• Title/Summary/Keyword: Gas Foil

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Graphene synthesis by chemical vapor deposition on Cu foil

  • Kim, Sung-Jin;Yoo, Kwon-Jae;Seo, E.K.;Boo, Doo-Wan;Hwang, Chan-Yong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.351-351
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    • 2011
  • Graphene has drawn great interests because of its distinctive band structure and physical properties[1]. A few of the practical applications envisioned for graphene include semiconductor applications, optoelectronics (sola cell, touch screens, liquid crystal displays), and graphene based batteries/super-capacitors [2-3]. Recent work has shown that excellent electronic properties are exhibited by large-scale ultrathin graphite films, grown by chemical vapor deposition on a polycrystalline metal and transferred to a device-compatible surface[4]. In this paper, we focussed our scope for the understanding the graphene growth at different conditions, which enables to control the growth towards the application aimed. The graphene was grown using chemical vapor deposition (CVD) with methane and hydrogen gas in vacuum furnace system. The grown graphene was characterized using a scanning electron microscope(SEM) and Raman spectroscopy. We changed the growth temperature from 900 to $1050^{\circ}C$ with various gas flow rate and composition rate. The growth condition for larger domain will be discussed.

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Controlled Synthesis of Hexagonal Boron Nitride on Cu Foil Using Chemical Vapor Deposition

  • Han, Jaehyun;Lee, Jun-Young;Kwon, Heemin;Yeo, Jong-Souk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.630-630
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    • 2013
  • Recently, atomically smooth hexagonal boron nitride(h-BN) known as a white graphene has drawn great attention since the discovery of graphene. h-BN is a III-V compound and has a honeycomb structure very similar to graphene with smaller lattice mismatch. Because of strong covalent sp2bonds like graphene, h-BN provides a high thermal conductivity and mechanical strength as well as chemical stability of h-BN superior to graphene. While graphene has a high electrical conductivity, h-BN has a highly dielectric property as an insulator with optical band gap up to 6eV. Similar to the graphene, h-BN can be applied to a variety of field, such as gate dielectric layers/substrate, ultraviolet emitter, transparent membrane, and protective coatings. However, up until recently, obtaining and controlling good quality monolayer h-BN layers have been too difficult and challenging. In this work, we investigate the controlled synthesis of h-BN layers according to the growth condition, time, temperature, and gas partial pressure. h-BN is obtained by using chemical vapor deposition on Cu foil with ammonia borane (BH3NH3) as a source for h-BN. Scanning Transmission Electron Microscopy (STEM, JEOL-JEM-ARM200F) is used for imaging and structural analysis of h-BN layer. Sample's surface morphology is characterized by Field emission scanning electron microscopy (SEM, JEOL JSM-7100F). h-BN is analyzed by Raman spectroscopy (HORIBA, ARAMIS) and its topographic variations by Atomic force microscopy (AFM, Park Systems XE-100).

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Three-Dimensional Numerical Analysis of Spinning Detonation Wave (Spinning Detonation 파의 3차원 수치 해석)

  • Cho, Deok-Rae;Choi, Jeong-Yeol;Won, Su-Hee
    • 한국연소학회:학술대회논문집
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    • 2006.04a
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    • pp.205-212
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    • 2006
  • Three-dimensional numerical study was carried out for the investigation of the detonation wave structures propagating in tubes. Fluid dynamics equations and conservation equation of reaction progress variable were analyzed by a MUSCL-type TVD scheme and four stage Runge-Kutta time integration. Chemical reaction was modeled by using a simplified one-step irreversible kinetics model. The variable gas properties between unburned and burned states were considered by using variable specific heat ratio formulation. The unsteady computational results in three-dimension show the detailed mechanisms of rectangular and diagonal mode of detonation wave instabilities resulting same cell length but different cell width in smoked-foil record. The results for the small reaction constant shows the spinning mode of three-dimensional detonation wave dynamics, which was rarely observed in the previous numerical simulation of the detonation waves.

