Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Photocatalyst Surface Properties of the Oxide Thin Films According to the Plasma Etching Process

플라즈마 에칭공정에 따른 산화물 박막의 광촉매 표면 특성

  • Lee, Chang-Hyun (Department of Electronic and Electrical Engineering, Catholic University of Daegu) ;
  • Seo, Sung-Bo (Department of Electronic and Electrical Engineering, Catholic University of Daegu) ;
  • Oh, Ji-Yong (Department of Electronic and Electrical Engineering, Catholic University of Daegu) ;
  • Jin, Ik-Hyeon (Department of Electronic and Electrical Engineering, Catholic University of Daegu) ;
  • Sohn, Sun-Young (Future IT Innovation Laboratory, Pohang University of Science and Technology) ;
  • Kim, Hwa-Min (Department of Electronic and Electrical Engineering, Catholic University of Daegu)
  • 이창현 (대구가톨릭대학교 전자전기공학과) ;
  • 서성보 (대구가톨릭대학교 전자전기공학과) ;
  • 오지용 (대구가톨릭대학교 전자전기공학과) ;
  • 진익현 (대구가톨릭대학교 전자전기공학과) ;
  • 손선영 (포항공과대학교 미래IT융합연구원) ;
  • 김화민 (대구가톨릭대학교 전자전기공학과)
  • Received : 2015.01.22
  • Accepted : 2015.04.24
  • Published : 2015.05.01
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Abstract

$WO_3$, $SiO_2$, and $TiO_2$ films with hydrophilic property are deposited by rf-magnetron sputtering. Their wettability is strongly depends on the presence or absence of the oxygen plasma etching on the glass substrates. The $TiO_2$ film of 50 nm-thick on the plasma etched glass shows a water contact angle (WCA) below $5^{\circ}$ which means a super-hydrophilic surface. However, WCA values are gradually degraded when the films are exposed under atmosphere, especially $WO_3$. In order to improve hydrophilic property, the degraded films can be again recovered by UV illumination for 10 sec using UV-light and the $TiO_2$ film shows a super-hydrophilic surface about $3^{\circ}$.

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