• The Transactions of The Korean Institute of Electrical Engineers
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• v.58 no.8
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• pp.1566-1571
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• 2009

The discharge electrodes in ac PDP are coated with dielectric layer, and transparent MgO thin films are deposited on the dielectric layer. The main role of the MgO thin films in ac PDP is to protect the dielectric layer from sputtering by ion bombardment in the glow-discharge plasma. An additional important role of the MgO thin film is the high secondary electron emission coefficient which leads the low firing voltage and low cost of the PDP. In this paper, we investigated the relations of the crystal orientation about deposition thickness, deposition rate, temperature of substrate, and distance between the MgO tablet and the substrate. Additionally, we investigated the discharge characteristics of the AC PDP using nano-powder MgO tablet

• The Transactions of the Korean Institute of Electrical Engineers
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• v.36 no.1
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• pp.29-35
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• 1987

TPolystyrene thin films are prepared by glow discharge of sytrene monomer vapor th establish the growth mechanism of organic thin films by the plasma polymerization. As the discharge parameters, discharge current(5mA-20mA), frequency (10kHz-50kHz, 13.56MHz), gaspressure (0.2torr-1.5torr), and discharge time(2min-12min)are adopted. Plasma-polymerized filmsof styrene vapor are identified as polystyrene by IR spectra. The thickness of plasma-polymerized films increases with gas pressure, frequency and discharge current in the region of the low frequency and below the allowed gas pressure where the polymerization occurs. It is suggested that the growth mechanism can be explained by ionic reaction in d.c. and low frequency region, and by radical reaction in high frequency region.

• Proceedings of the Korean Society of Dyers and Finishers Conference
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• 2001.04a
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• pp.66-68
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• 2001

• Journal of the Korean Society of Safety
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• v.29 no.6
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• pp.49-54
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• 2014

Electrostatic eliminators are essential in various areas of manufacturing industries to protect electrostatic hazards and to reduce inferior products. For ion sources used in the charge neutralizers, there are corona discharge, soft X-ray, and ultraviolet and glow discharge. Among them, corona discharge is generally used, because the corona discharge can easily and economically produce positive and negative ions including electrons in air at atmospheric pressure. But it is necessary to equip explosion-protection electrostatic eliminators wherever hazardous atmosphere. The electrostatic eliminators and their testing method of explosion-protection type have been developed in this research. The contents and scope of the research as follows; developing the type 'Ex s IIB T4' electrostatic eliminator of explosion-protection; developing the type 'Ex s d IIB T4' electrostatic eliminator of explosion-protection; developing the explosion-protection performance testing method of electrostatic eliminator for using AC power source.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.836-837
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• 2005

In order to enhance discharge efficiency of Plasma Display Panel (PDP), we used an electride as electron emission layer for PDP during PDP discharge process. As the electride used in this study, $12CaO7Al_2O_3$, has low work function, it is expected to yield high electron emission during glow discharge process. $12CaO7Al_2O_3$ powder was synthesized from $CaCO_3$ and $Al(OH)_3$ powder and Ca treated for realization of electride characteristics. The $12CaO7Al_2O_3$ powder was coated on the surface of dielectric layer of PDP and discharge characteristics of electride material were evaluated.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.61 no.12
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• pp.1880-1885
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• 2012

Nonlinear dynamical behaviors in thermionic low pressure discharge are investigated using a particle-in-cell(PIC) simulation. An electrostatic PIC code is developed to model the plasma discharge system including the kinetic effects. The elastic collision, excitation collision, ionization collision, and electron-ion recombination collision are considered in this code. The generated electrons and ions are traced to analyze physical characteristics of the plasma. The simulation results show that the nonlinear oscillation structures are observed for cold plasma in the system and the similar structures are observed for warm plasma with a shift in values of the bifurcation parameter. The detailed oscillation process can be subdivided into three distinct mode; anode-glow, temperature-limited, and double-layer modes.

• Transactions on Electrical and Electronic Materials
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• v.10 no.6
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• pp.212-216
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• 2009

The spatial distribution of the optogalvanic (OG) signal in argon at the 801.489 nm ($1s_5-2p_8$ transition at the metastable level in Paschen notation) was investigated in the radial direction of a hollow cathode discharge tube. The results of this experiment showed that the OG signal amplitude decreases in accordance with the following two conditions; first, the level of discharge current and second, the distance from the cathode dark space. These results can be quantified by analyzing the electron density profile along the discharge regions, which can directly influence the collisional ionization induced by electron impact.

• Analytical Science and Technology
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• v.12 no.4
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• pp.299-305
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• 1999

The electrolyte cathode atomic glow discharge (ELCAD) is a new plasma source for direct determination of trace heavy metals in drinking and waste water. ELCAD has been successfully developed for on-line monitoring of heavy metals, however, shows difficulty to measure mercury. In this study, ELCAD has been modified to apply the atomic absorption spectrometry (AAS) for the direct determination of trace elements of mercury in flowing water.The fundamental characteristics of this new types of plasma source have been investigated and found that the pH of the solution, discharge voltage, and current are most important factors.The absorbance of 1.0 ppm Hg standard solution increases as pH of the solution increases from pH 1.0 to 3.0.However, % RSD of the absorbance also increases as the pH of solution increasesdue to plasma unstability.The detection limits of the standard solution of pH 1.5 and pH 3.0 are about 40 ppb and 10 ppb level, respectively.

• Bulletin of the Korean Chemical Society
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• v.13 no.6
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• pp.620-624
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• 1992

The analytical performance of glow discharge mass spectrometer (GD-MS), using a flat type ion source is discussed. The efficiency of ion extraction was maximized at the distance between anode and cathode of 6 mm. At the operation condition of 4 mA, -1000 volt, and 1 mbar for the source, the optimum voltages for sampler and skimmer were40 volt and -280 volt, respectively. The intensities of Cu, Zn, and Mn were increased as a function of square root of current approximately. Korea standard reference materials (KSRM) were tested for an application study. The detection limits of most elements were obtained in the range of several ppm at the optimized operating condition. The peaks of aluminum and chromium were interfered by those of residual gases. The depth profile of nickel coated copper specimens (3, 5, 10 ${\mu}m$ thickness) were obtained by plotting time versus intensities of Ni and Cr after checking the thickness of nickel coated using a scanning electron microscope (SEM). At this moment, the sputtering rate of 0.2 ${\mu}m/min$ at the optimum operating condition was determined from the slope of the plot of time to the coating thickness. The roughness spectra of specimen's crater after 16 min, discharge were obtained using a Talysuf5m-120 roughness tester as well.

• Proceedings of the KIEE Conference
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• 1999.11d
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• pp.1096-1098
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• 1999

The performance of as plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the optimum preparation conditions of MgO Protecting layer by RF unbalanced magnetron sputtering(UBMS) in surface discharge type AC PDP. The samples prepared with the do bias voltage of -10V showed lower discharge voltage, lower erosion rate as a consequence of ion bombardment, higher optic transparency and higher crack resistance in annealing process than those samples prepared by conventional magnetron sputtering or E-beam eraporation.