• Title/Summary/Keyword: Glass etching

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Development of a Hot-Embossing Process using Ceramic Glass Molds for Polymer Micro Structures (글라스 주형을 이용한 폴리머 미세 형상 핫-엠보싱 공정 연구)

  • Kim, Joo-Han;Shin, Ki-Hoon
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.16 no.6
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    • pp.168-174
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    • 2007
  • A ceramic glass mold was developed for micro hot-embossing and replicated polymer parts are fabricated. The glass-ceramic micro mold could be fabricated with a laser process and a wet etching process and the fabrication time could be saved a lot. Various polymer micro structures can be obtained by hot-embossing. The process parameters such as ho-embossing temperatures or pressures were investigated and optimized. This process can be applied for fabrication of micro structures for flip-chips or micro fluidic channels for bio-engineering. The advantages and disadvantages of this process are discussed, too.

Fabrication of the Acceleration Sensor Body of Glass by Powder Blasting (미립분사가공을 이용한 유리 소재의 가속도 센서 구조물 성형)

  • Park, Dong-Sam;Kang, Dae-Kyu;Kim, Jeong-Keun
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.2 s.179
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    • pp.146-153
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    • 2006
  • Acceleration sensors have widely been used in the various fields of industry. In recent years, micromachining accelerometers have been developed and commercialized by the micromachining technique or MEMS technique. Typical structure of such sensors consist of a cantilever beam and a vibrating mass fabricated on Si wafers using etching. This study investigates the feasibility of powder blasting technique for microfabrication of sensor structures made of the pyrex glass alternating the existing Si based acceleration sensor. First, as preliminary experiment, effect of blasting pressure, mass flow rate of abrasive and no. of nozzle scanning on erosion depth of pyrex and soda lime glass is studied. Then the optimal blasting conditions are chosen for pyrex sensor. Structure dimensions of designed glass sensor are 2.9mm and 0.7mm for the cantilever beam length and width and 1.7mm for the side of square mass. Mask material is from aluminium sheet of 0.5mm in thickness. Machining results showed that tolerance errors of basic dimensions of glass sensor ranged from 3um in minimum to 20um in maximum. This results imply the powder blasting can be applied for micromachining of glass acceleration sensors alternating the exiting Si based sensors.

Fabrication of a robust, transparent, and superhydrophobic soda-lime glass

  • Rahmawan, Yudi;Kwak, Moon-Kyu;Moon, Myoung-Woon;Lee, Kwang-Ryeol;Suh, Kahp-Yang
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.86-86
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    • 2010
  • Micro- and nanoscale texturing and control of surface energy have been considered for superhydrophobicity on polymer and silicon. However these surfaces have been reported to be difficult to meet the robustness and transparency requirements for further applications, from self cleaning windows to biochip technology. Here we provided a novel method to fabricate a nearly superhydrophobic soda-lime glass using two-step method. The first step involved wet etching process to fabricate micro-sale patterns on soda-lime glass. The second step involved application of $SiO_x$-incorporated DLC to generate high intrinsic contact angle on the surface using chemical vapor deposition (CVD) process. To investigate the effect of surface roughness, we used both positive and negative micro-scale patterns on soda-limeglass, which is relatively hard for surface texturing in comparison to quartz or Pyrex glasses due to the presence of impurities, but cheaper. For all samples we tested the static wetting angle and transparency before and after 100 cycles of wear test using woolen steel. The surface morphology is observed using optical and scanning electron microscope (SEM). The results shows that negative patterns had a greater wear resistance while the hydrophobicity was best achieved using positive patterns having static contact angle up to 140 deg. with about 80% transparency. The overall experiment shows that positive patterns at etching time of 1 min shows the optimum transparency and hydrophobicity. The optimization of micro-scale pattern to achieve a robust, transparent, superhydrophobic soda-lime glass will be further investigated in the future works.

