• 한국정보과학회:학술대회논문집
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• 한국정보과학회 1999년도 가을 학술발표논문집 Vol.26 No.2 (2)
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• pp.24-26
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• 1999

본 논문에서는 용해로 이상감시를 위한 실시간 유리 용해로 운전 전문가시스템을 구축한 결과를 소개한다. 유리 용해 공정에서는 운전자의 경험지식에 의해 내부의 상황을 판단하게 되고, 이는 용해로 수명과 제품의 품질에 중요한 영향을 준다. 이를 전문가 시스템으로 구현하기 위하여, 먼저, 기존 운전자의 지식을 취합, 분석한다. 그 후, 취합된 각 지식들의 특성에 부합하도록 이진 룰(Crisp Rule)과 퍼지 룰(Fuzzy Rule)로 구분한다. 이 때, 선형 회귀분석을 통하여 퍼지 룰의 입력을 결정함으로써 보다 정확한 운전 지식의 표현이 가능하도록 하였다. 설계된 알고리즘은 젠심 (Gensym)사의 실시간 전문가 시스템 개발 툴인 G2를 사용하여 구현하였다. 제시된 퍼지 전문가 시스템은 삼성코닝(주) 수원사어장의 실제생산 용해 공정에 직접 적용하여 그 효율성이 검증되었다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.417-417
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• 2012

For desired optical properties of QDs, it is very important to reduce the presence of defects on their surfaces. Passivation of surface defects using larger band gap materials is the most effective way. Some groups successfully synthesized Cd based multi-shell structured quantum dots and improved its optical properties. However, its productivity has limit because of the amounts of glass ware and space. In this research, we try to synthesize Cd based multi-shell structured nanocrystal quantum dots to overcome demerits of conventional batch synthetic method. This reactor composed pump, SUS reaction part (3.2 mm stainless steel and furnace) and batch mixer. We successively synthesized CdSe/CdS/ZnS quantum dot at this reactor in one step.

• 한국세라믹학회지
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• 제16권4호
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• pp.237-242
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• 1979

In order to improve hydration reactivity of blast furnace slag, it's composition was changed by adding of CaO. The slags were quenched in water at 1,400℃. Hydration reactivityof modified slags was studied by x-ray diffractometer, conduction calorimeter and so on. Experimental results were summarized as follows. 1. Glass content and hydration reactivity of slag depend significantly on quenching temperature of the slag melt. To enhance the reactivity, slag melts which belongs to Frenkel-type liquid, must be quenched above 1,300℃. 2. Vitrification of slag melts was confirmed as CaO/SiO2 ratio increased up to 1.57 with flux, 1.51 without flux, also their hydration reactivity was improved.

• 한국산학기술학회:학술대회논문집
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• 한국산학기술학회 2009년도 추계학술발표논문집
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• pp.633-635
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• 2009

It is a quite quality concerning to control temperature of single crystalline growth as it does when you get most of heat treating products. It is also important factor to control temperature when you make the $Al_2O_3$(single crystalline) used to artificial jewels, glass of watches, heat resistant transparent glasses. Thus, it is a major interest to get the proper temperature in accordance with the time process while you are making mixture of oxygen and hydrogen to have the right temperature. In this paper, we will study of electrical valve positioning system for the gas mixture to improve the quality of products.

• Journal of Information Display
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• 제11권1호
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• pp.12-16
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• 2010

The effect of the crystallization and activated annealing of Si films using an excimer laser and the new CW blue laser are described and compared with furnace annealing for application in advanced TFTs and for future applications. Pulsed excimer laser annealing (ELA) is currently being used extensively as a low-temperature poly-silicon (LTPS) process on glass substrates as its efficiency is high in the ultra-violet (UV) region for thin Si films with thickness of 40-60 nm. ELA enables extremely low resistivity relating to high crystallinity for both the n- and p-type Si films. On the other hand, CW blue laser diode annealing (BLDA) enables the smooth Si surface to have arbitral crystal grains from micro-grains to an anisotropic huge grain structure only by controlling its power density. Both annealing techniques are expected to be applied in the future advanced TFT systems.

• 산업경영시스템학회지
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• 제35권2호
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• pp.106-112
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• 2012

Real-life time series characteristic data has significant amount of non-stationary components, especially periodic components in nature. Extracting such components has required many ad-hoc techniques with external parameters set by users in case-by-case manner. In our study, we evaluate whether Hilbert-Huang Transform, a new tool of time-series analysis can be used for effective analysis of such data. It is divided into two points : 1) how effective it is in finding periodic components, 2) whether we can use its results directly in detecting values outside control limits, for which a traditional method such as ARIMA had been used. We use glass furnace temperature data to illustrate the method.

