• 분석과학
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• 제8권1호
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• pp.69-77
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• 1995

원자흡수용 gas-jet assisted RF 글로우 방전시스템을 제작하고 시료손실량과 원자흡광도에 미치는 실험변수들에 관한 연구를 수행하였다. 시료손실량과 흡광도는 방전전력, 압력 및 가스흐름에 큰 영향을 받았다. 원자흡광도와 시료손실량을 가스흐름이 600ml/min로 증가할 때 까지 계속 증가하였으며, 방전 압력은 3mbar에서 최대 흡광도를 나타내었다. 방전전력이 증가할수록 시료손실량과 흡광도는 증가하였으나 시스템의 안정도에 영향을 미치는 관계로 적당한 값의 선택이 필요하였다. 스테인리스 스틸 시료 중의 Ni과 황동시료 중의 Cr의 검량선을 작성한 결과 양호한 직선성이 얻어졌다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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• pp.1161-1164
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• 2005

A Mercury-free, flat light source which shows high luminance and luminous efficiency simultaneously has been developed. An electrodeless, dielectric barrier discharge is used to generate the plasma using Ne-Xe mixture gas of relatively low gas pressure of a few tens torr in a 4.1 inch diagonal size of flat panel. The basic properties of the long gap glow discharge and its accompanying instabilities, which prevents us from having high luminous efficiency discharge have been analyzed. A new structure and optimized driving methods have been used to generate a glow discharge which shows a wide voltage margin of a few hundred volts. The luminous efficiency and luminance could be 110 lm/W at $1300\;cd/m^2$ and 50 lm/W at $5500\;cd/m^2$.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1996년도 하계학술대회 논문집 C
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• pp.1838-1840
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• 1996

In order to study the relationship between the physical properties of glow discharge plasma and the physical behavior of TiN thin film, electrical characteristics of RF discharge plasma driven at 13.56MHz in a parallel-plate electrode system were measured. Plasma parameters, such as electron density and temperature, are also studied since they may be considered as one of the very important factors deciding the physical properties of TiN thin film under given conditions of applied biasd voltage and pressure. The TiN thin film were fabricated over a wide range of discharge conditions, and some of the general relationships between the measured plasma parameters and the properties of TiN thin film were discussed.

• 한국전기전자재료학회논문지
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• 제16권10호
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• pp.902-907
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• 2003

In this paper, the ITO thin film, which is considered as one of the most currently used material for the high performance transparent conducting films for the PDP cell, was made in a parallel-plate, capacitively coupled DC magnetron sputtering system. Some electrical and optical properties of ITO films were investigated and discussed on the basis of glow discharge characteristics. The optimized thin film fabricating conditions of Ar gas pressure and substrate temperature were derived from the Paschen curve and glow discharge characteristics. The maximum transmittance of 89.61 % in the visible region and optical band gap of 3.89 eV and resistivity of 1.67${\times}$10$\^$-3/ $\Omega$-cm were obtained under the conditions of 300 C of substrate temperature and 10∼15 mtorr of pressure, which corresponds nearly to that of Paschen minimum.

• Journal of Korean Society for Atmospheric Environment
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• 제21권E2호
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• pp.57-65
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• 2005

An experimental study was performed on the decomposition of gaseous ammonia and two selected volatile organic compounds (VOCs: toluene and acetone) in a combined nonthermal plasma reactor with corona and glow discharges. A lab pilot scale reactor (206 liter) equipped with a high electric power pack was used to determine the decomposition efficiency in relation with the inlet concentration and applied voltage. Three different types of discharging electrode such as wired rack, wire strings for corona discharge, and thin plate for glow discharge were put in order in the reactor. While decomposition of ammonia decreased with an increase in the initial concentration, acetone showed an opposite result. In the case of toluene however no explicit tendency was found in toluene and aceton. Negative discharge resulted in high decomposition efficiency than the positive one for all gases. A better removal of gas phase element could be achieved when fume dust were present simultaneously.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
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• pp.101-102
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• 2000

The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the de bias voltage of -10V showed lower discharge voltage, lower erosion rate by ion bombardment, higher optic transparency and higher crack resistance in annealing process than those samples prepared by conventional magnetron sputtering or E-beam evaporation.

• 한국전기전자재료학회논문지
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• 제14권8호
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• pp.622-628
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• 2001

We developed 1- and 2-dimensional fluid model for the analysis of a capacitively coupled Ar RF(Radio Frequency) glow discharge. This discharge is in pure Ar gas at the pressure 100[mTorr], frequency 13.56[MHz] and voltage amplitude 120[V}. This model is based on the equations of continuity and electron energy conservation coupled with Poison equation. 2-dimensional model is simulated on the condition of GEC(Gaseous Electronic Conference cell). The geometry of the discharge chamber and the electrodes used in the model is cylindrically simmetric; tow cylinders for the electrodes are surrounded by the grounded chamber. It is shown that 1-dimensional model is very useful on the understanding of RF glow discharge property and of the movement of charged particles. 2-dimensional model predicts off-axis maximum structure as in the experiments and has the results in qualitatively and quantitatively good agreement with the experiments. Effects of dc self-bias voltage, guard ring and reactor geometry is discussed.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제49권9호
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• pp.527-532
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• 2000

The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with dc bias voltage of -10V showed lower discharge voltage and lower erosion rate byion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardement during deposition process.

• 대한화학회지
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• 제38권3호
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• pp.214-220
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• 1994

금속시료를 직접분석하기 위하여 원자흡수법에 의한 글로우방전시스템을 구성하였다. 방전이 일어나는 양극과 음극은 가공성 세라믹을 이용한 arrestor에 의해 분리하였으며, 방전에 영향을 미치는 전류 및 전압, arrestor의 형태, 가스 압력 그리고 가스 흐름 등을 개인용 컴퓨터와 ADC/DAC board 및 RS-232를 사용하여 자동적으로 제어될 수 있도록 하였다. 여러가지 방전에 미치는 실험변수들을 변화시키면서 시료손실속도, 원자흡광도 등의 변화를 측정하였으며, sputtering 된 후의 시료 표면을 주사형 전자현미경으로 관찰하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2001년도 제21회 학술발표회 초록집
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• pp.164-164
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• 2001