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Analysis of Poly(Ethylene-co-Vinyl Acetate) Using Off-line Pyrolysis

  • Choi, Sung-Seen;Kim, Eunha
    • Elastomers and Composites
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    • v.51 no.1
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    • pp.63-67
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    • 2016
  • Poly(ethylene-co-vinyl acetate) (EVA) was pyrolyzed to eliminate acetic acid of VA unit using off-line pyrolysis, and the deacetylated EVA was analyzed infrared spectroscopy (IR) and pyrolysis-gas chromatography/mass spectrometry (Py-GC/MS). EVA film for deacetylation was prepared by solution casting on aluminum foil and it was pyrolyzed at low temperature of $300^{\circ}C$ in the off-line pyrolysis apparatus. After deacetylation, carbon-carbon double bond (C=C) was formed by 1,2-elimination of the VA unit in the EVA backbone. Most of C=C bonds were trans-1,4-unit and 1,2-unit was also observed. Presence of the 1,2-unit in deacetylated EVA indicates that terminal or branch VA units exist in the raw EVA. Py-GC/MS chromatogram of deacetylated EVA displayed much smaller acetic acid and much more abundant other pyrolysis products than that of raw EVA, which means that the pyrolysis efficiency and separation condition were improved.

Electrochemical Characteristics of the Silicon Thin Films on Copper Foil Prepared by PECVD for the Negative Electrodes for Lithium ion Rechargeable Battery (PECVD법으로 구리 막 위에 증착된 실리콘 박막의 이차전지 음전극으로서의 전기화학적 특성)

  • Shim Heung-Taek;Jeon Bup-Ju;Byun Dongjin;Lee Joong Kee
    • Journal of the Korean Electrochemical Society
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    • v.7 no.4
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    • pp.173-178
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    • 2004
  • Silicon thin film were synthesized from silane and argon gas mixture directly on copper foil by rf PECVD and then lithium ion batteries were prepared from them employed as the negative electrodes without any further treatment. In the present study, two different kinds of silicon thin films, amorphous silicon and copper silicide were prepared by changing deposition temperature. Amorphous silicon film was prepared below $200^{\circ}C$, but copper silicide film with granular shape was formed by the reaction between silicon radical and diffused copper ions under elevating temperature above $400^{\circ}C$. The amorphous silicon film gives higher capacity than copper silicide, but the capacity decreases sharply with charge-discharge cycling. This is possibly due to severe volume changes. The cyclability is improved, however, by employing the copper silicide as a negative electrode. The copper silicide plays an important role as an active material of the electrode, which mitigates volume change cause by the existence of silicon and copper chemical bonding and provides low electrical resistance as well.

In-situ Observations of Gas Phase Dynamics During Graphene Growth Using Solid-State Carbon Sources

  • Kwon, Tae-Yang;Kwak, Jinsung;Chu, Jae Hwan;Choi, Jae-Kyung;Lee, Mi-Sun;Kim, Sung Youb;Shin, Hyung-Joon;Park, Kibog;Park, Jang-Ung;Kwon, Soon-Yong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.131-131
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    • 2013
  • A single-layer graphene has been uniformly grown on a Cu surface at elevated temperatures by thermally processing a poly(methyl methacrylate) (PMMA) film in a rapid thermal annealing (RTA) system under vacuum. The detailed chemistry of the transition from solid-state carbon to graphene on the catalytic Cu surface was investigated by performing in-situ residual gas analysis while PMMA/Cu-foil samples being heated, in conjunction with interrupted growth studies to reconstruct ex-situ the heating process. The data clearly show that the formation of graphene occurs with hydrocarbon molecules vaporized from PMMA, such as methane and/or methyl radicals, as precursors rather than by the direct graphitization of solid-state carbon. We also found that the temperature for vaporizing hydrocarbon molecules from PMMA and the length of time the gaseous hydrocarbon atmosphere is maintained, which are dependent on both the heating temperature profile and the amount of a solid carbon feedstock are the dominant factors to determine the crystalline quality of the resulting graphene film. Under optimal growth conditions, the PMMA-derived graphene was found to have a carrier (hole) mobility as high as ~2,700 cm2V-1s-1 at room temperature, superior to common graphene converted from solid carbon.

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Growth of Tin Dioxide Nanostructures on Chemically Synthesized Graphene Nanosheets (화학적으로 합성된 그래핀 나노시트 위에서의 이산화주석 나노구조물의 성장)