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EFFECTS OF HYDROFLUORIC ACID CONCENTRATION & ETCHING TIME ON THE SHEAR BOND STRENGTH BETWEEN LITHIUM DISILICATE CERAMIC AND RESIN CEMENT (불산 식각 농도 및 시간이 lithium disilicate 도재와 레진시멘트의 전단결합강도에 미치는 영향)

  • Seo, Jae-Min;Park, Charn-Woon;Ahn, Seung-Geun
    • The Journal of Korean Academy of Prosthodontics
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    • v.45 no.4
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    • pp.407-418
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    • 2007
  • Purpose: The objective of this study was to evaluate the effects of hydrofluoric acid concentration & etching time on the shear bond strength between IPS Empress 2 ceramic and resin cement. Material and methods: Thirty three rectangular shape ceramic specimens($20{\times}12{\times}5mm$ size, IPS Empress 2 core materials) were used for this study. The ceramic specimens divided into ten experimental groups with three specimens in each group and were etched with hydrofluoric acid(4%, 9%) according to different etching times(30s, 60s, 90s, 120s, 180s). Etched surfaces of ceramic specimens were bonded with resin cement(Rely X Unicorn) using acrylic glass tube. All cemented specimens were tested under shear loading until fracture on universal testing machine at a crosshead speed of 0.5mm/min and the maximum load at fracture(kg) was recorded. Collected shear bond strength data were analyzed with one way ANOVA and Duncan tests. All etched ceramic surfaces were examined morphologically using SEM(scanning electron microscopy). Results: Shear bond strength of etching group$(35.89{\sim}68.01MPa)$ had four to seven times greater than no-etching group$(9.53{\pm}2.29MPa)$. The ceramic specimen etched with 4% hydrofluoric acid for 60s showed the maximum shear bond strength$(68.01{\pm}11.78MPa)$. Ceramic surface etched with 4% hydrofluoric acid for 60s showed most retentive surface texture. Conclusion: It is considered that 60s etching with 4% hydrofluoric acid is optimal etching methods for IPS Empress 2 ceramic bonding.

STDUY ON THE SURFACE MORPHOLOGE AND SHEAR BOND STRENGTH OF IN-CERAM CORE TO RESIN CEMENT AFTER VARING MODES OF SURFACE CONDITIONING (In-Ceram 코아의 표면처리 방법에 따른 레진 시멘트와의 결함강도 및 표면상태에 관한 연구)

  • Kim, Yeung-Sug;Woo, Yi-Hyung;Lim, Ho-Nam;Choi, Boo-Byung
    • The Journal of Korean Academy of Prosthodontics
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    • v.33 no.4
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    • pp.693-704
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    • 1995
  • This study was performed to evaluate effective surface conditioning method of In-Ceram core to improve bonding with resin cement. The surface of each sample was avraded with glass bead for 20 seconds and then subjected to one of the following conditions : no modification, sandblasting with $50{\mu}m$ slumimum oxide powders for 20 seconds, etching with 20% hydrofluoric acid for 5, 10, and 15 minutes(half of the etched samples were coated with silane), and sandblasting with $250{\mu}m$ aluminum oxide powders and silica coating whith Silicoater MD system(Kulzer, Germany). The surface morphology changes were examined with scanning electronic microscope(SEM. and the shear bond strength of In-Ceram core samples to resin cement(Panavis 21, Kurayay, Japan) were measured. It was concluded that : 1. By SEM observation, 20% HF acid etching did not create clear microretentive structure and surface roughness diminished with increace in etching time. Sandblasting was more effective than 20% hydrofluoric acid etching in producing microretentive structure. 2. The bond strengths of all In-Ceram core samples surface conditioned were increased that that of control group. 3. Silica coating showed higher bond strength than etching with 20% hydrofluoric acid. 4. The use of silane coating was more effective in improving bond strength than lengthening etching time.

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THE SHEAR BOND STRENGTH OF TWO ADHESIVES BONDED TO COMPOSITE RESIN AND GLASS IONOMER CEMENT RESTORATIONS (복합레진과 Glass Ionomer Cement수복물에 대한 Bracket의 접착전단강도)

