity on the surface, can react with dangling bond and form Si-H2 networks which have a close correlation with photo-induced degradation of a-Si:H thin film solar cell [1]. To find contributions of suggested several external plasma conditions (pressure, frequency and ratio of mixture gas) [2,3] to suppressing productions of HSRS, some plasma characteristics are studied by numerical methods. For this study, a zero-dimensional global model for SiH4/H2 discharge and a one-dimensional particle-in-cell Monte-Carlo-collision model (PIC-MCC) for pure SiH4 discharge have been developed. Densities of important reactive species of SiH4/H2 discharge are observed by means of the global model, dealing 30 species and 136 reactions, and electron energy probability functions (EEPFs) of pure SiH4 discharge are obtained from the PIC-MCC model, containing 5 charged species and 15 reactions. Using global model, SiH2/SiH3 values were calculated when pressure and driving frequency vary from 0.1 Torr to 10 Torr, from 13.56 MHz to 60 MHz respectively and when the portion of hydrogen changes. Due to the limitation of global model, frequency effects can be explained by PIC-MCC model. Through PIC-MCC model for pure SiH4, EEPFs are obtained in the specific range responsible for forming SiH2 and SiH3: from 8.75 eV to 9.47 eV [4]. Through densities of reactive species and EEPFs, polymerization reactions and production of HSRS are discussed.

• Bulletin of the Korean Chemical Society
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• v.8 no.2
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• pp.96-101
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• 1987

2-Ethoxy-6-methoxy-5-cyano-3,4-dihydro-2H-pyran (1_a$), 2-n-butoxy-6-methoxy-5-cyano-3,4-dihydro-2H-pyr an (1b), 2-isobutoxy-6-methoxy-5-cyano-3,4-dihydro-2H-py ran ($1_c$), and 2-ethoxy-6-methoxy-3-methyl-5-cyano-3,4-dihydro -2H-pyran ($1_d$) were prepared by (4 + 2) cycloaddition reaction of methyl $\alpha$-cyanoacrylate with the corresponding alkyl vinyl ethers. Compounds $1_{a-d}$ were ring-open polymerized by cationic catalyst to obtain alternating head-to-head (H-H) copolymers. For comparison, head-to-tail (H-T) copolymer $3_a$ was also prepared by free radical copolymerization of the corresponding monomers. The H-H copolymer exhibited minor differences in its $1_H% NMR and IR spectra, but in the $^{13}C$ NMR spectra significant differences were observed between the H-H and H-T copolymers. Glass transition temperature ($T_g$) of H-H copolymer was higher than that of the H-T copolymer, but thermal decomposition temperature of the H-H copolymer was lower than that of the H-T copolymer. Compounds $1_a$, $a_b$, and $1_c$, copolymerized well with styrene by cationic catalyst, but compound 1d failed to copolymerize with styrene. All of the H-H and H-T copolymers were soluble in common solvents and the inherent viscosities were in the range 0.2-0.4 dl/g.

• Korean Journal of Metals and Materials
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• v.50 no.8
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• pp.569-573
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• 2012

In order to understand the difference in SiC deposition between the $CH_3SiCl_3-H_2$ and $C_3H_8-SiCl_4-H_2$ systems, we calculate the phase stability among ${\beta}$-SiC, graphite and silicon. We constructed the phase-diagram of ${\beta}$-SiC over graphite and silicon via computational thermodynamic calculation considering pressure (P), temperature (T) and gas composition (C) as variables. Both P-T-C diagrams showed a very steep phase boundary between the SiC+C and SiC region perpendicular to the H/Si axis, and also showed an SiC+Si region with a H/Si value of up to 6700 in the $C_3H_8-SiCl_4-H_2$, and 5000 in the $CH_3SiCl_3-H_2$ system. This difference in phase boundaries is explained by the ratio of Cl to Si, which is 4 for the $C_3H_8-SiCl_4-H_2$ system and 3 for the $C_3H_8-SiCl_4-H_2$ system. Because the C/Si ratio is fixed at 1 in the $CH_3SiCl_3-H_2$ system while it can be variable in the $C_3H_8-SiCl_4-H_2$ system, the functionally graded material is applicable for better mechanical bonding during SiC coating on graphite substrate in the $C_3H_8-SiCl_4-H_2$ system.