• Korean Journal of Optics and Photonics
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• v.18 no.3
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• pp.221-225
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• 2007

The possibility of improving amplification characteristics and lowering the melting point of bismuth-doped aluminosilicate glass as a new amplification material, which has broadband near-infrared emission at 1300 nm regions, was investigated. Spectroscopic analysis of bismuth-doped aluminosilicate glass shows that the addition of an alkali metal oxide, $Li_{2}O$ increases FWHM of fluorescence spectrum but decreases fluorescence intensity, while $GeO_{2}$ composition increases both FWHM of fluorescence spectrum and fluorescence intensity. Also, excellent optical amplification gain characteristics in a $GeO_{2}$-added sample were observed.

• Journal of the Korean Ceramic Society
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• v.43 no.3 s.286
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• pp.177-184
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• 2006

Dy $L_3$-edge XANES and EXAFS spectra of chalcogenide Ge-As-S glass doped with ca. 0.2 wt% dysprosium have been investigated along with some reference Dy-containing crystals. Amplitude of the white-line peak in XANES spectrum of the glass sample turns out to be stronger than that of other reference crystals, i.e., $DY_2S_3,\;Dy_2O_3\;and\;DyBr_3$. It has been verified from the Dy $L_3$-edge EXAFS spectra that a central Dy atom is surrounded by $6.7{\pm}0.5$ sulfur atoms in its first coordination shell in the Ge-As-S glass, which is relatively smaller than 7.5 of the $Dy_2S_3$ crystal. Averaged Dy-S inter-atomic-distance of the glass ($2.78{\pm}0.01{\AA}$) also turns out to be somewhat shorter than that of the $Dy_2S_3$ crystal ($2.82{\pm}0.01{\AA}$). Such nanostructural changes occurring at Dy atoms imply there being stronger covalency of Dy-S chemical bonds in the Ge-As-S glass than in the crystal counterpart. The enhanced covalency in the nanostructural environment of $Dy^{3+}$ ions inside the glass would then be responsible for optical characteristics of the $4f{\leftrightarrow}4f$ transitions of the dopants, i.e., increase of oscillator strengths and spontaneous radiative transition probabilities.

• ETRI Journal
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• v.27 no.4
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• pp.411-417
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• 2005

$Pr^{3+}-doped$ selenide glass optical fiber, which guarantees single-mode propagation of above at least 1310 nm, has been successfully fabricated using a Ge-Ga-Sb-Se glass system. Thermal properties such as glass transition temperature and viscosity of the glasses have been analyzed to find optimum conditions for fiber drawing. Attenuation loss incorporating the effects of an electronic band gap transition, Rayleigh scattering, and multiphonon absorption has also been theoretically estimated for the Ge-Ga-Sb-Se fiber. A conventional double crucible technique has been applied to fabricate the selenide fiber. The background loss of the fiber was estimated to be approximately 0.64 dB/m at 1650 nm, which can be considered fairly good. When excited at approximately 1470 nm, $Pr^{3+}-doped$ selenide fiber resulted in amplified spontaneous emission and saturation behavior with increasing pump power in a U-band wavelength range of 1625 to 1675 nm.

• ETRI Journal
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• v.23 no.4
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• pp.151-157
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• 2001

Spectroscopic and thermal analysis indicates that tellurite glasses doped with $B_2O_3$ and $GeO_2$ are promising candidate host materials for wide-band erbium doped fiber amplifier (EDFA) with a high 980 nm pump efficiency. In this study, we measured the thermal stabilities and the emission cross-sections for $Er^{3+}:^{4}I_{13/2}\;{\to}\;^{4}I_{15/2}$ transition in this tellurite glass system. We also determined the Judd-Ofelt parameters and calculated the radiative transition rates and the multiphonon relaxation rates in this glass system. The 15 mol% substitution of $B_2O_3$ for $TeO_2$ in the $Er^{3+}-doped\;75TeO_2-20ZnO-5K_2O$ glass raised the multiphonon relaxation rate for $^4I_{11/2}\;{\to}\;^4I_{13/2}$ transition from 4960 $s^{-1}$ to 24700 $s^{-1}$, but shortened the lifetime of the $^4I_{13/2}$ level by 14 % and reduced the emission cross-section for the $^4I_{13/2}\;{\to}\;^4I_{15/2}$ transition by 11%. The 15 mol% $GeO_2$ substitution in the same glass system also reduced the emission cross-section but increased the lifetime by 7%. However, the multiphonon relaxation rate for $^4I_{11/2}{\to}^4I_{13/2}$ transition was raised merely by 1000 $s^{-1}$. Therefore, a mixed substitution of $B_2O_3$ and $GeO_2$ for $TeO_2$ was concluded to be suitable for the 980 nm pump efficiency and the fluorescence efficiency of $^4I_{13/2}{\to}^4I_{15/2}$ transition in $Er^{3+}-doped$ tellurite glasses.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.134-134
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• 2009

In this work, we report that crystallization speed as well as the electrical and optical properties about the N-doped $Ge_2Sb_2Te_5$ thin films. The 200-nm-thick N-doped $Ge_2Sb_2Te_5$ thin film was deposited on p-type (100) Si and glass substrate by RF reactive sputtering at room temperature. The amorphous-to-crystalline phase transformation of N-doped $Ge_2Sb_2Te_5$ thin films investigated by X-ray diffraction (XRD). Changes in the optical transmittance of as-deposited and annealed films were measured using a UV-VIS-IR spectrophotometer and four-point probe was used to measure the sheet resistance of N-doped $Ge_2Sb_2Te_5$ thin films annealed at different temperature. In addition, the surface morphology and roughness of the films were observed by Atomic Force Microscope (AFM). The crystalline speed of amorphous N-doped $Ge_2Sb_2Te_5$ films were measured by using nano-pulse scanner with 658 nm laser diode (power : 1~17 mW, pulse duration: 10~460 ns). It was found that the crystalline speed of thin films are decreased by adding N and the crystalline temperature is higher. This means that N-dopant in $Ge_2Sb_2Te_5$ thin film plays a role to suppress amorphous-to-crystalline phase transformation.