  • Kim, Jong-IL;Kim, Ki-Chul
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.20 no.5
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    • pp.81-86
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    • 2019
  • Metal oxide/graphene composites have been known as promising functional materials for advanced applications such as high sensitivity gas sensor, and high capacitive secondary battery. In this study, tin dioxide ($SnO_2$) nanostructures were grown on chemically synthesized graphene nanosheets using a two-zone horizontal furnace system. The large area graphene nanosheets were synthesized on Cu foil by thermal chemical vapor deposition system with the methane and hydrogen gas. Chemically synthesized graphene nanosheets were transferred on cleaned $SiO_2$(300 nm)/Si substrate using the PMMA. The $SnO_2$ nanostuctures were grown on graphene nanosheets at $424^{\circ}C$ under 3.1 Torr for 3 hours. Raman spectroscopy was used to estimate the quality of as-synthesized graphene nanosheets and to confirm the phase of as-grown $SnO_2$ nanostructures. The surface morphology of as-grown $SnO_2$ nanostructures on graphene nanosheets was characterized by field-emission scanning electron microscopy (FE-SEM). As the results, the synthesized graphene nanosheets are bi-layers graphene nanosheets, and as-grown tin oxide nanostructures exhibit tin dioxide phase. The morphology of $SnO_2$ nanostructures on graphene nanosheets exhibits complex nanostructures, whereas the surface morphology of $SnO_2$ nanostructures on $SiO_2$(300 nm)/Si substrate exhibits simply nano-dots. The complex nanostructures of $SnO_2$ on graphene nanosheets are attributed to functional groups on graphene surface.

The Design Optimization of a Flow Control Fin Using CFD (CFD를 이용한 유동제어 핀의 최적설계)

  • Wie, Da-Eol;Kim, Dong-Joon
    • Journal of the Society of Naval Architects of Korea
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    • v.49 no.2
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    • pp.174-181
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    • 2012
  • In this paper, the Flow Control Fin(FCF) optimization has been carried out using computational fluid dynamics(CFD) techniques. This study focused on evaluation for the performance of the FCF attached in the stern part of the ship. The main advantage of FCF is to enhance the resistance performance through the lift generation with a forward force component on the foil section, and the propulsive performance by the uniformity of velocity distribution on the propeller plane. This study intended to evaluate these functions and to find optimized FCF form for minimizing viscous resistance and equalizing wake distribution. Four parameters of FCF are used in the study, which were angle and position of FCF, longitudinal location, transverse location, and span length in the optimization process. KRISO 300K VLCC2(KVLCC2) was chosen for an example ship to demonstrate FCF for optimization. The optimization procedure utilized genetic algorithms (GAs), a gradient-based optimizer for the refinement of the solution, and Non-dominated Sorting GA-II(NSGA-II) for Multiobjective Optimization. The results showed that the optimized FCF could enhance the uniformity of wake distribution at the expense of viscous resistance.

Understanding the Growth Kinetics of Graphene on Cu and Fe2O3 Using Inductively-Coupled Plasma Chemical Vapor Deposition

  • Van Nang, Lam;Kim, Dong-Ok;Trung, Tran Nam;Arepalli, Vinaya Kumar;Kim, Eui-Tae
    • Applied Microscopy
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    • v.47 no.1
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    • pp.13-18
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    • 2017
  • High-quality graphene was synthesized on Cu foil and $Fe_2O_3$ film using $CH_4$ gas via inductively-coupled plasma chemical vapor deposition (ICPCVD). The graphene film was formed on $Fe_2O_3$ at a temperature as low as $700^{\circ}C$. Few-layer graphene was formed within a few seconds and 1 min on Cu and $Fe_2O_3$, respectively. With increasing growth time and plasma power, the graphene thickness was controllably reduced and ultimately self-limited to a single layer. Moreover, the crystal quality of graphene was constantly enhanced. Understanding the ICPCVD growth kinetics that are critically affected by ICP is useful for the controllable synthesis of high-quality graphene on metals and oxides for various electronic applications.

CVD Graphene Synthesis on Copper Foils and Doping Effect by Nitric Acid

  • Oh, Teresa
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.5
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    • pp.246-249
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    • 2013
  • Graphene was obtained on Cu foil by thermal decomposition method. A gas mixture of $H_2$ and $CH_4$ and an ambient annealing temperature of $1,000^{\circ}C$ were used during the deposition for 30 Min., and for the transfer onto $SiO_2/Si$ and Si substrates. The physical properties of graphene were investigated with regard to the effect ofnitrogen atom doping and the various substrates used. The G/2D ratio decreased when the graphene became monolayer graphene. The graphene grown on $SiO_2/Si$ substrate showed a low intensity of the G/2D ratio, because the polarity of the $SiO_2$ layer improved the quality of graphene. The intensity of the G/2D ratio of graphene doped with nitrogen atoms increased with the doping time. The quality of graphene depended on the concentration of the nitrogen doping and chemical properties of substrates. High-quality monolayer graphene was obtained with a low G/2D ratio. The increase in the intensity of the G/2D ratios corresponded to a blue shift in the 2D peaks.