  • Han, Jae-Ik;Rhee, Byung-Tae
    • The korean journal of orthodontics
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    • v.20 no.3 s.32
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    • pp.583-591
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    • 1990
  • If the bond strength is sufficient to resist orthodontic force, orthodontic brackets can be bonded to restorations. Orthodontic brackets were bonded to composite resin and glass ionomer cement restorations with no-mix adhesive or glass ionomer cement. The shear bond strength of adhesives bonded to restorations was studied in vitro. Orthodontic brackets were bonded to 10 extracted natural teeth, 40 composite resin restorations and 40 glass ionomer restorations. The surfaces of composite resin restorations were roughened or applied with bonding agent (Scothbond) after surface roughening. The surfaces of glass ionomer cement restorations were conditioned with acid etching or applied with Scotchbond to etched surface. The adhesive was no-mix resin or glass ionomer cement. The shear bond strength was measured. The results were as follows: 1. Orthodontic brackets could be bonded to composite resin restorations effectively as they could be bonded to acid etched enamel with no-mix adhesive. The shear bond strength was sufficient to resist orthodontic force and was not affected by bonding agent greatly. 2. The shear bond strength of no-mix adhesive bonded to acid etched glass ionomer cement restorations was sufficient to resist orthodontic force. However. the fracture risk of glass ionomer cement restorations was increased during debonding. The bonding agent couldn't increase the shear bond strength greatly. 3. The shear bond strength of glass ionomer cement bonded to glass ionomer cement restorations was lower than that of no-mix adhesive. The shear bond strength was sufficient to resist orthodontic force and was greatly decreased by bonding agent. 4. The shear bond strength of glass ionomer cement bonded to composite resin restorations was too low to resist orthodontic force.

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Photocatalyst Surface Properties of the Oxide Thin Films According to the Plasma Etching Process (플라즈마 에칭공정에 따른 산화물 박막의 광촉매 표면 특성)

  • Lee, Chang-Hyun;Seo, Sung-Bo;Oh, Ji-Yong;Jin, Ik-Hyeon;Sohn, Sun-Young;Kim, Hwa-Min
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.28 no.5
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    • pp.300-305
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    • 2015
  • $WO_3$, $SiO_2$, and $TiO_2$ films with hydrophilic property are deposited by rf-magnetron sputtering. Their wettability is strongly depends on the presence or absence of the oxygen plasma etching on the glass substrates. The $TiO_2$ film of 50 nm-thick on the plasma etched glass shows a water contact angle (WCA) below $5^{\circ}$ which means a super-hydrophilic surface. However, WCA values are gradually degraded when the films are exposed under atmosphere, especially $WO_3$. In order to improve hydrophilic property, the degraded films can be again recovered by UV illumination for 10 sec using UV-light and the $TiO_2$ film shows a super-hydrophilic surface about $3^{\circ}$.

Atmospheric Pressure Plasma Etching Technology for Forming Circular Holes in Perovskite Semiconductor Materials (페로브스카이트 반도체 물질에 원형 패턴을 형성하기 위한 상압플라즈마 식각 기술)

  • Kim, Moojin
    • Journal of Convergence for Information Technology
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    • v.11 no.2
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    • pp.10-15
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    • 2021
  • In this paper, we formed perovskite (CH3NH3PbI3) thin films on glass with wet coating methods, and used various analytical techniques to discuss film thickness, surface roughness, crystallinity, composition, and optical property. The coated semiconductor material has no defects and is uniform, the surface roughness value is very small, and a high absorption rate has been observed in the visible light area. Next, in order to implement the hole shape in the organic-inorganic layer, Samples in the order of a metal mask with holes at regular intervals, a glass coated with a perovskite material, and a magnet were etched with atmospheric pressure plasma equipment. The shape of the hole formed in the perovskite material was analyzed by changing the time. It can be seen that more etching is performed as the time increases. The sample with the longest processing time was examined in more detail, and it was classified into 7 regions by the difference according to the location of the plasma.

Development of High Aspect Ratio Spacer Process using Anodic Bonding for FED (정전접합을 이용한 고종횡비의 FED용 스페이서 공정 개발)

  • Kim, Min-Su;Kim, Gwan-Su;Mun, Gwon-Jin;U, Gwang-Je;Lee, Nam-Yang;Park, Se-Gwang
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.49 no.1
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    • pp.70-72
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    • 2000
  • In this paper, a spacer process for FED(Field Emission Display) was developed with the glass to glass anodic bonding technology using Al film as an interlayer and a 3.5 inch monochromatic type FED was fabricated. Holder to dislocate spacers vertically was designed with (110) Si wafer by bulk etching. Spacers, $100\mum\; width\; and\; 1000\mum$ height, were formed on anode panel by spacer to glass anodic bonding and the fabricated FED was operated for emission at 1㎸ anode voltage.

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