• Journal of the Semiconductor & Display Technology
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• v.9 no.3
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• pp.41-45
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• 2010

The ZnO thin films doped with Ga(GZO) and both Ga and Ge(GZO:Ge) were deposited on glass substrate by using RF sputtering system respectively. Structural, morphological and optical properties of the films deposited in the same condition were investigated. Structural properties of the films were investigated by Field Emission Scanning Electron Microscopy, FE-SEM images and X-ray diffraction, XRD analysis. These studies showed shape of films' surface and direction of film growth respectively. It's showed that all films were deposited by vertical orientation strongly. It can be confirmed that all dopants of targets were included in deposited films by results of EDX analysis. UV-Vis spectrometer results showed that all samples had highly transparent characteristics in visible region and have similar 3.28~3.31 eV band gap. It was found that existence of all dopants by EDX analysis. Morphology and roughness of surface of each film were clearly shown by Atomic Force Microscopy, AFM images. It was found in this research that film doped with Ge more dense and stable with hardly any difference in gap energy compared to ZnO films.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.3 no.3
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• pp.161-165
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• 2002

Ge-doped rnulticomponent oxide glasses were prepared by a conventional melting method. The change of micro structure in glasses was investigated by using PL (photoluminescence) and ESR (electron spin resonance). Before UV irradiation, the PL intensity increased according to germanium contents, but decreased the intensity as soon as UV irradiation. A changed property was recovered near it original properties when it was annealed. These photodarkening and thermal bleaching effect were observed by ESR intrument. These effect did not change the glass phase but vary only change of micro structure.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.24 no.7
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• pp.584-588
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• 2011

The ZnO thin films doped with Ga and Ge (GZO:Ge) were prepared on glass substrate using RF sputtering system. Structural, morphological and optical properties of the films deposited in different temperatures were studied. Proportion of the element of using target was 97 wt% ZnO, 2.5 wt% Ga and 0.5 wt% Ge with 99.99% highly purity. Structural properties of the samples deposited in different temperatures with 200 w RF power were investigated by field emission scanning electron microscopy, FE-SEM images and x-ray diffraction XRD analysis. Atomic force microscopy, AFM images were able to show the grain scales and surface roughness of each film rather clearly than SEM images. it was showed that increasing temperature have better surface smoothness by FE-SEM and AFM images. Transmittance study using UV-Vis spectrometer showed that all the samples have highly transparent in visible region (300~800 nm). In addition, it can be able to calculate bandgap energy from absorbance data obtained with transmittance. The hall resistivity, mobility, and optical band gap energy are influenced by the temperature.

• Korean Journal of Optics and Photonics
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• v.16 no.4
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• pp.340-344
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• 2005

Microlens cells of Ge-doped BPSG (Boro-Phospho-Silicate Glass) are fabricated by dicing the film produced by FHD (Flame Hydrolysis Deposition). Microlens arrays of $53.4{\mu}m$ square unit are produced by the thermal reflow of the diced unit cells at $1200^{\circ}C$. The gap between the microlenses was about $70{\mu}m,$ and the thickness of the produced lens was about $28.4{\mu}m$. We analyzed the reflowed shape of the microlens cell by an image-process technique, and the focal length was about $62.2{\mu}m$. This method of fabricating a microlens is simple and inexpensive compared to the conventional method using the photolithographic process. Also, the control of the radius of curvature of the microlens is easier and a more precise microlens way of various types can be fabricated using this method.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.30 no.3
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• pp.133-138
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• 2017

We evaluated the structural, electrical and optical properties of tungsten (W)-doped $Ge_8Sb_2Te_{11}$ thin films. In a previous work, GeSbTe alloys were doped with different materials in an attempt to improve thermal stability. 200 mm thick $Ge_8Sb_2Te_{11}$ and W-doped $Ge_8Sb_2Te_{11}$ films were deposited on p-type Si (100) and glass substrates using a magnetron co-sputtering system at room temperature. The fabricated films were annealed in a furnace in the $0{\sim}400^{\circ}C$ temperature range. The structural properties were analyzed using X-ray diffraction (X'pert PRO, Phillips). The results showed increased crystallization temperature ($T_c$) leading to thermal stability in the amorphous state. The optical properties were analyzed using an UV-Vis-IR spectrophotometer (Shimadzu, U-3501, range : 300~3,000 nm). The results showed an increase in the crystalline material optical energy band gap ($E_{op}$) and an increase in the $E_{op}$ difference (${\Delta}E_{op}$). This is a good effect to reduce memory device noise. The electrical properties were analyzed using a 4-point probe (CNT-series). This showed increased sheet resistance ($R_s$), which reduces programming current in the memory device.