• 한국결정성장학회지
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• 제18권3호
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• pp.115-121
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• 2008

제강분진(EAF dust, 이하 더스트) 50wt%와 핵 형성제를 함유한 규산염계 유리 시편을 열처리하여 결정화 시킨 후 미세구조를 관찰하였다. 제조된 유리의 DTA 분석결과 결정화온도($T_c$)는 $850^{\circ}C$ 부근이었으며 이로부터 열처리 조건을 $950^{\circ}C$/15 hr로 정하였다. 핵 형성제 $TiO_2$는 $Fe_2O_3$나 $Cr_2O_3$에 비해 기계적 특성 및 화학적 내구성이 willemite 결정보다 우수한 franklinite 결정상의 성장을 시키는 효과가 탁월하였다. $TiO_2$가 첨가된 일부 결정화 유리 시편에서 augite 결정상이 관찰되었으며, 첨가량이 증가할수록 willemite 결정상은 줄어들고 franklinite 결정상은 증가하였다. 특히 5wt% 첨가된 시편은 willemite 결정상이 나타나지 않았으며 $1{\sim}2\;{\mu}m$ 크기의 franklinite 결정상이 유리 모상내에 고르게 분포되어 있었다. 또한 $TiO_2$가 5wt% 첨가된 시편에 $Fe_2O_3$를 첨가하면 franklinite 결정상들이 더욱 성장하여 서로 합체됨으로서 수지상 모양의 결정상을 나타내었다.

• 한국산학기술학회논문지
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• 제6권6호
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• pp.468-472
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• 2005

유리병의 제조에 있어서 유리 융체가 금형 벽면에 부착하는 것을 방지하기 위하여 성형할 때마다 금형 내벽면을 윤활제로 도포하는 공정이 있다. 금형 벽면을 통기성이 있는 다공질 소결체로 제조하면 도포공정을 생략할 수 있다. 따라서 본 연구에서는 스테인리스 중에서 내열${\cdot}$내마모 특성이 가장 우수한 310L계 조대 분말($-150{\mu}m$) 및 420J2 계 미세 분말($40{\~}50{\mu}m$)을 사용, 유리 금형용 내벽면 재로서 가장 적합한 다공질 소결체(소결체의 밀도: $85{\~}90\%$)를 제작하기 위하여 성형압력, 소결 분위기, 소결온도 및 시간을 변화시켜 다음과 같은 결과를 얻었다. (1) 고상 소결로서는 입자 크기가 큰 310L분말을 가지고는 어느 경우에 있어서나, 목적하는 소결 밀도를 얻을 수 없었다. (2) $2ton/cm^2$의 성형압력으로 성형한 실형상 성형체를 양산용 진공($1300^{\circ}C$, 2시간) 소결로에서 소결한 결과, 소결체의 밀도는 $310L+0.03\%B$, 420J2, 420J2+(0.03, 0.06)$\%$B에서 각각 6.2(79$\%$), 6.6(86$\%$), 7.3(95$\%$), $7.6(99\%)g/cm^3$로 나타났다. 따라서, 420J2계 분말(저압성형) 및 310L+0.03$\%$B(고압성형)분말을 사용하여 진공 중 소결하면 목적하는 통기도를 가진 소결체를 제작할 수 있다는 것을 알았다.

• 한국세라믹학회지
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• 제53권4호
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• pp.386-392
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• 2016

Heat insulation plates of fumed silica were prepared by mixing fumed silica, SiC powder and chopped glass fiber by a high speed mixer followed by pressing of the mixture powder in a stainless steel mold of $100{\times}100mm$. Composition of the plates, particle size of SiC, and type of inorganic binder were varied for observation of their contribution to heat insulation of the plate. The plate was installed on the upper portion of an electric furnace the inside temperature of which was maintained at $400^{\circ}C$ and $600^{\circ}C$, for investigation of heat transfer through the plate from inside of the electric furnace to outside atmosphere. Surface temperatures were measured in real time using a thermographic camera. The particle size of SiC was varied in the range of $1.3{\sim}17.5{\mu}m$ and the insulation was found to be most excellent when SiC of $2.2{\mu}m$ was incorporated. When the size of SiC was smaller or larger than $2.2{\mu}m$, the heat insulation effect was decreased. Inorganic binders of alkali silicate and phosphate were tested and the phosphate was found to maintain the heat insulation property while increasing mechanical properties.

• 한국표면공학회지
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• 제40권3호
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• pp.117-124
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• 2007

The ITO films were deposited on glass substrates by RF-superimposed dc reactive magnetron sputtering and were annealed in $N_2$ vacuum furnace with temperatures in the range of $403K{\sim}573K$ for 30 minutes. Electrical, optical and structural properties of ITO films were examined with varying annealing temperatures from 403 K to 573 K. The resistivity of as-deposited ITO films was $5.4{\times}10^{-4}{\Omega}cm$ at the sputter conditions of applied RF/DC power of 200/200 W, $O_{2}$ flow of 0.2 seem and Ar flow of 0.2 seem. As a result of annealing in the temperature range of $403K{\sim}573K$, the crystallization occurred at 423 K that is lower than the crystallization temperature caused by a conventional sputtering method. And the resistivity decreased from $5.4{\times}10^{-4}{\Omega}cm\;to\;2.3{\times}10^{-4}{\Omega}cm$, the carrier concentration and mobility of ITO films increased from $4.9{\times}10^{20}/cm^3\;to\;6.4{\times}10^{20}/cm^3$, from $20.4cm^2/Vsec\;to\;41.0cm^2/Vsec$, respectively. The transmittance of ITO films in visible became higher than 90% when annealed in the temperature range of $423K{\sim}573K$. High quality ITO thin films made by RF-superimposed dc reactive magnetron sputtering and annealing in $N_2$ vacuum furnace will be applied to transparent conductive oxides of the advanced flat panel display.